| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/03/1985 | EP0045802B1 Photoactive mixture of acrylic monomers and chromophore-substituted halomethyl-triazine |
| 04/03/1985 | EP0045769B1 Pressure-sensitive adhesive tape produced from photoactive mixture of acrylic monomers and polynuclear-chromo phore-substituted halomethyl-s-triazine |
| 04/02/1985 | US4508968 Apparatus for processing negative photoresist |
| 04/02/1985 | US4508814 Waterless negative or positive lithographic printing plate preparation |
| 04/02/1985 | US4508813 Exposing diazotype film to patterned electron beam radiation |
| 04/02/1985 | US4508812 Heating a coating of poly(tert-butyl methacrylate) |
| 04/02/1985 | US4508807 Photosensitive material employing encapsulated radiation sensitive composition and a transparentizable image-receiving layer |
| 04/02/1985 | US4508802 Multiple registration and imaging process to form a set of registered imaged elements |
| 04/02/1985 | US4508749 Etching |
| 04/02/1985 | US4508589 Protective coating stripping apparatus |
| 04/02/1985 | US4508453 Pattern detection system |
| 04/02/1985 | CA1184803A1 Developing diazonium salt polycondensation product layers using a developer composition containing a salt of substituted aromatic carboxylic acid |
| 03/28/1985 | WO1985001363A1 System and method for projecting multiple images directly onto printing plates |
| 03/27/1985 | EP0135348A2 Improvements in or relating to radiation sensitive compounds |
| 03/27/1985 | EP0135234A2 A negative-working photoresist composition for use on a polymethyl methacrylate surface |
| 03/27/1985 | EP0135059A1 Photoimaging compositions containing substituted cyclohexadienone compounds |
| 03/27/1985 | EP0135026A2 Light-curable composition and light-sensitive registration material prepared therefrom |
| 03/27/1985 | EP0134938A2 Dry process for forming metal patterns on a surface |
| 03/27/1985 | EP0134789A1 Bilevel ultraviolet resist system for patterning substrates of high reflectivity. |
| 03/26/1985 | US4507597 Electro-magnetic alignment assemblies |
| 03/26/1985 | US4507497 Water soluble michlers ketone analogs |
| 03/26/1985 | US4507384 Pattern forming material and method for forming pattern therewith |
| 03/26/1985 | US4507383 Material for a planographic plate and a method of preparing such material |
| 03/26/1985 | US4507382 Water developable positive acting lithographic printing plate |
| 03/26/1985 | US4507331 Dry process for forming positive tone micro patterns |
| 03/26/1985 | US4507187 Cured films |
| 03/26/1985 | US4507078 Wafer handling apparatus and method |
| 03/26/1985 | US4506977 Transfer apparatus provided with an auto-focusing mechanism |
| 03/26/1985 | CA1184673A2 Apparatus for projecting a series of images onto dies of a semiconductor wafer |
| 03/26/1985 | CA1184565A1 Light-sensitive compounds, light-sensitive mixture, and light-sensitive copying material prepared therefrom |
| 03/20/1985 | EP0134752A1 Layered material and its use |
| 03/20/1985 | EP0134697A1 Method of manufacturing a colour filter on a solid state colour imaging device and a solid state colour imaging device |
| 03/20/1985 | EP0134678A2 Polymers with graft alpha-alkylarylate functionality |
| 03/20/1985 | EP0134599A1 Improved electrically conductive materials for devices |
| 03/20/1985 | EP0134574A1 Curable light-sensitive mixture as a positively working recording material |
| 03/20/1985 | EP0134453A2 Method for exposure dose calculation of photolithography projection printers |
| 03/20/1985 | EP0134446A1 Negative photoresist formulations with radiation-absorbing additives |
| 03/20/1985 | EP0134438A2 Vacuum and/or electrostatic pinchuck for holding semiconductor wafers or other flat electrical components and method for making the same |
| 03/20/1985 | EP0134407A1 Developer and process for the development of exposed negative reproduction foils |
| 03/20/1985 | EP0134269A1 Electron beam projection lithography |
| 03/20/1985 | EP0134268A1 Positioning and adjusting table and method of manufacture |
| 03/19/1985 | US4506205 Electro-magnetic alignment apparatus |
| 03/19/1985 | US4506204 Electro-magnetic apparatus |
| 03/19/1985 | US4506094 Dye imbibition, photohardening images |
| 03/19/1985 | US4506083 Thioxanthonecarboxylic acid esters, thioesters and amides |
| 03/19/1985 | US4506006 Process for preparing relief images in imaged irradiated light-sensitive material having acid-cleavable compound by hot air treatment, overall irradiation and alkaline development |
| 03/19/1985 | US4506005 Chalcogenides, semiconductors, oxidation, plasma |
| 03/19/1985 | US4506004 Printed wiring board |
| 03/19/1985 | US4506003 Positive-working radiation-sensitive mixture |
| 03/19/1985 | US4505794 Photoinitiators with amines for photopolymerization of unsaturatedcompounds; solubility |
| 03/19/1985 | US4505793 Photopolymerizable compositions |
| 03/19/1985 | US4505223 Optical fiber coating apparatus |
| 03/19/1985 | CA1184321A1 Adhesion of a photoresist to a substrate |
| 03/19/1985 | CA1184298A1 Optically readable information disc and method of manufacturing same |
| 03/19/1985 | CA1184077A1 Process for preparing an overcoated photopolymer printing plate |
| 03/14/1985 | WO1985001127A1 Photopolymerizable compositions |
| 03/12/1985 | US4504964 Laser beam plasma pinch X-ray system |
| 03/12/1985 | US4504726 Pattern generator |
| 03/12/1985 | US4504646 Positive type, radiation-sensitive organic polymer materials |
| 03/12/1985 | US4504629 Polymers with graft α-alkylacrylate functionality |
| 03/12/1985 | US4504574 Method of forming a resist mask resistant to plasma etching |
| 03/12/1985 | US4504573 Photopolymerizable compositions |
| 03/12/1985 | US4504572 Nondiffusing hydroquinone |
| 03/12/1985 | US4504571 Photopolymerization, cohesive strength, image sharpness |
| 03/12/1985 | US4504567 Light-sensitive lithographic printing plate |
| 03/12/1985 | US4504566 Single exposure positive contact multilayer photosolubilizable litho element with two quinone diazide layers |
| 03/12/1985 | US4504565 Radiation imageable compositions containing hollow ceramic microspheres |
| 03/12/1985 | US4504558 Method of compensating the proximity effect in electron beam projection systems |
| 03/12/1985 | US4504372 Acid-curable composition containing a masked curing catalyst, and a process for its preparation |
| 03/12/1985 | US4504045 Wafer transforming device |
| 03/12/1985 | CA1183712A1 Photosensitive element including single effective silver halide grains in a regular geometric spaced array |
| 03/05/1985 | US4503335 Semiconductor printing apparatus with multiple independent temperature control |
| 03/05/1985 | US4503140 Radiation-sensitive compositions of polymers containing a π-metal carbonyl complex of conjugated polyolefin |
| 03/05/1985 | US4503134 Method of modifying surface of colored micro-filter element |
| 03/05/1985 | US4502916 Semiconductors, magnetic bubbles |
| 03/05/1985 | US4502677 Method for feeding recording sheet materials |
| 03/05/1985 | CA1183639A1 Water-dispersible energy curable heterocyclic group- containing polyesters |
| 03/05/1985 | CA1183433A1 Fine-line die and method of making same |
| 03/05/1985 | CA1183382A1 Production relief copies by subjecting an exposed photosensitive layer to ultrasonic treatment |
| 03/05/1985 | CA1183379A1 Light-sensitive mixture and copying material prepared therefrom including a novolak containing brominated phenol units |
| 02/26/1985 | US4501993 Deep UV lamp bulb |
| 02/26/1985 | US4501811 Diffusion transfer process; contains cyanine sensitizing dye |
| 02/26/1985 | US4501810 Lithographic printing plate with resin reinforced image and process |
| 02/26/1985 | US4501809 Photosetting microcapsules and photo- and pressure-sensitive recording sheet |
| 02/26/1985 | US4501806 Photocuring, development of water soluble bisazidocompound, diazocompound and polymer |
| 02/26/1985 | US4501689 Photopolymerizable composition |
| 02/26/1985 | US4501588 Instant thread dyeing method for sewing machine |
| 02/26/1985 | US4501480 System for developing a photo-resist material used as a recording medium |
| 02/26/1985 | US4501061 Fluorine plasma oxidation of residual sulfur species |
| 02/26/1985 | CA1183038A1 Process for the formation of images using a composition including an epoxide resin, a benzenoid polyamine and an aromatic acid progenitor |
| 02/26/1985 | CA1183036A1 Radiation sensitive composition including an acid- free novolak resin, naphthoquinone diazide derivative and acid-sensitive dyestuff |
| 02/26/1985 | CA1183035A1 Radiation sensitive composition including haloalkyl- s-triazine, acid sensitive dyestuff and positive acting diazo oxide |
| 02/20/1985 | EP0133266A2 Process for the production of relief forms with special amides |
| 02/20/1985 | EP0133265A2 Multilayer photosensitive material |
| 02/20/1985 | EP0133216A1 Process for obtaining negative copies using a 1,2-quinone diazide material |
| 02/19/1985 | US4500629 Method of forming images from liquid masses |
| 02/19/1985 | US4500628 Irradiating film consisting of polymer and organosilicon monomer |
| 02/19/1985 | US4500625 Developer is aqueous solution containing alkali silicate and organoboron compound |
| 02/19/1985 | US4500615 Controlling exposure on basis of thickness measurement of photoresist film or chip |
| 02/19/1985 | US4500204 Scanning-type lithographic and image-pickup device using optical fiber |