Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1984
11/07/1984EP0123912A1 Blends of cyclic vinyl ether containing compounds and epoxides
11/07/1984EP0123842A1 Photo-curable epoxy resin type composition
11/06/1984US4481664 Process for inspecting objects showing patterns with dimensional tolerances and reject criteria varying with the locations of said patterns and apparatus and circuits for carrying out said process
11/06/1984US4481340 Photoresists
11/06/1984US4481282 Photocurable polysiloxanes
11/06/1984US4481281 Photoresists for printed circuits
11/06/1984US4481280 Relief printing plates
11/06/1984US4481279 Silane compound in polymer; gas plasma development
11/06/1984US4481276 Photopolymerizable composition containing a combination of photoinitiators
11/06/1984US4481233 Process for producing solid-state color image pickup array
11/06/1984US4481091 By body of characteristic dimension
11/06/1984US4481050 Method of making a three-dimensional photograph
11/06/1984US4481049 Unsaturated ester containing silicon
11/06/1984US4480910 Pattern forming apparatus
11/06/1984CA1177373A1 Stripping compositions and methods of stripping resists
11/06/1984CA1177303A1 Process for the burning-in of light-sensitive layers during the preparation of printing forms
11/06/1984CA1177301A1 Photosensitive composition and lithographic plate manufactured with the same
10/1984
10/31/1984EP0123301A2 Photolithographic process for obtaining structures by the lift-off technique
10/31/1984EP0123159A2 Positive-working photosensitive benzoin esters
10/31/1984EP0123158A2 Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards
10/31/1984EP0123153A2 Plate making process using positive working presensitized plate
10/30/1984US4480105 3,5-Disubstituted phthalic acids and phthalic anhydrides
10/30/1984US4480094 Benzil ketal derivatives
10/30/1984US4479990 Arc and track resistant articles utilizing photosensitive sag resistant cycloaliphatic epoxy resin coating compositions
10/30/1984US4479983 With unsaturated acid modified epoxy resin or epoxidized novolak, phenolic resin, thickener, unsaturated compound, and photoinitiator
10/30/1984US4479860 Organoaluminum compound and peroxysilyl compound as hardening catalyst
10/30/1984CA1176903A1 Radiation-sensitive composition including an iodine- containing azide compound
10/30/1984CA1176902A1 Method for the manufacture of resist structures using short wave uv with a copolymer including chloro or cyano substituted acrylic derivative
10/30/1984CA1176901A1 Resist developer including quaternary ammonium or phosphonium cation
10/30/1984CA1176896A1 Production of photopolymer gravure printing plates by baking the exposed and developed relief layer at 200.sup.oc to 260.sup.oc
10/24/1984EP0122398A2 Pattern forming material and method for forming pattern therewith
10/23/1984US4478992 Photography
10/23/1984US4478977 Photopolymer derivatives of polyvinyl alcohol
10/23/1984US4478932 Process of making a printed circuit using dry film resists
10/23/1984US4478931 Precurled flexographic printing plate
10/23/1984US4478930 Silver and non-silver layers; acrylic and methacrylic copolymers dispersed in colloid layer
10/23/1984US4478885 Surface treating agent
10/17/1984EP0122223A2 Metallocenes and a photopolymerisable composition containing them
10/17/1984EP0121969A2 Lithography system
10/16/1984US4477681 Photosensitive hydroxyalkylphenones
10/16/1984US4477557 Stencil making and utilization methods, apparatus and articles
10/16/1984US4477556 Acidic o-nitroaromatics as photoinhibitors of polymerization in positive working films
10/16/1984US4477553 Photosensitive compositions
10/16/1984US4477552 Stabilization of diazo-resin sensitizers with polyvinyl pyridine
10/16/1984US4477328 Oligomeric acrylate or methacrylate coating on synthetic resin substrate
10/16/1984US4477185 Optical imaging apparatus
10/16/1984US4477182 Pattern exposing apparatus
10/16/1984CA1176090A2 Optical focusing system
10/10/1984EP0121412A2 Method of forming by projection an integrated circuit pattern on a semiconductor wafer
10/10/1984EP0121391A2 Method for peel development
10/10/1984EP0121069A2 Reflecting system for improving the uniformity of a light beam
10/09/1984US4476290 Photocurable silicon compound composition
10/09/1984US4476217 Sensitive positive electron beam resists
10/09/1984US4476216 Method for high resolution lithography
10/09/1984US4476215 Negative-acting photoresist composition
10/09/1984US4475999 Alkyl cinnamyl ketone
10/09/1984US4475811 Overlay test measurement systems
10/09/1984US4475810 Docking sensor system
10/09/1984US4475458 Vacuum frame for offset printing plates
10/09/1984CA1175990A1 Class of photo resists based on donor polymer-doped halocarbon acceptor transfer complexes
10/09/1984CA1175958A1 Pattern generator
10/09/1984CA1175703A1 Image-forming compositions and elements containing ionic polyester dispersing agents
10/03/1984EP0120514A1 Optically readable information disc comprising an envelope of cross-linked synthetic resin
10/03/1984EP0120089A1 Automatically adjustable chip design method
10/03/1984EP0030969B1 Poly(ethylenically unsaturated alkoxy)heterocyclic compounds and crosslinked polymeric coatings
10/03/1984EP0029061B1 Accelerated particle lithographic processing
10/02/1984US4475223 Exposure process and system
10/02/1984US4474869 Crosslinking, patterns
10/02/1984US4474868 Organic peroxide and compound containing cationic oxygen, sulfur oxygen,sulfur or selenium
10/02/1984US4474864 Method for dose calculation of photolithography projection printers through bleaching of photo-active compound in a photoresist
10/02/1984US4474621 Halogen containing polymer
10/02/1984US4474465 Method and apparatus for making a mask conforming to a ceramic substrate metallization pattern
10/02/1984US4474463 Mixer coupling lens subassembly for photolithographic system
10/02/1984US4474445 Vacuum holddown device for flexographic printing plates
10/02/1984CA1175439A1 Imidyl compounds, polymers therefrom, and use of the polymers
10/02/1984CA1175419A1 Reproduction materials based on light sensitive diazo compounds
10/02/1984CA1175385A1 Process for the preparation of screen printing stencils by an electroplating method
10/02/1984CA1175384A1 Lithographic printing plates
10/02/1984CA1175279A1 Solid state devices produced by plasma developing of resists
10/02/1984CA1175227A1 One step optical imaging method
09/1984
09/26/1984EP0119959A1 Process for producing images
09/26/1984EP0119719A1 Radiation sensitive polymer composition
09/26/1984EP0119472A2 Process for the thermal treatment of substrates, particularly semiconductor wafers
09/26/1984EP0119425A1 Photocopolymerizable compositions based on epoxides,polyols containing organic materials and a substituted cycloaliphatic monoepoxide reactive diluent
09/26/1984EP0119387A1 A method for fabricating pellicle cover for photomask
09/26/1984EP0119337A1 Photoresist stripping composition and method
09/26/1984EP0119310A1 Method of fabricating a pellicle cover for projection printing system
09/25/1984US4473639 Reagent strip test for antithrombin-III
09/25/1984US4473292 Dampening system
09/25/1984CA1174891A1 Process for bromine surface treatment of flexographic printing plates containing butadiene/ acrylonitrile copolymers
09/25/1984CA1174890A1 Process for surface treatment of photosensitive elastomeric flexographic printing plates with monopersulphate and bromide salts
09/19/1984EP0119162A2 Photopolymerisable composition, material coated therewith, and process for obtaining relief images
09/19/1984EP0119017A2 Electron-beam and X-ray sensitive polymers and resists
09/19/1984EP0118766A2 Light-sensitive composition
09/19/1984EP0118764A1 Photosensitive polymer composition
09/19/1984EP0118748A1 Blends of epoxy containing organic materials
09/19/1984EP0118623A1 Pellicle cover for photomask
09/19/1984EP0118444A1 Mixer coupling lens subassembly for photolithographic system
09/18/1984US4472020 Structure for monolithic optical circuits
09/18/1984CA1174506A1 Method to make a built up area rotary printing screen
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