| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/03/1986 | US4592650 Apparatus for projecting a pattern on a semiconductor substrate |
| 06/03/1986 | US4592625 Double-conjugate maintaining optical system |
| 05/28/1986 | EP0182745A2 Polyimides, process for their fabrication, and their use |
| 05/28/1986 | EP0182744A2 Radiation curable filled epoxy resin compositions and their use |
| 05/28/1986 | EP0182665A2 Method of projecting a photoelectron image |
| 05/28/1986 | EP0182587A2 A photo resist and a process for manufacturing an integrated circuit |
| 05/28/1986 | EP0182585A2 Optical disc base plate |
| 05/28/1986 | EP0182443A2 X-ray lithographic system, in particular gas control for the same, and method for fabricating a semiconductor substrate |
| 05/28/1986 | EP0182332A2 Method of processing integrated circuits by photolithography |
| 05/28/1986 | EP0182195A2 Process and apparatus for the production of printing screens |
| 05/28/1986 | EP0182031A2 Process for preparing multicolour images |
| 05/28/1986 | EP0181968A1 Process for the production of photographic relief images by tanning development and wash-off processing of silver halide emulsion materials |
| 05/27/1986 | US4592081 Adaptive X-ray lithography mask |
| 05/27/1986 | US4591608 Ultraviolet-curable organopolysiloxane composition |
| 05/27/1986 | US4591547 Plasma etching, semiconductors |
| 05/27/1986 | US4591546 Spin castable resist composition and use |
| 05/27/1986 | US4591545 Photosensitive image-forming material having a layer of photosensitive polyester modified with chain extender |
| 05/27/1986 | US4591540 Superimposing in predetermined alignment |
| 05/27/1986 | US4591522 Liquid photopolymers curable to fire-retardant, hydrolysis resistant compositions |
| 05/27/1986 | US4591406 Automatic laminator with integrated printer buffer/interface |
| 05/27/1986 | US4591265 System for contact printing with liquid photopolymers |
| 05/27/1986 | US4591169 Seal arrangement for retaining a liquid level above a strip passing through a chamber |
| 05/22/1986 | WO1986003033A1 Fabrication of microminiature devices |
| 05/21/1986 | EP0181837A2 Process for the manufacture of films and relief pictures from polyimides |
| 05/21/1986 | EP0181343A1 Method of applying a protective layer on a surface to be subjected to etching. |
| 05/20/1986 | US4590287 Photoinitiators |
| 05/20/1986 | US4590149 Irradiation, heating negative photoresist containing polymer and aromatic azide |
| 05/20/1986 | US4590148 Process for producing light sensitive lithographic plate requiring no dampening solution |
| 05/20/1986 | US4590147 Dry film resists containing unsaturated oligomer |
| 05/20/1986 | US4590146 Stabilization of photopolymerizable mixtures |
| 05/20/1986 | US4590145 Photopolymerization initiator comprised of thioxanthones and oxime esters |
| 05/20/1986 | US4590144 Polyurethane binder having acryloyl groups |
| 05/20/1986 | US4590138 Positive-working photoresist composition and method for forming a light-absorbing matrix in a color CRT structure |
| 05/20/1986 | US4590094 Inverted apply using bubble dispense |
| 05/20/1986 | US4589952 Three level mask |
| 05/20/1986 | US4589769 Exposure apparatus |
| 05/20/1986 | CA1204882A1 Submicron circuit structures and methods of formation |
| 05/20/1986 | CA1204793A1 Transport system for an automatic repetitive registration and imagewise exposure apparatus |
| 05/14/1986 | EP0181194A2 X-ray generating system |
| 05/14/1986 | EP0181193A2 X-ray irradiation system |
| 05/13/1986 | US4588801 Polysilane positive photoresist materials and methods for their use |
| 05/13/1986 | US4588676 Photoexposing a photoresist-coated sheet in a vacuum printing frame |
| 05/13/1986 | US4588675 Vapor deposition of metal film onto substrate, impregnation with polymerizable material, and polymerization |
| 05/13/1986 | US4588671 Quione diazide, iodine |
| 05/13/1986 | US4588670 Light-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresist |
| 05/13/1986 | US4588669 Photosensitive lithographic plate with diazo resin underlayer and polyvinyl acetal resin with azide in side chain overlayer |
| 05/13/1986 | US4588664 Photopolymerizable compositions used in holograms |
| 05/13/1986 | US4588379 Configuration for temperature treatment of substrates, in particular semi-conductor crystal wafers |
| 05/13/1986 | US4588277 Waterless lithographic plate processor |
| 05/10/1986 | CN85107827A Method and apparatus for controlling continuously operation of automatic photo-composer |
| 05/09/1986 | WO1986002744A1 Method of producing devices using nonplanar lithography |
| 05/09/1986 | WO1986002743A1 Photosensitive polymers, preparation thereof and film-forming compositions containing them for photoengraving |
| 05/07/1986 | EP0180466A2 Photopolymerizable composition for use as an etching-resist ink |
| 05/07/1986 | EP0180122A2 Developer for exposed negatively operating registration layers, process for producing printing plates and use of the developer |
| 05/07/1986 | EP0180078A2 Apparatus and method for applying coating material |
| 05/07/1986 | EP0179921A1 Base material having a dyed surface film and dyeing method |
| 05/07/1986 | EP0179823A1 Process for the sensitization of an oxidoreduction photocalatyst, and photocatalyst thus obtained. |
| 05/06/1986 | US4587346 Alkylation with alkene and acid catalyst |
| 05/06/1986 | US4587205 Method of using polysilane positive photoresist materials |
| 05/06/1986 | US4587204 Photopatternable dielectric compositions, method for making and use |
| 05/06/1986 | US4587203 Wet process for developing styrene polymer resists for submicron lithography |
| 05/06/1986 | US4587202 Photoresist-coated metal sheet |
| 05/06/1986 | US4587201 Photo-curable urethane-acrylate resin composition for permanent resist |
| 05/06/1986 | US4587200 Photopolymerizable composition comprising an acridine and a heterocyclic thiol compound as a photopolymerization initiator and a photographic process using said photopolymerizable composition |
| 05/06/1986 | US4587199 Flexible support, removable cover sheet; printed circuits |
| 05/06/1986 | US4587198 Vaporization of color layer under an exposed and developed photoresist to deposit on receptor |
| 05/06/1986 | US4587197 Flexible photosensitive polymer composition with azide and/or amine compound, poly(amic acid) and highly polar compound with boiling point above 150° C. |
| 05/06/1986 | US4587196 Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide |
| 05/06/1986 | US4587194 Multicolor |
| 05/06/1986 | US4587186 Mask element for selective sandblasting and a method |
| 05/06/1986 | US4587165 Films of a copolymer of an ester derived from a fluorine-containing alcohol |
| 05/06/1986 | US4586996 Surface hardner for nylon lens |
| 05/06/1986 | US4586980 Thin films, lift-off, multilayer |
| 05/06/1986 | US4586799 Exposure apparatus |
| 05/06/1986 | CA1204016A1 Actinic light polymerizable coating compositions and method of using the same |
| 04/30/1986 | EP0179508A2 System for contact printing with liquid photopolymers |
| 04/30/1986 | EP0179448A2 Photosensitive planographic printing plate |
| 04/30/1986 | EP0179274A2 Process for the preparation of multicolour images |
| 04/30/1986 | EP0179146A1 Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces. |
| 04/29/1986 | US4585876 Novel xanthones and thioxanthones |
| 04/29/1986 | US4585727 Fixed point method and apparatus for probing semiconductor devices |
| 04/29/1986 | US4585726 Photopolymerizable water-soluble or water-dispersible mixture containing a salt of nitrous acid |
| 04/29/1986 | US4585342 System for real-time monitoring the characteristics, variations and alignment errors of lithography structures |
| 04/29/1986 | CA1203769A1 Treating character fonts of print wheel with monomer and irradiating |
| 04/23/1986 | EP0178660A2 X-ray exposure apparatus |
| 04/23/1986 | EP0178654A2 Method of manufacturing a semiconductor device comprising a method of patterning an organic material |
| 04/23/1986 | EP0178606A2 Molecular controlled structure and method of manufacturing the same |
| 04/23/1986 | EP0178594A2 Process for the preparation of negative copies with a quinodiazide material |
| 04/23/1986 | EP0178496A2 High contrast photoresist developer |
| 04/23/1986 | EP0178495A2 Method of high contrast positive photoresist developing |
| 04/22/1986 | US4584261 Chemically soluble coloidal silver pigment;dotetched lithographic film |
| 04/22/1986 | US4584260 Photopolymerizable compositions with combined photoinitiators |
| 04/22/1986 | US4583840 Exposure apparatus |
| 04/22/1986 | US4583838 Printing apparatus |
| 04/22/1986 | CA1203644A1 Automatically adjustable chip design method |
| 04/22/1986 | CA1203541A1 Nonlinear optical materials and processes employing diacetylenes |
| 04/22/1986 | CA1203442A1 Surface treating agent |
| 04/16/1986 | EP0178208A1 Photosensitive film of a silicon-containing polymer and its use as a mask in photolithographic processes |
| 04/16/1986 | EP0178181A2 Methods for producing an aperture in a surface |
| 04/16/1986 | EP0178156A2 Method of drawing a desired pattern on a target through exposure thereof with an electron beam |