G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1986
10/21/1986	US4618562 Aqueous developable lithographic printing plates containing an admixture of diazonium salts and polymers and composition therefor
10/21/1986	US4618550 Resin printing plate and preparation thereof
10/21/1986	US4618233 Linerarly varying exposure dose photoresist receives
10/21/1986	CA1213092A1 Flexible, fast processing, photopolymerizable composition
10/21/1986	CA1213077A1 Structure and process for lift-off wafer processing
10/21/1986	CA1212890A1 Use of depolymerizable polymers in the fabrication of lift-off structure for multilevel metal processes
10/21/1986	CA1212856A1 Process for the production of images
10/15/1986	EP0197616A1 Photopolymerizable composition and a photo-initiator system
10/15/1986	EP0197601A1 Method of forming a patterned photopolymer coating on a printing roller and also a printing roller with patterned photopolymer coating
10/15/1986	EP0197519A2 Process for masking and resist formation
10/15/1986	EP0197396A2 Process for preparing a multicolour image
10/15/1986	EP0197286A2 A dry development method for a resist film
10/15/1986	EP0197211A1 X-ray exposure system
10/15/1986	CN85102974A Photosensitive recording material for use in the prodn. of planographic printing plate
10/14/1986	US4617681 Bistable aligner cartridge foot
10/14/1986	US4617469 Alignment apparatus
10/14/1986	US4617254 Process for forming detailed images
10/14/1986	US4617253 Polymeric pyridinium ylides and products prepared from same
10/14/1986	US4617252 Antireflective coatings for use in the manufacture of semi-conductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes
10/14/1986	US4617251 Stripping composition and method of using the same
10/14/1986	US4617250 Light-sensitive diazo composition with acidic compounds for use with lithographic printing plates
10/14/1986	US4617094 Co-electrodeposition of coloring material and polymer on electroconductive layers
10/14/1986	US4617085 Process for removing organic material in a patterned manner from an organic film
10/14/1986	US4616908 For projecting a reduced image of a reticle
10/14/1986	CA1212798A1 Polymer composition having terminal alkene and terminal carboxyl groups
10/14/1986	CA1212667A1 Light-sensitive co-condensates
10/09/1986	WO1986005895A1 Device for the alignment, testing and/or measurement of two-dimensional objects
10/09/1986	WO1986005778A1 Photo-initiators for photo-polymerization of unsaturated systems
10/09/1986	WO1986005777A1 Photo-initiator for the photo-polymerization of unsaturated systems
10/08/1986	EP0196999A2 Modified phenolic resins
10/08/1986	EP0196571A1 Photosensitive composition
10/08/1986	EP0196561A1 Photosensitive lithographic printing plate
10/08/1986	EP0196324A1 Post-treatment of cured, radiation sensitive polymerizable resins
10/08/1986	CN85101036A Conjugated diene copolymer, a process for producing the copolymer, and a photosensitive compsition comprising the copolymer
10/07/1986	US4616130 Projection exposure apparatus
10/07/1986	US4615968 Compositions of matter which crosslink under the action of light in the presence of sensitizers
10/07/1986	US4615962 Conjugated polymers coupled to silicon substrate
10/07/1986	US4615782 Undercutting etching of a polysiloxane layer
10/07/1986	US4615621 Auto-focus alignment and measurement system and method
10/07/1986	US4615614 Optical exposure apparatus
10/07/1986	US4615515 For use in a semiconductor circuit manufacturing apparatus
10/02/1986	EP0093110A4 Raster image processor and method.
10/01/1986	EP0196033A2 Multilevel imaging of photopolymer relief layer for the preparation of casting molds
10/01/1986	EP0196031A2 Light-sensitive compositions and light-sensitive materials
10/01/1986	EP0195992A2 Gripping equipment in a laminating machine
10/01/1986	EP0195986A2 High contrast, high resolution deep ultraviolet lithographic resists
10/01/1986	EP0195846A2 Photo-curable epoxy resin type composition and curing process
10/01/1986	CN85107915A Developer and use of developer for exposed negative and process for producing printing form
09/1986
09/30/1986	US4614864 Apparatus for detecting defocus
09/30/1986	US4614706 Method of forming a microscopic pattern with far UV pattern exposure, alkaline solution development, and dry etching
09/30/1986	US4614704 Stable UV curable compositions comprising triphenyl phosphite for forming solder mask coatings of high cure depth
09/30/1986	US4614703 Negative photoresists of α-chlorovinyl methyl ketone copolymers
09/30/1986	US4614701 Photocurable diazo or azide composition with acrylic copolymer having hydroxy and amino groups on separate acrylic monomer units
09/30/1986	CA1212106A1 Light-sensitive, diazonium group-containing polycondensation product, process for its production, and light-sensitive recording material, containing this polycondensation product
09/24/1986	EP0195767A1 Composition and method for preparing a pattern of an adhesive
09/24/1986	EP0195724A2 Spatial phase modulating masks and production processes thereof, and processes for the formation of phase-shifted diffraction gratings
09/24/1986	EP0195479A2 Fine positioning device
09/24/1986	EP0195322A2 Process for the preparation of a photopolymerisable registration material
09/24/1986	EP0195315A2 Process for the production of photoresist patterns
09/24/1986	EP0195291A2 Method of creating patterned multilayer films for use in the production of semiconductor circuits and systems
09/24/1986	EP0195106A1 Lift-off mask production process and use of the mask
09/23/1986	US4613981 Method and apparatus for lithographic rotate and repeat processing
09/23/1986	US4613561 Fluorocarbon or carboxylated surfactant
09/23/1986	US4613560 Photosensitive ceramic coating composition
09/23/1986	US4613400 In-situ photoresist capping process for plasma etching
09/23/1986	US4613398 Protective oxide forming metal
09/23/1986	US4613230 Wafer exposure apparatus
09/23/1986	CA1211869A1 Continuous alignment target pattern and signal processing
09/23/1986	CA1211868A1 Method of forming diffraction gratings and optical branching filter elements produced thereby
09/17/1986	EP0194824A2 A method for preparing a printed circuit board
09/17/1986	EP0194704A1 Process for the formation of linework or halftone multicolour colloid patterns
09/17/1986	EP0194587A2 Light-sensitive diazonium salt polycondensation product, and light-sensitive registration material prepared therewith
09/17/1986	EP0194470A2 Method and composition of matter for improving conductor resolution of microelectronic circuits
09/17/1986	EP0194440A1 Light-sensitive registration material
09/16/1986	US4612276 Method of forming lithographic print plate utilizing water development of an imaged bi-layer negative-working diazonium material
09/16/1986	US4612275 Multilayer resists with improved sensitivity and reduced proximity effect
09/16/1986	US4612274 Electron beam/optical hybrid lithographic resist process in acoustic wave devices
09/16/1986	US4612270 Two-layer negative resist
09/16/1986	US4612268 Method of forming phosphor pattern on fluorescent screen for color picture tubes with polymer coagulent
09/16/1986	US4612267 Process for producing structures in resist layers using ultrasonic irradiation
09/16/1986	US4612085 Photochemical patterning
09/16/1986	US4611967 Cassette-type container for a sheet-like member
09/16/1986	US4611553 Suction nozzle
09/16/1986	CA1211309A1 Electron beam sensitive mixture resist
09/12/1986	WO1986005284A1 Polysiloxane resist for ion beam and electron beam lithography
09/10/1986	EP0193621A1 Photopolymerizable compositions and elements containing acid to reduce scum and stain formation
09/10/1986	EP0193603A1 Photolithography process using positive photoresist containing unbleachable light absorbing agent
09/10/1986	EP0193543A1 Process for forming a layer of patterned photoresist.
09/09/1986	US4610953 Patterns
09/09/1986	US4610952 Photocuring with alkanolacrylamide and h'droxyl-containing polymer, photoinitiators
09/09/1986	US4610951 Process of using a flexible, fast processing photopolymerizable composition
09/09/1986	US4610950 Method of producing printing plates
09/09/1986	US4610949 Printing plates
09/09/1986	US4610948 Lithography and photoprinting, positive resists
09/09/1986	US4610947 Photo polymerization and annealing
09/09/1986	US4610941 Method for photographically improving the resolution of screen printed photopolymer images
09/09/1986	US4610940 Method for fabricating a photomask pattern
09/03/1986	EP0193166A2 Light-sensitive composition and light-sensitive positive registration material
09/03/1986	EP0192967A1 Sulphurated derivatives of aromatic-aliphatic and aliphatic ketones as polymerisation photoinitiators
09/02/1986	US4610020 For X-ray lithography

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