Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/1984
03/06/1984CA1163271A1 Thioxanthonecarboxylic acids, esters, thioesters and amides with reactive functional groups
03/01/1984WO1984000826A1 Aqueous alkaline solution and method for developing positively working reproduction layers
02/1984
02/29/1984EP0101587A2 Positive process for obtaining relief or resist patterns
02/29/1984EP0101586A2 Process for the manufacture of plates for intaglio printing using plastic printing foils
02/28/1984US4434224 Method of pattern formation
02/28/1984US4434223 Photopolymerizable, printing plates
02/28/1984US4434217 Chalcogenide product
02/28/1984US4434035 Mixtures of aromatic-aliphatic ketones as photoinitiators and photopolymerizable systems containing them
02/28/1984US4433994 Method of manufacturing curved discharge tubes
02/28/1984US4433893 Process for producing holograms
02/28/1984CA1162779A1 Method of producing color filters
02/22/1984EP0101210A2 Assembly for use in making a printing plate
02/22/1984EP0101165A2 Developer for use in forming a polyimide pattern
02/22/1984EP0101010A1 Aqueous-alkaline solution and process for developping positively acting layers
02/22/1984EP0100938A2 Treatment of image-forming laminated plate
02/22/1984EP0100920A1 Photosensitive composition and pattern forming process using same
02/22/1984EP0100862A1 2-Acyl-dihydro-1,3-dioxepines, process for their preparation and their use as photoinitiators
02/21/1984US4433130 Cycloalkylsulfonates, polymers and processes relating to same
02/21/1984US4433045 Laser mirror and method of fabrication
02/21/1984US4433044 Dry developable positive photoresists
02/21/1984US4433043 Used for photoresist patterns
02/21/1984CA1162591A1 Apparatus for point to point and line by line recording of image information
02/16/1984WO1984000506A1 Photomagnetic catalysis
02/15/1984EP0100736A2 Structure and process for lift-off wafer processing
02/14/1984US4431923 Alignment process using serial detection of repetitively patterned alignment marks
02/14/1984US4431725 O-quinonediazide and an n-heterocyclic compound as a promoter; photoresists
02/14/1984US4431724 Offset printing plate and process for making same
02/14/1984US4431723 Mercaptocarboxylic acid modified butadiene or isoprene polymer, unsaturated compound and free radical catalyst activated by actinic radiation
02/14/1984US4431685 Decreasing plated metal defects
02/14/1984US4431478 Etching agent for polyimide type resins and process for etching polyimide type resins with the same
02/14/1984US4431304 Apparatus for the projection copying of mask patterns on a workpiece
02/14/1984US4431263 Novel nonlinear optical materials and processes employing diacetylenes
02/14/1984US4431259 Adsorption on polymer matrix containing a diketone
02/08/1984EP0100079A2 Dry resist development using downstream plasma generation
02/08/1984EP0099949A1 Improved aqueous processable, positive-working photopolymer compositions
02/07/1984US4430418 Radiation-sensitive polyimide precursor composition derived from a diaryl fluoronated diamine compound
02/07/1984US4430417 Blend with ethylenically unsaturated compounds and initiator
02/07/1984US4430416 Transfer element for sandblast carving
02/07/1984US4430400 Exposed filter base is developed, dyed, wetted
02/07/1984US4430379 Ink resistant filicone layer containing a fluorine containing surfactant
02/07/1984US4430363 Process of making information carrying systems
02/07/1984US4429983 Developing apparatus for exposed photoresist coated wafers
02/07/1984CA1161685A1 Class of x-ray resists based on donor polymer-doped halocarbon acceptor transfer complexes
02/01/1984EP0099525A2 Photoresist
02/01/1984EP0099426A1 A process for coating a liquid photopolymerizable composition and a process for producing a printed circuit board thereby
01/1984
01/31/1984US4429034 Dry film resists
01/31/1984US4428871 Stripping compositions and methods of stripping resists
01/31/1984US4428807 Composition containing polymerizable entities having oxirane groups and terminal olefinic unsaturation in combination with free-radical and cationic photopolymerizations means
01/31/1984US4428659 Process for developing a graphic arts article
01/31/1984CA1161595A1 Photocurable polymers obtained from succinylosuccinic acid and maleic acid derivatives, processes for the preparation of the polymers, and use of the polymers
01/31/1984CA1161592A1 Photopolymerisation by means of sulfoxonium salts
01/31/1984CA1161295A1 Solid-state color imaging device having a color filter array using a photocrosslinkable barrier
01/31/1984CA1161294A1 Light-sensitive composition including a diazonium saltpolycondensation product and a branched polyurethane binder
01/25/1984EP0099003A2 Developer and process for the development of exposed negative reproduction foils
01/25/1984EP0098982A1 Photopolymerizable mixture, and photopolymerizable copying material produced therewith
01/25/1984EP0098931A2 Process for the production of self-supporting structured foils
01/25/1984EP0098922A2 Process for selectively generating positive and negative resist patterns from a single exposure pattern
01/25/1984EP0098917A2 A method of photoetching polyesters
01/24/1984US4427761 Multicolor
01/24/1984US4427760 Graft polymer of monoester of vinylaromaticmaleic anhydride copolymer and glycidyl monomer
01/24/1984US4427759 Process for preparing an overcoated photopolymer printing plate
01/24/1984US4427758 Sodium bisulfite-aldehyde adduct gelatin hardener
01/24/1984US4427713 Planarization technique
01/24/1984CA1161192A1 Negative-working polymers useful as electron beam resists
01/24/1984CA1160884A1 Non-silver photosensitive material yielding negative tonable images
01/24/1984CA1160882A1 Developer composition for lithographic plates including tetrahydrofurfuryl alcohol
01/18/1984EP0098582A2 Method for patterning layer having high reflectance using photosensitive material
01/18/1984EP0098472A1 Method for decreasing plated metal defects by treating a metallic surface
01/18/1984EP0098318A1 Process for the formation of grooves having essentially vertical lateral silicium walls by reactive ion etching
01/18/1984EP0025036B1 Process for focusing a mask image onto a workpiece
01/17/1984US4426440 Integrated optical grating device by thermal SiO2 growth on Si
01/17/1984US4426439 Method and apparatus for processing negative photoresist
01/17/1984US4426437 Imageable material with radiation absorbing microstructured layers overcoated with photoresist layer
01/17/1984US4426311 Methylene chloride-methane sulfonic acid stripping compositions and methods for using same
01/17/1984US4426247 Method for forming micropattern
01/17/1984US4425869 Fluid flow control mechanism for circuit board processing apparatus
01/17/1984US4425867 Apparatus for applying toner
01/17/1984US4425769 Applying photoresist and photographic film, development, then removal and cathode bombardment
01/11/1984EP0097903A2 Method of electron beam exposure
01/11/1984EP0097864A1 Photopolymerizable mixture and photopolymerizable copying material produced therewith
01/11/1984EP0097831A2 Optical projection systems and methods of producing optical images
01/10/1984US4425508 Electron beam lithographic apparatus
01/10/1984US4425423 Auger microlithography with regard to Auger window
01/10/1984US4425420 Production of a planographic printing plate through the silver complex diffusion transfer process
01/10/1984US4425419 Photosensitive composition
01/10/1984US4425416 Color filter and method for manufacturing the same
01/10/1984US4425208 Compositions and process
01/10/1984US4425076 Process and apparatus for automatic positioning of a substrate on a worktable
01/10/1984US4425038 In a photolithographic system
01/10/1984US4425037 For use in a microlithography system
01/04/1984EP0097509A2 Erasable recording medium comprising a dimer acid polyamide resin
01/04/1984EP0097417A2 Electron beam lithography
01/04/1984EP0097380A2 A system for positioning a utilization device
01/04/1984EP0097333A2 Organopolysiloxanes, process for their production and their use
01/04/1984EP0097282A2 Developer compositions for photoresists
01/04/1984EP0097250A2 Light source
01/04/1984EP0097225A1 Radiation sensitive adhesive
01/03/1984US4424366 Tricyclic imidyl derivatives
01/03/1984US4424325 Photosensitive material
01/03/1984US4424314 Polyurethane acrylate, n-vinylaminocarbonyl compound