Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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09/18/1984 | CA1174493A1 Means for providing uniform illumination to a light sensitive element |
09/14/1984 | EP0104235A4 Electron beam-optical hybrid lithographic resist process. |
09/13/1984 | WO1984003570A1 Method for obtaining and observing color and relief images |
09/12/1984 | EP0118291A2 Photoresist composition containing a novolak resin |
09/12/1984 | EP0118096A2 Enzyme-containing liquid processing agent used in treatment of light-sensitive lithographic printing plates and plate-making method |
09/11/1984 | US4470872 Preventing side-etching by adhering an overhang mask to the sidewall with adhesive |
09/11/1984 | CA1174099A1 Color imaging device having a color filter array using a metal salt of a long-chain fatty acid as a barrier |
09/11/1984 | CA1174097A1 Light-sensitive copying material including a surface-active copolymer consisting of dialkyl- siloxane and oxyalkylene units |
09/05/1984 | EP0117483A1 Laminating and trimming process |
09/05/1984 | EP0117258A1 Process for the production of metallic layers adhering to plastic supports |
09/04/1984 | US4469950 Charged particle beam exposure system utilizing variable line scan |
09/04/1984 | US4469778 As crosslinker for polymer |
09/04/1984 | US4469776 Developing solution for light-sensitive printing plates |
09/04/1984 | US4469775 Multi-layer elements with polyvinyl alcohol overcoat suitable for the production of relief printing plates |
09/04/1984 | US4469774 Relief printing plates, photoresists |
09/04/1984 | US4469772 Lithographic photosensitizers |
09/04/1984 | US4469766 Method of forming cathode-ray tube phosphor screen |
09/04/1984 | US4469625 Display electrodes for computer video display output |
09/04/1984 | US4469424 Method and system for developing a photo-resist material used as a recording medium |
09/04/1984 | US4469414 Restrictive off-axis field optical system |
09/04/1984 | CA1173993A1 Photocrosslinkable polymers with side groups derived from indenone and the preparation and use of these polymers |
09/04/1984 | CA1173889A1 High resolution optical lithography method and apparatus having excimer laser light source and stimulated raman shifting |
09/04/1984 | CA1173689A1 Electron beam exposed positive resist mask process |
09/04/1984 | CA1173688A1 Method of preparing a phosphor suspension |
08/29/1984 | EP0117233A1 Coloured photo-curable mouldings |
08/29/1984 | EP0117078A2 Automatic laminator |
08/29/1984 | EP0117013A2 Additive film and method |
08/29/1984 | EP0116951A2 Photosensitive compositions |
08/29/1984 | EP0116940A2 Pattern transfer device and method |
08/29/1984 | EP0116659A1 Apparatus for applying sheets or the like to both sides of board-like workpieces, and process for operating the same |
08/28/1984 | US4468453 Dry process for forming an image |
08/28/1984 | US4468447 Photosensitive bisazide composition for dry development |
08/28/1984 | US4468116 Process camera for printing pictures of different sizes in the desired display positions |
08/28/1984 | CA1173416A1 Precision lamp positioner |
08/28/1984 | CA1173304A2 Method for forming video discs |
08/28/1984 | CA1173291A1 Planographic printing plate for direct printing |
08/22/1984 | EP0116343A2 Photoresist stripper composition and method of use |
08/22/1984 | EP0116258A2 Photopolymerizable composition, material coated therewith, and use thereof |
08/22/1984 | EP0116123A1 Process for the photopolymerization of vinyl compounds and photopolymerized material |
08/22/1984 | EP0116121A1 Process for the photopolymerization of vinyl compounds and photopolymerized material |
08/21/1984 | US4467082 Benzophenone radical |
08/21/1984 | US4467028 Acid interlayered planographic printing plate |
08/21/1984 | US4467027 Process of developing posi-type lithographic printing plate with inorganic alkali solution |
08/21/1984 | US4467026 Process for drawing patterns with extremely fine features in the production of VLSI, LSI and IC systems |
08/21/1984 | US4467025 O-naphthoquinone diazide and triarylmethane dye |
08/21/1984 | US4467022 Imaging process and article employing photolabile, blocked surfactant |
08/15/1984 | EP0115952A1 Electron beam exposure method and apparatus |
08/15/1984 | EP0115899A2 Positive, laminable proofing construction |
08/15/1984 | EP0115870A2 Photopolymerizable compositions based on polyols and substituted cycloaliphatic monoepoxides |
08/14/1984 | US4465934 Parallel charged particle beam exposure system |
08/14/1984 | US4465768 Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate |
08/14/1984 | US4465760 Production of relief images or resist images by a negative-working method |
08/14/1984 | US4465759 Method of fabricating a pellicle cover for projection printing system |
08/14/1984 | US4465758 1,3-Diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixtures containing same |
08/14/1984 | US4465572 Ripening agent for acrylic plastisols |
08/14/1984 | US4465368 Exposure apparatus for production of integrated circuit |
08/14/1984 | CA1172790A1 Radiation curable composition including an acrylated urethane, and unsaturated carboxylic acid, a multifunctional acrylate and a siloxy-containing polycarbinol |
08/14/1984 | CA1172499A1 Method of making a sight model, said model, its use as a mold part and said mold |
08/14/1984 | CA1172492A1 Process for the production of lithographic printing forms using a light-sensitive material based on diazonium salt polycondensation products |
08/08/1984 | EP0115471A2 Image-forming process |
08/08/1984 | EP0115446A2 Metal film imaging structure |
08/08/1984 | EP0115414A2 Treatment of resin based printing plates |
08/08/1984 | EP0115354A2 Storage stable photopolymerizable composition |
08/08/1984 | EP0115184A1 An automatic focus control device |
08/08/1984 | EP0115156A2 Light sensitive composition |
08/08/1984 | EP0115021A2 Process for obtaining positive relief and printing formes |
08/08/1984 | EP0114949A2 Self-aligning resist mask |
08/08/1984 | EP0114881A1 Photomagnetic catalysis |
08/08/1984 | EP0020773B1 Light-sensitive polymer composition |
08/07/1984 | US4464461 Quaternary alkanol ammonium hydroxide developer and a semicarbizide stabilizer |
08/07/1984 | US4464460 Process for making an imaged oxygen-reactive ion etch barrier |
08/07/1984 | US4464459 Small gaps there between; magnetic bubble or semiconductor |
08/07/1984 | US4464458 Process for forming resist masks utilizing O-quinone diazide and pyrene |
08/07/1984 | US4464457 10-Phenyl-1,3,9-triazaanthracenes and photopolymerizable mixture containing same |
08/07/1984 | US4464456 Flexographic printing plates developable in water or alcohol |
08/07/1984 | US4464455 Dry-developing negative resist composition |
08/07/1984 | US4464221 Photoresist dry film |
08/07/1984 | US4464035 Processing unit for developing photosensitive materials |
08/07/1984 | US4464030 Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system |
08/07/1984 | CA1172112A1 Process for making conductive coatings |
08/07/1984 | CA1172086A1 Photopolymerizable recording material including a thermoplastic diisocyanate-modified nylon binder possessing quaternary nitrogen atoms and photopolymerizable double bonds in side branches |
08/07/1984 | CA1172085A1 Imaging process and article employing photolabile, blocked surfactant |
08/02/1984 | WO1984002986A1 Bilevel ultraviolet resist system for patterning substrates of high reflectivity |
08/01/1984 | EP0114712A2 Device for photolithographically treating a thin substrate |
08/01/1984 | EP0114524A1 Production of high performance optical spatial filters |
08/01/1984 | EP0114517A1 Mark position detecting method and apparatus |
08/01/1984 | EP0114402A2 Method of developing light-sensitive planographic printing plates and automatic development apparatus |
08/01/1984 | EP0114341A2 Dye-containing layer in a photopolymerisable composition, and process for obtaining relief and printing formes |
08/01/1984 | EP0114335A2 Image transfer film unit with modified surface layer |
08/01/1984 | EP0114229A2 Method of forming a lift-off mask with improved oxygen barrier layer |
07/31/1984 | US4463265 Electron beam proximity effect correction by reverse field pattern exposure |
07/31/1984 | US4463142 Photocrosslinkable polymers with side groups derived from indenone and the preparation and use of these polymers |
07/31/1984 | US4463139 Photocrosslinkable polymers having thioetherimidyl side groups |
07/31/1984 | US4462860 End point detection |
07/31/1984 | US4462688 Spectrally tailored wafer chuck shaped light meter |
07/31/1984 | US4462678 Device for feeding and transporting printing forms |
07/31/1984 | CA1171713A1 Presensitized plate for use in lithography including a diazo compound which has been pretreated by heating, uv light, laser or electron beam |
07/25/1984 | EP0114126A2 Method for forming resist pattern |
07/24/1984 | US4461825 Method for forming resist pattern |
07/24/1984 | US4461822 Process for toning image-wise modified surfaces |