Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1984
09/18/1984CA1174493A1 Means for providing uniform illumination to a light sensitive element
09/14/1984EP0104235A4 Electron beam-optical hybrid lithographic resist process.
09/13/1984WO1984003570A1 Method for obtaining and observing color and relief images
09/12/1984EP0118291A2 Photoresist composition containing a novolak resin
09/12/1984EP0118096A2 Enzyme-containing liquid processing agent used in treatment of light-sensitive lithographic printing plates and plate-making method
09/11/1984US4470872 Preventing side-etching by adhering an overhang mask to the sidewall with adhesive
09/11/1984CA1174099A1 Color imaging device having a color filter array using a metal salt of a long-chain fatty acid as a barrier
09/11/1984CA1174097A1 Light-sensitive copying material including a surface-active copolymer consisting of dialkyl- siloxane and oxyalkylene units
09/05/1984EP0117483A1 Laminating and trimming process
09/05/1984EP0117258A1 Process for the production of metallic layers adhering to plastic supports
09/04/1984US4469950 Charged particle beam exposure system utilizing variable line scan
09/04/1984US4469778 As crosslinker for polymer
09/04/1984US4469776 Developing solution for light-sensitive printing plates
09/04/1984US4469775 Multi-layer elements with polyvinyl alcohol overcoat suitable for the production of relief printing plates
09/04/1984US4469774 Relief printing plates, photoresists
09/04/1984US4469772 Lithographic photosensitizers
09/04/1984US4469766 Method of forming cathode-ray tube phosphor screen
09/04/1984US4469625 Display electrodes for computer video display output
09/04/1984US4469424 Method and system for developing a photo-resist material used as a recording medium
09/04/1984US4469414 Restrictive off-axis field optical system
09/04/1984CA1173993A1 Photocrosslinkable polymers with side groups derived from indenone and the preparation and use of these polymers
09/04/1984CA1173889A1 High resolution optical lithography method and apparatus having excimer laser light source and stimulated raman shifting
09/04/1984CA1173689A1 Electron beam exposed positive resist mask process
09/04/1984CA1173688A1 Method of preparing a phosphor suspension
08/1984
08/29/1984EP0117233A1 Coloured photo-curable mouldings
08/29/1984EP0117078A2 Automatic laminator
08/29/1984EP0117013A2 Additive film and method
08/29/1984EP0116951A2 Photosensitive compositions
08/29/1984EP0116940A2 Pattern transfer device and method
08/29/1984EP0116659A1 Apparatus for applying sheets or the like to both sides of board-like workpieces, and process for operating the same
08/28/1984US4468453 Dry process for forming an image
08/28/1984US4468447 Photosensitive bisazide composition for dry development
08/28/1984US4468116 Process camera for printing pictures of different sizes in the desired display positions
08/28/1984CA1173416A1 Precision lamp positioner
08/28/1984CA1173304A2 Method for forming video discs
08/28/1984CA1173291A1 Planographic printing plate for direct printing
08/22/1984EP0116343A2 Photoresist stripper composition and method of use
08/22/1984EP0116258A2 Photopolymerizable composition, material coated therewith, and use thereof
08/22/1984EP0116123A1 Process for the photopolymerization of vinyl compounds and photopolymerized material
08/22/1984EP0116121A1 Process for the photopolymerization of vinyl compounds and photopolymerized material
08/21/1984US4467082 Benzophenone radical
08/21/1984US4467028 Acid interlayered planographic printing plate
08/21/1984US4467027 Process of developing posi-type lithographic printing plate with inorganic alkali solution
08/21/1984US4467026 Process for drawing patterns with extremely fine features in the production of VLSI, LSI and IC systems
08/21/1984US4467025 O-naphthoquinone diazide and triarylmethane dye
08/21/1984US4467022 Imaging process and article employing photolabile, blocked surfactant
08/15/1984EP0115952A1 Electron beam exposure method and apparatus
08/15/1984EP0115899A2 Positive, laminable proofing construction
08/15/1984EP0115870A2 Photopolymerizable compositions based on polyols and substituted cycloaliphatic monoepoxides
08/14/1984US4465934 Parallel charged particle beam exposure system
08/14/1984US4465768 Pattern-formation method with iodine containing azide and oxygen plasma etching of substrate
08/14/1984US4465760 Production of relief images or resist images by a negative-working method
08/14/1984US4465759 Method of fabricating a pellicle cover for projection printing system
08/14/1984US4465758 1,3-Diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixtures containing same
08/14/1984US4465572 Ripening agent for acrylic plastisols
08/14/1984US4465368 Exposure apparatus for production of integrated circuit
08/14/1984CA1172790A1 Radiation curable composition including an acrylated urethane, and unsaturated carboxylic acid, a multifunctional acrylate and a siloxy-containing polycarbinol
08/14/1984CA1172499A1 Method of making a sight model, said model, its use as a mold part and said mold
08/14/1984CA1172492A1 Process for the production of lithographic printing forms using a light-sensitive material based on diazonium salt polycondensation products
08/08/1984EP0115471A2 Image-forming process
08/08/1984EP0115446A2 Metal film imaging structure
08/08/1984EP0115414A2 Treatment of resin based printing plates
08/08/1984EP0115354A2 Storage stable photopolymerizable composition
08/08/1984EP0115184A1 An automatic focus control device
08/08/1984EP0115156A2 Light sensitive composition
08/08/1984EP0115021A2 Process for obtaining positive relief and printing formes
08/08/1984EP0114949A2 Self-aligning resist mask
08/08/1984EP0114881A1 Photomagnetic catalysis
08/08/1984EP0020773B1 Light-sensitive polymer composition
08/07/1984US4464461 Quaternary alkanol ammonium hydroxide developer and a semicarbizide stabilizer
08/07/1984US4464460 Process for making an imaged oxygen-reactive ion etch barrier
08/07/1984US4464459 Small gaps there between; magnetic bubble or semiconductor
08/07/1984US4464458 Process for forming resist masks utilizing O-quinone diazide and pyrene
08/07/1984US4464457 10-Phenyl-1,3,9-triazaanthracenes and photopolymerizable mixture containing same
08/07/1984US4464456 Flexographic printing plates developable in water or alcohol
08/07/1984US4464455 Dry-developing negative resist composition
08/07/1984US4464221 Photoresist dry film
08/07/1984US4464035 Processing unit for developing photosensitive materials
08/07/1984US4464030 Dynamic accuracy X-Y positioning table for use in a high precision light-spot writing system
08/07/1984CA1172112A1 Process for making conductive coatings
08/07/1984CA1172086A1 Photopolymerizable recording material including a thermoplastic diisocyanate-modified nylon binder possessing quaternary nitrogen atoms and photopolymerizable double bonds in side branches
08/07/1984CA1172085A1 Imaging process and article employing photolabile, blocked surfactant
08/02/1984WO1984002986A1 Bilevel ultraviolet resist system for patterning substrates of high reflectivity
08/01/1984EP0114712A2 Device for photolithographically treating a thin substrate
08/01/1984EP0114524A1 Production of high performance optical spatial filters
08/01/1984EP0114517A1 Mark position detecting method and apparatus
08/01/1984EP0114402A2 Method of developing light-sensitive planographic printing plates and automatic development apparatus
08/01/1984EP0114341A2 Dye-containing layer in a photopolymerisable composition, and process for obtaining relief and printing formes
08/01/1984EP0114335A2 Image transfer film unit with modified surface layer
08/01/1984EP0114229A2 Method of forming a lift-off mask with improved oxygen barrier layer
07/1984
07/31/1984US4463265 Electron beam proximity effect correction by reverse field pattern exposure
07/31/1984US4463142 Photocrosslinkable polymers with side groups derived from indenone and the preparation and use of these polymers
07/31/1984US4463139 Photocrosslinkable polymers having thioetherimidyl side groups
07/31/1984US4462860 End point detection
07/31/1984US4462688 Spectrally tailored wafer chuck shaped light meter
07/31/1984US4462678 Device for feeding and transporting printing forms
07/31/1984CA1171713A1 Presensitized plate for use in lithography including a diazo compound which has been pretreated by heating, uv light, laser or electron beam
07/25/1984EP0114126A2 Method for forming resist pattern
07/24/1984US4461825 Method for forming resist pattern
07/24/1984US4461822 Process for toning image-wise modified surfaces