Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1985
11/21/1985EP0161476A2 A process for producing a negative tone resist image
11/21/1985EP0161463A1 Polymeric or polymerisable aromatic-aliphatic ketones suitable for use as polymerisation photoinitiators
11/21/1985EP0161461A2 Process for the anodic oxidation of aluminium and its use as a support material for offset printing plates
11/21/1985EP0161258A1 Data handling system for a pattern generator
11/21/1985EP0161256A1 GRAFT POLYMERIZED SiO 2? LITHOGRAPHIC MASKS.
11/19/1985USRE32033 Patterning semiconductors
11/19/1985US4554458 Electron beam projection lithography
11/19/1985US4554373 Method of preparing telomers which can be cross-linked by light
11/19/1985US4554346 Preparation of curable resin from cyanate ester compound
11/19/1985US4554339 Organopolysiloxanes containing both acryloxyalkyl groups and Si-bonded hydrogen atoms in the same molecule
11/19/1985US4554240 Photosensitive recording material which can be developed with water, for the production of printing plates, relief plates or resist images
11/19/1985US4554238 Spectrally-sensitized imaging system
11/19/1985US4554237 Photosensitive resin composition and method for forming fine patterns with said composition
11/19/1985US4554236 Amino acid stabilizers for water soluble diazonium compound condensation products
11/19/1985US4554235 Microencapsulated transfer imaging system employing developer sheet and discontinuous layer of thermoplastic pigment
11/19/1985US4554229 Multilayer hybrid integrated circuit
11/19/1985US4554040 Knit fabric, thermoplastic elastomer, vacuum, heating, bonding
11/19/1985US4553834 Mask aligner having a malfunction disposal device
11/19/1985CA1196813A1 Antibuckling apparatus for lithographic printing plates
11/13/1985EP0161029A1 Device for exchanging masks
11/13/1985EP0160979A2 Printing method by electrolytic colloid coagulation and colloid composition therefor
11/13/1985EP0160742A1 Slope etch of polyimide
11/12/1985US4552835 Silver halide photographic light-sensitive element having a light insensitive upper layer
11/12/1985US4552833 Radiation sensitive and oxygen plasma developable resist
11/12/1985US4552831 Fabrication method for controlled via hole process
11/12/1985US4552830 Unsaturated compound, free radical-producing photoinitiator fluora color former, proton donor
11/12/1985US4552829 Transfer sheet with color pattern having metallic luster, and method of manufacturing said sheet
11/12/1985CA1196649A1 2-acylated dihydro-1,3-dioxepins, process for the production thereof and use thereof as photo- initiators
11/07/1985WO1985004912A1 Base material having a dyed surface film and dyeing method
11/06/1985EP0160518A2 Optical image bar
11/06/1985EP0160468A2 Process for the ozone protection of photopolymer-flexoprinting plates by liquid polyether
11/06/1985EP0160257A2 Fluor-containing copolymers, process for their preparation and their use
11/06/1985EP0160248A2 Method of forming narrow photoresist lines on the surface of a substrate
11/06/1985EP0159985A1 Improvements in or relating to electro-sensitive materials
11/05/1985US4551522 Process for making photopolymerizable aromatic polyamic acid derivatives
11/05/1985US4551418 Process for preparing negative relief images with cationic photopolymerization
11/05/1985US4551417 Addition polymers containing silyl groups
11/05/1985US4551416 Process for preparing semiconductors using photosensitive bodies
11/05/1985US4551415 Photosensitive coatings containing crosslinked beads
11/05/1985US4551414 Chlorinated methacrylate polymerized with a fluorinated methacrylate
11/05/1985US4551409 Photoresist composition of cocondensed naphthol and phenol with formaldehyde in admixture with positive o-quinone diazide or negative azide
11/05/1985US4551408 Color image forming method and color image forming photo-sensitive material to be used therefor
11/05/1985US4551407 Transfer imaging system
11/05/1985US4551192 Electrostatic or vacuum pinchuck formed with microcircuit lithography
11/05/1985CA1196308A1 Natural lithographic fabrication of microstructures over large areas
11/05/1985CA1196223A1 Imageable materials
10/1985
10/30/1985EP0159854A2 Flexible display image
10/30/1985EP0159621A2 Method for tapered dry etching
10/30/1985EP0159579A2 Soluble surfactant additives for ammonium fluoride/hydrofluoric acid oxide etchant solutions
10/30/1985EP0159428A1 Anti-reflective coating
10/29/1985US4550074 Sensitizing bath for chalcogenide resists
10/29/1985US4550073 For proofs, printing plates; non-tacky produces clear images
10/29/1985US4550072 Photosensitive recording materials containing particles for the production of abrasion-resistant gravure printing plates, and the production of gravure printing plates using these recording materials
10/29/1985US4550069 Positive photoresist compositions with o-quinone diazide, novolak, and propylene glycol alkyl ether acetate
10/29/1985US4549944 Electrochemical developing process for reproduction layers
10/29/1985US4549843 Mask loading apparatus, method and cassette
10/29/1985CA1196112A1 Self-aligning mask
10/29/1985CA1195869A1 Process for preparing relief images
10/24/1985WO1985004780A1 Multilayer hybrid integrated circuit
10/23/1985EP0035530B1 Imageable, composite dry-transfer sheet
10/22/1985US4549084 Alignment and focusing system for a scanning mask aligner
10/22/1985US4548895 Heating 1,2-epoxy compound and polymerizing agent, expose to altin
10/22/1985US4548894 Photosensitive recording materials for the production of abrasion-resistant and scratch-resistant gravure printing plates comprising particles
10/22/1985US4548893 Negative working, vinyl polymer having aromatic quaternized nitrog
10/22/1985US4548892 Photopolymerizable composition containing acylhaloacetic acid amide derivatives
10/22/1985US4548891 Photoresists; heat resistance; thickness; sharpness
10/22/1985US4548890 Water-based photopolymerizable compositions and their use
10/22/1985US4548884 Applying photosensitive liquid between substrate and photomask which are hinged together
10/22/1985US4548689 Radical polymerizable monomer, ketocarbonyl compound and mercaptob
10/22/1985US4548688 Uv radiation, heating
10/22/1985CA1195595A1 Etching solution for etching of photopolymeric films
10/16/1985EP0158357A2 Method of forming resist micropattern
10/16/1985EP0158139A1 Error-corrected corpuscular beam lithography
10/16/1985EP0157932A1 Process for the preparation of polyimidazole and polyimidazopyrrolone relief structures
10/16/1985EP0157931A1 Process for preparing precursors of polyimidazoles and polyimidazo pyrrolones
10/16/1985EP0157930A1 Process for the preparation of polyimide and polyisoindolo-quinazoline dione relief structures
10/16/1985EP0157929A1 Process for preparing precursors of polyimides and polyisoindolo-quinazoline diones
10/16/1985EP0157783A1 Thermal development of photosensitive materials employing microencapsulated radiation sensitive compositions.
10/15/1985US4547457 Process of preparing toner treated with polymeric quaternary ammonium salt and slip agent
10/15/1985US4547456 Heat mode recording material and a recording method by the use thereof
10/15/1985US4547455 Process of forming polyimide pattern and developer therefor
10/15/1985US4547454 Base, photosensitive layer and adhesive consisting of binder and methylolated melamine-formaldehyde resin
10/15/1985US4547453 Photosensitive image layer, foamed polyvinyl chloride layer, support layer
10/15/1985US4547450 Silver halide sensor type polymerizable light-sensitive material
10/15/1985US4547394 Use of hydroxyalkylphenones as initiators for radiation curing of aqueous prepolymer dispersions
10/15/1985US4547066 Exposure apparatus
10/15/1985US4547044 Beam-folding wedge tunnel
10/15/1985CA1195181A1 Step and repeat adaptor for a large size platemaker
10/15/1985CA1195166A1 Photosensitive materials for use in making dry transfers
10/09/1985EP0157374A2 Radiation-polymerisable composition and process for applying markings to a solder resist layer
10/09/1985EP0157262A1 Novel electron beam resist materials
10/09/1985EP0157261A2 Printed circuit board laminating apparatus
10/09/1985EP0157241A1 Photosensitive recording material and its use in a process for the production of a printing plate or a printed circuit
10/08/1985US4546072 Toners treated with polymeric quaternary ammonium salts and slip agent
10/08/1985US4546067 Image production utilizing multifunctional light sensitive compounds
10/08/1985US4546066 Method for forming narrow images on semiconductor substrates
10/08/1985US4546064 Positive-working photoresist composition and method for forming a light-absorbing matrix
10/08/1985CA1195039A1 Radiation-sensitive polyimide precursor composition derived from a diaryl fluoro compound
10/08/1985CA1194765A1 Stripping compositions and methods of stripping resists
10/08/1985CA1194764A1 Stripping compositions and methods of stripping resists
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