| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/17/1984 | CA1165932A1 Polymeric amide-ester resin heat-resistant photopolymerizable semiconductor and capacitor relief coatings |
| 04/17/1984 | CA1165902A1 Method of manufacturing a semiconductor device |
| 04/17/1984 | CA1165761A1 Class of e-beam resists based on conducting organic charge transfer salts |
| 04/17/1984 | CA1165613A2 Method for developing photoresist layer on a video disc master |
| 04/17/1984 | CA1165610A1 Aqueous developer containing nonionic surfactant and salts of aliphatic monocarboxylic and carboxylic acids |
| 04/12/1984 | WO1984001454A1 Automatically adjustable chip design method |
| 04/11/1984 | EP0105109A1 Gelatin silver photographic elements for tanning development |
| 04/10/1984 | US4442302 Photopolymer compositions for printing plates |
| 04/10/1984 | US4442199 Pattern formation with negative type resist |
| 04/10/1984 | US4442197 Photocurable compositions |
| 04/10/1984 | US4442196 Photosensitive composition |
| 04/10/1984 | US4442195 Photosensitive composition and article with o-quinone diazide and 6-membered cyclic acid-anhydride |
| 04/10/1984 | CA1165466A1 Method of producing relief structures for integrated semiconductor circuits |
| 04/10/1984 | CA1165164A1 Developing exposed negative-working diazonium salt layers using a mixture containing salt of an alkanoic acid and a block copolymer of ethylene and propylene oxides |
| 04/04/1984 | EP0104954A2 Multilayer dry-film photoresist |
| 04/04/1984 | EP0104917A2 Deflection system in an electron beam exposure device |
| 04/04/1984 | EP0104863A2 Light-sensitive planographic printing plate |
| 04/04/1984 | EP0104763A2 An electron beam pattern transfer system having an autofocusing mechanism |
| 04/04/1984 | EP0104751A2 Photosensitive elastomeric polymer composition for flexographic printing plates |
| 04/04/1984 | EP0104685A2 Method of manufacturing a mask for obtaining texturised patterns in resist layers using X-ray lithography |
| 04/04/1984 | EP0104590A1 Photocurable silicon compound composition |
| 04/04/1984 | EP0104537A2 Developer and development process for negative-exposure reproduction layers |
| 04/04/1984 | EP0104371A2 Variable resolution X-ray lithography systems |
| 04/04/1984 | EP0104351A1 Gelatin silver halide photographic elements for tanning development |
| 04/04/1984 | EP0104235A1 Electron beam-optical hybrid lithographic resist process |
| 04/03/1984 | US4440850 Photopolymerisation process with two exposures of a single layer |
| 04/03/1984 | US4440846 Photocopy sheet employing encapsulated radiation sensitive composition and imaging process |
| 04/03/1984 | US4440802 Preparation of prepregs from cellulosic fibers using water-borne resin compositions |
| 04/03/1984 | US4440586 Method of manufacturing a die for duplicating plastics information carriers |
| 04/03/1984 | US4440493 Printing apparatus |
| 04/03/1984 | CA1165016A1 Plugged pinhole thin film and method of making same |
| 04/03/1984 | CA1164978A1 Position control circuit |
| 04/03/1984 | CA1164723A1 Process for heating printing plates |
| 04/03/1984 | CA1164713A1 Method and apparatus for transferring patterns |
| 04/03/1984 | CA1164712A1 Preparation of relief copies by heating an irradiated copying material containing a compound with an acid cleavable c-o-c group |
| 04/03/1984 | CA1164711A1 Light-curable mixture containing a diazonium salt polycondensation product or an organic azide and a polymer with alkenylsulfonylurethane side groups |
| 04/03/1984 | CA1164710A1 Phototropic photosensitive compositions containing fluoran colorformer |
| 04/03/1984 | CA1164707A1 Dye imbibition imaging material including cationic mordant layer and photosensitive polyesterionomer layer |
| 03/28/1984 | EP0104143A1 Photopolymerizable compositions containing diaryliodosyl salts |
| 03/28/1984 | EP0104057A2 Radiation curable coating for photographic laminate |
| 03/28/1984 | EP0103808A1 Stripping compositions and methods of stripping resists |
| 03/28/1984 | EP0103800A2 Bisarido compounds, light-sensitive compositions containing them and process for obtaining relief images |
| 03/28/1984 | EP0103671A2 Method and apparatus for forming a subsequent metallization pattern on a ceramic substrate |
| 03/27/1984 | US4439517 Process for the formation of images with epoxide resin |
| 03/27/1984 | US4439516 High temperature positive diazo photoresist processing using polyvinyl phenol |
| 03/27/1984 | US4439515 Light-sensitive ethylenically unsaturated materials containing benzanthrones and novel sensitizers |
| 03/27/1984 | US4439514 Photoresistive compositions |
| 03/27/1984 | US4439511 Light-sensitive mixture based on O-naphthoquinone diazide ester of condensate of bisphenol and formaldehyde and light-sensitive copying material prepared therefrom |
| 03/27/1984 | US4439464 Composition and method for forming amorphous chalcogenide films from solution |
| 03/27/1984 | US4439244 Apparatus and method of material removal having a fluid filled slot |
| 03/27/1984 | US4439243 Apparatus and method of material removal with fluid flow within a slot |
| 03/27/1984 | US4439022 Arrangement for the point- and line-wise recording of image information |
| 03/27/1984 | CA1164267A1 Dry planographic printing plate and preparation thereof |
| 03/27/1984 | CA1164262A1 Photosensitive bodies including an o-nitroarylmethyl ester |
| 03/27/1984 | CA1164261A1 PROCESS FOR FORMING RESIST PATTERNS BY DEVELOPING A POLYMER CONTAINING TRIFLUOROETHYL-.alpha.- CHLOROCRYLATE UNITS WITH SPECIFIC KETONE COMPOUNDS |
| 03/21/1984 | EP0103337A1 Method of manufacturing a semiconductor device |
| 03/21/1984 | EP0103305A1 Photo-curable epoxy resin composition |
| 03/21/1984 | EP0103294A1 N-alkylindolylidene and N-alkylbenzothiazolylidene alkanones as sensitizers for photopolymer compositions |
| 03/21/1984 | EP0103247A2 Method and device for determination of antithrombin-III |
| 03/21/1984 | EP0103225A2 Photoresist for creating relief structures on high-temperature resistant polymers |
| 03/21/1984 | EP0103218A1 10-Phenyl-1,3,9-triazaanthracenes and photopolymerisable mixture containing these compounds |
| 03/21/1984 | EP0103197A1 Acidic O-nitroaromatics as photoinhibitors of polymerization in positive working films |
| 03/21/1984 | EP0103188A2 Improved shock and vibration isolation system |
| 03/21/1984 | EP0103052A1 Method for forming patterned resist layer on semiconductor body |
| 03/20/1984 | US4438278 Crosslinkable monomers |
| 03/20/1984 | US4438245 Polymers containing aromatic sulfonic acid ester or amide groups |
| 03/20/1984 | US4438192 Photoresist stripper composition and method of use |
| 03/20/1984 | US4438190 Protective coatings for printed circuits |
| 03/20/1984 | US4438189 Polyunsaturated compound, crosslinkable epoxy or methylol compound |
| 03/20/1984 | US4437959 Photopolymerizable composition based on epoxy compound |
| 03/20/1984 | US4437924 Method of making fine-line die |
| 03/20/1984 | US4437836 Photopolymerizable dental compositions |
| 03/20/1984 | US4437760 Reusable electrical overlay measurement circuit and process |
| 03/20/1984 | CA1164028A1 High vacuum compatible air bearing stage |
| 03/20/1984 | CA1163858A1 Waterless planographic printing plate and process for using same |
| 03/20/1984 | CA1163852A1 Image formation process using a positive resist composition containing a film forming material having a substituted benzoin group in the chain backbone |
| 03/15/1984 | WO1984001039A1 Mixer coupling lens subassembly for photolithographic system |
| 03/14/1984 | EP0102921A2 Process for making images from liquid substances |
| 03/14/1984 | EP0102629A1 Stripping compositions and methods of stripping resists |
| 03/14/1984 | EP0102628A1 Stripping compositions and methods of stripping resists |
| 03/14/1984 | EP0102586A1 1,3-Diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixture containing these compounds |
| 03/14/1984 | EP0102528A2 Voltage to pressure transducer |
| 03/14/1984 | EP0102450A2 Resist compositions |
| 03/13/1984 | US4436807 Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material |
| 03/13/1984 | US4436806 Photopolymerization, curing |
| 03/13/1984 | US4436804 Light-sensitive polymeric diazonium condensates and reproduction compositions and materials therewith |
| 03/13/1984 | CA1163726A1 Gripping arrangement for an apparatus for automatically laminating circuit boards |
| 03/13/1984 | CA1163654A1 Shock and vibration isolation system |
| 03/13/1984 | CA1163491A1 Transfer, encapsulating, and fixing of toner images |
| 03/13/1984 | CA1163489A1 Process for making an imaging medium solution by heating a combination including a dye dispersion and a nitrocellulose solution |
| 03/09/1984 | EP0088091A4 Method and apparatus for transport of a substrate. |
| 03/07/1984 | EP0102198A2 Apparatus and method of material removal with fluid flow within a slot |
| 03/07/1984 | EP0101976A2 Negative process for obtaining relief or resist patterns |
| 03/07/1984 | EP0101752A1 Reversal process for the production of chromium masks |
| 03/06/1984 | US4435498 Manufacture of wafer-scale integrated circuits |
| 03/06/1984 | US4435497 Carboxyl-containing compositions and their polymerization |
| 03/06/1984 | US4435496 With free radical photosensitizer |
| 03/06/1984 | US4435491 Electroconductive support with hydrophilic surface with light sensitive layer and photoconductive insulation |
| 03/06/1984 | US4435489 Cationic hydrazone derivatives, processes for their preparation and their use |
| 03/06/1984 | US4435259 Radiation curable composition of vinyl polysiloxane and hydrogen polysiloxane with photosensitizer |