G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1986
12/02/1986	CA1214676A1 Light-sensitive mixture based on o-naphthoquinone diazides and light-sensitive copying material prepared therefrom
11/1986
11/26/1986	EP0203030A2 Coated material and its use
11/26/1986	EP0203014A2 Photomechanical contact device for the correction of the image deformation in a metal box extrusion process
11/26/1986	EP0202961A1 Apparatus for projecting and exposing a photomask pattern onto re-exposing substrates
11/26/1986	EP0202907A2 In-situ photoresist capping process for plasma etching
11/26/1986	EP0202880A2 Seismic Isolation system, including microlithography system for submicron design rule
11/26/1986	EP0202705A1 Patterned polyimide film, a photosensitive polyamide acid derivative and an electrophoretic image-display cell
11/26/1986	EP0202690A2 Photoimaging compositions containing substituted cyclohexadienone compounds
11/26/1986	EP0202490A1 Method for forming a polymer image and image recording material therefor
11/26/1986	EP0202458A2 Cross-linked polyalkenyl phenol based photoresist compositions
11/26/1986	EP0202396A2 Scanning wedge method for determining characteristics of a photoresist
11/25/1986	US4625121 Method of electron beam exposure
11/25/1986	US4625120 Deep ultraviolet (DUV) flood exposure system
11/25/1986	US4624912 Thermally transferable layers of radiation sensitive epoxy resins used to prepare protective coatings and relief images
11/25/1986	US4624910 Photopolymerization
11/25/1986	US4624909 Photosensitivity, diazo compound, microelectronic device, etching
11/25/1986	US4624908 Deep ultra-violet lithographic resist composition and process of using
11/25/1986	US4624560 Capsule rupture printing system
11/25/1986	US4624557 Photomask carrier and container for photomask carrier
11/25/1986	US4624551 Light irradiation control method for projection exposure apparatus
11/25/1986	CA1214463A1 Acylphosphine compounds, their preparation and their use
11/25/1986	CA1214351A1 Process for surface improvement of surprint proof with transparentized particulate material
11/25/1986	CA1214349A1 Method and apparatus for setting and monitoring an exposure spot for printing
11/20/1986	WO1986006876A1 Optical provision of connections in integrated devices
11/20/1986	WO1986006730A1 Aqueous alkaline developable, uv curable urethane acrylate compounds and compositions useful for forming solder mask coatings
11/20/1986	EP0202196A2 Cyclic acetals or ketals of beta-ketoesters or amides
11/20/1986	EP0202177A1 Organopolysiloxane composition comprising compounds which generate free radicals and which can be cross-linked by energy
11/20/1986	EP0201903A2 Photopolymerizable composition
11/20/1986	EP0201869A2 Screen printing process
11/20/1986	EP0201836A2 Negative-working, non-swelling resist
11/19/1986	CN86101758A Photographic method and apparatus for forming images on plain paper
11/19/1986	CN86101349A Magnetic brush abrasion development of imaging sheets employing photosensitive microcapsules
11/18/1986	US4623676 Photocurable
11/18/1986	US4623611 Photolithographic stripping method for removing contrast enhancement layer
11/18/1986	US4623610 Positive image-forming method using 4-methyl-1-pentene polymer
11/18/1986	US4623609 Process for forming patterns using ionizing radiation sensitive resist
11/18/1986	US4623608 Method and apparatus for coating a selected area of the surface of an object
11/18/1986	US4623607 Coating defects, selective masking and irradiation
11/18/1986	US4623257 Alignment marks for fine-line device fabrication
11/12/1986	EP0201282A2 Position adjustment device with a piezoelectric element as a lock mechanism
11/12/1986	EP0201034A2 X-ray source
11/12/1986	EP0200913A1 Developing mixture, use and method of preparation of lithographic printing plates with this developer
11/12/1986	EP0200828A1 Dual curing coating method for substrates with shadow areas
11/12/1986	CA1213769A Low striation positive resist composition
11/11/1986	US4622286 Photoimaging composition containing admixture of leuco dye and 2,4,5-triphenylimidazolyl dimer
11/11/1986	US4622283 Deep ultra-violet lithographic resist composition and process of using
11/11/1986	US4622282 Photographic method for forming images on plain paper
11/11/1986	US4622088 Printing plates
11/05/1986	EP0200680A2 Coated material and its use
11/05/1986	EP0200477A2 Process for pattern formation
11/05/1986	EP0200463A2 Coating compositions for use in the production of light-sensitive reproduction materials
11/05/1986	EP0200237A2 Process to obtain thin film lines
11/05/1986	EP0200129A2 Positive photoresist compositions
11/05/1986	EP0200110A1 Photosensitive composition and pattern forming process using same
11/05/1986	EP0199940A2 Photolithographic process, and organosilicone polymer composition for use therein
11/04/1986	US4621371 Method of forming by projection an integrated circuit pattern on a semiconductor wafer
11/04/1986	US4621044 Photosensitive polymer composition
11/04/1986	US4621043 Storage stable photopolymerizable composition
11/04/1986	US4621042 O-cresol novolac resin
11/04/1986	US4621041 Irridium compound, gold compound
11/04/1986	US4621040 Imaging element and process with laser absorptive ink barrier layer
11/04/1986	US4621037 Method for detecting endpoint of development
11/04/1986	US4621019 Protective lamination of electronic circuit panel with thermoplastic resins
11/04/1986	CA1213600A1 Light-sensitive mixture based on o- naphthoquinonediazides, and light-sensitive copying material prepared therefrom
11/04/1986	CA1213599A1 Light-sensitive mixture and copying material comprising an o-naphthoquinonediazide
11/04/1986	CA1213588A1 Photocurable coloured compositions
10/1986
10/29/1986	EP0199685A2 A method of forming a stencil for screen printing machines
10/29/1986	EP0199672A1 Oxime sulphonates containing reactive groups
10/29/1986	EP0199467A1 Polyesters comprising recurring photoconductive and photocrosslinkable units and elements thereof
10/29/1986	EP0199306A2 Wash-off film containing synthetic amphoteric polymers
10/29/1986	EP0199303A2 Method of forming a photoresist pattern
10/29/1986	EP0199125A2 Multi-layer resist structure
10/29/1986	EP0199014A2 Apparatus and method for determining focus correction for a lithographic tool
10/29/1986	CN86102448A Process to obtain thin film lines
10/28/1986	US4620288 Data handling system for a pattern generator
10/28/1986	US4620089 Automatic optical focusing device
10/28/1986	US4619998 Light-sensitive triazines possessing trichloromethyl groups
10/28/1986	US4619890 Optical recording element having a polymerized crosslinked homopolymer smoothing layer
10/28/1986	US4619885 Photoresists
10/28/1986	US4619876 Flexible display image
10/28/1986	US4619508 Illumination optical arrangement
10/28/1986	US4619326 In a well completion process
10/28/1986	CA1213274A1 1,3-diaza-9-thia-anthracene-2,4-diones and photopolymerizable mixtures containing same
10/23/1986	WO1986006203A1 Process for fabricating glass tooling
10/23/1986	WO1986006182A1 Exposure latitude improvements in printing proofs
10/23/1986	WO1986006024A1 Stretched, composite polyester films useable particularly for graphic arts
10/22/1986	EP0198798A2 Light-sensitive polycondensates, process for their preparation, materials coated therewith and their use
10/22/1986	EP0198674A2 Deep ultra-violet lithographic resist composition
10/22/1986	EP0198575A2 Silver image enhancement composition and process for use thereof
10/22/1986	EP0198392A1 Partial neutralization of aqueous developable photoresist
10/22/1986	EP0198357A2 Stabilized solutions of radiation-hardenable prepolymers of heat-resistant polymers
10/22/1986	EP0198280A2 Dry development process for metal lift-off profile
10/22/1986	EP0198215A2 A process for rendering a polymeric material resistant to an oxygen-containing plasma
10/22/1986	EP0198058A1 Photosensitive polymers, preparation thereof and film-forming compositions containing them for photoengraving
10/22/1986	CN86102725A Photosensitive compostion and pattern forming process using same
10/21/1986	US4618971 X-ray lithography system
10/21/1986	US4618567 High resolution liquid photopolymer coating patterns over irregular printed wiring board surface conductors
10/21/1986	US4618566 Fluorene containing compounds and negative photoresist compositions therefrom
10/21/1986	US4618565 Of methyl methacrylate polymer, dyes, and solvent
10/21/1986	US4618564 Novolaks, sulfonic acid releasing compounds, actinic radiation, base developer, increased solubility

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