| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/13/1987 | US4636459 Photoinitiator and unsaturated monomer; printing plates |
| 01/13/1987 | US4636454 Method for the preparation of a patterned photoresist layer and a photoresist composition therefor |
| 01/13/1987 | US4636453 Photopolymer films containing microencapsulated sensitometric adjuvants |
| 01/13/1987 | US4636078 Microscopic detection of membrane surface defects through interference patterns |
| 01/13/1987 | US4636077 Aligning exposure method |
| 01/13/1987 | US4636067 Photography pin board system |
| 01/13/1987 | US4635373 Wafer conveying apparatus with alignment mechanism |
| 01/13/1987 | CA1216455A1 Imaging system |
| 01/10/1987 | EP0157783A4 Thermal development of photosensitive materials employing microencapsulated radiation sensitive compositions. |
| 01/08/1987 | DE3621477A1 Resin mixture which can be cured by radiation of effective energy |
| 01/08/1987 | DE3620970A1 Mask holding device |
| 01/07/1987 | EP0207893A2 Image-forming process |
| 01/07/1987 | EP0207551A1 Process for obtaining a photosensitive polymer having a high resolution, developable by plasma, and photolithographic process using this polymer |
| 01/07/1987 | EP0207495A2 Process for producing novel photosensitive resins |
| 01/07/1987 | EP0207188A2 Resin composition for solder resist ink |
| 01/06/1987 | US4635282 X-ray source and X-ray lithography method |
| 01/06/1987 | US4634659 Photooxidation of hydrophobic to hydrophilic surface |
| 01/06/1987 | US4634657 And a leevco dye, monomeric compound and photoiniator; improved printout capabilities |
| 01/06/1987 | US4634655 Water-soluble polymer and ammonium dichromate |
| 01/06/1987 | US4634652 Overlay light-sensitive proofing film with transparent aluminum oxide and transparent magnesium fluoride layers therein |
| 01/06/1987 | US4634645 Method of forming resist micropattern |
| 01/06/1987 | US4634644 Printing plates, printed circuits |
| 01/06/1987 | US4634270 Protective cover |
| 01/06/1987 | US4634025 Hopper mounting arrangement for an automatic toning apparatus |
| 01/06/1987 | CA1216219A1 Automatic laminator |
| 12/30/1986 | US4633492 Plasma pinch X-ray method |
| 12/30/1986 | US4632900 Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface |
| 12/30/1986 | US4632899 Bleachable dye |
| 12/30/1986 | US4632898 Etching a photoresist-developed, metal-masked glass surface |
| 12/30/1986 | US4632897 Photopolymerizable recording material suitable for the production of photoresist layers |
| 12/30/1986 | US4632891 Process for the production of images |
| 12/30/1986 | US4632522 Optical system of variable magnification and a method for varying magnification of the same |
| 12/30/1986 | US4632382 Roller engaging and disengaging device |
| 12/30/1986 | EP0206983A2 Method and polymer for obtaining images |
| 12/30/1986 | EP0206712A2 Misregistration/distortion correction scheme |
| 12/30/1986 | EP0206669A2 Aziridine-treated articles |
| 12/30/1986 | EP0206412A2 Photo-setting resin composition |
| 12/30/1986 | EP0206308A1 Developing method for photosensitive material |
| 12/30/1986 | EP0206261A2 Process for producing a photosensitive layer on a support |
| 12/30/1986 | EP0206159A2 Process for the preparation of thermostable structured layers, and their use |
| 12/30/1986 | EP0206158A2 Photopolymers on a polyether basis |
| 12/30/1986 | EP0206086A2 Active energy ray-curing resin composition |
| 12/30/1986 | EP0206030A2 Photocurable composition |
| 12/30/1986 | EP0205571A1 Establishing and/or evaluating alignment by means of alignment marks. |
| 12/23/1986 | US4631250 Process for removing covering film and apparatus therefor |
| 12/23/1986 | US4631249 Process for forming thermally stable negative images on surfaces utilizing polyglutarimide polymer in photoresist composition |
| 12/23/1986 | US4631247 Acetylene compounds as shelf life improvers for photoresist compositions containing organic iodides |
| 12/23/1986 | US4631246 Resists, solder maskes, printed circuit boards |
| 12/23/1986 | US4631245 Polyvinyl acetal-acid anhydride binders, coatings for photoresists and printing plates |
| 12/23/1986 | US4631113 Selective etching |
| 12/23/1986 | US4631111 Applying two photphardenable layers to substrate-one sensitive to ultraviolet, other ot visible light |
| 12/23/1986 | US4631110 Peeling type developing apparatus |
| 12/23/1986 | US4630922 Pattern transfer apparatus |
| 12/23/1986 | CA1215614A1 Brown stain suppressing phenol free and chlorinated hydrocarbon free photoresist stripper |
| 12/23/1986 | CA1215570A1 Exposure device |
| 12/18/1986 | WO1986007474A1 Method and apparatus for the production of high resolution images |
| 12/18/1986 | WO1986007473A1 Contrast enhancement layer |
| 12/18/1986 | WO1986007315A1 Needlecraft with metallic substrate |
| 12/17/1986 | EP0205319A2 Polymer composition for photoresist application |
| 12/17/1986 | EP0205148A2 Method of applying a resist |
| 12/17/1986 | EP0205083A2 Image forming method and transfer recording medium therefor |
| 12/17/1986 | EP0204963A2 Use of Alkali-Soluble Polyorganosilsesquioxane Polymers in a resist for preparing electronics parts. |
| 12/17/1986 | CN85104886A Cylinderical hologram and micro-lens cylinderic successive photography |
| 12/16/1986 | US4630094 Use of metallic glasses for fabrication of structures with submicron dimensions |
| 12/16/1986 | US4629777 Polyimides, a process for their preparation and their use |
| 12/16/1986 | US4629773 Imidylcompounds, polymers therefrom, and use of the polymers |
| 12/16/1986 | US4629685 Protective films or photographic relief images |
| 12/16/1986 | US4629680 Photopolymerizable materials capable of being developed by a weak alkaline aqueous solution |
| 12/16/1986 | US4629679 Tetrazole compound-containing photopolymerizable resin composition |
| 12/16/1986 | US4629676 Image forming method |
| 12/16/1986 | US4629313 Exposure apparatus |
| 12/16/1986 | CA1215481A1 Electron lithography mask manufacture |
| 12/16/1986 | CA1215412A1 Suction device for holding plates |
| 12/10/1986 | EP0204415A2 A method for preparing a printed circuit board |
| 12/10/1986 | EP0204292A2 Process for the production of printed circuits using a photopolymerisable system |
| 12/10/1986 | EP0204253A2 Formation of etch-resistant resists through preferential permeation |
| 12/10/1986 | EP0203931A1 Method of producing devices using nonplanar lithography. |
| 12/10/1986 | EP0126712B1 Curable composition and use thereof |
| 12/10/1986 | CN85102958A Process for the anodic oxidation of aluminum and use of the latter as a support material for offset printing plates |
| 12/09/1986 | US4628023 Reduced exposure, silicon wafers |
| 12/09/1986 | US4628022 Multilayer circuit board fabrication process and polymer insulator used therein |
| 12/09/1986 | US4628020 Light-sensitive compound mixture and copying material comprising o-naphthquinonediazide compound |
| 12/04/1986 | WO1986007169A1 Device for automatically determining the deviation between the structures of a pattern and those of an object compared therewith |
| 12/04/1986 | WO1986007071A1 Thiol group-containing polybutadiene derivatives, resin composition containing same, process for preparing said derivatives and said resin composition, and process for producing circuit board |
| 12/03/1986 | EP0203829A2 Supported photoinitiator |
| 12/03/1986 | EP0203613A2 Light-sensitive material containing microcapsules and image-recording method using the same |
| 12/03/1986 | EP0203393A1 Curable composition |
| 12/03/1986 | EP0203372A2 Process for making photopolymerizable aromatic polyamic acid derivatives |
| 12/03/1986 | CN85104369A The objective for a scanning projection photoetching machine |
| 12/02/1986 | US4627088 Intense X-ray source using a plasma microchannel |
| 12/02/1986 | US4627010 Method and device for discriminating stillness of a step exposure apparatus |
| 12/02/1986 | US4626556 Solvent-soluble organopolysilsesquioxane, process for producing the same, and semi-conductor using the same |
| 12/02/1986 | US4626497 Process for the production of colored photographic polymer images |
| 12/02/1986 | US4626492 Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound |
| 12/02/1986 | US4626491 Oligomeric 2-diazomalonates as solubilizers |
| 12/02/1986 | US4626484 Light-sensitive printing plate precursor |
| 12/02/1986 | US4626098 Copying frame for producing offset plates |
| 12/02/1986 | CA1214679A1 Process for forming pattern with negative resist |
| 12/02/1986 | CA1214678A1 Photopolymerizable composition including catalyst comprising diketone plus 4-(n,n- dimethylamino)benzoic acid or ester thereof |
| 12/02/1986 | CA1214677A1 Photosensitive resinous composition |