Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/1995
03/29/1995EP0645797A1 Electron beam lithography with background exposure in a neighbouring region
03/29/1995EP0645679A1 Resist material and pattern forming process
03/29/1995EP0645678A1 Radiation-sensitive composition
03/29/1995EP0645673A2 Photographic element provided with a backing layer and method for manufacture thereof
03/29/1995EP0644829A1 Engraving head.
03/28/1995US5402514 Optical waveguide devices including dry photohardenable layers
03/28/1995US5402367 Apparatus and method for model based process control
03/28/1995US5402267 Catadioptric reduction objective
03/28/1995US5402224 Distortion inspecting method for projection optical system
03/28/1995US5401617 Method for forming positive patterned resist layer on tantalum substrate utilizing quinone diazide composition with aromatic hydroxy additive
03/28/1995US5401616 Patterning method employing laser
03/28/1995US5401614 Mid and deep-UV antireflection coatings and methods for use thereof
03/28/1995US5401613 Method of manufacturing microelectronic devices having multifunctional photolithographic layers
03/28/1995US5401608 Hydroxy-styrene and melamine derivative polymers
03/28/1995US5401607 Iodonium salt and squarylium dye with pyrilium group for acid formation
03/28/1995US5401605 Positive working photosensitive resin composition containing 1,2-naphthoquinone diazide esterification product of triphenylmethane compound
03/28/1995US5401604 Reaction product of polyepoxide, aromatic acid with phenolic hydroxy group, aromatic acid, quinone diazide with sulfonyl group, photoresists
03/28/1995US5401603 Aqueous-processable imaging element tonable at room temperature before and after exposure to actinic radiation
03/28/1995US5401316 Method and apparatus for hydrophobic treatment
03/28/1995CA1334952C Method of forming a cured coating film
03/28/1995CA1334911C Process for the vapor deposition of polysilanes
03/28/1995CA1334898C Radiation sensitive mixture and production of relief patterns
03/28/1995CA1334897C Electrodeposition coating composition and image-forming method using the same
03/23/1995WO1995008137A1 Photosensitive compositions and elements for flexographic printing
03/23/1995WO1995008136A1 Photosensitive compositions and elements for flexographic printing
03/23/1995WO1995007765A1 Hybrid pulsed valve for thin film coating and method
03/23/1995WO1995007764A1 Liquid spin coating method and apparatus therefor
03/22/1995EP0644581A1 Wafer Stepper
03/22/1995EP0644462A1 Reactive ion etching of gratings and cross gratings structures
03/22/1995EP0644461A1 A method for making a lithographic printing plate
03/22/1995EP0644460A1 Positive working photoresist composition
03/22/1995EP0644059A1 Seal manufacturing apparatus
03/22/1995EP0643645A1 A method and a device for retaining a thin medium between two bodies.
03/22/1995EP0394354B1 Use of particular mixtures of ethyl lactate and methyl ethyl ketone to remove undesirable peripheral material (e.g. edge beads) from photoresist-coated substrates
03/21/1995US5400386 Angle detecting device and optical apparatus, such as exposure apparatus, employing the same
03/21/1995US5399898 Multi-chip semiconductor arrangements using flip chip dies
03/21/1995US5399872 Charged-particle beam exposure method
03/21/1995US5399782 Benzoyl-substituted phosphabicycloalkanes and phosphabicycloalkanesulfides as photoinitiators
03/21/1995US5399770 Photoinitiator, preparation of printing plates, curing white paints
03/21/1995US5399655 Positive-working photodefinable polyimide precursors
03/21/1995US5399647 Photoresist composition of 1-(1'-cyanoethenyl)adamantane
03/21/1995US5399624 High purity resins for thiol-ene polymerizations and method for producing same
03/21/1995US5399596 Cationic polymerization, production of epoxy resins, polystyrene, polyorthoesters, polyorthocarbonates
03/21/1995US5399464 Triamine positive photoresist stripping composition and post-ion implantation baking
03/21/1995US5399463 Antihalation
03/21/1995US5399462 Method of forming sub-half micron patterns with optical lithography using bilayer resist compositions comprising a photosensitive polysilsesquioxane
03/21/1995US5399460 Negative photoresists containing aminoacrylate salts
03/21/1995US5399458 Process for making images employing a toner which has a tackiness that can be increased by actinic radiation
03/21/1995US5399457 Complexing
03/21/1995US5399456 Image reversal negative working photoresist containing O-quinone diazide and cross-linking compound
03/21/1995US5399449 Method for producing color filter wherein the voltage used to electrodeposit the colored layers is decreased with each subsequent electrodeposition step
03/21/1995US5399398 Photomask container
03/21/1995US5399202 Resist-peeling liquid and process for peeling a resist using the same
03/21/1995CA1334880C Solder mask resins having improved stability
03/21/1995CA1334804C Process for detackifying photopolymer flexographic printing plates
03/16/1995WO1995007498A1 Improvements relating to plate rinsing within an image plate processor
03/16/1995WO1995007497A1 Improvements relating to image plate developers
03/16/1995WO1995007496A1 A light sensitive printing plate
03/16/1995WO1995007152A1 Surface processing
03/16/1995DE4432604A1 Method and arrangements for exposure control in the photomechanical transfer of originals (copies, masters) onto printing plates or films
03/16/1995DE4330449A1 Process for the preparation of a polymer solution
03/16/1995CA2106231A1 Negative photoresist and a process therefor
03/15/1995EP0643344A1 Apparatus and method for model based process control
03/15/1995EP0643335A1 Optical system for the projection of patterned light onto the surface of three dimensional objects
03/15/1995EP0643334A1 Resist deposition
03/15/1995EP0643333A1 Donor element for use in a dry color proofing process
03/15/1995EP0643332A1 Light-sensitive material and process for making a coloured image
03/15/1995EP0643329A2 Radiation curable liquid composition, particularly for stereolithography
03/15/1995EP0642423A1 A method and an apparatus for illuminating points on a medium.
03/15/1995CN1100218A Computerized quick developing and water-proof printing method of combined image
03/14/1995US5398271 Exposure apparatus
03/14/1995US5398092 Method and apparatus for developing lithographic offset printing plate
03/14/1995US5397846 Process for preparing organic compounds carrying tert-butyloxycarbonyl groups
03/14/1995US5397685 Light-sensitive composition and process
03/14/1995US5397684 Antireflective polyimide dielectric for photolithography
03/14/1995US5397683 Photochemical method of making decorative designs
03/14/1995US5397682 Polyimide precursor and photosensitive composition containing the same
03/14/1995US5397681 Laminate used for the production of a dry planographic printing plate
03/14/1995US5397680 Positive photoresist having improved processing properties
03/14/1995US5397679 Cyclic carbonate compounds, method for producing the same and positive photoresist composition using the same
03/14/1995US5397678 Multicolor
03/14/1995US5397676 Image forming method including heat development while covering surface of light-sensitive material
03/14/1995US5397675 Alkali developable photosensitive resin composition containing oil-soluble diazo resin
03/14/1995US5397665 Surface treatment with hexamethyldisilazane, storage stability
03/14/1995US5397663 Phase shift mask and method of manufacturing the same
03/14/1995US5397662 Process for forming a polymerized material and presenting holographic images
03/09/1995WO1995006943A1 Cd mastering process
03/09/1995WO1995006900A1 Method and apparatus for pattern formation
03/09/1995WO1995006899A1 Method and apparatus for producing integrated circuit devices
03/09/1995WO1994024609A3 Photocurable compositions
03/09/1995DE4414808A1 Anti-reflection coating, and process for the production of a semiconductor component using same
03/08/1995EP0642058A1 Process and apparatus for continuous separation of ingrédients from a developing bath
03/08/1995EP0642057A1 Photosensitive resin composition
03/08/1995EP0641485A1 Membrane dielectric isolation ic fabrication
03/08/1995EP0641460A1 Organometallic monomers and polymers with improved adhesion
03/08/1995EP0641250A1 Inorganic membrane for microfiltration, and a process for production of such an inorganic membrane.
03/08/1995EP0345340B1 Photoimageable compositions
03/08/1995CN1099699A Printing plate
03/08/1995CN1027842C 荫罩 Mask
03/07/1995US5396312 Apparatus for optically forming pattern
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