| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/20/1995 | CA2173490A1 Electrodeless lamp with improved efficacy |
| 04/20/1995 | CA2118192A1 Positive photoresist composition |
| 04/19/1995 | EP0649063A1 Matted radiation-sensitive recording material |
| 04/19/1995 | EP0649062A2 Process for reducing sludge in diffusion transfer printing plates |
| 04/19/1995 | EP0649061A1 Positive electron-beam resist composition and developer for positive electron-beam resist |
| 04/19/1995 | EP0649054A1 Stripe internal edging method and apparatus |
| 04/19/1995 | EP0648770A2 Pyrrolo(3,4-c)pyrroles |
| 04/19/1995 | EP0648612A1 Reversible heat-sensitive recording material |
| 04/19/1995 | EP0648350A1 Metal ion reduction in top anti-reflective coatings for photoresists. |
| 04/19/1995 | EP0648349A1 Solid state imager. |
| 04/19/1995 | EP0648348A1 Variable annular illuminator for photolithographic projection imager. |
| 04/19/1995 | EP0648343A1 Lithographically produced stepped lens with a fresnel surface structure and process for producing it. |
| 04/19/1995 | EP0648232A1 High purity thiol-ene composition |
| 04/19/1995 | EP0403561B1 Optical devices and methods of fabrication thereof |
| 04/19/1995 | CN2195104Y Multipurpose resin plate-making machine |
| 04/18/1995 | US5408296 Color proof making apparatus |
| 04/18/1995 | US5408083 Method of measuring the best focus position having a plurality of measuring mark images and a plurality of focus positions |
| 04/18/1995 | US5407969 Photoinitiators; suitable for aqueous salts |
| 04/18/1995 | US5407788 Using mixture of tetramethylammonium hydroxide, dimethyl sulfoxide and dipropylene glycol monomethyl ether |
| 04/18/1995 | US5407787 Process to fabricate thick coplanar microwave electrode structures |
| 04/18/1995 | US5407786 Coating substrate with photosensitive resin film, exposing to light to develop mask pattern, applying ammonia to decompose acid groups present, applying silicon compound to silylate, etching to remove developed resin |
| 04/18/1995 | US5407785 Coating with photoresist; masking; underexposure to bleach portions |
| 04/18/1995 | US5407784 Photocurable composition comprising maleic anhydride adduct of polybutadiene or butadiene copolymers |
| 04/18/1995 | US5407783 Photoimageable compositions containing substituted 1, 2 dihalogenated ethanes for enhanced printout image |
| 04/18/1995 | US5407782 Containing x-ray absorbing materials |
| 04/18/1995 | US5407781 Photosensitive element having support with adjustable adhesion |
| 04/18/1995 | US5407780 High sensitivity, resolution and heat resistance |
| 04/18/1995 | US5407779 A phenolic resin and photoinitiator comprising the esters of quinonediazidesulfonic acid and a poly/alkylhydroxyphenylalkyl/biphenol; resolution, profil and depth of focus |
| 04/18/1995 | US5407778 Positive resist composition |
| 04/18/1995 | US5407764 Plate for producing lithographic printing plate having substrate, polymeric photosensitive water insoluble hydrophilic and hydrophobic layers containing binders and compounds capable of promoting hardening when exposed to light |
| 04/18/1995 | US5407527 Automated process for the manufacture of flexible plates and apparatus for implementing the process |
| 04/14/1995 | CA2117865A1 Pyrrolo¬3,4-c| pyrroles |
| 04/13/1995 | WO1995010073A1 Novolak/polyhydroxystyrene copolymer and photoresist compositions |
| 04/13/1995 | WO1995010072A1 Binary vapor adhesion promoters and methods of using the same |
| 04/13/1995 | WO1995010071A1 Waterless lithographic plate |
| 04/13/1995 | DE4435791A1 Negative photoresist composition, and etching process using same |
| 04/12/1995 | EP0647884A1 Photoresist strippers containing reducing agents to reduce metal corrosion |
| 04/12/1995 | EP0647871A1 Method for manufacturing a substrate having window-shaped coating films and frame-shaped coating film on the surface thereof |
| 04/12/1995 | EP0647828A2 Cofocal optical systems for thickness measurements of patterned wafers |
| 04/12/1995 | EP0647788A1 Tare supporting apparatus |
| 04/11/1995 | US5406351 Photolithography system with improved illumination |
| 04/11/1995 | US5405813 Optimized photoresist dispense method |
| 04/11/1995 | US5405783 Removing photoremovable protective group from region of substrate, contacting with protected amino acid, repeating to form peptide |
| 04/11/1995 | US5405734 Applying photoresist; exposure to light; solvent removal of exposured photoresist |
| 04/11/1995 | US5405733 Multiple beam laser exposure system for liquid crystal shutters |
| 04/11/1995 | US5405731 Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits |
| 04/11/1995 | US5405730 Imaging element and method for making aluminum lithographic printing plates according to the silver salt diffusion transfer process |
| 04/11/1995 | US5405729 Method for making a lithographic offset plate by the silver salt diffusion transfer process |
| 04/11/1995 | US5405720 Radiation-sensitive composition containing 1,2 quinonediazide compound, alkali-soluble resin and monooxymonocarboxylic acid ester solvent |
| 04/11/1995 | US5405676 Film forming process |
| 04/11/1995 | US5405508 Method for regenerating tetraalkylammonium hydroxide |
| 04/11/1995 | US5405443 Substrates processing device |
| 04/11/1995 | CA2045917C Positive photoresist composition |
| 04/11/1995 | CA1335162C Method of controlling variation of density of images in 3-d pictures |
| 04/06/1995 | WO1995009384A1 Process for improving the hydrophilicity of the substrate for a lithographic printing plate by treatment with polyvinyl phosphonic acid |
| 04/06/1995 | WO1995009383A1 Photopolymerisable composition |
| 04/06/1995 | WO1995009087A1 Process for preparing improved lithographic printing plates |
| 04/06/1995 | WO1995009086A1 Process for preparing improved lithographic printing plates |
| 04/06/1995 | WO1995009068A1 Full field mask illumination enhancement methods and apparatus |
| 04/06/1995 | CA2173141A1 Full field mask illumination enhancement methods and apparatus |
| 04/06/1995 | CA2172734A1 Process for improving the hydrophilicity of the substrate for a lithographic printing plate by treatment with polyvinyl phosphonic acid |
| 04/06/1995 | CA2172731A1 Process for preparing improved lithographic printing plates |
| 04/06/1995 | CA2171555A1 Process for preparing improved lithographic printing plates |
| 04/05/1995 | EP0646949A2 Method of forming a semiconductor device |
| 04/05/1995 | EP0646845A1 Color filter, material thereof and resin |
| 04/05/1995 | EP0646580A2 Vinylether compounds with additional functional groups differing from vinylether and their use in the formulation of curable compositions |
| 04/05/1995 | EP0646568A2 Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same |
| 04/05/1995 | EP0453488B1 Radiation-sensitive film comprising at least one monomolecular layer of fluorine-containing amphiphilic substances |
| 04/05/1995 | EP0381729B1 Acid-curing binder systems containing 1,2-disulfones |
| 04/05/1995 | EP0342208B1 X-ray lithography system comprising a thin target |
| 04/04/1995 | US5404366 Narrow band excimer laser and wavelength detecting apparatus |
| 04/04/1995 | US5404364 Optically pumped X-ray laser and applications thereof |
| 04/04/1995 | US5404076 Electrodeless lamp having light transmissive envelope, fill including elemental sulfur, excitation means for coupling electromagnetic energy to fill at specified power density for exciting discharge |
| 04/04/1995 | US5404047 Semiconductor die having a high density array of composite bond pads |
| 04/04/1995 | US5404019 Charged particle exposure system having a capability of checking the shape of a charged particle beam used for exposure |
| 04/04/1995 | US5404018 Method of and an apparatus for charged particle beam exposure |
| 04/04/1995 | US5404005 Solid state imaging device and method of manufacturing same |
| 04/04/1995 | US5403878 With alpha olefin oligomer and acidic sulfur compound; mold releasing, thermostability |
| 04/04/1995 | US5403754 Lithography method for direct alignment of integrated circuits multiple layers |
| 04/04/1995 | US5403701 Using lift-off approach; forming, patterning, removing barrier plane, photoresist; taut membrane |
| 04/04/1995 | US5403699 Applying resist comprising copolymer of alpha-alkyl styrene and alpha haloacrylic ester to substrate, exposing to radiation, developing |
| 04/04/1995 | US5403698 Neutralized copolymer from acrylic acid or methacrylic acid, non-water-soluble monomer having two or more photopolymerizable double bonds, photoinitiator, and benzotriazole derivative having carboxyl groups |
| 04/04/1995 | US5403697 Comprising compound which forms acid after high energy radiation and an acid-cleavable compound, polymeric binder |
| 04/04/1995 | US5403696 Mixture of phenolic resin obtained by condensation reaction of formaldehyde with phenol mixture of meta-cresol and 2-tert-butyl-4-methylphenol or 2-tert-butyl-6-methylphenol and 1,2-quinone diazide compound |
| 04/04/1995 | US5403695 Resist for forming patterns comprising an acid generating compound and a polymer having acid decomposable groups |
| 04/04/1995 | US5403694 Water developable diazo based lithographic printing plate comprising an intermediate layer having a polysaccharide |
| 04/04/1995 | US5403685 Defining phase shifting edges in resist layer, irradiating to produce dark interference bands, developing exposed resist, hardening dark band sections, coating with second resist layer, projecting light pattern, developing |
| 04/04/1995 | US5403682 Alternating rim phase-shifting mask |
| 04/04/1995 | US5403681 Shadow printing or projection printing by means of a reticle; photolithography; first layer of chip pattern does not overlie the edge |
| 04/04/1995 | US5403617 Hybrid pulsed valve for thin film coating and method |
| 04/04/1995 | US5403437 Fluorosurfactant in photoresist for amorphous "Teflon" patterning |
| 04/04/1995 | US5403436 Plasma treating method using hydrogen gas |
| 04/04/1995 | US5402726 Register mark |
| 04/04/1995 | US5402725 Lithographic base with a modified dextran or pullulan hydrophilic layer |
| 04/04/1995 | CA1335049C Terpene-based solvents for washout of photopolymer printing plates |
| 03/30/1995 | WO1995008790A1 Process for producing microstructure bodies |
| 03/30/1995 | WO1995008445A1 Imaging medium with adhesive layers |
| 03/30/1995 | DE4332876A1 Highly heat-resistant relief structures |
| 03/30/1995 | DE4331468A1 Fourier microstructuring |
| 03/30/1995 | CA2170399A1 Imaging medium with adhesive layers |