| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 12/18/1997 | WO1997047660A1 Photopolymerization initiator and actinic radiation-curable composition comprising the same |
| 12/18/1997 | WO1997047370A1 Microfabricated filter and method of making same |
| 12/18/1997 | DE19639675A1 Fullerene cluster compounds useful as coatings or in lithography |
| 12/18/1997 | DE19623352A1 Verfahren zur Herstellung von eine räumlich gemusterte Oberfläche aufweisenden Druck- oder Prägezylindern A process for producing a spatially patterned surface having printing or embossing cylinders |
| 12/17/1997 | EP0813235A2 Method for manufacturing multilayer wiring board and wiring pattern forming apparatus |
| 12/17/1997 | EP0813116A1 Process and device for the continuous separation of a photopolymer-water mixture using membranes and filters |
| 12/17/1997 | EP0813115A2 Scanning exposure apparatus with surface position detecting system |
| 12/17/1997 | EP0813114A2 Antireflective coating compositions |
| 12/17/1997 | EP0813113A1 Copolymers and photoresist compositions comprising copolymer resin binder component |
| 12/17/1997 | EP0813085A2 Catadioptric system for photolithography |
| 12/17/1997 | EP0812705A1 Method of manufacturing support for planographic printing plate |
| 12/17/1997 | EP0812434A2 Microcontact printing on surfaces and derivative articles |
| 12/17/1997 | CN1168179A Method of developing positive photoresist and compositions therefor |
| 12/16/1997 | US5699282 Methods and test structures for measuring overlay in multilayer devices |
| 12/16/1997 | US5699260 Technique for optimizing the number of IC chips obtainable from a wafer |
| 12/16/1997 | US5699183 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
| 12/16/1997 | US5699148 Exposure apparatus and microdevice manufacturing method using the same |
| 12/16/1997 | US5699146 Scanning exposure apparatus with velocity calculating means for stage elements |
| 12/16/1997 | US5699145 Scanning type exposure apparatus |
| 12/16/1997 | US5698503 Stripping and cleaning composition |
| 12/16/1997 | US5698377 Method of forming a resist pattern |
| 12/16/1997 | US5698376 Blend of binder, photopolymerizable material and photoinitiator |
| 12/16/1997 | US5698375 Process for formation of capacitor electrode for semiconductor device |
| 12/16/1997 | US5698374 Process for the formation of an image through adhesion of particulate image forming material |
| 12/16/1997 | US5698373 Having photocurable layer containing partially saponified polyvinyl acetate or polyamide, compound having two or more double bonds, photopolymerization initiator, dye precursor, quinolinol dark coloration preventing agent |
| 12/16/1997 | US5698372 Photosensitive lithographic printing plate |
| 12/16/1997 | US5698371 Photosensitive polymer composition for flexographic printing plates processable in aqueous media |
| 12/16/1997 | US5698370 Esterified styrene/maleic anhydride polymer and polymer-containing photoimageable composition having improved alkaline process resistance |
| 12/16/1997 | US5698369 Photosensitive composition comprising a sulfonimide compound according to the formula R1 -SO2 -NR3 -SO2 -R2 wherein R1, R2 and R3 each represents an aromatic group or an alkyl group |
| 12/16/1997 | US5698367 Lithographic printing plate |
| 12/16/1997 | US5698363 Imagewise providing in second layer component not in first layer, selected from cobalt complex having ammonia or primary amine ligand, compound having absorption wavelength changed by ligand, compound causing ligand to be released |
| 12/16/1997 | US5698362 Containing a triarylmethane derivative; high resolution, excellent in depth of focus and pattern profile, storage stable |
| 12/16/1997 | US5698361 Photosensitive composition |
| 12/16/1997 | US5698360 Sulfonamido substituted acetal polymers and use thereof in photo-sensitive compositions and lithographic printing plates |
| 12/16/1997 | US5698352 Semiconductor device containing Si, O and N anti-reflective layer |
| 12/16/1997 | US5698351 Method for producing a screen printing stencil |
| 12/16/1997 | US5698350 Forming ultra-fine pattern by diffracting incident light while controlling components vertically incident on a photomask to increase depth of focus and improve resolution |
| 12/16/1997 | US5698348 Phase shifting mask, manufacturing method thereof, and exposure method using such a phase shifting mask |
| 12/16/1997 | US5698347 Light screening patterns defining spaces having differing widths |
| 12/16/1997 | US5698346 Photomask-pattern-shape evaluation method, photomask, photomask manufacturing method, photomask-pattern forming method, and exposure method |
| 12/16/1997 | US5698345 Photosensitive recording material, photosensitive recording medium, and process for producing hologram using this photosensitive recording medium |
| 12/16/1997 | US5698113 Two step dry etching process first removes sio2 overlay with fluorine-containing gas, then removes mo/si layers with chlorine-containing gas |
| 12/16/1997 | US5698071 Etching aftertreatment under vacuum |
| 12/16/1997 | US5698037 Integrated delivery system for chemical vapor from non-gaseous sources for semiconductor processing |
| 12/16/1997 | US5698030 Compact disc coating and handling system |
| 12/11/1997 | WO1997047164A2 Method of exposing a path on a curved, or otherwise irregularly shaped surface |
| 12/11/1997 | WO1997046915A1 Metal ion reduction of aminochromatic chromophores and their use in the synthesis of low metal bottom anti-reflective coatings for photoresists |
| 12/11/1997 | WO1997046914A1 Method of manufacturing semiconductor integrated circuit device, photomask, and methods of manufacturing photomask |
| 12/11/1997 | WO1997046519A1 Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively |
| 12/11/1997 | DE19623891A1 Lichtempfindlicher, wäßrig-alkalisch entwickelbarer, negativ arbeitender Resist A light sensitive, aqueous-alkaline developable negative working resist |
| 12/11/1997 | DE19622350A1 Manufacturing method for a nozzle plate |
| 12/10/1997 | EP0812000A2 Dose modification proximity effect compensation (PEC) technique for electron beam lithography |
| 12/10/1997 | EP0811899A1 Supporting apparatus using magnetic power |
| 12/10/1997 | EP0811884A1 Planar circular brush for photopolymer plate developing machines |
| 12/10/1997 | EP0811883A2 Exposure apparatus and device manufacturing method using the same |
| 12/10/1997 | EP0811882A1 Laser pattern generation apparatus |
| 12/10/1997 | EP0811881A2 Exposure apparatus and method |
| 12/10/1997 | EP0811880A1 A kit of parts for making analkaline processing liquid for processing a lithographic printing plate |
| 12/10/1997 | EP0811879A1 Resist material and fabrication method thereof |
| 12/10/1997 | EP0811878A1 A diazo based imaging element having increased sensitivity |
| 12/10/1997 | EP0811865A2 Illumination system and exposure apparatus |
| 12/10/1997 | EP0811181A1 Method and device for producing features on a photolithographic layer |
| 12/10/1997 | EP0641485A4 Membrane dielectric isolation ic fabrication. |
| 12/10/1997 | CN1167332A Improved photoresistance for cathode ray tube and preparation method |
| 12/10/1997 | CN1036693C Method for forming tin solder durable figures with photosensitive thermosetting resin composition |
| 12/09/1997 | US5696631 Unit magnification projection lens system |
| 12/09/1997 | US5696624 Optical lenses for argon fluoride excimer laser forming a fine, sharp patterns |
| 12/09/1997 | US5696623 UV exposure with elongated service lifetime |
| 12/09/1997 | US5696590 Position control method position control apparatus, and semiconductor manufacturing apparatus |
| 12/09/1997 | US5696581 Lens evaluating device |
| 12/09/1997 | US5696218 Using basic catalyst |
| 12/09/1997 | US5696177 Active energy ray-curing resin composition |
| 12/09/1997 | US5695910 Resist composition for deep ultraviolet light |
| 12/09/1997 | US5695908 Providing on support layer containing water soluble polymer which becomes insoluble with metal ions, feeding metal ion imagewisely from surface of layer to form image pattern |
| 12/09/1997 | US5695907 Laser addressable thermal transfer imaging element and method |
| 12/09/1997 | US5695906 Photosensitive resin composition and method for forming a pattern using the composition |
| 12/09/1997 | US5695905 Photosensitive compositions and lithographic printing plates utilizing oxazoline modified acid polymers |
| 12/09/1997 | US5695903 Using an aqueous alkaline developer |
| 12/09/1997 | US5695897 Alignment method and semiconductor exposure method |
| 12/09/1997 | US5695894 Method and apparatus for changing the scale of a pattern printed from a total internal reflection hologram |
| 12/09/1997 | US5695817 Method of forming a coating film |
| 12/09/1997 | US5695707 For forming three-dimensional objects on a layer by layer basis; building materials |
| 12/09/1997 | US5695660 Optical techniques of measuring endpoint during the processing of material layers in an optically hostile environment |
| 12/09/1997 | US5695659 Process for removing a protective coating from a surface of an airfoil |
| 12/09/1997 | US5695658 Non-photolithographic etch mask for submicron features |
| 12/09/1997 | US5695274 Illuminating optical system for use in projecting exposure device |
| 12/04/1997 | WO1997045772A1 Photolithography mask using serifs and method thereof |
| 12/04/1997 | WO1997045770A1 Reconfigurable mask |
| 12/04/1997 | WO1997045497A1 Photoimageable polyimides coatings based on non-aromatic dianhydrides |
| 12/03/1997 | EP0810641A2 Process for etching defective zones on the circumference of semiconductor substrate and etching apparatus |
| 12/03/1997 | EP0810634A2 Substrate treating system and substrate treating method |
| 12/03/1997 | EP0810633A2 Coating film forming method and apparatus |
| 12/03/1997 | EP0810478A2 A coater having a controllable pressurized process chamber for semiconductor processing |
| 12/03/1997 | EP0810477A2 Photoactive systems for high resolution photolithography |
| 12/03/1997 | EP0810476A1 Polyamic acid esters and positive type photosensitive resin compositions and their use for polyimide films for electronic devices |
| 12/03/1997 | EP0810475A2 Pattern exposing method using phase shift and mask used therefor |
| 12/03/1997 | EP0810474A2 Pattern exposing method using phase shift and mask used therefor |
| 12/03/1997 | EP0809819A1 Manufacture of intaglio printing plates by photoablation |
| 12/03/1997 | EP0809814A1 Arbitrarily wide lens array with an image field to span the width of a substrate |
| 12/03/1997 | EP0719183A4 Hybrid pulsed valve for thin film coating and method |