| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/05/1997 | US5654126 Photodefinable dielectric composition useful in the manufacture of printed circuits |
| 08/05/1997 | US5654125 Laser apparatus and process of use |
| 08/05/1997 | US5654121 Positive-working radiation-sensitive mixture |
| 08/05/1997 | US5654032 Non-photosensitive aqueous blockout composition and blockout method for repairing flaws |
| 08/05/1997 | US5653929 Process for preparing a photopolymerizable printing element |
| 08/05/1997 | US5653317 Vibration removing apparatus and method thereof |
| 08/05/1997 | CA2083007C Imaging laminate with improved tab for delamination |
| 07/31/1997 | WO1997027608A1 Black matrix in colour picture tubes and method of producing the black matrix |
| 07/31/1997 | WO1997027519A1 Optical components containing complex diffraction gratings and methods for the fabrication thereof |
| 07/31/1997 | WO1997027515A1 Resist composition |
| 07/31/1997 | WO1997006468A3 Pattern formation, replication, fabrication and devices thereby |
| 07/31/1997 | DE19602444A1 Structured metallised surface preparation |
| 07/31/1997 | CA2216127A1 Black matrix in colour picture tubes and method of producing the black matrix |
| 07/30/1997 | EP0786841A1 Gas discharge laser control systems using multiple cpu's with shared memory on a common bus |
| 07/30/1997 | EP0786701A1 Resist composition |
| 07/30/1997 | EP0786700A1 Photosensitive elastomer composition and photosensitive rubber printing plate |
| 07/30/1997 | EP0786699A1 Positive photoresist composition |
| 07/30/1997 | EP0786071A1 On-axis mask and wafer alignment system |
| 07/30/1997 | EP0785917A1 Method of treating an anti-reflective coating on a substrate |
| 07/30/1997 | CN1155889A Metal ion reduction in novolak resin solution using an anion exchange resin |
| 07/29/1997 | US5652938 Method and apparatus for developing resist |
| 07/29/1997 | US5652747 Optical disk recording method having duration ratio between high and low levels during formation of pits |
| 07/29/1997 | US5652645 High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates |
| 07/29/1997 | US5652317 Antireflective coatings for photoresist compositions |
| 07/29/1997 | US5652297 Aqueous antireflective coatings for photoresist compositions |
| 07/29/1997 | US5652280 Anionic photoinitiation |
| 07/29/1997 | US5652163 Use of reticle stitching to provide design flexibility |
| 07/29/1997 | US5652084 Method for reduced pitch lithography |
| 07/29/1997 | US5652082 Photopolymerization initiator for transfer sheets, printing plates, photoresists, color proofs |
| 07/29/1997 | US5652081 Positive working photoresist composition |
| 07/29/1997 | US5651900 Microfabricated particle filter |
| 07/29/1997 | US5651860 After hydrogenation by immersion into pressurized boiling water |
| 07/29/1997 | US5651823 Clustered photolithography system |
| 07/29/1997 | CA1339150C Halogenated hydrocarbon solvents and use thereof |
| 07/29/1997 | CA1339118C Integrated optic components |
| 07/24/1997 | WO1997026586A1 Composition for the manufacture of flexographic printing plates |
| 07/24/1997 | CA2194629A1 Gas discharge laser control systems using multiple cpu's with shared memory on a common bus |
| 07/23/1997 | EP0785571A2 Exposure method and apparatus therefore |
| 07/23/1997 | EP0785565A1 Phosphor pattern, processes for preparing the same and photosensitive element to be used for the same |
| 07/23/1997 | EP0785474A1 Process and apparatus for the fabrication of flexographic printing plates |
| 07/23/1997 | EP0785473A2 Reduction in damage to optical elements used in optical lithography for device fabrication |
| 07/23/1997 | EP0785472A2 Scan type projection exposure apparatus and device manufacturing method using the same |
| 07/23/1997 | EP0785471A2 Method and apparatus for forming fine patterns on printed circuit board |
| 07/23/1997 | EP0785470A2 Method of providing resist pattern |
| 07/23/1997 | EP0785469A2 A Process for making an x-ray mask |
| 07/23/1997 | EP0784857A1 Radiation cured radiographic intensifying screen |
| 07/23/1997 | EP0784543A1 Lithographic surface or thin layer modification |
| 07/23/1997 | EP0784542A1 Stamp for a lithographic process |
| 07/23/1997 | EP0784527A1 X-y-theta positioning mechanism |
| 07/23/1997 | EP0749594A4 Stable, ionomeric photoresist emulsion and process of preparation and use thereof |
| 07/23/1997 | EP0469026B1 Manufacture of flat panel displays |
| 07/23/1997 | CN1155258A Process for producing three-dimensional object |
| 07/23/1997 | CN1155101A Rewinder |
| 07/23/1997 | CN1155100A Sensitive composition and printing plate for sensitive offset press using said composition |
| 07/23/1997 | CN1154910A Method for production of printing mould plate and apparatus thereof |
| 07/22/1997 | US5651019 Solid-state blue laser source |
| 07/22/1997 | US5650877 Imaging system for deep ultraviolet lithography |
| 07/22/1997 | US5650840 Focus detecting method and apparatus |
| 07/22/1997 | US5650632 Focal plane phase-shifting lithography |
| 07/22/1997 | US5650631 Electron beam writing system |
| 07/22/1997 | US5650630 Mercury vapor high-pressure discharge lamp and irradiation method, particularly for mask pattern exposure of semiconductor wafers |
| 07/22/1997 | US5650262 High-resolution negative photoresist with wide process latitude |
| 07/22/1997 | US5650261 Positive acting photoresist comprising a photoacid, a photobase and a film forming acid-hardening resin system |
| 07/22/1997 | US5650260 Method and apparatus for fabricating three-dimensional object |
| 07/22/1997 | US5650259 Processes for pattern formation using photosensitive compositions and liquid development |
| 07/22/1997 | US5650258 Image formation |
| 07/22/1997 | US5650257 Multilayer photosensitive element with coverings of epoxy resins |
| 07/22/1997 | US5650251 Process for producing color filter comprising an ultrasonic wave projected perpendicularly to the substrate |
| 07/22/1997 | US5650250 Light exposure mask for semiconductor devices |
| 07/22/1997 | US5650249 Method for making precision radomes |
| 07/22/1997 | US5650247 Preparation and reproduction of filters and preparation of filter photographic materials |
| 07/22/1997 | US5650233 Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition |
| 07/22/1997 | US5649486 Thin-metal lithographic printing members with visible tracking layers |
| 07/17/1997 | WO1997025653A1 Three-dimensional etching process |
| 07/17/1997 | WO1997025359A1 Acidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefrom |
| 07/17/1997 | WO1997025127A1 Method of filtering the organic solutions arising in the production of circuit boards |
| 07/17/1997 | DE19600967A1 Verfahren zum Auftrennen von aus der Leiterplattenherstellung stammenden organischen Prozeßlösungen Method for separating derived from the organic circuit board manufacture process solutions |
| 07/17/1997 | CA2242162A1 Method of filtering the organic solutions arising in the production of circuit boards |
| 07/16/1997 | EP0784233A1 Photosensitive composition and lithographic printing plate |
| 07/16/1997 | EP0784232A1 Photosensitive composition and photosensitive rubber plate |
| 07/16/1997 | EP0783728A1 Radiation-sensitive adducts comprising diazonium cations, quaternary cations, and sulfonated polyester anions |
| 07/16/1997 | EP0783727A1 Microstructures and methods for manufacturing microstructures |
| 07/16/1997 | EP0525185B1 Positive resist composition |
| 07/15/1997 | US5649261 Apparatus for treating photographic originals with a treatment liquid |
| 07/15/1997 | US5648854 Alignment system with large area search for wafer edge and global marks |
| 07/15/1997 | US5648451 Process for producing photosensitive resin |
| 07/15/1997 | US5648324 Photoresist stripping composition |
| 07/15/1997 | US5648202 Silicon oxynitrides |
| 07/15/1997 | US5648201 Photodegradation |
| 07/15/1997 | US5648200 Process for creating circuitry on the surface of a photoimageable dielectric |
| 07/15/1997 | US5648199 Method of forming a resist pattern utilizing an acid water-soluble material overlayer on the resist film |
| 07/15/1997 | US5648198 Resist hardening process having improved thermal stability |
| 07/15/1997 | US5648196 Water-soluble photoinitiators |
| 07/15/1997 | US5648195 Film forming polymer treated with solvent and radiation sensitive ester of diazoketone |
| 07/15/1997 | US5648194 High speed |
| 07/15/1997 | US5648159 Dry resist |
| 07/15/1997 | US5648000 Stable discharge at atmosphere pressure; dielectric between pair of electrodes |
| 07/15/1997 | US5647999 Method for fine patterning of a polymeric film |
| 07/10/1997 | WO1997024760A1 Method and device for transferring thin plate-like substrate |
| 07/10/1997 | DE19632563A1 Structured quarter-wave plate, mirror, grating and prism production |