G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1997
11/18/1997	US5688723 Method of forming fine patterns
11/18/1997	US5688719 Method for plasma hardening of patterned photoresist layers
11/18/1997	US5688634 Energy sensitive resist material and process for device fabrication using the resist material
11/18/1997	US5688633 Polyurethanes modified with acrylate and/or methacrylate modified polymers for light sensitive resins
11/18/1997	US5688632 Photosensitive polymer composition containing a soluble polymer of islands-in-a-sea structure, a photopolymerizable polymer, and a photopolymerization initiator
11/18/1997	US5688631 Bis/o-aminophenol/ reacted with dicarboxylic acid halogenide for heat resistant polymers
11/18/1997	US5688629 Process for the production of lithographic printing plates utilizing peel development
11/18/1997	US5688628 Acid former, polymers, phenolic compound
11/18/1997	US5688627 Lithography, light sensitive elements with coatings on aluminum
11/18/1997	US5688555 Gas barrier during edge rinse of SOG coating process to prevent SOG hump formation
11/18/1997	US5688415 Localized plasma assisted chemical etching through a mask
11/18/1997	US5688410 Oxygen, sulfur hexafluoride
11/18/1997	US5688409 Depositing device layer to be patterned above a substrate, depositing photoresist layer, providing a reticle having first layer having first and second phase region, a second layer, exposing phtoresist using stepper, adjusting coherence
11/18/1997	US5688365 Method of making semiconductor device
11/18/1997	US5688326 Apparatus for coating elongated material with photoresist
11/18/1997	US5688322 Apparatus for coating resist on substrate
11/18/1997	US5687947 Mounting method
11/18/1997	US5687462 Method of forming an electro-active device
11/13/1997	WO1997042549A1 Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects
11/13/1997	WO1997042548A1 Lithographical process for production of nanostructures on surfaces
11/13/1997	WO1997042227A1 Polymerisable composition
11/13/1997	WO1997035231A3 Thermal treatment process of positive photoresist composition
11/13/1997	WO1997033763A3 Application to fabric of heat-activated transfers
11/13/1997	DE19617643A1 Film conversion system converting 2-D into 3-D images
11/13/1997	CA2253882A1 Lithographical process for production of nanostructures on surfaces
11/13/1997	CA2251788A1 Polymerisable composition
11/12/1997	EP0806707A1 Microlithographic imaging system
11/12/1997	EP0805828A1 Metal ion reduction in novolak resins solution in pgmea
11/12/1997	EP0720535B1 Imaging medium with adhesive layers
11/12/1997	CN1164644A Mask for checking lens distortion
11/11/1997	US5686997 Scanning projection exposure method and projection exposure apparatus
11/11/1997	US5686991 Positioning apparatus having the interferometer and accelerometer positioned such that there signals are in phase
11/11/1997	US5686984 Projection exposure method and apparatus to determine optical performance of reticle
11/11/1997	US5686793 Excimer lamp with high pressure fill
11/11/1997	US5686728 Projection lithography system and method using all-reflective optical elements
11/11/1997	US5686561 Metal ion reduction in novolak resin solution using an anion exchange resin
11/11/1997	US5686503 Photoinitiators
11/11/1997	US5686231 Process for disposing of developer for pigment-containing non-silver-salt photo sensitive material, apparatus therefor and automatic developing system
11/11/1997	US5686230 Exposing senstive layer to collimated radiation through mask
11/11/1997	US5686228 Substituted propenitrile compounds as antifoggants for black-and-white photothermographic and thermographic elements
11/11/1997	US5686226 Method of forming an applicator for applying tacking media to a circuit substrate
11/11/1997	US5686224 Ink jet print head having channel structures integrally formed therein
11/11/1997	US5686223 Semiconductors
11/11/1997	US5686221 Negative working peel apart color proofing process
11/11/1997	US5686220 Photo-curing composition and photosensitive capsule
11/11/1997	US5686211 Removing photoresist layer from semiconductors
11/11/1997	US5685895 Chemical filter, photolithography
11/11/1997	US5685754 Method of generating a reactive species and polymer coating applications therefor
11/11/1997	US5685232 Positioning stage device exposure apparatus and device manufacturing method utilizing the same
11/06/1997	WO1997041488A2 Processes for cleaning and stripping photoresist from surfaces of semiconductor wafers
11/06/1997	WO1997041110A1 Processes for preparing thioxanthone and derivatives thereof
11/06/1997	DE19709393A1 Surface treatment of lithographic printing plate to give silver image
11/06/1997	DE19617541A1 Stereoscopic picture sequence master production method
11/05/1997	EP0805159A1 Phosphorus containing alkyl or arylsulphonyl derivatives and method for preparing same
11/05/1997	EP0805152A2 Cyclic amine substituted phenyl-alkyl-ketone and process for its preparation
11/05/1997	EP0805021A2 Process for the regulation of the temperature within a device for the inscription of printing plates using a laser radiation particularly for an offset printing machine
11/05/1997	EP0804753A1 Method of developing positive photoresist and compositions therefor
11/05/1997	EP0804431A1 GLYCOPROTEIN IIb/IIIa ANTAGONISTS
11/05/1997	EP0576622B1 Lithographic printing plates
11/05/1997	EP0522175B1 Photopolymerizable composition
11/05/1997	EP0511403B1 Photosensitive resin composition and photosensitive element structure
11/05/1997	EP0511328B1 Silicone coating formulations and planographic printing plates made therewith
11/05/1997	EP0464081B1 Method of manufacturing an optical disc
11/05/1997	CN1164049A Method for fabricating light exposure mask
11/04/1997	US5684856 Stage device and pattern transfer system using the same
11/04/1997	US5684642 Optical transmission system and light radiating method
11/04/1997	US5684595 Alignment apparatus and exposure apparatus equipped therewith
11/04/1997	US5684571 Apparatus for and method of exposing photosensitized plates
11/04/1997	US5684567 Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern
11/04/1997	US5684566 Illumination system and method employing a deformable mirror and diffractive optical elements
11/04/1997	US5684565 Pattern detecting method, pattern detecting apparatus, projection exposing apparatus using the same and exposure system
11/04/1997	US5684360 Electron sources utilizing negative electron affinity photocathodes with ultra-small emission areas
11/04/1997	US5684301 For measuring geometrical characteristics of features on a substrate
11/04/1997	US5683857 Method for forming resist pattern by irradiating a resist coating on a substrate, contacting the resist with organic solvent vapor and removing the irradiated portion
11/04/1997	US5683856 Cationic ammonium resin, acid generator, dissolution inhibition
11/04/1997	US5683852 Light-sensitive material for producing a multi-color image
11/04/1997	US5683851 Thymol or isothymol phenolic resin, naphthoquinonediazidesulfonate, low molecular weight phenolic polyhydroxide
11/04/1997	US5683837 Amine addition polymer, unsaturated monomer, photoinitiator
11/04/1997	US5683595 Fine pattern forming method and fine pattern device
11/04/1997	US5683592 Vision defects
10/1997
10/30/1997	WO1997040650A1 Method and apparatus for generating x-ray or euv radiation
10/30/1997	WO1997040423A2 Cleaning and stripping of photoresist from surfaces of semiconductor wafers
10/30/1997	WO1997040422A1 Image enhancement using interferometry
10/30/1997	WO1997040421A1 Nitrone compounds as photopolymer polymerization inhibitors and contrast enhancing additives
10/30/1997	WO1997040412A1 Confocal optical apparatus and hologram exposure apparatus
10/30/1997	WO1997040115A1 Ultraviolet-curing adhesive composition and article
10/30/1997	WO1997039894A1 Heat-sensitive composition and method of making a lithographic printing form with it
10/30/1997	DE19716794A1 Close-up microlithography device for manufacture of e.g. LCD display or semiconductor device
10/30/1997	DE19711968A1 Illumination device for manufacturing black matrix on inner surface of CRT front plate
10/30/1997	DE19710695A1 Exposure technique for formation of photo-resist layer in construction of CRT
10/30/1997	DE19705732A1 Production of monolithic capillary X-ray lenses
10/30/1997	DE19616324A1 Polymer-based opto-electronic, e.g. active or passive, component manufacture
10/30/1997	CA2175302A1 Bis(alk or arylsulphonyl) alkyl phosphine oxides
10/29/1997	EP0803904A2 Substrate support
10/29/1997	EP0803778A1 Treating fluid for making waterless lithographic plate
10/29/1997	EP0803777A1 Undercoating composition for photolithographic resist
10/29/1997	EP0803776A2 Composition for anti-reflection coating
10/29/1997	EP0803775A1 Positive working photosensitive composition
10/29/1997	EP0803769A1 Imaging element for making a lithographic printing plate wherein that imaging element comprises a thermosensitive mask
10/29/1997	EP0803755A2 Projection optical system and exposure apparatus with the same

1 ... 1044 1045 1046 1047 1048 1049 1050 1051 1052 1053 1054 1055 1056 1057 1058 1059 1060 1061 1062 1063 1064 ... 1272