Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1997
10/14/1997US5677041 Integrated circuits formed in radiation sensitive material and method of forming same
10/14/1997US5677011 Premasking
10/14/1997US5677001 On semiconductor wafer; prewetting; rotation
10/14/1997US5677000 Substrate spin treating method and apparatus
10/14/1997US5676904 Thermal stereolithography
10/14/1997US5676789 Film peeling method and apparatus
10/14/1997CA2049795C Process for fabricating a device
10/09/1997WO1997037380A1 Method of processing a semiconductor wafer for controlling drive current
10/09/1997WO1997037283A1 Lithographic scanning exposure projection apparatus
10/09/1997WO1997037282A1 Scanning-slit exposure device
10/09/1997WO1997037267A1 Lens focus shift sensor
10/09/1997DE19703752A1 Well-structurised black matrix in colour picture tube
10/09/1997CA2201455A1 Photoimageable composition having an acrylic-functional uv stabilizer
10/08/1997EP0800116A1 Photoresist composition
10/08/1997EP0799858A1 Ultraviolet-curable composition and method for forming cured-product patterns therefrom
10/08/1997EP0799832A2 Hydrolysable fluorinated silanes; process for their preparation and their use in preparing silicic acid polycondensates and silicic acid heteropolycondensates
10/08/1997EP0799717A1 A method for preparing a hydrophilic surface of a lithographic aluminum base for lithographic printing plates
10/08/1997EP0799716A2 Diazo compounds for laser-induced mass transfer imaging materials
10/08/1997EP0799713A1 Thermal transfer donor element comprising a colourless sublimable compound and image forming process
10/08/1997EP0799439A1 Positioning device with a force actuator system for compensating centre-of-gravity displacements
10/08/1997EP0799438A1 Production of water-less lithographic plates
10/08/1997EP0614497B1 Apparatus and method for treating a wafer of semiconductor material
10/08/1997CN1161751A Positive photosensitive composition
10/08/1997CN1036102C Method for fabricating semiconductor device
10/07/1997US5675433 Method for external excitation of subwavelength light sources that is integrated into feedback methodologies
10/07/1997US5675418 Pattern alignment mark of semiconductor device
10/07/1997US5675403 Stress-free mount for imaging mask
10/07/1997US5675402 Stepper light control using movable blades
10/07/1997US5675401 For an optical system
10/07/1997US5675164 High performance multi-mesa field effect transistor
10/07/1997US5675140 Autofocus control device with a light source
10/07/1997US5674922 Active energy beam-curable compositions comprising oxetane compounds
10/07/1997US5674662 Contacting organic solution with ammonium hydroxide modified cation exchange resin
10/07/1997US5674660 Non-tacky photoimageable electrodepositable photoresist composition
10/07/1997US5674659 Coating porous photoresist film on conductive substrate, roll-pressing with heating to change film from porous to uniform, photoetching
10/07/1997US5674658 Lithographic printing plates utilizing an oleophilic imaging layer
10/07/1997US5674657 Phenolic resin copolymer comprising meta-cresol, para-cresol and other phenolic monomer selected from xylenols, methoxyphenols; radiation sensitivity
10/07/1997US5674652 Diffracted light from latent images in photoresist for exposure control
10/07/1997US5674650 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
10/07/1997US5674648 Applying the coating of polyimide film containing curcumin dye to the substrate, patterning by photolithography
10/07/1997US5674414 Method and apparatus of irradiating a surface of a workpiece with a plurality of beams
10/07/1997US5674410 Chemical agent producing device and method thereof
10/07/1997US5674409 Maskless etching the patterned photoresist layer which having at least one non-volatile material distributed within
10/07/1997US5674356 Method for forming a semiconductor device in which an anti reflective layer is formed by varying the composition thereof
10/02/1997WO1997036209A1 Solutions and processes for removal of sidewall residue after dry-etching________________________________________________________
10/02/1997WO1997036208A1 Production of water-less lithographic plates
10/02/1997WO1997035907A1 Polymers with 2,3-dihydrofurane groups
10/02/1997WO1997035837A1 Liquid photo initiators
10/02/1997DE19709761A1 Electron beam exposure apparatus for semiconductor circuit manufacture
10/02/1997DE19612329A1 Metal master production for CD manufacture
10/02/1997CA2250054A1 Production of water-less lithographic plates
10/01/1997EP0798598A2 Method of processing resist onto substrate and resist processing apparatus
10/01/1997EP0798597A1 Negative working photoresist composition based on polyimide primers
10/01/1997EP0798585A2 Catadioptric one-to-one telecentric image combining system
10/01/1997EP0798341A1 Radiation-curable composition and method for manufacturing cured-product patterns therefrom
10/01/1997EP0797835A1 Method for fabricating a pixelized phosphor
10/01/1997EP0797830A1 Exit window for x-ray lithography beamline
10/01/1997EP0797792A1 Photolithographic method of producing structural features
10/01/1997EP0797791A1 Photosensitive compositions and clean running photopolymer printing plates therefrom
10/01/1997EP0797790A1 Microstructured body gradual construction process and thus produced microstructured bodies
10/01/1997CN1160718A Alkylphenylbisacylphosphine oxides and photoinitiator mixtures
09/1997
09/30/1997US5673208 Computer-implemented method
09/30/1997US5673135 Scanning projection optical device
09/30/1997US5673134 For conducting a light beam source to an object
09/30/1997US5673131 Circuit coupling apparatus
09/30/1997US5673103 Exposure apparatus and method
09/30/1997US5673102 Image farming and microdevice manufacturing method and exposure apparatus in which a light source includes four quadrants of predetermined intensity
09/30/1997US5673101 Method of repetitively imaging a mask pattern on a substrate, and apparatus for performing the method
09/30/1997US5672760 Obtaining a photoabsorber-containing acrylic polymer by using n-2-hydroxyethyl-n-ethyl aniline to obtain 4-((2-hydroxyethyl)ethylamino)-4'-(trifluoromethylsulfonyl)-tolane which reacts with a polymerizable methacrylic acid
09/30/1997US5672637 Stabilized cationically-curable compositions
09/30/1997US5672577 Stripper solution also contains water, 1,2-dihydroxybenzene or derivatives, mercaptophenol/o-/ or mercaptobenzoic acid/o-/, and ethylenediaminetetracarboxylic acid as chelating agents to provide stability and effectiveness
09/30/1997US5672520 Method of checking alignment accuracy in photolithography
09/30/1997US5672465 Polyethyleneimine binder complex films
09/30/1997US5672464 Exposure to computer controlled light source, for printed circuits
09/30/1997US5672463 Polyfunctional vinyl ether compound and photoresist resin composition containing the same
09/30/1997US5672461 Storage stability of an imaging element for making a printing plate according to the silver salt diffusion transfer process
09/30/1997US5672460 Method for forming conductive or insulating layers
09/30/1997US5672459 Radiation sensitive resin composition containing quinone diazide ester having two hindered phenol groups
09/30/1997US5672449 Silicon membrane and method of making same
09/30/1997US5672312 Thermal stereolithography
09/30/1997US5672243 Antireflection coating for highly reflective photolithographic layers comprising chromium oxide or chromium suboxide
09/30/1997US5672225 Method for engraving three dimensional images
09/30/1997US5672205 Coating apparatus
09/30/1997US5671760 Apparatus for controlling resist stripping solution
09/30/1997CA2107795C Processes for electron lithography
09/30/1997CA2070325C Process and apparatus for controllably separating framed working area from remainder of the membrane
09/30/1997CA1339485C Active energy ray-curable unsaturated resin composition
09/25/1997WO1997035235A1 Improved photomask
09/25/1997WO1997035233A1 Industrial method and device for preparing lightened or pre-lightened positive plates for offset printing
09/25/1997WO1997035232A1 Uv-curable compositions comprising an acyl phosphine oxide and an optical brightener
09/25/1997WO1997035231A2 Thermal treatment process of positive photoresist composition
09/25/1997WO1997034935A1 Photoactivatable chain transfer agents
09/25/1997WO1997029222A3 Production of bevelled galvanic structures
09/25/1997DE19611349A1 Polymerisate mit 2,3-Dihydrofurangruppen Polymers with 2,3-Dihydrofurangruppen
09/25/1997CA2249287A1 Photoactivatable chain transfer agents
09/24/1997EP0797121A2 Exposure apparatus
09/24/1997EP0797120A2 Multilayer recording element suitable for the production of flexographic printing plates by digital information transmission
09/24/1997EP0797119A1 Photosensitive resin compositions and printing plate materials
09/24/1997EP0796172A1 On-press developable printing plates with hydrogen bond forming developability stabilizer
09/24/1997CN1160228A Illumination method and apparatus for formation of micro patterns