Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/13/1998 | EP0841593A1 Method and apparatus for depositing a photoresist layer on a substrate |
05/13/1998 | EP0841190A1 Lithographic printing plate |
05/13/1998 | EP0840907A1 Screen for flat or rotary screen printing and method for its manufacturing |
05/13/1998 | CN2281555Y Negative ion etching apparatus |
05/13/1998 | CN1181820A Process for obtaining a lift-off imaging profile |
05/13/1998 | CN1181767A Process for producing a polyamide based on a dicarboxylic acid and a diamine |
05/13/1998 | CN1181520A Chemically amplified resist composition |
05/12/1998 | US5751683 Nanometer scale data storage device and associated positioning system |
05/12/1998 | US5751428 Exposure method and exposure apparatus using the same |
05/12/1998 | US5751426 Positional deviation measuring device and method for measuring the positional deviation between a plurality of diffraction gratings formed on the same object |
05/12/1998 | US5751404 Exposure apparatus and method wherein alignment is carried out by comparing marks which are incident on both reticle stage and wafer stage reference plates |
05/12/1998 | US5751403 Projection exposure apparatus and method |
05/12/1998 | US5751325 Working relationship of a reducing agent for a metal compoundand physical nuclei that catalyze the metal |
05/12/1998 | US5751004 Projection reticle transmission control for coulomb interaction analysis |
05/12/1998 | US5750897 Active anti-vibration apparatus and method of manufacturing the same |
05/12/1998 | US5750680 N-vinyllactam derivatives and polymer thereof |
05/12/1998 | US5750638 Method for the production of poly-o-hydroxyamides |
05/12/1998 | US5750632 Isolation of novolak resin by low temperature sub surface forced steam distillation |
05/12/1998 | US5750442 Germanium as an antireflective coating and method of use |
05/12/1998 | US5750317 Process and system for flattening secondary edgebeads on resist coated wafers |
05/12/1998 | US5750316 Light exposure of a photoresist coated on an amorphous carbon film on the surface of a transparent film covering a light reflecting surface, the thicknesses of which provide a standing wave |
05/12/1998 | US5750315 Casting liquid photopolymerizable resin directly onto compressible material having open cells on surface; incompletely curing; coating with another resin layer; curing; developing |
05/12/1998 | US5750314 Method for selectively imaging a lithographic printing plate |
05/12/1998 | US5750313 Photosensitive resin composition and process for producing the same |
05/12/1998 | US5750312 Process for fabricating a device |
05/12/1998 | US5750311 Image-formable material with releaseable cushion layer |
05/12/1998 | US5750310 Positive photoresist composition |
05/12/1998 | US5750309 Chemically amplified positive resist composition |
05/12/1998 | US5750294 Best focus determining method |
05/12/1998 | US5750292 Triazine derivative, (meth)acrylate polymer binder |
05/12/1998 | US5750291 Image-forming process |
05/12/1998 | US5750290 Forming an integrated circuit on a semiconductor wafer |
05/12/1998 | US5750031 Washing with deionized water; ion exchanging |
05/12/1998 | US5750015 Electrophoresis and photolithography |
05/12/1998 | US5750003 Chuck for holding semiconductor photolithography masks |
05/12/1998 | US5749698 Substrate transport apparatus and substrate transport path adjustment method |
05/07/1998 | WO1998019219A1 Direct positive lithographic plate |
05/07/1998 | WO1998019218A1 Improved process for 3d chip stacking |
05/07/1998 | WO1998019214A2 Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
05/07/1998 | WO1998018868A1 Solventless primers which are hardenable by radiation |
05/07/1998 | DE19748711A1 Lithographic printing plate production |
05/07/1998 | CA2268622A1 Solvent-free, radiation-curable primer |
05/06/1998 | EP0840364A1 Method of forming a semiconductor device |
05/06/1998 | EP0840361A2 Method and apparatus for depositing a film over a substrate |
05/06/1998 | EP0840170A1 Selected O-quinonediazide sulfonic acid esters of phenolic compounds |
05/06/1998 | EP0840147A2 Method and apparatus for making continuous chirped fiber bragg gratings |
05/06/1998 | EP0839647A1 Method for making a lithographic printing plate with improved ink-uptake |
05/06/1998 | EP0839341A1 Heterogeneous photo-initiators, photopolymerisable compositions and their use |
05/06/1998 | EP0809814A4 Arbitrarily wide lens array with an image field to span the width of a substrate |
05/06/1998 | CN1180849A Radiation sensitve composition |
05/06/1998 | CN1180848A Novel photoresist copolymer |
05/05/1998 | US5748365 Catadioptric one-to-one telecentric image combining system |
05/05/1998 | US5748331 Process control strip and method for recording |
05/05/1998 | US5748323 Method and apparatus for wafer-focusing |
05/05/1998 | US5748316 Detector for wavelength of excimer laser |
05/05/1998 | US5748315 Optical interference measuring apparatus and method for measuring displacement of an object having an optical path separating system |
05/05/1998 | US5748288 Lighting assembly, exposure apparatus and exposure method employing the lighting assembly |
05/05/1998 | US5748225 Condition sensitive method and apparatus for imaging a lithographic printing plate |
05/05/1998 | US5748222 Laser angroxing head employing acousto-optic modulator |
05/05/1998 | US5747993 Movement actuator/sensor systems |
05/05/1998 | US5747817 One-step method for on-line lithographic pattern inspection |
05/05/1998 | US5747813 Broadband microspectro-reflectometer |
05/05/1998 | US5747790 Solid state imaging device and method of manufacturing same |
05/05/1998 | US5747692 Sensor system for determining acceleration |
05/05/1998 | US5747622 Polymer having silicon atoms and sulfonium salt units and photoresist compositions containing the same |
05/05/1998 | US5747611 Broad molecular weight distribution |
05/05/1998 | US5747388 Antireflection layer and process for lithographically structuring a layer |
05/05/1998 | US5747387 Removal method of organic matter and system for the same |
05/05/1998 | US5747224 Stock developer solutions for photoresists and developer solutions prepared by dilution thereof |
05/05/1998 | US5747223 Composition for photoimaging |
05/05/1998 | US5747221 Photolithography method and photolithography system for performing the method |
05/05/1998 | US5747220 Light sensitive planographic printing plate having particular deposited particles and process for producing the same |
05/05/1998 | US5747218 Naphthoquinonediazide sulfonic acid tetraester of polyhydroxypolyphenols |
05/05/1998 | US5747217 Graphic arts |
05/05/1998 | US5747216 Presensitized plate comprising two photosensitive layers wherein the layer adjacent to the support has a lower concentration of dye than the other layer |
05/05/1998 | US5747202 Projection exposure method |
05/05/1998 | US5747201 Controlling method of forming thin film, system for said controlling method, exposure method and system for said exposure method |
05/05/1998 | US5747200 Radiation exposure of wafers, photoresists and positioning and forming patterns |
05/05/1998 | US5747199 Method of making color filter arrays by transferring two or more colorants simultaneously |
05/05/1998 | US5747198 Multilayer element with phenol resin on substrate with naphthoquinonediazide for positive resist and a negative working agent |
05/05/1998 | US5747115 Acrylated epoxy resin cured with acrylates, mixing with rutile and manganese ferrite coated on steel panels then curing with xenon lamp |
05/05/1998 | US5746562 Processing system and device manufacturing method using the same |
04/30/1998 | WO1998018049A1 Sub-micron patterning using optical lithography |
04/30/1998 | WO1998017483A1 Apparatus and method for recovering photoresist developers and strippers |
04/30/1998 | DE19747773A1 Method of correcting lighting patterns |
04/30/1998 | DE19745776A1 Processing lithographic printing plate for scanning irradiation |
04/30/1998 | DE19743564A1 Radiation curable adhesion promoting primer coating |
04/30/1998 | CA2217084A1 Hydrogenation catalysts and processes therewith |
04/29/1998 | EP0838728A2 Precision stage interferometer system with air duct |
04/29/1998 | EP0838727A1 Radiation sensitive composition |
04/29/1998 | EP0838478A1 Amido substituted acetal polymers and their use in photosensitive compositions and lithographic printing plates |
04/29/1998 | EP0838134A1 Procedure and device for the chemical and electrolytic treatment of printed circuit boards and films |
04/29/1998 | EP0838084A1 Multilayer high vertical aspect ratio thin film structures |
04/29/1998 | EP0838045A1 Making a photopolymer printing plate |
04/29/1998 | EP0837940A1 Novel secretion factors for gram-positive microorganisms, genes encoding them and methods of using it |
04/29/1998 | EP0741914A4 Packaged strain actuator |
04/29/1998 | CN2280305Y Washing and brushing device used for process of printing forms prodn. and washing |
04/29/1998 | CA2219630A1 Method and apparatus for correcting exposure patterns, and exposure mask, method of exposing, and semiconductor device |
04/28/1998 | US5745388 Profile simulation method and pattern design method |
04/28/1998 | US5745294 Illuminating optical apparatus |