Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/1997
08/26/1997US5660968 Negative working, peel developeable, single sheet color proofing system with improved background color
08/26/1997US5660967 Photosensitive resin composition and method for forming photoresist pattern using the same
08/26/1997US5660957 Electron-beam treatment procedure for patterned mask layers
08/26/1997US5660692 Method of crosslinking amino acid-containing polymers using photoactivatable chemical crosslinkers
08/26/1997US5660680 Method for fabrication of high vertical aspect ratio thin film structures
08/26/1997US5660381 Carrier device
08/26/1997US5660255 Stiff actuator active vibration isolation system
08/21/1997WO1997030571A1 Coating pattern formation
08/21/1997WO1997030378A1 Positional measurements
08/21/1997WO1997020696A3 Transfer printing medium
08/21/1997DE19638747C1 Glass master manufacturing process for CD or CD-ROM
08/20/1997EP0790533A2 Process and apparatus for surface cleaning
08/20/1997EP0790532A1 A method for making by phototypesetting a lithographic printing plate according to the silver salt diffusion transfer process
08/20/1997EP0790531A1 A method for making an offset printing plate according to the silver salt diffusion transfer process
08/20/1997EP0790530A1 Dummy plate for offset printing
08/20/1997EP0790529A2 Color proofing article incorporating novel antihalation dye
08/20/1997EP0790256A2 Spherical polymer particles and process for their production
08/20/1997EP0790119A2 Apparatus for solidifying and shaping optically cured fluid by carrying out scanning simultaneously with recoating
08/20/1997EP0790082A2 Apparatus for coating substrates
08/20/1997EP0789721A2 Visible-light curable epoxy system with enhanced depth of cure
08/20/1997CN2259996Y Printing surface mfg. machine for large flexible forme
08/20/1997CN1157479A Method for forming re-entrant photoresist lift-off profile for thin film device processing and thin film device made thereby
08/20/1997CN1157426A Organic base catalytic non-developing gas-phase photoresist
08/20/1997CN1157418A Integral X-ray lens and manufacturing method thereof and equipment using the same
08/19/1997US5659429 Illuminating optical apparatus and method
08/19/1997US5659390 Method and apparatus for detecting particles on a surface of a semiconductor wafer having repetitive patterns
08/19/1997US5659383 Exposure apparatus and exposure quantity control method
08/19/1997US5658966 Using an addition polymer
08/19/1997US5658713 Storage stability
08/19/1997US5658712 (Meth)acrylates containing urethane groups
08/19/1997US5658711 Forming resist film containing base generator, generating base by radiation, forming metal oxide film, etching
08/19/1997US5658709 Method for manufacturing implantable cardiac defibrillation electrodes using a laser beam material removal process
08/19/1997US5658708 Radiation absorbing material containing enol ether groups
08/19/1997US5658706 Resist composition for forming a pattern comprising a pyridinium compound as an additive
08/19/1997US5658700 Tracking location of wafer moved between exposure position and replacement position
08/19/1997US5658698 Microstructure, process for manufacturing thereof and devices incorporating the same
08/19/1997US5658697 Method for producing color filters by the use of anionic electrocoats
08/19/1997US5658615 Applying solvent to surface of substrate while rotating, rotating to diffuse solvent, applying coating solution to center of substrate while rotating to spread solution and form film of uniform thickness
08/19/1997US5658469 Method for forming re-entrant photoresist lift-off profile for thin film device processing and a thin film device made thereby
08/19/1997US5658440 Sputter etching patterned photoresists
08/19/1997US5658416 Method and apparatus for peeling a laminate
08/14/1997WO1997029404A1 Methods and apparatus for detecting and compensating for focus errors in a photolithography tool
08/14/1997WO1997029403A1 Method and apparatus for transferring a reticle pattern to a large area substrate by scanning
08/14/1997WO1997029222A2 Production of bevelled galvanic structures
08/14/1997WO1997022235A3 Solder mask for manufacture of printed circuit boards
08/13/1997EP0789389A2 Method of peeling photo-resist layer without damage to metal wiring
08/13/1997EP0789280A2 Holding mechanism, and exposure apparatus using the mechanism
08/13/1997EP0789279A1 Polymer and resist material
08/13/1997EP0789278A2 Radiation-sensitive resin composition
08/13/1997EP0789277A2 Method for preparing prepress color proof and intermediate receiver element and carrier plate useful therein
08/13/1997EP0789065A2 Radiation-curable blend and its use
08/13/1997EP0788620A1 Positive photosensitive composition
08/13/1997EP0788612A1 Beamsplitter in single fold optical system and optical variable magnification method and system
08/13/1997EP0671025B1 Metal ion reduction in bottom anti-reflective coatings for photoresists
08/13/1997CN1157042A Photosensitive paste, plasma display and process for production thereof
08/13/1997CN1156876A Exposure apparatus
08/13/1997CN1156848A Illuminator and exposure method using same
08/12/1997US5657235 Continuous scale optical proximity correction by mask maker dose modulation
08/12/1997US5657130 Exposure apparatus and method
08/12/1997US5656882 Packaged strain actuator
08/12/1997US5656526 Method of fabricating a display device
08/12/1997US5656414 Methods of forming tall, high-aspect ratio vias and trenches in photo-imageable materials, photoresist materials, and the like
08/12/1997US5656413 Demetallization, purification by filtering through a cleaned acidic exchanging resin and anion exchange resin
08/12/1997US5656412 Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material
08/12/1997US5656411 Two-part system; one part thermocurable material; other part curing system
08/12/1997US5656403 Method and template for focus control in lithography process
08/12/1997US5656400 Photomask and pattern forming method employing the same
08/12/1997US5656399 Process for making an x-ray mask
08/12/1997US5656182 Process for fabricating a device in which the process is controlled by near-field imaging latent features introduced into energy sensitive resist materials
08/12/1997US5656127 Device for initiating the delamination of an image suited for dry processing
08/12/1997US5655452 Method and apparatus for an automated plate handler with slip sheet removal mechanism
08/12/1997CA2132493C Photographic element provided with a backing layer and method for manufacture thereof
08/12/1997CA2081135C Method for precipitating an organic resin from an alkaline solution thereof
08/07/1997WO1997028490A1 Covered microchannels and the microfabrication thereof
08/07/1997WO1997023808A3 A mixed solvent system for positive photoresists
08/07/1997WO1997016482A3 Low-shrinkage light-curable resin
08/07/1997DE19604242A1 Herstellung von schrägen Galvanikstrukturen Production of oblique galvanic structures
08/06/1997EP0788143A2 Method of producing semiconductor device and rinse for cleaning semiconductor device
08/06/1997EP0788032A1 Process for exposing a peripheral area of a wafer and a device for executing the process
08/06/1997EP0788031A1 Positive working photosensitive composition
08/06/1997EP0788030A2 Support for colour proof
08/06/1997EP0788029A2 Laminable proofing elements
08/06/1997EP0787777A1 Carbon black graft polymer, process for the production of the polymer and use thereof
08/06/1997EP0787583A2 Lithographic printing members with deformable cushioning layers
08/06/1997EP0787256A1 Process for producing a perforated disc
08/06/1997EP0787255A1 Perforated disc, especially for injection valves, and process for producting it
08/06/1997EP0787254A1 Perforated disc, especially for injection valves
08/06/1997CN1156327A Electronic beam unit projection stamp mark system
08/06/1997CA2196643A1 Coating compositions curable by radiation and their use for preparing coated substrates
08/05/1997US5655110 Method for setting and adjusting process parameters to maintain acceptable critical dimensions across each die of mass-produced semiconductor wafers
08/05/1997US5655040 Method of forming a dispersing grating in an optical fiber
08/05/1997US5654792 Semiconductor device manufacturing method
08/05/1997US5654553 Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate
08/05/1997US5654547 Method for particle wave reconstruction in a particle-optical apparatus
08/05/1997US5654376 Polymeric dyes for antireflective coatings
08/05/1997US5654220 Method of making a stacked 3D integrated circuit structure
08/05/1997US5654202 Stabilization of a patterned planarizing layer for solid state imagers prior to color filter pattern formation
08/05/1997US5654130 High contrast
08/05/1997US5654128 Single resist layer lift-off process for forming patterned layers on a substrate
08/05/1997US5654127 Forming cavities in substrate, lining and covering with flexible layer, metal layer, second flexible layer, removing substrate to expose flexible material, removing to expose metal, forming metal tip, removing rest of substrate