| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 01/22/1998 | WO1998002913A2 Method of forming a gate electrode for an igfet |
| 01/22/1998 | WO1998002786A1 Method and apparatus for development of resist |
| 01/22/1998 | WO1998002785A1 Process for producing a screen printing form and screen printing fabric of a coated screen web |
| 01/22/1998 | WO1998002784A1 Method of phase shift lithography |
| 01/22/1998 | WO1998002493A1 Curing process for cationically photocurable formulations |
| 01/22/1998 | WO1998002254A1 Resist coating apparatus and coating method |
| 01/22/1998 | WO1998002252A1 Device for wet coating, in particular printed circuit boards with lacquer |
| 01/22/1998 | DE19730498A1 Photocurable composition curing thoroughly even when pigmented or too thick to transmit light |
| 01/22/1998 | DE19646993A1 Method of producing screen printing forme from plastics filaments using light-sensitive emulsion |
| 01/22/1998 | DE19646987A1 Verfahren zum Herstellen einer Siebdruckform sowie Siebdruckgewebe aus einer beschichteten Siebbahn A method for producing a stencil and screen printing fabric from a coated screen web |
| 01/22/1998 | CA2258076A1 Curing process for cationically photocurable formulations |
| 01/21/1998 | EP0820093A1 Etching organic antireflective coating from a substrate |
| 01/21/1998 | EP0819989A1 Process for an automated production of printing sleeves |
| 01/21/1998 | EP0819988A1 Projection exposure apparatus |
| 01/21/1998 | EP0819987A1 Photosensitive resin laminate, production method thereof and package thereof |
| 01/21/1998 | EP0819986A1 An acid-sensitive substance and photosensitive compositions therewith |
| 01/21/1998 | EP0819985A1 A radiation sensitive imaging element and a method for producing lithographic plates therewith |
| 01/21/1998 | EP0819984A1 Irradiation-sensitive composition and an irradiation-sensitive recording material containing the composition for flexographic printing plates |
| 01/21/1998 | EP0819983A1 Photoresist composition |
| 01/21/1998 | EP0819982A1 Radiation-sensitive composition |
| 01/21/1998 | EP0819981A1 Radiation sensitive resin composition |
| 01/21/1998 | EP0819980A1 An IR radiation-sensitive imaging element and a method for producing lithographic plates therewith |
| 01/21/1998 | EP0819267A1 Coating compositions |
| 01/21/1998 | EP0819266A1 Photodefineable compositions |
| 01/21/1998 | EP0819265A1 Exposure and pressure applicator device for printing an image |
| 01/21/1998 | EP0802854A4 Embossed substrate and photoreceptor device incorporating the same and method |
| 01/21/1998 | EP0668995B1 Method of fabricating at least a membrane mounted on a frame |
| 01/20/1998 | US5710624 Aligner and contamination detecting method |
| 01/20/1998 | US5710620 Projection exposure method and apparatus |
| 01/20/1998 | US5710619 Large-area, scan-and-repeat, projection patterning system with unitary stage and magnification control capability |
| 01/20/1998 | US5710234 Polyorthoesters for molding materials, adhesives and heat resistant polymers |
| 01/20/1998 | US5710193 Photopolymerisable components of radiation sensitive compositions |
| 01/20/1998 | US5710066 Method of forming fine patterns |
| 01/20/1998 | US5709977 A 1,2-quinonediazide compound and an alkali-soluble resin obtained by condensing a phenol compound, formaldehyde and and aromatic aldehyde having at least one alkoxy and one hydroxy substituent |
| 01/20/1998 | US5709970 Mask having a pattern for detecting illuminance nonuniformity |
| 01/20/1998 | US5709955 Lamination, photoreactor with wavelength-specific sensitizer bonded to photoinitiator |
| 01/20/1998 | US5709756 Hydroxylamine, ammonium fluoride, water |
| 01/20/1998 | US5709754 Oxidation of photoresists to remove coatings from substrates |
| 01/15/1998 | WO1998001903A1 Method of manufacturing semiconductor integrated circuit device |
| 01/15/1998 | WO1998001792A1 Composite relief image printing plates and methods for preparing same |
| 01/15/1998 | WO1998001791A1 Positive photoresist composition |
| 01/15/1998 | WO1998001479A1 Radiation curable resin composition for molding by polymerization in dies |
| 01/14/1998 | EP0818814A2 Overlay alignment measurement of semiconductor wafers |
| 01/14/1998 | EP0818782A2 Methods for providing artwork on plastic information discs |
| 01/14/1998 | EP0818711A2 Process and apparatus for the manufacturing of flexographic printing plates |
| 01/14/1998 | EP0818515A1 Water-base photosensitive resin composition |
| 01/14/1998 | EP0788612A4 Beamsplitter in single fold optical system and optical variable magnification method and system |
| 01/14/1998 | EP0783727A4 Microstructures and methods for manufacturing microstructures |
| 01/14/1998 | EP0667877B1 Unitary reaction resin systems |
| 01/14/1998 | EP0436639B1 Multifunctional photolithographic compositions |
| 01/14/1998 | CN1170474A Forming polyimide coatings by screen printing |
| 01/14/1998 | CN1170149A Light exposure installation of double-sided printed circuit plate through artworks |
| 01/13/1998 | US5708505 Laser interferometer having a sheath for the laser beam |
| 01/13/1998 | US5708276 Electron-beam exposure device and a method of detecting a mark position for the device |
| 01/13/1998 | US5708106 Copolymers having pendant functional thymine groups |
| 01/13/1998 | US5708063 Photochromic compound |
| 01/13/1998 | US5707947 Organic stripping composition |
| 01/13/1998 | US5707908 Silica glass |
| 01/13/1998 | US5707784 Method of forming chemically amplified resist pattern and manufacturing for semiconductor device by using the chemically amplified resist pattern |
| 01/13/1998 | US5707783 Mixtures of mono- and DI- or polyfunctional silanes as silylating agents for top surface imaging |
| 01/13/1998 | US5707782 Photoimageable, dielectric, crosslinkable copolyesters |
| 01/13/1998 | US5707781 Photopolymerizable compositions having acyl or diacyl phosphine oxide and a fluorescent optical brightner |
| 01/13/1998 | US5707780 Photohardenable epoxy composition |
| 01/13/1998 | US5707777 Disulfone, acid-decomposable tert-alkyl compound, alkaline water soluble resin |
| 01/13/1998 | US5707776 Photoresists for manufacture of integrated circuits, sensitive to excimer laser radiation, block polymers of phenolic resins and dicyclopentadiene modified phenolic resins |
| 01/13/1998 | US5707775 Imaging element and method for making a lithographic printing plate according to silver salt diffusion transfer processing |
| 01/13/1998 | US5707774 Heavy metal sulfide for development with precipitation of sulfide |
| 01/13/1998 | US5707773 Process for preparing an aqueous developable photosensitive element |
| 01/13/1998 | US5707765 Photolithography mask using serifs and method thereof |
| 01/13/1998 | US5707687 Rotary-cup coating apparatus and method of coating object with such rotary-cup coating apparatus |
| 01/13/1998 | US5707558 Radiation sensitive resin composition |
| 01/13/1998 | US5707501 Filter manufacturing apparatus |
| 01/13/1998 | US5707487 Method of manufacturing semiconductor device |
| 01/13/1998 | US5706843 Substrate rotating device |
| 01/08/1998 | WO1998000761A1 Projection aligner for integrated circuit fabrication |
| 01/08/1998 | WO1998000760A1 Lithography exposure device and lithography procedures |
| 01/08/1998 | WO1998000759A1 Photopolymerizable thermosetting resin composition |
| 01/08/1998 | WO1998000244A1 Improved post plasma ashing wafer cleaning formulation |
| 01/08/1998 | DE19706495A1 Semiconductor device production using etch-resist pattern |
| 01/08/1998 | DE19627170A1 Masked ion beam lithography arrangement |
| 01/08/1998 | DE19626176A1 Lithographie-Belichtungseinrichtung und Lithographie-Verfahren Lithography exposure device and lithography method |
| 01/07/1998 | EP0816926A2 Exposure apparatus |
| 01/07/1998 | EP0816925A1 Ultraviolet-curable composition and method for curing or patterning |
| 01/07/1998 | EP0816924A1 Imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 01/07/1998 | EP0816923A1 Imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 01/07/1998 | EP0816922A1 Imaging element for making an improved printing plate according to the silver salt diffusion transfer process |
| 01/07/1998 | EP0816921A1 Photosensitive elements and their process of use |
| 01/07/1998 | EP0816920A2 A flexographic printing element having a powder layer and a method for making a flexographic printing plate therefrom |
| 01/07/1998 | EP0816892A2 Catadioptric lens system |
| 01/07/1998 | EP0816876A2 Preparation and reproduction of filters and preparation of filter photographic materials |
| 01/07/1998 | EP0816419A2 Ultraviolet-curable polysiloxane composition and method for the formation of cured patterns therefrom |
| 01/07/1998 | EP0815579A1 Black matrix in colour picture tubes and method of producing the black matrix |
| 01/07/1998 | EP0815565A1 Method and apparatus for micromachining using hard x-rays |
| 01/07/1998 | EP0815495A1 Method and apparatus for peeling a laminate |
| 01/07/1998 | EP0815494A1 Scanning lithography system with opposing motion |
| 01/07/1998 | EP0815481A2 Magnification correction for small field scanning |
| 01/07/1998 | EP0815480A2 Scanning lithography system having double pass wynne-dyson optics |
| 01/07/1998 | EP0782719A4 Protective mask for pellicle |
| 01/07/1998 | CN1169369A Seal making device, its function changing-over mechanism, exposure device and device for detecting object of seal-making thereof |
| 01/06/1998 | US5706091 Apparatus for detecting a mark pattern on a substrate |