G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1997
10/29/1997	EP0803060A1 Film exposure control apparatus
10/29/1997	EP0802854A1 Embossed substrate and photoreceptor device incorporating the same and method
10/29/1997	EP0802835A1 Surface modification processing of flat panel device substrates
10/29/1997	EP0662990B1 Novolak resin mixtures
10/29/1997	EP0659286B1 Use of a casting resin and process for producing the same
10/29/1997	CN1163177A 激光加工装置 The laser processing apparatus
10/28/1997	US5682415 Collimator for x-ray spectroscopy
10/28/1997	US5682243 Method of aligning a substrate
10/28/1997	US5682239 Apparatus for detecting positional deviation of diffraction gratings on a substrate by utilizing optical heterodyne interference of light beams incident on the gratings from first and second light emitters
10/28/1997	US5682228 Alignment method and apparatus in an exposing process
10/28/1997	US5682226 Photomask, an exposure method and a projection exposure apparatus
10/28/1997	US5682080 Method and apparatus for igniting electrodeless lamp discharge
10/28/1997	US5681685 Photopolymerizable composition containing squarylium compound
10/28/1997	US5681684 Photosensitive resin composition
10/28/1997	US5681683 Radiated with actinic radiation; lithography printing plates
10/28/1997	US5681682 Laminiating a light sensitive material consisting base film of plastic; photopolymerizable layer consisting binder, free-radical polymerizable compound, initiator and dye; and thermoplastic adhesion layer, exposing and peeling
10/28/1997	US5681681 On-demand production of LAT imaging films
10/28/1997	US5681676 Registration method
10/28/1997	US5681675 Fabricating method of liquid crystal display apparatus
10/28/1997	US5681643 Active energy ray-curable composition, recording medium and image-forming method employing the same
10/28/1997	US5681638 Substrate, and method and apparatus for holding the substrate
10/28/1997	US5681614 Hydrophobic treatment method involving delivery of a liquid process agent to a process space
10/28/1997	US5681487 Method of removing photoresist film
10/28/1997	US5681485 Bisphenol-epichlorohydrin resin as photosensitive film for laminating onto insulating material carrying conductor pattern
10/28/1997	CA1339516C Method for crosslinking amino-acid containing polymers using photoactiv atable chemical crosslinkers
10/23/1997	WO1997039470A1 Method of making color screens for fed and other cathodoluminscent displays
10/23/1997	WO1997039383A1 Method of manufacturing passive elements using conductive polypyrrole formulations
10/23/1997	WO1997039092A1 Photoresist stripping compositions
10/23/1997	WO1997039047A1 Polymers or 2,7-dioxa-bicyclo[3,2,1]octane derivatives
10/23/1997	WO1997038865A1 Laser addressable thermal transfer imaging element with an interlayer
10/23/1997	WO1997038802A1 Polymeric self-assembled mono- and multilayers and their use in photolithography
10/23/1997	DE19632535C1 Equipment for production of printing plates
10/23/1997	CA2250971A1 Laser addressable thermal transfer imaging element with an interlayer
10/22/1997	EP0802457A1 Appartus for making and imaging a lithographic printing plate
10/22/1997	EP0802456A1 Resist compositions for circuit boards
10/22/1997	EP0802455A1 Photocurable resin composition
10/22/1997	EP0785917A4 Method of treating an anti-reflective coating on a substrate
10/22/1997	EP0644829B1 Engraving head
10/22/1997	CN1162767A Method for preparing prepress color proof and intermediate receiver element and carrier plate useful therein
10/22/1997	CN1162608A Photoimageable, dielectric, crosslinkable copolyesters
10/21/1997	US5680588 Method and system for optimizing illumination in an optical photolithography projection imaging system
10/21/1997	US5680428 Process for holding an object
10/21/1997	US5680200 Image-forming optical system
10/21/1997	US5679766 Purification process of novolar resins using acid treated chelating cation exchange resin
10/21/1997	US5679502 Using polymethyl methacrylate as photoresist for proper exposure using synchotron device to provide x-ray beam having required photon energy
10/21/1997	US5679500 Forming resist film by using a chemical amplification resist which generates an acid in response to laser light and which reacts with the acid
10/21/1997	US5679499 Method for forming photo mask for use in fabricating semiconductor device
10/21/1997	US5679498 Patterned development of photosensitive dielectric layer, sensitizing with catalyst, patterning photoresist to delineate conductors, forming conductors, repeating to add successive layers
10/21/1997	US5679497 First acid generating agent having sensitivity only to an electron beam and second acid generating agent having a sensitivity to an optical beam; exposing to both beams to form a preferential pattern
10/21/1997	US5679496 Containing sulfonium salt having tert-butoxycarbonylmethoxy group(s) as acid labile groups; sensitivity, resolution, etch and heat resistance
10/21/1997	US5679495 Radiation sensitive resin composition
10/21/1997	US5679485 Curable elastic blend containing hydrophobic addition polymer having pendant hydrophilic phosphate groups; aqueous development of image
10/21/1997	US5679268 Thin multi-layer circuit board and process for fabricating the same
10/21/1997	US5679125 Method for producing silica glass for use with light in a vacuum ultraviolet wavelength range
10/21/1997	US5679046 Exposing method for forming fluorescent layer of color cathode ray tube and apparatus therefor
10/16/1997	WO1997038357A1 Lithography system using dual substrate stages
10/16/1997	WO1997038356A1 Photolithographic apparatus
10/16/1997	WO1997038354A1 Photo-curable resin composition
10/16/1997	WO1997038300A1 Acrylic microchannels and their use in electrophoretic applications
10/16/1997	WO1997038035A1 Liquid curable resin composition
10/16/1997	DE19614635A1 Polymere von 2,7-Dioxa-bicyclo[3.2.1]octanderivaten Octane derivatives of polymeric 2,7-dioxa-bicyclo [3.2.1]
10/16/1997	CA2251037A1 Liquid curable resin composition
10/15/1997	EP0801422A2 Removing agent composition for a photoresist and process for producing a semiconductor integrated circuit
10/15/1997	EP0801418A2 Method for forming a T-shaped gate electrode in a semi-conductor device, and the T-shaped gate electrode
10/15/1997	EP0801329A1 Radiation-sensitive composition and recording medium produced therefrom
10/15/1997	EP0801328A1 Photoimageable composition having an acrylic-functional UV stabilizer
10/15/1997	EP0801327A1 Positive resist composition
10/15/1997	EP0801123A2 Optically pumped up converting light source
10/15/1997	EP0800706A1 Forming polyimide coatings by screen printing
10/15/1997	EP0800704A1 Method of manufacturing a semiconductor device
10/15/1997	EP0800665A1 Low metal ions p-cresol oligomers and photosensitive compositions
10/15/1997	EP0800664A1 Metal ion reduction in novolak resin using an ion exchange resin in a polar solvent and photoresists compositions therefrom
10/15/1997	EP0800657A1 Polymers based on block copolymers
10/15/1997	EP0800542A1 Isolation of novolak resin by low temperature sub-surface forced steam distillation
10/15/1997	EP0800541A1 Siloxane-containing networks
10/15/1997	EP0800511A1 Functionalised photoinitiators, derivatives and macromers therefrom and their use
10/15/1997	CN1162131A Developer for photosensitive resin printing plate and method for preparing photosensitive resin printing plate
10/14/1997	US5678116 Method and apparatus for drying a substrate having a resist film with a miniaturized pattern
10/14/1997	US5677939 Illuminating apparatus
10/14/1997	US5677758 Lithography System using dual substrate stages
10/14/1997	US5677757 Projection exposure apparatus
10/14/1997	US5677756 Apparatus for exposing a semiconductor wafer to light including an illumination optical system comprising a glass substrate having light-permeable patterns
10/14/1997	US5677755 Method and apparatus for pattern exposure, mask used therefor, and semiconductor integrated circuit produced by using them
10/14/1997	US5677754 Scanning exposure apparatus
10/14/1997	US5677450 Curing agent
10/14/1997	US5677385 Photo-setting colored filter composition, a color filter, a process for the preparation thereof, and a curable resin composition
10/14/1997	US5677113 Method for ashing a photoresist resin film on a semiconductor wafer and an asher
10/14/1997	US5677112 Process for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent composition
10/14/1997	US5677111 Semiconductors
10/14/1997	US5677110 On-press development of an overcoated lithographic plate
10/14/1997	US5677109 Method for E-beam writing
10/14/1997	US5677108 Overcoatings comprising at least two hydrophilic polymers including a polymeric quencher and a water soluble crystal compound
10/14/1997	US5677107 Photohardenable film with photoresponsive agent; irradiating selective portions of cross-sectional patterns that are to be colored differently
10/14/1997	US5677106 Removing non-exposed imaging layer by lamination, peeling, or rubbing by lithographic printing ink without using alkaline developing solution
10/14/1997	US5677105 Method for making a lithographic printing plate according to the silver salt diffusion transfer process
10/14/1997	US5677103 Comprising quinonediazide sulfonic acid ester of aromatic polyhydroxy compound, alkali soluble resin, solvent, additives; high sensitivity and resolution
10/14/1997	US5677102 Method for the preparation of photoresist solution
10/14/1997	US5677101 Light-sensitive lithographic printing plate having a light sensitive layer comprising a clathrate compound
10/14/1997	US5677093 Size modulated stochastic screening
10/14/1997	US5677091 Lithographic print bias/overlay target and applied metrology

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