G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor

Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1997
12/03/1997	EP0503076B1 Photopolymerizable composition and photopolymerizable element
12/03/1997	CN1166798A Non-aminic photoresist adhesion promoters for microelectronic applications
12/03/1997	CN1166688A Exposure device for forming fluorescence-free absorbing film of CRT panel
12/03/1997	CN1166487A Phenyl alkyl ketone substituted by cyclic amine and process for preparation thereof
12/02/1997	US5694241 Catadioptric reduction projection optical system and exposure apparatus employing the same
12/02/1997	US5693950 Projection system for charged particles
12/02/1997	US5693749 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom
12/02/1997	US5693691 Thermosetting anti-reflective coatings compositions
12/02/1997	US5693548 Method for making T-gate of field effect transistor
12/02/1997	US5693455 Masking portions of photosensitive layer for heat insulation, then heating for removal, applying second mask to expose different areas, exposure to ultraviolet light and development
12/02/1997	US5693454 Two-sided photoetching process for needle fabrication
12/02/1997	US5693453 Method of forming micropattern
12/02/1997	US5693452 Positive chemically amplified resist composition
12/02/1997	US5693449 Lamination; exposure; peeling leaving the unexposed layer areas on the image-receiving material together with the adhesive layer; repeating steps for nulticolor
12/02/1997	US5693448 Method for making an offset printing plate according to the silver salt diffusion transfer process
12/02/1997	US5693439 Exposure method and apparatus
12/02/1997	US5693382 Frame-supported pellicle for dustproof protection of photomask in photolithography
12/02/1997	US5693147 Forming plasma in chamber, introducing water vapor and fluorocarbon to form hydrogen fluoride vapor which cleans chamber
12/02/1997	US5693145 Apparatus of formation of chemically amplified resist pattern
12/02/1997	US5692873 Apparatus for holding a piece of semiconductor
11/1997
11/27/1997	WO1997044714A1 Holographic medium and process
11/27/1997	WO1997044712A1 Photosensitive solutions and use thereof in making thin films
11/27/1997	WO1997044708A1 Processless diacetylenic salt films capable of developing a black image
11/27/1997	WO1997044692A2 Fabrication of small-scale coils and bands as photomasks on optical fibers for generation of in-fiber gratings, electromagnets as micro-nmr coils, microtransformers, and intra-vascular stents
11/27/1997	WO1997044365A1 Photo-addressable substrates and photo-addressable side-group polymers with highly inducible double refraction
11/27/1997	WO1997044364A1 Photoactive compounds for use with narrow wavelength band ultraviolet (uv) curing systems
11/27/1997	WO1997040423A3 Cleaning and stripping of photoresist from surfaces of semiconductor wafers
11/27/1997	DE19703969A1 Air-supply hood system for photolithography in semiconductor manufacture
11/27/1997	CA2255629A1 Photoactive compounds for use with narrow wavelength band ultraviolet (uv) curing systems
11/26/1997	EP0809284A1 Method and device for transferring thin plate-like substrate
11/26/1997	EP0809282A1 A method for treating a substrate surface, a method for producing an at least partially metallized substrate and a substrate having a treated surface
11/26/1997	EP0809151A1 Photoresist layer supporting film and photoresist film laminate
11/26/1997	EP0809150A1 Photosensitive aqueous developable thick film composition employing vinylpyrrolidone polymer
11/26/1997	EP0809125A1 Fast high resolution lens
11/26/1997	EP0808823A1 Free-radical curable compositions
11/26/1997	EP0808481A1 Photolithographic structure generation process
11/26/1997	EP0808480A1 Photoactive compounds
11/26/1997	EP0808477A1 Fabrication and use of a sub-micron dimensional standard
11/26/1997	EP0808222A1 Process for the functionalisation of surfaces
11/26/1997	EP0637776B1 Photosensitive resin composition and process for forming relief pattern therefrom
11/26/1997	CN1166145A Selective removal of material by irradiation
11/26/1997	CN1165981A Device for supporting artwork for light exposure installation of flat piece
11/26/1997	CN1165980A Positive type photosensitive resin composition and semiconductor device using the same
11/25/1997	US5691806 Projection exposure apparatus containing an enclosed hollow structure
11/25/1997	US5691803 Advanced exposure apparatus and exposure method using the same
11/25/1997	US5691802 Catadioptric optical system and exposure apparatus having the same
11/25/1997	US5691541 Maskless, reticle-free, lithography
11/25/1997	US5691396 Polyhydroxybenzylsilsesquioxane
11/25/1997	US5691395 Applying a photosensitive layer on a substrate, the resin binder a polybutadiene with epoxy group and photoacid or base
11/25/1997	US5691394 Photosensitive composition with sensitizing dye of unsaturated thiazole
11/25/1997	US5691117 Using a hydrogen conveyor furnace
11/25/1997	US5691116 Pattern transfer techniques for fabrication of lenslet arrays for solid state imagers
11/25/1997	US5691115 Exposure method, aligner, and method of manufacturing semiconductor integrated circuit devices
11/25/1997	US5691114 Method of imaging of lithographic printing plates using laser ablation
11/25/1997	US5691113 Anionic photoinitiation
11/25/1997	US5691112 Sulfonium salt and chemically amplified positive resist composition
11/25/1997	US5691111 Sulfonium salt, acrylate ester polymer
11/25/1997	US5691110 Process for controlled deprotection of polymers and a process for fabricating a device utilizing partially deprotected resist polymers
11/25/1997	US5691106 Photosensitive material for the production of lithographic printing plates utilizing peel development
11/25/1997	US5691105 Method for making an imaging element and a printing plate according to the silver salt diffusion transfer process
11/25/1997	US5691104 Method for making by phototypesetting a lithographic printing plate according to the silver salt diffusion transfer process
11/25/1997	US5691102 Process of producing ink-oozing plate for a stamp
11/25/1997	US5691101 Nontoxic photoresists for manufacture of cathode ray tubes and image pickup devices, acid generating compound which catalyzes crosslinking or decomposition of resin
11/25/1997	US5691100 Pattern forming material including photoacid and photobase generators for large exposure latitude
11/25/1997	US5691098 Laser-Induced mass transfer imaging materials utilizing diazo compounds
11/25/1997	US5691089 Integrated circuits formed in radiation sensitive material and method of forming same
11/25/1997	US5691088 Dustproofing; frame, transparent polymeric film, skicky adhesive film
11/25/1997	US5691063 Laser imageable tuned optical cavity thin film and printing plate incorporating the same
11/25/1997	US5691006 Water soluble acrylate polymer
11/25/1997	US5690785 Lithography control on uneven surface
11/25/1997	US5690747 Method for removing photoresist with solvent and ultrasonic agitation
11/25/1997	CA2022163C Bakeable aqueous photopolymer
11/20/1997	WO1997043785A1 Wafer aligning method
11/20/1997	WO1997043782A1 Method of patterning a substrate using spin-on glass as a hard mask
11/20/1997	WO1997043770A1 Maskless, reticle-free lithography
11/20/1997	WO1997043759A1 Photorefractive composite
11/20/1997	WO1997043696A1 Methods to increase the exposure sensitivity of photopolymerizable matrices and apparatus useful therefor
11/20/1997	WO1997043695A1 Compositions and processes for photogeneration of acid
11/20/1997	WO1997043690A1 Black-and-white photothermographic and thermographic elements comprising 3-heteroaromatic-substituted acrylonitrile compounds as co-developers
11/20/1997	WO1997043134A1 Method for forming a micro-relief on a metallic article and variants
11/20/1997	WO1997043051A1 Process and device for coating disc-shaped data storage media
11/20/1997	DE19648063A1 Microlens patterning mask for solid state image sensor
11/20/1997	DE19619678C1 Verfahren und Vorrichtung zum Beschichten von scheibenförmigen Informationsspeichermedien Method and apparatus for coating disc-shaped information storage media
11/20/1997	DE19618447A1 Lithographisches Verfahren zur Erzeugung von Nanostrukturen auf Oberflächen A lithographic method for the generation of nanostructures on surfaces
11/20/1997	CA2254118A1 Photorefractive composite
11/19/1997	EP0807856A1 Device for double-sided exposure of printed circuit boards using masks
11/19/1997	EP0807855A1 Mask holder for a flat panel exposure device
11/19/1997	EP0807854A1 Exposure method and apparatus
11/19/1997	EP0807853A2 Photocurable resin composition, method of producing photo-cured shaped object, vacuum casting mold, vacuum casting method and urethane acrylate
11/19/1997	EP0807852A1 Positive type photosensitive resin composition and semiconductor device using the same
11/19/1997	EP0807832A2 Optical path converting optical element, optical path converter, and optical projector and image display apparatus using said optical element
11/19/1997	EP0807534A1 A flexible supported lithographic printing plate having improved dimensional stability
11/19/1997	EP0807280A1 Tension arm developer apparatus
11/19/1997	EP0797830A4 Exit window for x-ray lithography beamline
11/19/1997	EP0755321B1 Process for producing a three-dimensional object
11/19/1997	EP0552382B1 A two layer structureresist and a process for producing it
11/18/1997	US5689749 Apparatus for developing a resist-coated substrate
11/18/1997	US5689377 Catadioptric optical system and exposure apparatus having the same
11/18/1997	US5688987 Photoresists for semiconductor applications, antireflective coatings
11/18/1997	US5688893 Method of using a Lewis base to control molecular weight of novolak resins

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