| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/09/1997 | EP0783137A2 REMA objective for microlithographic projection illumination |
| 07/09/1997 | EP0783136A2 Chemically amplified positive photoresists |
| 07/09/1997 | EP0783135A1 Imaging-apparatus and method for manufacture of microdevices |
| 07/09/1997 | EP0782720A1 Process and apparatus for rejuvenating developer in printing plate development |
| 07/09/1997 | EP0782719A1 Protective mask for pellicle |
| 07/09/1997 | EP0782483A1 Selective removal of material by irradiation |
| 07/09/1997 | EP0697025B1 Compositions of matter |
| 07/09/1997 | EP0542768B1 Process for producing microstructures with locally different structural heights |
| 07/09/1997 | CN1153926A Oximesulfonic acid esters and use thereof as latent sulfonic acids |
| 07/09/1997 | CN1153794A Photocurable composition |
| 07/09/1997 | CN1153775A Novel N-vinyllactam derivatives and polymer thereof |
| 07/09/1997 | CN1153704A Method for producing screen printing stencil |
| 07/09/1997 | CN1035406C Plate printing apparatus |
| 07/08/1997 | US5646870 Method for setting and adjusting process parameters to maintain acceptable critical dimensions across each die of mass-produced semiconductor wafers |
| 07/08/1997 | US5646715 Illuminating arrangement for an optical system having a reticle masking unit |
| 07/08/1997 | US5646452 Registration accuracy measurement mark for semiconductor devices |
| 07/08/1997 | US5646413 Exposure apparatus and method which synchronously moves the mask and the substrate to measure displacement |
| 07/08/1997 | US5646218 Novolak resin blends for photoresist applications |
| 07/08/1997 | US5645979 Heat-resistant photoresist composition and negative-type pattern formation method |
| 07/08/1997 | US5645977 Method of making molds for manufacturing multiple-lead microstructures |
| 07/08/1997 | US5645976 Capacitor apparatus and method of manufacture of same |
| 07/08/1997 | US5645975 Quaternary ammonium polymers |
| 07/08/1997 | US5645974 Photopolymerization initiator comprising benzoylaminobenzylalkane and phenyldialkoxyacetophenone |
| 07/08/1997 | US5645973 Process for adjusting the sensitivity to radiation of photopolymerizable compositions |
| 07/08/1997 | US5645972 Method for preparing an aluminium foil for use as a support in lithographic printing plates |
| 07/08/1997 | US5645971 Method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 07/08/1997 | US5645970 Weak base developable positive photoresist composition containing quinonediazide compound |
| 07/08/1997 | US5645969 Photosensitive composition and photosensitive lithographic printing plate |
| 07/08/1997 | US5645963 Method for making color filter elements using laminable colored photosensitive materials |
| 07/08/1997 | US5645684 Microelectromechanical systems, electronic circuits and mechanical devices integrated on the same chip |
| 07/03/1997 | WO1997023945A1 Low voltage electrostatic clamp for substrates such as dielectric substrates |
| 07/03/1997 | WO1997023899A1 Shape memory alloy lift pins for semiconductor processing equipment |
| 07/03/1997 | WO1997023809A1 Photosensitive resin composition |
| 07/03/1997 | WO1997023808A2 A mixed solvent system for positive photoresists |
| 07/03/1997 | WO1997023342A1 Process for the stereolithographic preparation of three-dimensional objects using a radiation-curable liquid formulation which contains fillers |
| 07/03/1997 | DE19548807A1 Flexographic printing plates prepared by photopolymerising plate coating through negative |
| 07/02/1997 | EP0782047A1 Method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 07/02/1997 | EP0782046A2 Negative working peel apart color proofing process |
| 07/02/1997 | EP0781977A2 Pattern shape inspection apparatus for forming specimen image on display apparatus |
| 07/02/1997 | EP0781424A1 Photolithographic method of producing structural features |
| 07/02/1997 | CN1153321A Quick silk screen photosensitive film and its synthetic method |
| 07/01/1997 | US5644390 For a lithographic process for semiconductor devices |
| 07/01/1997 | US5644384 Reinforcing, adjustable, serviceable hinge assembly for photoimaging apparatus and a method for making same |
| 07/01/1997 | US5644383 Scanning exposure apparatus and device manufacturing method using the same |
| 07/01/1997 | US5644381 Method of exposure employing phase shift mask of attenuation type |
| 07/01/1997 | US5644144 Device and method for programming a logic level within an integrated circuit using multiple mask layers |
| 07/01/1997 | US5644136 Seal making device |
| 07/01/1997 | US5644038 Quinone diazo compound containing non-metallic atom |
| 07/01/1997 | US5643710 Imaging element and method for making lithographic printing plates according to the silver salt diffusion transfer process |
| 07/01/1997 | US5643700 Photoresist composition and method of exposing photoresist |
| 07/01/1997 | US5643698 Mask for manufacturing semiconductor device and method of manufacture thereof |
| 07/01/1997 | US5643657 Aqueous processable, multilayer, photoimageable permanent coatings for printed circuits |
| 07/01/1997 | US5643472 Selective removal of material by irradiation |
| 07/01/1997 | US5643392 Method of and apparatus for delaminating imaging media |
| 07/01/1997 | US5642956 Adjustable link for kinematic mounting systems |
| 06/28/1997 | CA2190921A1 Negative working peel apart color proofing process |
| 06/26/1997 | WO1997022911A1 Electrodepositable photoimageable composition containing a microgel comprising crosslinked organic particles |
| 06/26/1997 | WO1997022910A1 Solder mask compositions |
| 06/26/1997 | WO1997022900A1 Dual beam automatic focus system |
| 06/26/1997 | WO1997022858A1 Multiple field of view calibration plate for use in semiconductor manufacturing |
| 06/25/1997 | EP0780880A1 Discharge lamp |
| 06/25/1997 | EP0780879A2 Electron beam exposure apparatus |
| 06/25/1997 | EP0780732A2 Polymer composition and resist material |
| 06/25/1997 | EP0780731A2 Photopolymerizable composition for a color filter, color filter and liquid crystal display device |
| 06/25/1997 | EP0780730A2 Positive-type light-sensitive lithographic printing plate |
| 06/25/1997 | EP0780729A1 Chemical-sensitization photoresist composition |
| 06/25/1997 | EP0780376A1 2-Acylamino-9-aryl-acridines, process for their preparation and light-sensitive compositions containing them |
| 06/25/1997 | EP0779891A1 Novel acylphosphine oxides |
| 06/25/1997 | CN1035289C Device for applying lacquer coating to a disc-shaped registration carrier |
| 06/24/1997 | US5642183 Spatial filter used in a reduction-type projection printing apparatus |
| 06/24/1997 | US5641850 Hydrosilation of a hydridopolysiloxane by an alkene containing mesogenic groups followed by reaction with an alkene containing a (meth)acryloxy group; crosslinking; haze-free films |
| 06/24/1997 | US5641715 Semiconductor IC device fabricating method |
| 06/24/1997 | US5641610 Depositing photoresist on substrate, forming opening, depositing second photoresist, forming overlying opening larger than first opening, sequentially transferring openings to substrate and removing photoresists, repeating |
| 06/24/1997 | US5641609 Method for manufacturing pattern layer having different minimum feature sizes |
| 06/24/1997 | US5641608 Direct imaging process for forming resist pattern on a surface and use thereof in fabricating printing plates |
| 06/24/1997 | US5641607 Layer has composition including elements of silicon, oxygen, and nitrogen |
| 06/24/1997 | US5641605 Scratch, stain resistance, improved image quality; undercoat layer, silver halide emulsion layer, development nuclei layer |
| 06/24/1997 | US5641604 Photoresist composition with improved differential solubility through hydroxyl group blocking via reaction with vinyl ethers |
| 06/24/1997 | US5641595 Manufacture of color filters by incremental exposure method |
| 06/24/1997 | US5641594 Colored, photosensitive resin composition |
| 06/24/1997 | US5641593 Lithographic mask and exposure apparatus using the same |
| 06/24/1997 | US5641577 Lead-frame forming material |
| 06/24/1997 | US5641383 Selective etching process |
| 06/24/1997 | US5641264 Substrate conveying device and method of controlling the same |
| 06/19/1997 | WO1997022235A2 Solder mask for manufacture of printed circuit boards |
| 06/19/1997 | WO1997022037A1 Polymers for reversible photoinduced sol gel transitions |
| 06/19/1997 | WO1997022021A1 Polariser made from brewster plates |
| 06/19/1997 | WO1997021737A1 Photoinitiator composition containing a borate salt and a hypervalent atom-containing salt |
| 06/19/1997 | WO1997010088A3 Process for improving the contrast in the structuring of 3-dimensional surfaces |
| 06/19/1997 | DE19651349A1 Stable silver complex diffusion transfer lithographic print plate mfr. |
| 06/19/1997 | CA2239031A1 Solder mask for manufacture of printed circuit boards |
| 06/18/1997 | EP0779558A2 Projection-exposure apparatus |
| 06/18/1997 | EP0779557A2 Method for forming re-entrant photoresist lift-off profile for thin film device processing and a thin film device made thereby |
| 06/18/1997 | EP0779556A2 Method of fabricating a semiconductor device |
| 06/18/1997 | EP0779555A1 Method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 06/18/1997 | EP0779554A1 A correcting liquid for a silver imaged lithographic printing plate |
| 06/18/1997 | EP0779553A1 Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern formation using the same |
| 06/18/1997 | EP0779552A2 Photoresist composition |
| 06/18/1997 | EP0779528A2 High numerical aperture ring field optical reduction system |
| 06/18/1997 | EP0779161A1 A heat sensitive imaging element and a method for producing lithographic plates therewith |