Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
03/1998
03/11/1998CN1175788A Method of forming resist pattern on semiconductor wafer
03/11/1998CN1175583A Molecular complex compounds as photoinitiators
03/10/1998US5726879 Control apparatus, a stage apparatus and a hard disk servo writer apparatus including a robust stabilizing compensator
03/10/1998US5726757 Alignment method
03/10/1998US5726756 Exposure apparatus with thickness and defect detection
03/10/1998US5726741 Photolithographic projection systems including grating masks and related methods
03/10/1998US5726740 Projection exposure apparatus having illumination device with ring-like or spot-like light source
03/10/1998US5726739 Projection exposure apparatus and device manufacturing method using the same
03/10/1998US5726738 Aperture for off-axis illumination and projection exposure apparatus employing the same
03/10/1998US5726548 Moving stage apparatus and system using the same
03/10/1998US5726542 Stage apparatus
03/10/1998US5726296 Photoresists
03/10/1998US5726295 Photoactive coumarin derivatives
03/10/1998US5726279 Preparation of poly-o-hydroxyamides and poly o-mercaptoamides
03/10/1998US5726219 Resin composition and printed circuit board using the same
03/10/1998US5726217 Photosensitizers for positive resists
03/10/1998US5725997 Method for preparing a resist pattern of t-shaped cross section
03/10/1998US5725996 Phosphorus ester polymer resist composition used in lithographic process
03/10/1998US5725995 Transistors and integrated circuits
03/10/1998US5725994 Containing an acid precursor and a hydroxyl group containing linear polymer
03/10/1998US5725992 Process for the production of a multicolored image and photosensitive material for carrying out this process
03/10/1998US5725991 Photosensitive material and method of producing offset printing plates
03/10/1998US5725989 Prevents contamination of image with particles of light-to-heat conversion layer
03/10/1998US5725988 Solid transfer negative- or positive-working color proofing element
03/10/1998US5725978 Water-soluble photosensitive resin composition and a method of forming black matrix patterns using the same
03/10/1998US5725977 Method of forming fluorescent screen for color cathode-ray tube and exposure system for forming same
03/10/1998US5725974 Method and apparatus for producing scanning data used to produce a photomask
03/10/1998US5725973 Photo mask and method for manufacturing same
03/10/1998US5725971 Method of manufacturing phase shift masks and a method of manufacturing semiconductor integrated circuit devices
03/10/1998US5725970 Photohardened photopolymer layer on support, diffusion layers
03/10/1998US5725914 Process and apparatus for producing a functional structure of a semiconductor component
03/10/1998US5725903 Sedimentary deposition of photoresist on semiconductor wafer
03/10/1998US5725788 Apparatus and method for patterning a surface
03/10/1998US5725100 Semiconductor wafer case
03/10/1998CA2214913A1 Method for improving photoimage quality
03/06/1998CA2214639A1 Non-corrosive cleaning composition for removing plasma etching residues
03/06/1998CA2214628A1 Photoresist stripping and cleaning compositions
03/05/1998WO1998008776A1 Method for determining laser-induced compaction in fused silica
03/05/1998WO1998008775A1 Silica with low compaction under high energy irradiation
03/05/1998DE19733725A1 Lithographic printing plate production to increase inking and printing endurance and avoid cloudiness in washing solution
03/05/1998DE19633320A1 Comminuting mask reproduction on substrate by charged particles
03/04/1998EP0827188A2 Cleaning liquid for producing semiconductor device and process for producing semiconductor device using same
03/04/1998EP0827185A2 Substrate treatment system, substrate transfer system, and substrate transfer method
03/04/1998EP0827034A2 Method and apparatus for changing photoprinting glass in production line
03/04/1998EP0827033A2 High performance curable polymers and processes for the preparation thereof
03/04/1998EP0827032A2 Aqueous developable high performance curable polymers
03/04/1998EP0827031A2 Blends containing curable polymers
03/04/1998EP0827030A2 Process for direct substitution of high performance polymers with unsaturated ester groups
03/04/1998EP0827029A2 High performance polymer composition
03/04/1998EP0827028A2 Hydroxyalkated high performance curable polymers
03/04/1998EP0827027A2 Curable compositions
03/04/1998EP0827026A2 Processes for substituting haloalkylated polymers with unsaturated ester, ether, and alkylcarboxymethylene groups
03/04/1998EP0827025A1 Negative resist composition
03/04/1998EP0827024A2 Radiation-sensitive resin composition
03/04/1998EP0826748A2 Mold having a thin release coat
03/04/1998EP0826700A2 Process for haloalkylation of high performance polymers
03/04/1998EP0826692A2 Molecular complexes as photoinitiators
03/04/1998EP0826514A1 Antistatic coat, thermal transfer sheet having antistatic property and antistatic agent
03/04/1998EP0825927A1 Heat-sensitive composition and method of making a lithographic printing form with it
03/04/1998EP0609241B1 Method for producing images using a photopolymerizable composition
03/04/1998CN2275725Y PC board driver for vertical etcher
03/03/1998US5724122 Illumination system having spatially separate vertical and horizontal image planes for use in photolithography
03/03/1998US5724121 Mounting member method and apparatus with variable length supports
03/03/1998US5723917 Flat linear motor
03/03/1998US5723876 Device and method for programming a logic level within an intergrated circuit using multiple mask layers
03/03/1998US5723633 Pyran derivative, photosensitive resin composition, and hologram recording medium using it
03/03/1998US5723513 Photocrosslinkable, photoinsolubilizing coating; photoinitiators
03/03/1998US5723512 Photoinitiators
03/03/1998US5723264 Pattern transfer techniques for fabrication of lenslet arrays using specialized polyesters
03/03/1998US5723262 Photocurable mixture of phenolic polymer and unsaturated monomer having an epoxy or isocyanate group; heat, plating, and alkali resistance; adhesives, solder resists
03/03/1998US5723261 Photopolymerizable composition
03/03/1998US5723260 Unsaturated group-containing urethane compound, photopolymerizable composition containing it, and photosensitive lithographic printing plate
03/03/1998US5723259 Negative type composition for chemically amplified resist and process and apparatus of formation of chemically amplified resist pattern
03/03/1998US5723258 Acetal group-containing alkoxy-styrene polymers, method of preparing the same and chemical amplified photoresist composition mainly comprising the same
03/03/1998US5723257 Si containing high molecular compound and photosensitive resin composition
03/03/1998US5723256 Color image forming process through transfer of image portion to receiving material, via cushion layer
03/03/1998US5723254 Novolak esterified with o-naphthoquinone diazide
03/03/1998US5723253 Photosensitivity for lithographic printing plates
03/03/1998US5723238 Inspection of lens error associated with lens heating in a photolithographic system
03/03/1998US5723237 Method for determining baking conditions for resist pattern formation through development of unexposed trial resist films
03/03/1998US5723235 Method of producing photomask and exposing
03/03/1998US5723234 Phase shift photomask and phase shift photomask dry etching method
03/03/1998US5723233 Optical proximity correction method and apparatus
03/03/1998US5722162 Fabrication procedure for a stable post
02/1998
02/26/1998WO1998008145A1 Baths for producing microstructures
02/26/1998WO1998008144A1 Process and device for applying a photoresist lacquer on uneven base body surfaces
02/26/1998WO1998008143A1 Method for forming photoresist features having reentrant profiles using a basic agent
02/26/1998WO1998008142A1 Production of color proofs and printing plates
02/26/1998WO1998007576A1 Laser absorbable photobleachable compositions
02/26/1998WO1997041488A3 Processes for cleaning and stripping photoresist from surfaces of semiconductor wafers
02/26/1998WO1997034171A3 Microlens scanner for microlithography and wide-field confocal microscopy
02/26/1998DE19735755A1 Lithographic printing plate production by silver complex diffusion process without silver sludge formation
02/26/1998DE19734059A1 Charged particle shadow projection lithography system
02/26/1998DE19706570C1 Production of structured, self-organising molecular mono:layer
02/26/1998DE19634122A1 Neuartige Bäder zur Erzeugung von Mikrostrukturen Novel baths for producing microstructures
02/26/1998DE19634121A1 Production of gratings for mounting samples in electron microscope
02/26/1998DE19633407A1 Vorrichtung und Verfahren zum Auftragen von Fotoresist auf nicht ebene Grundkörperflächen für fotolithografische Verfahren Apparatus and method for applying photoresist on non-planar body surfaces for photolithographic method
02/26/1998DE19632763A1 Measurement head for monitoring development of photoresist
02/25/1998EP0825809A2 Multilayer circuit board and photosensitive resin composition usable therefor
02/25/1998EP0825492A1 Method of treating a resist pattern on a semiconductor wafer
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