| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 03/26/1998 | WO1998012605A1 Phase shifting circuit manufacture method and apparatus |
| 03/26/1998 | WO1998012604A1 Method of monitoring a photolithographic process |
| 03/26/1998 | WO1998012603A1 Photolithography masking arrangements |
| 03/26/1998 | WO1998012238A1 Light-absorbing polymer, method for synthesizing the same, and film-forming composition and antireflection film prepared using said polymer |
| 03/26/1998 | WO1998012232A1 Photocatalytic composition |
| 03/25/1998 | EP0831376A2 Scanning exposure method and mask therefor |
| 03/25/1998 | EP0831375A2 Photopolymerizable mixture exhibiting low oxygen sensitivity for the production of colour proofs |
| 03/25/1998 | EP0831374A1 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer |
| 03/25/1998 | EP0831373A2 Photo-curable resin compositions and process for preparing a resin-based mold |
| 03/25/1998 | EP0831372A1 Photopolymers |
| 03/25/1998 | EP0831371A2 Positive resist composition |
| 03/25/1998 | EP0831370A1 Positive resist composition |
| 03/25/1998 | EP0831369A2 Positive photosensitive composition |
| 03/25/1998 | EP0831298A2 Wave-surface aberration-measuring apparatus and methods |
| 03/25/1998 | EP0831127A1 Stereolithographic resin composition and stereolithographic method |
| 03/25/1998 | EP0830928A2 Resin composition and mold made from such resin, for forming fibrous material |
| 03/25/1998 | EP0830642A1 Film-stripping process |
| 03/25/1998 | EP0830641A1 Photohardenable epoxy composition |
| 03/25/1998 | EP0830640A1 Stabilizers for use with photoacid precursor formulations |
| 03/25/1998 | EP0830639A1 Molecularly imprinted materials, method for their preparation and devices employing such materials |
| 03/25/1998 | EP0830552A1 Method for reducing the level of diluent in diluent-containing resins using microwave energy |
| 03/25/1998 | CN1177272A Cirucit substrate, circuit-formed suspension substrate, and prodn. method thereof |
| 03/25/1998 | CN1177200A Apparatus for forming photoresist film in semiconductor device and method of forming photoresist film using the same |
| 03/25/1998 | CN1176969A Circuit substrate, circuit-formed suspension substrate, and prodn. method thereof |
| 03/24/1998 | USRE35753 Optical lithographical imaging system including optical transmission diffraction devices |
| 03/24/1998 | US5731909 Method for increasing the power of an elastically deformable lens |
| 03/24/1998 | US5731877 Automated system utilizing self-labeled target by pitch encoding |
| 03/24/1998 | US5731866 Apparatus and a method for irradiating a section of a length of a sheet-like material |
| 03/24/1998 | US5731641 Linear motor driven vertical lift stage |
| 03/24/1998 | US5731591 Beam exposure system having improved mask unit |
| 03/24/1998 | US5731577 Illumination apparatus and projection exposure apparatus using the same |
| 03/24/1998 | US5731388 Acrylated polyurethane |
| 03/24/1998 | US5731386 Polymer for positive acid catalyzed resists |
| 03/24/1998 | US5731385 Polymeric dyes for antireflective coatings |
| 03/24/1998 | US5731364 Photoimageable compositions comprising multiple arylsulfonium photoactive compounds |
| 03/24/1998 | US5731363 Photopolymerizable composition containing sensitizing dye and titanocene compound |
| 03/24/1998 | US5731324 Glycoprotein IIb/IIIa antagonists |
| 03/24/1998 | US5731246 Protection of aluminum metallization against chemical attack during photoresist development |
| 03/24/1998 | US5731132 Containing anionic and nonionic surfactants; for photoresist layers |
| 03/24/1998 | US5731131 Method of manufacturing semiconductor devices |
| 03/24/1998 | US5731129 Photosensitive resin composition comprising a carboxyl group-containing diene copolymer and a hydrogenated diene block polymer |
| 03/24/1998 | US5731128 Resin composition for flexographic printing plate |
| 03/24/1998 | US5731127 Wear resistance, solvent resistance |
| 03/24/1998 | US5731126 Blend of polysiloxane and photoacid generator |
| 03/24/1998 | US5731125 For forming resist film |
| 03/24/1998 | US5731124 Method for preparing an aluminum foil for use as a support in lithographic printing plates |
| 03/24/1998 | US5731123 Sulfonimide and acid generating compounds |
| 03/24/1998 | US5731113 Method of reducing registration error in exposure step of semiconductor device |
| 03/24/1998 | US5731112 Processless diacetylenic salt films capable of developing a black image |
| 03/24/1998 | US5730924 Ultraviolet radiation |
| 03/24/1998 | US5730889 Ink jet recording head, fabrication method thereof, and printer with ink jet recording head |
| 03/24/1998 | US5730833 Image transfer apparatus |
| 03/24/1998 | US5729894 Method of assembling ball bump grid array semiconductor packages |
| 03/19/1998 | WO1998011471A1 Dry peel-apart imaging system |
| 03/19/1998 | WO1998011470A1 Dry peel-apart imaging or proofing system |
| 03/18/1998 | EP0829868A1 Method of manufacturing glass masters with a graphical image |
| 03/18/1998 | EP0829768A1 Non-corrosive cleaning composition for removing plasma etching residues |
| 03/18/1998 | EP0829767A1 Resist processing method and resist processing system |
| 03/18/1998 | EP0829766A2 Novel polymers and photoresist compositions |
| 03/18/1998 | EP0829765A1 Photosensitive resin composition |
| 03/18/1998 | EP0829558A1 Process and apparatus for the electrodeposition of a chromium layer on a printing cylinder |
| 03/18/1998 | EP0829502A2 Photosensitive reworkable encapsulant |
| 03/18/1998 | EP0829373A2 Seal making device |
| 03/18/1998 | EP0829036A1 Lithographic scanning exposure projection apparatus |
| 03/18/1998 | EP0829035A1 Scanning-slit exposure device |
| 03/18/1998 | EP0829031A1 Non-wettable layer for color filters in flat panel display devices |
| 03/18/1998 | EP0803060A4 Film exposure control apparatus |
| 03/18/1998 | EP0786071A4 On-axis mask and wafer alignment system |
| 03/18/1998 | EP0679265B1 On-press developable lithographic printing plates |
| 03/18/1998 | EP0586470B1 Preparation of photopolymerised elastomeric printing plates |
| 03/18/1998 | EP0555376B1 Device for controlling radiation and uses thereof |
| 03/18/1998 | CN2276639Y Hand control device for diazonium duplicator developing part |
| 03/18/1998 | CN1176405A Method for improving photoimage quality |
| 03/17/1998 | US5729564 Electrostatic precipitator for a gas discharge laser |
| 03/17/1998 | US5729331 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
| 03/17/1998 | US5728664 Nonaqueous naphthalene free negative photoresists stripping composition, alkyl or dialkylbenzenesulfonic acid and alkylphenols |
| 03/17/1998 | US5728618 Method to fabricate large capacitance capacitor in a semiconductor circuit |
| 03/17/1998 | US5728509 Arcuate film formed by photolithography on photoresist film formed on surface of device |
| 03/17/1998 | US5728508 Improving image dimensional accuracy using solvent soluble fluoropolymer protective coatings |
| 03/17/1998 | US5728506 Lithographic processes employing radiation sensitive polymers and photosensitive acid generators |
| 03/17/1998 | US5728505 Flexible photopolymerizable coating with alkaline developers for protective coatings |
| 03/17/1998 | US5728504 Positive photoresist compositions and multilayer resist materials using the same |
| 03/17/1998 | US5728503 Micro-roughness to improve adhesion, hardness but still provide good image contrast |
| 03/17/1998 | US5728495 Scanning exposure method and apparatus |
| 03/17/1998 | US5727685 Reticle container with corner holding |
| 03/17/1998 | CA1339751C Stereolithographic supports |
| 03/17/1998 | CA1339750C Stereolithographic curl reduction |
| 03/12/1998 | WO1998010335A1 Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity |
| 03/12/1998 | WO1998010334A1 Method of contact printing on metal alloy-coated polymer films |
| 03/12/1998 | WO1998010050A1 Non-corrosive cleaning composition for removing plasma etching residues |
| 03/12/1998 | WO1998010003A1 Aqueous developable photosensitive polyurethane-methacrylate |
| 03/12/1998 | WO1998010002A1 Liquid curable resin composition |
| 03/12/1998 | DE19715730A1 Semiconductor component, e.g. integrated circuit, on semiconductor substrate manufacture |
| 03/12/1998 | CA2263254A1 Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity |
| 03/11/1998 | EP0828197A1 Photoresist stripping and cleaning compositions |
| 03/11/1998 | EP0828196A2 Lithographic imaging system for interchangeable plate cylinders |
| 03/11/1998 | EP0828195A2 Method for improving photoimage quality |
| 03/11/1998 | EP0828172A1 Optical projection system and exposure apparatus |
| 03/11/1998 | EP0828171A2 Projection optical system |
| 03/11/1998 | EP0808477A4 Fabrication and use of a sub-micron dimensional standard |