| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 09/24/1997 | CN1160058A Borate photoinitiators from polyboranes |
| 09/24/1997 | CN1160054A Acid-stable borates for photopolymerization |
| 09/23/1997 | US5671165 Method of determining position offset of a pattern |
| 09/23/1997 | US5671057 For use with an exposure apparatus |
| 09/23/1997 | US5671054 Method and apparatus for measuring position of pattern formed on a substrate having a thickness |
| 09/23/1997 | US5670844 Discharge lamp |
| 09/23/1997 | US5670842 Method and apparatus for igniting electroeless lamp discharge |
| 09/23/1997 | US5670299 Pattern formation process |
| 09/23/1997 | US5670298 Forming porous layer, then photoresists; etching |
| 09/23/1997 | US5670297 Process for the formation of a metal pattern |
| 09/23/1997 | US5670294 Aqueous alkaline solution for developing offset printing plates |
| 09/23/1997 | US5670293 Lead-frame forming material |
| 09/23/1997 | US5670280 Optically controlled imaging phase mask element |
| 09/23/1997 | US5670240 Embossed substrate and photoreceptor device incorporating the same and method |
| 09/23/1997 | US5670210 Method of uniformly coating a substrate |
| 09/23/1997 | US5669979 Photoreactive surface processing |
| 09/23/1997 | US5669977 Shape memory alloy lift pins for semiconductor processing equipment |
| 09/23/1997 | US5669800 Process of forming holes in a photosensitive resin layer to produce cathodes with microtips |
| 09/23/1997 | US5669708 Optical element, production method of optical element, optical system, and optical apparatus |
| 09/23/1997 | US5669304 Stamp unit and method of preparing stamp unit |
| 09/23/1997 | US5669303 Apparatus and method for stamping a surface |
| 09/18/1997 | WO1997034319A1 Manufacture of semiconductor device |
| 09/18/1997 | WO1997034201A1 Color filter |
| 09/18/1997 | WO1997034200A1 Process for developing a positive photoresist |
| 09/18/1997 | WO1997034199A1 Photosensitive resin composition and coating comprising said composition |
| 09/18/1997 | WO1997034198A1 Photosensitive resin composition and coating comprising said composition |
| 09/18/1997 | WO1997034197A1 Resin compositions for photoresist applications |
| 09/18/1997 | WO1997034195A1 2-substituted malondialdehyde compounds as co-developers for black-and-white photothermographic and thermographic elements |
| 09/18/1997 | WO1997034171A2 Microlens scanner for microlithography and wide-field confocal microscopy |
| 09/18/1997 | WO1997034025A1 Microcontact printing of catalytic colloids |
| 09/18/1997 | WO1997033938A1 Initiators for the cationic crosslinking of polymers containing organofunctional groups |
| 09/18/1997 | WO1997033763A2 Application to fabric of heat-activated transfers |
| 09/18/1997 | DE19609700A1 Developing silicon coated printing plates |
| 09/18/1997 | CA2248778A1 Initiators for the cationic crosslinking of polymers containing organofunctional groups |
| 09/17/1997 | EP0795998A1 Producing a lithographic printing plate by sequentially exposing a thermo-sensitive imaging element by a set of radiation beams |
| 09/17/1997 | EP0795995A1 Halftone reproduction by single spot multibeam laser recording |
| 09/17/1997 | EP0795895A2 Semiconductor device with a plurality of stacked wiring layers and manufacturing method of the same |
| 09/17/1997 | EP0795803A2 Method and apparatus for holographically recording an essentially periodic pattern |
| 09/17/1997 | EP0795790A2 Peel-developable lithographic printing plate |
| 09/17/1997 | EP0795789A1 Negative type image recording material |
| 09/17/1997 | EP0795788A1 Resist compositions for plating |
| 09/17/1997 | EP0795787A1 Photopolymerizable composition and presensitized planographic printing plate employing the same |
| 09/17/1997 | EP0795786A2 Positive photosensitive composition |
| 09/17/1997 | EP0795421A2 Laser addressable thermal transfer imaging element and method of forming an image |
| 09/17/1997 | EP0795420A1 Lithographic printing plate adapted to be imaged by ablation |
| 09/17/1997 | EP0795199A1 Structure and method for exposing photoresist |
| 09/17/1997 | EP0794865A1 Delaminating method and apparatus |
| 09/17/1997 | EP0554276B1 Imageable recording films |
| 09/17/1997 | EP0495923B1 Non-electroscopic prolonged tack toners |
| 09/17/1997 | CN1159602A Automatic diaphragm device |
| 09/17/1997 | CN1159593A Automatic focusing controller with light source |
| 09/17/1997 | CN1159459A Polymer composition and resist meterial |
| 09/17/1997 | CN1159453A Polymer and resist material |
| 09/17/1997 | CN1159450A Borate photoinitiators from monoboranes |
| 09/16/1997 | US5668673 Catadioptric reduction projection optical system |
| 09/16/1997 | US5668672 For forming a reduced image of a pattern |
| 09/16/1997 | US5668624 Scan type exposure apparatus |
| 09/16/1997 | US5668401 Chessboard pattern layout for scribe lines |
| 09/16/1997 | US5668248 Polyamic acid esters |
| 09/16/1997 | US5668226 2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the same |
| 09/16/1997 | US5668192 Polymerization catalysts |
| 09/16/1997 | US5668042 Method for aligning micro patterns of a semiconductor device |
| 09/16/1997 | US5668018 Method for defining a region on a wall of a semiconductor structure |
| 09/16/1997 | US5667942 Carboxylic acid-forming photoresist |
| 09/16/1997 | US5667941 Photolithography, resolution |
| 09/16/1997 | US5667940 Process for creating high density integrated circuits utilizing double coating photoresist mask |
| 09/16/1997 | US5667939 Method for obtaining a lithographic printing plate utilizing a diazo-base imaging element containing a dispersed water insoluble polymer |
| 09/16/1997 | US5667938 Acid scavengers for use in chemically amplified photoresists |
| 09/16/1997 | US5667937 Epoxy resin with photoacid precursor, sulfonium salt, sensitizer with benzoperylene, diphenyl hexatriene and diphenyl octratetrarne |
| 09/16/1997 | US5667935 Protective coating for imaging elements |
| 09/16/1997 | US5667934 Solder mask for printed circuits, epoxidized bisphenol a novolak, cationic photopolymerization catalyst |
| 09/16/1997 | US5667932 Positive photoresist composition |
| 09/16/1997 | US5667931 Positive photoresist composition containing quinone diazide 5-triazine esterification compound |
| 09/16/1997 | US5667930 Photoresist composition containing 4,6-(bis)chloromethyl-5-triazine initiator |
| 09/16/1997 | US5667923 Charged particle beam exposure compensating proximity effect |
| 09/16/1997 | US5667922 Partial curing of polyimide followed by water rinse to remove solvent, then photolithography, etching, and complete curing, improved resolution of patterns |
| 09/16/1997 | US5667920 Process for preparing a color filter |
| 09/16/1997 | US5667918 Method of lithography using reticle pattern blinders |
| 09/16/1997 | US5667700 Process for the fabrication of a structural and optical element |
| 09/16/1997 | US5667655 Stripping |
| 09/16/1997 | US5667164 Device and method for feeding a sheet |
| 09/16/1997 | CA2000051C Process for stabilizing a leuco-dye solution and radiation-polymerizable mixture containing a leuco dye |
| 09/12/1997 | WO1997033206A1 Thermal treatment process of positive photoresist composition |
| 09/12/1997 | WO1997033205A1 Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| 09/12/1997 | WO1997033204A1 Lithopraphic apparatus for step-and-scan imaging of a mask pattern |
| 09/12/1997 | WO1997033203A1 Imaging system and apparatus for ultraviolet lithography |
| 09/12/1997 | WO1997033202A1 A screen printing stencil |
| 09/12/1997 | WO1997033201A1 Bottom antireflective coatings through refractive index modification by anomalous dispersion |
| 09/12/1997 | WO1997033200A1 Light-absorbing antireflective layers with improved performance due to refractive index optimization |
| 09/12/1997 | WO1997033199A1 A process for obtaining a lift-off imaging profile |
| 09/12/1997 | WO1997033198A1 Photoresist compositions comprising polycyclic polymers with acid labile pendant groups |
| 09/12/1997 | WO1997033197A1 Method of preparing photosensitive printing plate, aqueous developing solution suited for the preparation, aqueous rinsing solution and developer for the photosensitive printing plate |
| 09/12/1997 | WO1997032734A1 Raw fabric for printing |
| 09/10/1997 | EP0794465A2 Photolithographic method of producing a semiconductor device, using an alignment correction method |
| 09/10/1997 | EP0794464A1 Heating apparatus and thermal developing system |
| 09/10/1997 | EP0794463A2 Resist develop process having a post develop dispense step |
| 09/10/1997 | EP0794462A2 Independently controllable shutters and variable area apertures for off axis illumination |
| 09/10/1997 | EP0794461A1 Squeegee for a printing screen coating device |
| 09/10/1997 | EP0794460A2 A process for device fabrication and an anti-reflective coating for use therein |
| 09/10/1997 | EP0794459A1 Method for making a printing plate according to the silver salt diffusion transfer process |