| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 02/25/1998 | EP0825491A2 Exposure apparatus of reduced projection scanning type |
| 02/25/1998 | EP0825201A1 Photocurable composition and curing process therefor |
| 02/25/1998 | EP0825022A1 Digital control strip for imageable media |
| 02/25/1998 | EP0825021A2 Thin-film imaging recording contructions incorporating matallic inorganic layers and optical interference structures |
| 02/25/1998 | EP0824722A1 Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
| 02/25/1998 | EP0824721A1 Imaging system and apparatus for ultraviolet lithography |
| 02/25/1998 | EP0824720A1 Acid bleachable dye containing lithographic printing plate composition |
| 02/25/1998 | EP0824719A1 A process for obtaining a lift-off imaging profile |
| 02/25/1998 | EP0824399A1 Laser exposure apparatus |
| 02/25/1998 | CN2275283Y Device for photoetching double face film |
| 02/25/1998 | CN1174547A Functionalised photoinitiators, derivatives and macromeres therefrom and their use |
| 02/25/1998 | CN1174525A Process for functionalisation of surfaces |
| 02/25/1998 | CN1174402A Charged-beam exposure mask and charged-beam exposure method |
| 02/25/1998 | CN1174343A Management device of photoetching film stripping liquid |
| 02/25/1998 | CN1174342A Sculpture technology for composite containing polyurethane |
| 02/25/1998 | CN1037552C Negative photosensitive printed board and its making method |
| 02/24/1998 | US5721619 Misregistration detecting marks for pattern formed on semiconductor substrate |
| 02/24/1998 | US5721608 Projection exposure method and apparatus |
| 02/24/1998 | US5721606 Large-area, high-throughput, high-resolution, scan-and-repeat, projection patterning system employing sub-full mask |
| 02/24/1998 | US5721605 Alignment device and method with focus detection system |
| 02/24/1998 | US5721292 Acylphosphine oxides |
| 02/24/1998 | US5721288 Photopolymerizable composition including a photopolymerization initiation system having excellent light sensitivity to visible light |
| 02/24/1998 | US5721131 Surface modification of polymers with self-assembled monolayers that promote adhesion, outgrowth and differentiation of biological cells |
| 02/24/1998 | US5721091 Composition for forming an electrically conductive layer to be used in patterning |
| 02/24/1998 | US5721090 Method of etching a substrate |
| 02/24/1998 | US5721089 Coating with blend of colorant and resin |
| 02/24/1998 | US5721088 Cationic or anionic positive-acting photoresists containing a photosensitive component and a microgel |
| 02/24/1998 | US5721087 Irradiating precursor comprising support having first layer for converting laser beam to heat and second layer having ink-repellant surface to conduct image exposure, pressing adhesive sheet on second layer, separating adhesive sheet |
| 02/24/1998 | US5721079 Length of optical path is adjusted such that the magnification factor in the emission of nonexposure light matches the magnification factor in emission of exposure light |
| 02/24/1998 | US5721078 Photoresists tetragon shapes with incline, spacing containing phenolic resin blends including a naphthoquinone diazides and a negative working agent |
| 02/24/1998 | US5721077 Coating with blend of colorant and resin |
| 02/24/1998 | US5721076 Color filters and materials and resins therefor |
| 02/24/1998 | US5721074 Method for fabricating a light exposure mask comprising the use of a process defect inspection system |
| 02/24/1998 | US5720814 Photoresist coating apparatus |
| 02/19/1998 | WO1998007071A1 Aqueous antireflective coatings for photoresist compositions |
| 02/19/1998 | WO1998007070A1 Antireflective coatings for photoresist compositions |
| 02/19/1998 | WO1998007069A1 Polymer-based micromachining technology for microfluidic devices |
| 02/18/1998 | EP0824224A1 Apparatus for processing photosensitive material |
| 02/18/1998 | EP0824223A1 Photosensitive resin composition for far-ultraviolet exposure |
| 02/18/1998 | EP0824222A1 Photo recording medium |
| 02/18/1998 | EP0823977A1 Lithopraphic apparatus for step-and-scan imaging of a mask pattern |
| 02/18/1998 | CN1173928A Photoactive compounds |
| 02/18/1998 | CN1173843A Embossed substrate and photoreceptor device incorporating the same and method |
| 02/18/1998 | CN1173648A Precoating sensitive plate and its prodn. method |
| 02/18/1998 | CN1173647A Photoresist composition |
| 02/18/1998 | CN1037475C Support element for an automatic loading tray of an exposure unit for silicon wafers |
| 02/17/1998 | US5719915 X-ray dispersing/focusing device and method of producing same |
| 02/17/1998 | US5719704 Projection exposure apparatus |
| 02/17/1998 | US5719698 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
| 02/17/1998 | US5719617 Illumination system for superposing light beams one upon another on a surface using a projecting system having different focal point positions |
| 02/17/1998 | US5719605 Large array heater chips for thermal ink jet printheads |
| 02/17/1998 | US5719495 Apparatus for semiconductor device fabrication diagnosis and prognosis |
| 02/17/1998 | US5719009 Laser ablatable photosensitive elements utilized to make flexographic printing plates |
| 02/17/1998 | US5719008 Photoresist composition comprising a polyfunctional vinyl ether compound |
| 02/17/1998 | US5719005 Variations of tackiness in photosensitive layer |
| 02/17/1998 | US5719004 Positive photoresist composition containing a 2,4-dinitro-1-naphthol |
| 02/17/1998 | US5719003 Method for increasing the differential solubility of an imaged photoresist through hydroxy group blocking via reaction with vinyl ethers |
| 02/17/1998 | US5718992 Substrate having light shielding layer |
| 02/17/1998 | US5718763 Resist processing apparatus for a rectangular substrate |
| 02/12/1998 | WO1998006009A1 Lithography system with remote multisensor alignment |
| 02/12/1998 | WO1998006008A1 Positive photoresist composition containing a 2,4-dinitro-1-naphthol |
| 02/12/1998 | WO1998006007A1 A method of forming a monolayer of particles, and products formed thereby |
| 02/12/1998 | WO1998005712A1 Black photosensitive resin composition, color filter made by using the same, and process for the production thereof |
| 02/12/1998 | CA2233721A1 A method of forming a monolayer of particles, and products formed thereby |
| 02/11/1998 | EP0823667A2 Alignment apparatus and exposure apparatus equipped with same |
| 02/11/1998 | EP0823666A1 Method and apparatus for an automated plate handler with cassette loading system and cover removal mechanism |
| 02/11/1998 | EP0823665A2 Cassette for storing and accessing plates within an automated plate handler |
| 02/11/1998 | EP0823664A1 Method and apparatus for an automated plate handler with slip sheet removal |
| 02/11/1998 | EP0823663A1 Method and apparatus for an automated plate handler with elevator and table support mechanism |
| 02/11/1998 | EP0823662A2 Projection exposure apparatus |
| 02/11/1998 | EP0823661A1 Composition for anti-reflective coating material |
| 02/11/1998 | EP0823660A2 Photoresist layer supporting polyester film and photoresist film laminate |
| 02/11/1998 | EP0823659A1 Negative type image recording material |
| 02/11/1998 | EP0823460A1 Water-base photosensitive resin composition |
| 02/11/1998 | EP0823334A2 Image forming material and image forming method employing the same |
| 02/11/1998 | EP0823327A2 Positive photosensitive composition, positive photosensitive lithographic printing plate and method for making positive photosensitive lithographic printing plate |
| 02/11/1998 | EP0823073A1 Illumination unit for an optical apparatus |
| 02/11/1998 | EP0823072A1 Deep pattern micro-lithography |
| 02/11/1998 | EP0823071A1 On-press removable overcoat for lithographic printing plates |
| 02/11/1998 | EP0823070A1 Negative-acting no-process printing plates |
| 02/11/1998 | EP0822881A1 Method and apparatus for step and repeat exposures |
| 02/11/1998 | EP0556357B1 Silver image bleaching solution and process |
| 02/11/1998 | CN1173227A Polymers based on block copolymers |
| 02/11/1998 | CN1173148A NCO-terminated vinyl telomers |
| 02/11/1998 | CN1172972A Ultraviolet-curable composition and method for forming cured-product patterns therefrom |
| 02/11/1998 | CN1172971A Improved photoresist material containing photosensitive component for cathod-ray tube and its preparation method |
| 02/11/1998 | CN1172970A Improved photoresist material and its preparation method |
| 02/11/1998 | CN1037397C Method of and apparatus for cover sheet removal from laminated board |
| 02/11/1998 | CN1037376C Method of making relief plate |
| 02/10/1998 | US5717612 Post-exposure bake simulator for chemically amplified photoresists |
| 02/10/1998 | US5717518 Broad spectrum ultraviolet catadioptric imaging system |
| 02/10/1998 | US5717483 Illumination optical apparatus and method and exposure apparatus using the illumination optical apparatus and method |
| 02/10/1998 | US5717482 Stage apparatus and method of mounting a substrate on a substrate holding surface of a substrate chuck in which a substrate is mounted in a Z-axis direction |
| 02/10/1998 | US5717281 Improved video image contrast |
| 02/10/1998 | US5717251 Semiconductor integrated circuit device having minature multi-level wiring structure low in parasitic capacitance |
| 02/10/1998 | US5717218 Focal plane phase-shifting lithography |
| 02/10/1998 | US5717003 Acid-curable binder systems containing 1,2-disulfones |
| 02/10/1998 | US5716763 Liquid immersion heating process for substrate temperature uniformity |
| 02/10/1998 | US5716759 Method and apparatus for producing integrated circuit devices |
| 02/10/1998 | US5716758 Process for forming fine pattern for semiconductor device utilizing multiple interlaced exposure masks |