| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/14/1998 | US5738961 Forming on substrate an alignment mark, forming blanket layer, etching to remove portion of blanket to expose alignment mark, patterning, etching, employing partially replicated alignment mark to register photolithographic mask on substrate |
| 04/14/1998 | US5738744 Method and apparatus for continuously supplying a continuous film in a film applying apparatus |
| 04/14/1998 | US5738165 Substrate holding apparatus |
| 04/14/1998 | US5738014 Method and apparatus for making lithographic printing plates in an automated computer to plate imaging system |
| 04/09/1998 | WO1998014834A1 Antireflective coating for photoresist compositions |
| 04/09/1998 | WO1998014833A1 Light sensitive composition containing an arylhydrazo dye |
| 04/09/1998 | WO1998014832A1 Bottom antireflective coatings containing an arylhydrazo dye |
| 04/09/1998 | WO1998014831A1 Photosensitive composition and use thereof |
| 04/09/1998 | WO1998014497A1 Monomers, oligomers and polymers with terminal oxirane groups, method of preparation and polymerisation under radiation exposure |
| 04/09/1998 | WO1998014485A1 Electron-beam curable epoxy compositions |
| 04/09/1998 | CA2272123A1 Electron-beam curable epoxy compositions |
| 04/09/1998 | CA2264690A1 Monomers, oligomers and polymers with terminal oxirane groups, method of preparation and polymerisation under radiation exposure |
| 04/08/1998 | EP0834773A2 Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
| 04/08/1998 | EP0834772A2 Exposure apparatus |
| 04/08/1998 | EP0834771A1 Apparatus and method for projection exposure |
| 04/08/1998 | EP0834770A2 Dyed photoresists and methods and articles of manufacture comprising same |
| 04/08/1998 | EP0834769A1 Silver halide light-sensitive material comprising support, hardening layer and light-sensitive layer |
| 04/08/1998 | EP0834753A1 Device comprising a birefringent planar plate and DUV-quarter-wave plate |
| 04/08/1998 | EP0834751A2 Optical element manufacturing method |
| 04/08/1998 | EP0834576A2 Methods using nucleic acid hybridization patterns on a matrix of oligonucleotides |
| 04/08/1998 | EP0834575A2 Methods using target nucleic acid hybridization patterns on a matrix of oligonucleotides |
| 04/08/1998 | EP0834502A2 Polymeric polyionic compounds, process for their preparation and their use as photoinitiators |
| 04/08/1998 | EP0834492A2 Fluorinated ionic sulphonylimides and sulphonylmethylides, process for their preparation and their use as photoinitiators |
| 04/08/1998 | EP0834191A1 Removal of material by polarized radiation and back side application of radiation |
| 04/08/1998 | EP0834100A1 Photolithographic apparatus |
| 04/08/1998 | EP0563156B1 Planographic printing plate precursor |
| 04/07/1998 | US5737281 Data writing method and device of semiconductor device |
| 04/07/1998 | US5737137 Critical illumination condenser for x-ray lithography |
| 04/07/1998 | US5737064 Exposure apparatus for transferring a mask pattern onto a substrate |
| 04/07/1998 | US5737063 Projection exposure apparatus |
| 04/07/1998 | US5736464 Process and apparatus for producing a functional structure of a semiconductor component |
| 04/07/1998 | US5736301 Method for patterning a photoresist material wherein an anti-reflective coating comprising a copolymer of bisphenol A and benzophenone is used |
| 04/07/1998 | US5736300 Irradiating coherent ultraviolet light beam to surface of phase shift mask having enlarged mask pattern, projecting light transmitted to form reduced pattern image on photoresist film overlying integrated circuit wafer, transferring pattern |
| 04/07/1998 | US5736298 Comprises a particulate polymer of a carboxy-group-containing-diene having a crosslinked structure |
| 04/07/1998 | US5736297 Positive-working radiation-sensitive mixture and recording material produced therewith |
| 04/07/1998 | US5736296 Positive resist composition comprising a mixture of two polyhydroxystyrenes having different acid cleavable groups and an acid generating compound |
| 04/07/1998 | US5736292 Radiation-sensitive positive resist composition comprising an alkali soluble resin made from m-cresol, 2,3,5-trimethyl phenol and optionally p-cresol and a polyphenol compound having alkyl or alkoxy side groups |
| 04/07/1998 | US5736281 Dose modification proximity effect compensation (PEC) technique for electron beam lithography |
| 04/07/1998 | US5736280 Projecting masking pattern onto resist-covered wafer by exposure to light of predetermined intensity, then development, for improved resolution |
| 04/07/1998 | US5736195 Method of coating a thin film on a substrate |
| 04/07/1998 | US5735983 Method for manufacturing a printing plate |
| 04/07/1998 | CA2058076C Styrene/maleates terpolymers |
| 04/07/1998 | CA1339806C Liquid photoinitiator mixtures |
| 04/03/1998 | CA2187046A1 Sulfonylimides and sulfonylmethylides, use thereof as photoinitiators |
| 04/02/1998 | WO1998013730A1 Multilayer flexographic printing plate |
| 04/02/1998 | WO1998013729A1 A hydrolyzable, radiation-curable monomer or oligomer, a radiation-curable resin composition, an article, and improved rapid prototyping methods |
| 04/02/1998 | WO1998013728A1 Ultra thin organic black matrix |
| 04/02/1998 | WO1998013664A1 Laser interferometric lithographic system providing automatic change of fringe spacing |
| 04/02/1998 | WO1998013394A1 Water soluble and oxygen-impermeable polymeric layers |
| 04/02/1998 | WO1998013342A1 Sulfonium salts, cationic polymerization initiators, and curable compositions |
| 04/02/1998 | DE19743236A1 Exposure projector for integrated circuit production |
| 04/02/1998 | DE19740727A1 Verfahren zur Herstellung von optischen Wellenleiterbauteilen A process for the manufacture of optical waveguide components |
| 04/02/1998 | DE19720413A1 Thinner composition used in removal of photoresists |
| 04/02/1998 | DE19639897A1 Wasserlösliche und sauerstoffsperrende Polymerschichten und deren Verwendung für lichtempfindliche Materialien And water-soluble oxygen-impermeable polymer layers and the use thereof for photosensitive materials |
| 04/02/1998 | CA2269538A1 Ultra thin organic black matrix |
| 04/01/1998 | EP0833373A2 Emission device comprising a mercury lamp of the short ARC type |
| 04/01/1998 | EP0833209A2 Scanning exposure apparatus and device manufacturing method using the same |
| 04/01/1998 | EP0833208A2 A stage apparatus |
| 04/01/1998 | EP0833207A2 Flexographic printing forms for UV-hardenable printing inks |
| 04/01/1998 | EP0833206A2 Photopolymerizable composition for the production of flexographic printing forms with improved resistance to UV-hardenable printing inks |
| 04/01/1998 | EP0833205A2 Three-dimensional object by optical stereography and resin composition for producing the same |
| 04/01/1998 | EP0833204A1 Infrared-sensitive diazonaphthoquinone imaging composition and element |
| 04/01/1998 | EP0833203A1 Color filter grade photosensitive resin coloring composition, and color filter using the same |
| 04/01/1998 | EP0833193A2 Exposure apparatus |
| 04/01/1998 | EP0833180A2 Catadioptric objective for microlithographic reduction |
| 04/01/1998 | EP0833163A1 Accelerometer |
| 04/01/1998 | EP0832942A2 Dyes for color filters, photosensitive resist resin compositions containing the same, and color filters |
| 04/01/1998 | EP0832755A1 Seal making device |
| 04/01/1998 | EP0832739A1 Method for making a lithographic printing plate involving the use of a heat-sensitive imaging element |
| 04/01/1998 | EP0832448A1 Method of manufacturing passive elements using conductive polypyrrole formulations |
| 04/01/1998 | EP0832447A1 Photoreaction quenchers in on-press developable lithographic printing plates |
| 04/01/1998 | EP0832446A1 Therapeutic microdevices and methods of making and using same |
| 04/01/1998 | EP0832438A1 Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus |
| 04/01/1998 | EP0832095A1 A method of cross-linking amino acid-containing polymers using photoactivatable chemical cross-linkers |
| 04/01/1998 | EP0831963A1 Micromachined porous membranes with bulksupport |
| 04/01/1998 | CN1178031A Black matrix in colour picture tubes and method of producing the black matrix |
| 04/01/1998 | CN1177823A Exposure device for cathode-ray tube face plate |
| 04/01/1998 | CN1177631A Thinner composition for washing photoetching glue in process for preparing semiconductors |
| 03/31/1998 | US5734944 Apparatus for rejuvenating developer in printing plate development |
| 03/31/1998 | US5734462 Exposure apparatus and exposure method |
| 03/31/1998 | US5734408 Thermal imaging apparatus and method for material dispensing and applicating |
| 03/31/1998 | US5733948 Exposing acrylate-containing photopolymer resin to actinic radiation, developing |
| 03/31/1998 | US5733821 Downflow plasma treatment |
| 03/31/1998 | US5733714 Antireflective coating for photoresist compositions |
| 03/31/1998 | US5733713 Forming carbon layer on light reflecting layer; then photosensitive resin; irradiation; development |
| 03/31/1998 | US5733712 Multilayer; variation in photoabsorbance |
| 03/31/1998 | US5733711 Process for forming both fixed and variable patterns on a single photoresist resin mask |
| 03/31/1998 | US5733710 Patterns with a large number of microstructures |
| 03/31/1998 | US5733708 Multilayer e-beam lithography on nonconducting substrates |
| 03/31/1998 | US5733707 Lithographic printing plates from signals |
| 03/31/1998 | US5733706 Contains suitable solvent, a strong acid former as photoactive component, and a copolymer or terpolymer of maleic anhydride |
| 03/31/1998 | US5733705 Acid Scavengers for use in chemically amplified photoresists |
| 03/31/1998 | US5733704 Resist compositions for chemically amplified resists comprising a di(t-butyl)malonyl methyl side group in the base polymer |
| 03/31/1998 | US5733703 Imaging element and method for making a lithographic printing plate according to the silver salt diffusion transfer process |
| 03/31/1998 | US5733690 Adjustment marks |
| 03/31/1998 | US5733687 Photomask, exposing method using photomask, and manufacturing method of photomask |
| 03/31/1998 | US5733479 Positive photoactive compounds based on 2,6-dinitro benzyl groups |
| 03/31/1998 | US5733465 Process for producing cutting die and produced cutting die |
| 03/31/1998 | US5733024 Modular system |
| 03/31/1998 | US5732624 Annular shaped silk screen member for silk screen printing halftones |