| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 04/28/1998 | US5745284 Solid-state laser source of tunable narrow-bandwidth ultraviolet radiation |
| 04/28/1998 | US5745222 Apparatus for making a stamp from an original picture |
| 04/28/1998 | US5745221 Exposure equipment |
| 04/28/1998 | US5745150 Laser drawing apparatus having drawing beams in a common place aligned with a lens meridian |
| 04/28/1998 | US5744947 Movement actuator/sensor systems |
| 04/28/1998 | US5744924 Guideless stage with isolated reaction frame |
| 04/28/1998 | US5744858 Semiconductor packaging technique yielding increased inner lead count for a given die-receiving area |
| 04/28/1998 | US5744856 Electronic system |
| 04/28/1998 | US5744814 Method and apparatus for scanning exposure having thickness measurements of a film surface |
| 04/28/1998 | US5744810 Method and system for exposing pattern on object by charged particle beam |
| 04/28/1998 | US5744557 Transition metal-containing organometallic catalyst |
| 04/28/1998 | US5744537 Film-forming polymeric binder and fluorocarbon compound |
| 04/28/1998 | US5744512 For photopolymerization of systems containing unsaturated compounds |
| 04/28/1998 | US5744511 Visible ray polymerization initiator and visible ray polymerizable composition |
| 04/28/1998 | US5744305 Arrays of materials attached to a substrate |
| 04/28/1998 | US5744293 Semiconductor device having antireflective layer containing organic resin with dispersed carbon particles |
| 04/28/1998 | US5744286 Applying polyamic acid coating with photosensitive system that becomes more soluble in aqueous base developer when exposed to actinic radiation |
| 04/28/1998 | US5744284 Method for fabricating resilient z-axis contacts for electrically interconnecting integrated circuits on a plurality of stacked carriers |
| 04/28/1998 | US5744283 Method of photolithographically metallizing at least the inside of holes arranged in accordance with a pattern in a plate of an electrically insulating material |
| 04/28/1998 | US5744282 Photosensitive resin compositions and photosensitive element using the same |
| 04/28/1998 | US5744281 P-hydroxystyrene polymer |
| 04/28/1998 | US5744248 Containing unsaturated binder, mixture of polyester prepared from fatty acids and compound containing (meth)acryloyl groups, photoinitiator |
| 04/28/1998 | US5744101 Reactor system for synthesizing polymer sequences on substrate; solid phase synthesis |
| 04/28/1998 | US5743965 Disk coating system |
| 04/28/1998 | US5743188 Method of imaging a zirconia ceramic surface to produce a lithographic printing plate |
| 04/25/1998 | CA2194723A1 Amido substituted acetal polymer binders and their use in photosensitive compositions |
| 04/23/1998 | WO1998002913A3 Method of forming a gate electrode for an igfet |
| 04/23/1998 | DE19712281A1 Projection illuminator using phase-shift mask for integrated circuit manufacture |
| 04/22/1998 | EP0837371A2 Line width insensitive wafer target detection |
| 04/22/1998 | EP0837370A1 Exposure apparatus for flexographic printing plates |
| 04/22/1998 | EP0837369A1 Pattern formation method and surface treatment agent |
| 04/22/1998 | EP0837368A1 Positive resist composition |
| 04/22/1998 | EP0837367A2 Positive resist composition comprising a dipyridyl compound |
| 04/22/1998 | EP0837366A1 Photocurable resin composition |
| 04/22/1998 | EP0836628A1 Process for preparing polyhydroxystyrene with a novolak type structure |
| 04/22/1998 | EP0836540A1 Process for manufacturing mould inserts |
| 04/22/1998 | EP0677069B1 Metal ion reduction in the raw materials |
| 04/22/1998 | CN1179557A Photosensitive aqueous developable thick film composition employing vinylpyrrolidone polymer |
| 04/21/1998 | US5742864 Exposure apparatus for use in the manufacture of color CRTs |
| 04/21/1998 | US5742634 Picosecond laser |
| 04/21/1998 | US5742436 For transmitting radiation from an object plane to an image plane |
| 04/21/1998 | US5742397 Control device of the position and slope of a target |
| 04/21/1998 | US5742386 Apparatus for detecting foreign matter on a substrate, and an exposure apparatus including the same |
| 04/21/1998 | US5742377 Cantilever for scanning probe microscope including piezoelectric element and method of using the same |
| 04/21/1998 | US5742376 Projection exposure apparatus and projection exposure method |
| 04/21/1998 | US5742362 Process for forming a photosensitive material and an exposure apparatus used for the process |
| 04/21/1998 | US5742067 Exposure method and apparatus therefor |
| 04/21/1998 | US5742062 Arrangement for masked beam lithography by means of electrically charged particles |
| 04/21/1998 | US5741879 Energy-polymerizable compositions comprising a cyanate ester monomer or oligomer and a polyol |
| 04/21/1998 | US5741732 Method for detecting implantation mask misalignment |
| 04/21/1998 | US5741630 Acid-catalyzed thermal decomposition of secondary acid generator and formation of second acid; copper compound and reactive material used to decompose superacid precursor |
| 04/21/1998 | US5741629 Resist materials and related processes |
| 04/21/1998 | US5741628 Method of forming micropatterns by having a resist film absorb water |
| 04/21/1998 | US5741626 Method for forming a dielectric tantalum nitride layer as an anti-reflective coating (ARC) |
| 04/21/1998 | US5741625 Process for forming fine patterns in a semiconductor device utilizing multiple photosensitive film patterns and organic metal-coupled material |
| 04/21/1998 | US5741624 Connecting semiconductor layers |
| 04/21/1998 | US5741622 Comprising copolymer having unsaturated compound and free carboxyl group, polyfunctional unsaturated compond diluent, solvent, photoinitiator, vinyltriazine compound, inorganic filler |
| 04/21/1998 | US5741621 Process for using photoimageable films prepared for aqueous photoimageable liquid emulsions |
| 04/21/1998 | US5741620 Reactive polymeric dyes |
| 04/21/1998 | US5741619 Negative image-recording material comprising an acrylic resin, a diazo compound and carbon black |
| 04/21/1998 | US5741614 Atomic force microscope measurement process for dense photoresist patterns |
| 04/21/1998 | US5741368 Dibasic ester stripping composition |
| 04/21/1998 | US5740732 Apparatus for simultaneously manufacturing multiple annular shaped screen frames |
| 04/21/1998 | US5740580 Stepper vacuum chuck wiper |
| 04/21/1998 | CA2094438C Pressurized sealable transportable containers for storing a semiconductor wafer in a protective gaseous environment |
| 04/21/1998 | CA2089822C Photosensitive laminate having dual intermediate layers |
| 04/16/1998 | WO1998015952A1 Optical apparatus |
| 04/16/1998 | WO1998015410A1 Inverted stamping process |
| 04/16/1998 | DE19743540A1 Improved aluminium-supported printing plates |
| 04/16/1998 | CA2216705A1 Line width insensitive wafer target detection |
| 04/15/1998 | EP0836120A1 Alkaline developing composition and method of use to process lithographic printing plates |
| 04/15/1998 | EP0836119A1 Chemically amplified resist composition |
| 04/15/1998 | EP0835917A1 Ultraviolet-curing adhesive composition and article |
| 04/15/1998 | EP0835848A2 Fluorine-containing silica glass, its method of manufacture and a projection exposure apparatus comprising the glass |
| 04/15/1998 | CN1038069C Method for producing integrate three dimension rigid article and apparatus for precisely producing said article |
| 04/14/1998 | US5740489 Apparatus and method for making a lithographic printing plate according to silver salt diffusion transfer processing |
| 04/14/1998 | US5740488 Resist developing apparatus with selectable spray and drip nozzles |
| 04/14/1998 | US5740068 Fidelity enhancement of lithographic and reactive-ion-etched images by optical proximity correction |
| 04/14/1998 | US5740065 Method for manufacturing semiconductor device |
| 04/14/1998 | US5740052 Method and apparatus for manufacture of semiconductor devices |
| 04/14/1998 | US5739964 Projection lens assembly |
| 04/14/1998 | US5739913 Alignment system for a lithography system |
| 04/14/1998 | US5739899 Projection exposure apparatus correcting tilt of telecentricity |
| 04/14/1998 | US5739898 Exposure method and apparatus |
| 04/14/1998 | US5739636 Cadmium discharge lamp of the short arc type and method of producing UV light therewith |
| 04/14/1998 | US5739589 Semiconductor integrated circuit device process for fabricating the same and apparatus for fabricating the same |
| 04/14/1998 | US5739265 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom |
| 04/14/1998 | US5739254 Chloromethylation with acetylhalide in presence of dimethoxymethane and a halogen containing lewis acid catalyst in methanol |
| 04/14/1998 | US5739214 Radiation-curable coating of unsaturated prepolymer, epoxy and ketone resin |
| 04/14/1998 | US5739175 Photoreactor composition containing an arylketoalkene wavelength-specific sensitizer |
| 04/14/1998 | US5739174 Epoxysilicone photocurable composition comprising a sulfolene or isatin photosensitizer |
| 04/14/1998 | US5738977 Forming copper layer on substrate surface, forming layer of nickel-boron, cataphoretically coating with photosensitive lacquer, exposing, developing, removing uncovered layers, stripping lacquer, sealing with nickel-phosphorus layer |
| 04/14/1998 | US5738976 Photo-curable organopolysiloxane composition and a method for producing a (meth) acryloyloxyl group-containing organopolysiloxane used therein |
| 04/14/1998 | US5738975 Mixture containing (meth)acrylate terpolymer having group which reacts with an acid to convert polarity of polymer, photo acid generating compound, solvent |
| 04/14/1998 | US5738974 Photopolymerizable composition and photosensitive lithographic printing plate |
| 04/14/1998 | US5738972 Blend of binder, dissolution inhibitor, photosensitivr compound, base, phenolic resin and solvent |
| 04/14/1998 | US5738971 Photosensitive composition for transfer sheets |
| 04/14/1998 | US5738970 Negative working, peel developable, single sheet color proofing system with polyvinyl acetal photoadhering layer |
| 04/14/1998 | US5738969 Water insoluble compound having mercapto or thione group, and sulfonated styrene-containing polymer |
| 04/14/1998 | US5738968 Positive photoresist composition |