Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/1998
05/27/1998CN1183146A Acid bleachable dye containing lithographic printing plate composition
05/27/1998CN1182890A Water bare female pattern pre-coating photosensitive plate and making method and usage thereof
05/27/1998CN1182660A Anti-welding composition and printed-circuit board
05/26/1998US5757838 Output control method for excimer laser
05/26/1998US5757673 Automated data management system for analysis and control of photolithography stepper performance
05/26/1998US5757507 Method of measuring bias and edge overlay error for sub-0.5 micron ground rules
05/26/1998US5757505 Exposure apparatus
05/26/1998US5757470 Variable annular illuminator for photolithographic projection imager
05/26/1998US5757469 Scanning lithography system haing double pass Wynne-Dyson optics
05/26/1998US5757409 Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
05/26/1998US5757313 Lacer-induced transfer printing medium and method
05/26/1998US5757160 Moving interferometer wafer stage
05/26/1998US5757149 Drive control apparatus
05/26/1998US5757130 Lamp with electrodes for increased longevity
05/26/1998US5757019 Pattern drawing apparatus
05/26/1998US5757017 Imaging system and apparatus for ultraviolet lithography
05/26/1998US5757016 Ablative flashlamp imaging
05/26/1998US5756997 Scanning probe/optical microscope with modular objective/probe and drive/detector units
05/26/1998US5756981 Optical scanner for reading and decoding one- and-two-dimensional symbologies at variable depths of field including memory efficient high speed image processing means and high accuracy image analysis means
05/26/1998US5756850 Argon fluoride excimer laser lithography with acid generating resins with sulfonium salts
05/26/1998US5756689 Diazo compounds for laser-induced mass transfer imaging materials
05/26/1998US5756648 Photosensitive polymide materials for electronic packaging applications
05/26/1998US5756364 Laser processing method of semiconductor device using a catalyst
05/26/1998US5756267 Developing solution for negative type photosensitive resin compositions
05/26/1998US5756266 Process for manufacturing devices using maleimide containing resist polymers
05/26/1998US5756262 Coating substrate, exposure through mask in preferential humidity setting, development
05/26/1998US5756261 A curable photoresists blends comprising a polyetherurethane or a polyesterurethane copolymer with an acrylic copolymer and carboxy group-containing cellulose, a photoinitiator; adhesion, flexibility, elasticity
05/26/1998US5756260 Polyamic acid ester, propylene glycol monomethyl ether acetate
05/26/1998US5756259 With polymer having bound photoabsorber
05/26/1998US5756258 Materials for holograms, plates for laser direct process, photoresists and photosensitive elements
05/26/1998US5756257 Color proofing article incorporating novel antihalation dye
05/26/1998US5756256 Resist composition comprising specified solvent having organic polymer and indole-3-carboxylic acid dissolved therein
05/26/1998US5756255 Undercoating composition for photolithography
05/26/1998US5756254 Containing photosensitive acid generator
05/26/1998US5756252 Exposing, devloping and neutralizing
05/26/1998US5756251 Method for making lithographic printing plate
05/26/1998US5756242 Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and exposure parameter
05/26/1998US5756241 Self-aligned method for forming a color display screen
05/26/1998US5756240 Depositing and patterning a photoresists layer on first substrate to form selected openings over pixels, heating second substrate having heat transferable colorant material layer, transferring the colorant, removing photoresist
05/26/1998US5756239 Method of forming a color filter array with improved resolution
05/26/1998US5756238 Lithographic print bias/overlay target and applied metrology
05/26/1998US5756236 Fabrication of high resolution aluminum ablation masks
05/26/1998US5755919 Having cylindrical holographic master plate for continuous image duplication onto photosensitive film without lamination defects
05/25/1998CA2222110A1 Illumination system with spatially controllable partial coherence
05/25/1998CA2222109A1 Reduction of pattern noise in scanning lithographic system illuminators
05/22/1998WO1998021629A2 In-line holographic mask for micromachining
05/22/1998WO1998021626A1 Multifunctional microstructures and preparation thereof
05/22/1998WO1998021398A1 Imaging transfer system and process for transferring image and non-image areas thereof to a receptor element
05/22/1998WO1998021287A1 Thermosettable pressure sensitive adhesive
05/22/1998WO1998021038A1 Radiation-sensitive compositions and printing plates
05/22/1998WO1998021037A1 A processless planographic printing plate
05/22/1998CA2761346A1 In-line holographic mask for micromachining
05/22/1998CA2688799A1 In-line holographic mask for micromachining
05/22/1998CA2277056A1 Imaging transfer system and process for transferring image and non-image areas thereof to receptor element
05/20/1998EP0843221A2 Projection exposure apparatus
05/20/1998EP0843220A1 Radiation sensitive resin composition
05/20/1998EP0843219A2 Formulation for producing watersoluble deposit upon a substrate
05/20/1998EP0843218A1 Photosensitive composition
05/20/1998EP0842789A1 Thermal image forming method using light
05/20/1998EP0842788A1 Image-forming material with protective layer and its preparation method
05/20/1998DE19647221A1 Projector for displaying three=dimensional geometrical objects
05/20/1998CN1182486A Illumination unit for an optical apparatus
05/20/1998CN1182485A Negative-acting no-process printing plates
05/20/1998CN1182280A Pattern drawing method using charged particle beams and apparatus therefor
05/19/1998US5754340 Comprising positive power of diffraction optical element, fluorite lens and negative power of quartz lens; laser beam emitter
05/19/1998US5754300 Alignment method and apparatus
05/19/1998US5754299 Inspection apparatus and method for optical system, exposure apparatus provided with the inspection apparatus, and alignment apparatus and optical system thereof applicable to the exposure apparatus
05/19/1998US5754279 Method and apparatus for changing photoprinting glass in production line
05/19/1998US5754275 Optical apparatus having lens-system drive device for temperature correction in direction of optical axis
05/19/1998US5754214 Image exposing apparatus using optical sensor to detect start synchronization of scanning line
05/19/1998US5753926 Scan type exposure apparatus and method having a reference plate with marks for image detection
05/19/1998US5753788 Photolabile nucleoside protecting groups
05/19/1998US5753783 Catalyzing the modifying reaction of polyether copolymer or polyether ketone copolymer with acetyl halide, dimethoxymethane in presence of lewis acids and methanol to form a crosslinkable photoresists
05/19/1998US5753722 Photocurable and thermosetting matte liquid resist composition
05/19/1998US5753601 Organic stripping composition
05/19/1998US5753523 Method for making airbridge from ion-implanted conductive polymers
05/19/1998US5753421 Stock developer solutions for photoresists and developer solutions prepared by dilution thereof
05/19/1998US5753420 Rough dielectric film by etchback of residue
05/19/1998US5753419 Increase dram node capacitance by etching rough surface
05/19/1998US5753418 0.3 Micron aperture width patterning process
05/19/1998US5753417 Photolithography
05/19/1998US5753416 Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process
05/19/1998US5753415 Apparatus for piece-by-piece development corresponding to large scale substrates
05/19/1998US5753414 Laminate
05/19/1998US5753412 Photoresist having increased sensitivity and use thereof
05/19/1998US5753408 Method for making an offset printing plate according to the silver salt diffusion transfer process
05/19/1998US5753407 Polyamic acid composition
05/19/1998US5753406 Radiation-sensitive resin composition
05/19/1998US5753405 Positive-working recording material containing aluminum base and mat-finished quinone diazide layer developable in weak alkaline developers
05/19/1998US5753404 Photosensitive recording material containing negative working diazonium salt layer and discontinuous top layer
05/19/1998US5753403 Diazo based imaging element containing hydrolysed polyvinyl alcohol and metal-free phthalocyanine
05/19/1998US5753135 Apparatus and method for recovering photoresist developers and strippers
05/19/1998US5753014 Membrane filter and a method of manufacturing the same as well as a membrane
05/19/1998US5752441 Method of manufacturing a plurality of annular shaped silk screen members
05/14/1998WO1998020517A1 Micromachining using high energy light ions
05/14/1998WO1998020395A1 Method of applying dry film photoresist
05/14/1998WO1998020394A1 Photodefinable dielectric compositions
05/14/1998CA2271382A1 Photodefinable dielectric compositions
05/13/1998EP0841806A2 Improvements in or relating to apparatus and methods for exposing printing plates
05/13/1998EP0841681A2 Exposure apparatus and exposure method
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