| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 01/06/1998 | US5706077 Scan type projection exposure apparatus and microdevice manufacturing method using the same |
| 01/06/1998 | US5706076 Semiconductor light exposure apparatus |
| 01/06/1998 | US5705570 Acrylate polymers |
| 01/06/1998 | US5705321 Method for manufacture of quantum sized periodic structures in Si materials |
| 01/06/1998 | US5705320 Patterns for insulation layers on semiconductor wafers and integrated circuits, etching |
| 01/06/1998 | US5705319 Process for forming fine patterns for a semiconductor device utilizing three photosensitive layers |
| 01/06/1998 | US5705317 Radiation-sensitive mixture |
| 01/06/1998 | US5705316 Vinyl ether compounds having additional functional groups other than vinyl ether groups and the use thereof in the formulation of curable compositions |
| 01/06/1998 | US5705315 Image-receiving material for production of a color image utilizing a transferred white pigment layer |
| 01/06/1998 | US5705314 Method for preparing prepress color proof and intermediate receiver element and carrier plate useful therein |
| 01/06/1998 | US5705313 Process for the production of a lithographic printing plate through selective transfer |
| 01/06/1998 | US5705310 Flexographic printing plate |
| 01/06/1998 | US5705309 Photosensitive composition and element containing polyazide and an infrared absorber in a photocrosslinkable binder |
| 01/06/1998 | US5705308 Infrared-sensitive, negative-working diazonaphthoquinone imaging composition and element |
| 01/06/1998 | US5705301 Analyzing integrated circuit layout; partitioning and generating reticle design using computer; photolithography |
| 01/06/1998 | US5705299 Large die photolithography |
| 01/06/1998 | US5705298 Holographic method for generating three dimensional conformal photo lithographic masks |
| 01/06/1998 | US5705116 Anthracene uv light-absorbing compound |
| 01/06/1998 | US5704986 Semiconductor substrate dry cleaning method |
| 01/06/1998 | US5704291 Lithographic printing members with deformable cushioning layers |
| 01/03/1998 | CA2204074A1 A flexographic printing element having a powder layer and a method for making a flexographic printing plate therefrom |
| 01/02/1998 | DE19726058A1 Catadioptric system for object image projection ion photolithography |
| 01/02/1998 | DE19624593A1 Optical micro-lens manufacturing method |
| 12/31/1997 | WO1997050280A1 Thick-film conductor circuit and production method therefor |
| 12/31/1997 | WO1997050117A1 Method of etching conductive lines through an etch resistant photoresist mask |
| 12/31/1997 | WO1997050112A1 Method of selectively exposing a material using a photosensitive layer and multiple image patterns |
| 12/31/1997 | WO1997050019A1 Improved method for sulfuric acid resist stripping |
| 12/31/1997 | WO1997049557A1 Lithographic plates |
| 12/31/1997 | WO1997049475A1 Microfabricated filter and shell constructed with a permeable membrane |
| 12/30/1997 | US5703712 Optical lens having hydrogen concentration higher in central concentric area than in edge area |
| 12/30/1997 | US5703675 Projection-exposing apparatus with deflecting grating member |
| 12/30/1997 | US5703493 Wafer holder for semiconductor applications |
| 12/30/1997 | US5703374 Telecentric NUV-DUV irradiator for out-of-contact exposure of large substrates |
| 12/30/1997 | US5703186 Mixed polymers |
| 12/30/1997 | US5703140 Contains ethylenically unsaturated bond, oxime ether compound, spectral sensitizing dye |
| 12/30/1997 | US5703137 Polyorganosiloxanes |
| 12/30/1997 | US5702872 Process for resist pattern formation using positive electrodeposition photoresist compositions |
| 12/30/1997 | US5702869 Soft ashing method for removing fluorinated photoresists layers from semiconductor substrates |
| 12/30/1997 | US5702868 High resolution mask programmable via selected by low resolution photomasking |
| 12/30/1997 | US5702867 Coating photosensitive film on material to be patterned, selectively exposing surface, diffusing silicon into surface by use of hexamethyl disilazane or tetramethyl disilazane, etching |
| 12/30/1997 | US5702862 Alkali soluble resin; a quinone diazide group-containing compound |
| 12/30/1997 | US5702861 Blend of alkali soluble resin, quinone diazide compound and an aromatic polyhydroxy compound |
| 12/30/1997 | US5702848 Mask for optical lithography using phase shift masking and integrated circuit produced therefrom |
| 12/30/1997 | US5702846 Photosensitive composition for volume hologram recording |
| 12/30/1997 | US5702820 Blend of epoxy resin and unsaturated carboxylic acid |
| 12/30/1997 | US5702776 Organic polysilane composition, colored material, method of manufacturing colored material and liquid crystal display |
| 12/30/1997 | US5702767 Non-Aminic photoresist adhesion promoters for microelectronic applications |
| 12/30/1997 | US5702620 Sensitive to high energy beams |
| 12/30/1997 | US5702567 Plurality of photolithographic alignment marks with shape, size and spacing based on circuit pattern features |
| 12/30/1997 | US5702495 Silica glass member for UV-lithography, method for silica glass production, and method for silica glass member production |
| 12/29/1997 | EP0814382A1 Improved photoresists and method for making printing plates |
| 12/29/1997 | EP0814381A1 Positive image forming composition |
| 12/29/1997 | EP0814380A2 Method for manufacturing liquid jet recording head |
| 12/29/1997 | EP0814109A1 Photosensitive polyimide precursor and its use for pattern formation |
| 12/29/1997 | EP0814083A2 Process for the preparation of 1-methoxy-2-propyl ester of 3-(7-diethylamino-2-oxo-2H-chromene-3-yl)-3-oxo-propionic acid |
| 12/29/1997 | EP0813565A1 Energy-polymerizable compositions comprising a cyanate ester monomer or oligomer and a polyol |
| 12/29/1997 | EP0734325B1 Ablative imaging by proximity lithography |
| 12/29/1997 | EP0724498B1 Full field mask illumination enhancement methods and apparatus |
| 12/29/1997 | EP0559900B1 Method of surface treating rolling roll |
| 12/29/1997 | EP0542858B1 Process for forming a colored image using an aqueous developable precolored diazo imaging element |
| 12/24/1997 | WO1997049005A1 Plate for waterless lithography |
| 12/24/1997 | WO1997048677A1 Non-ionic photoacid generators with improved quantum efficiency |
| 12/24/1997 | CN1168488A Photoimageable composition having acrylic-functional UV stabilizer |
| 12/24/1997 | CN1168401A Composition for anti-reflection coating |
| 12/24/1997 | CN1168399A Liquid composition, laser marking article and marking process |
| 12/24/1997 | CN1168321A Method of facsimiling and etching figure on marble |
| 12/24/1997 | CN1168318A Electronic instrument |
| 12/23/1997 | US5701544 Process for producing color filter |
| 12/23/1997 | US5701542 Automatic developing apparatus for photosensitive lithographic printing plates |
| 12/23/1997 | US5701169 Illumination system and exposure apparatus with demountable transparent protective member |
| 12/23/1997 | US5701041 Weight supporting apparatus |
| 12/23/1997 | US5701014 Projection lithography apparatus |
| 12/23/1997 | US5701013 Wafer metrology pattern integrating both overlay and critical dimension features for SEM or AFM measurements |
| 12/23/1997 | US5700849 Photopolymerizable composition containing a sensitizing dye and a titanocene compound |
| 12/23/1997 | US5700732 Semiconductor wafer, wafer alignment patterns and method of forming wafer alignment patterns |
| 12/23/1997 | US5700629 Applying developing solution to photoresist surface while jetting controlled pressure gas at it for removal of narrow sections and formation of walls vertical to substrate, accuracy, resolution |
| 12/23/1997 | US5700628 Dry microlithography process |
| 12/23/1997 | US5700627 Device for the insolation of micrometric and/or submicrometric areas in a photosensitive layer and a method for the creation of patterns in such a layer |
| 12/23/1997 | US5700626 Preventing a generation of charge-up effect in exposure to electron beams and reducing detect errors |
| 12/23/1997 | US5700625 Negative-working photoresist composition |
| 12/23/1997 | US5700624 Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups |
| 12/23/1997 | US5700622 Platemaking process with heat developable silver salt diffusion transfer |
| 12/23/1997 | US5700621 Copolymer binder of acrylamide or alkylacrylamide and acidic hydrogen atom containing unit derived from sulfonic, carboxylic, phosphonic, carboximides, sulfonamides, sulfonimides and phenols |
| 12/23/1997 | US5700620 Radiation ray sensitive resin compostion containing at least two different naphthoquinonediazide sulfonic acid esters and an alkali-soluble low-molecular compound |
| 12/23/1997 | US5700619 Photosensitive composition comprising diazonium polycondensation product and/or free radical polymerizable system consisting of photoinitiators and polymerizable components, polyvinyl acetal binder having free acid group |
| 12/23/1997 | US5700610 Scanwise exposure for rendering a halftone dots |
| 12/23/1997 | US5700607 Method of forming a multilayer printed circuit board and product thereof |
| 12/23/1997 | US5700604 For transferring images or patterns onto a radiation sensitive substrate, for printing integrated circuits, accuracy |
| 12/23/1997 | US5700603 Semiconductor device having X-ray lithographic mask and method for manufacturing the same |
| 12/23/1997 | US5700602 Method and apparatus for precision determination of phase-shift in a phase-shifted reticle |
| 12/23/1997 | US5700601 Formed of a semitransparent film and a phase shifter; phase angles of light beams passing through respective areas are different from each other substantially by 180 degrees |
| 12/23/1997 | US5699739 Assembly and method for reclaiming incompatible resins from printing plates |
| 12/23/1997 | US5699621 Positioner with long travel in two dimensions |
| 12/18/1997 | WO1997048127A1 METHOD FOR ENGRAVING THE GATE IN MOS TECHNOLOGY USING A SiON BASED HARD MASK |
| 12/18/1997 | WO1997048117A1 The provision of color elements on substrates by means of a screen-printing or stencil-printing method |
| 12/18/1997 | WO1997048023A1 Stripping composition |
| 12/18/1997 | WO1997048022A1 Method of producing printing or embossing cylinders having a patterned surface |
| 12/18/1997 | WO1997048021A1 Process for modulating interferometric lithography patterns to record selected discrete patterns in photoresist |
| 12/18/1997 | WO1997048020A1 The provision of tracks on flat substrates by means of a stencil-printing method |
| 12/18/1997 | WO1997047997A1 Holographic patterning method and tool for production environments |