Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
08/1998
08/20/1998WO1998036445A1 Method for one-shot removal of resist member and sidewall protection layer
08/20/1998WO1998036326A1 Planographic printing
08/20/1998WO1998036325A1 Photocurable resin composition
08/20/1998WO1998036323A1 High temperature performance polymers for stereolithography
08/20/1998WO1998036297A1 Phase mask with spatially variable diffraction efficiency
08/20/1998WO1998036045A1 Post clean treatment
08/20/1998WO1998036000A1 Modified copolymer, process for preparing the same, and curable resin composition
08/19/1998EP0859400A2 Improvements in or relating to integrated circuits
08/19/1998EP0859285A2 Light exposure controlling method
08/19/1998EP0859284A1 Water-developable photosensitive composition and production process thereof
08/19/1998EP0859283A1 4-(Alkoxyhydroxy)styryl triazine photoinitiators
08/19/1998EP0859282A1 Positive-tone photoimageable crosslinkable coating
08/19/1998EP0859281A1 Carrier element useful for preparing prepress color proofs
08/19/1998EP0858617A2 Low-shrinkage light-curable resin
08/19/1998EP0858616A1 Method of contact printing on metal alloy-coated polymer films
08/19/1998EP0858615A1 Thermosetting anti-reflective coatings and method for making same
08/19/1998EP0858472A1 Photosensitive resin composition
08/19/1998EP0858470A1 A solvent-free, radiation-curable, optical glass fiber coating composition and solvent-free method for making a solvent-free, radiation-curable, optical glass fiber coating composition
08/19/1998EP0858392A2 Processes for preparing and using moulds
08/19/1998EP0800542B1 Isolation of novolak resin by low temperature sub-surface forced steam distillation
08/19/1998EP0665960B1 Imaging medium and process
08/19/1998EP0662243B1 Antireflex layer and process for lithographically structuring such a layer
08/19/1998EP0652920B1 Antistatic agent and method for suppressing electrification
08/19/1998EP0635145B1 Photoresists having a low level of metal ions
08/19/1998CN2288463Y Exposure device for mask-making technology
08/19/1998CN2288462Y Ultraviolet (i ray) projection photoetching optical lens system
08/19/1998CN1191019A Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus
08/18/1998US5796804 X-ray mask structure for reducing the distortion of a mask
08/18/1998US5796524 Catadioptric optical system and exposure apparatus using the same
08/18/1998US5796484 System for detecting unevenness degree of surface of semiconductor device
08/18/1998US5796469 Exposure apparatus and device manufacturing method using the same
08/18/1998US5796468 Apparatus used to align and mark wafers
08/18/1998US5796467 Scanning projection exposure method and apparatus using substrate position adjustment based on mask pattern positioin during scanning exposure
08/18/1998US5796114 Exposure apparatus and method for positioning with a high accuracy
08/18/1998US5795985 Phenyl alkyl ketone substituted by cyclic amine and a process for the preparation thereof
08/18/1998US5795831 Cold processes for cleaning and stripping photoresist from surfaces of semiconductor wafers
08/18/1998US5795702 Photoresist stripping liquid compositions and a method of stripping photoresists using the same
08/18/1998US5795701 Amplified ultraviolet radiation photoresist
08/18/1998US5795700 Method for forming resist pattern with enhanced contrast film
08/18/1998US5795699 Langmuir-blodgett (LB) films as ARC and adhesion promoters for patterning of semiconductor devices
08/18/1998US5795698 Lithographic printing plate for development, inks, exposure, photoresists and photopolymerization
08/18/1998US5795697 Consisting of image receiving layer with developmsent nuclei,photosensitive layer, two antistress layers; storage stability
08/18/1998US5795688 Automatic detection of advance design photomasks
08/18/1998US5795687 Projection exposure method and alignment
08/18/1998US5795686 Thin films transistors
08/18/1998CA2228654A1 Positive-tone photoimageable crosslinkable coating
08/18/1998CA2107451C Electron lithography using photocathode
08/18/1998CA2098958C Photosensitive compositions and lithographic printing plates with reduced propensity to blinding
08/18/1998CA2077572C Method of and apparatus for stabilizing shapes of objects, such as optical elements, as well as exposure apparatus using same and method of manufacturing semiconductr devices
08/18/1998CA2077237C Sor exposure system and method of manufacturing semiconductor devices using same
08/14/1998CA2197706A1 Method of fabricating apodized phase mask
08/13/1998WO1998035271A1 Molecule, layered medium and method for creating a pattern
08/13/1998WO1998035255A1 Selective interferometry
08/13/1998WO1998034992A1 Method for gluing a surface to a component
08/13/1998WO1998034987A1 Stereolithographic resin composition
08/13/1998WO1998034777A1 Fabrication method and apparatus for fabricating an object as a plurality of successive laminae
08/13/1998WO1998028661A3 Optical height meter, surface-inspection device provided with such a height meter, and lithographic apparatus provided with the inspection device
08/13/1998DE19705027A1 Verfahren zum Verkleben eines Bauelements mit einer Oberfläche A process for bonding a component with a surface
08/13/1998CA2279849A1 Method for cementing a component to a surface
08/12/1998EP0858249A1 Laser plasma X-ray source, and semiconductor lithography apparatus and method using the same
08/12/1998EP0858099A2 Method of treating substrate and apparatus for the same
08/12/1998EP0858097A2 Mercury lamp of the short arc type
08/12/1998EP0857163A1 Photo-encoded selective etching for glass based microtechnology applications
08/11/1998US5793836 X-ray mask pellicle
08/11/1998US5793474 In a scanning exposure apparatus
08/11/1998US5793473 Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same
08/11/1998US5793472 Exposure method using reference marks on both the mask and the substrate and capable of providing high alignment precision even after multiple exposures
08/11/1998US5793471 Projection exposure method and apparatus in which scanning exposure is performed in accordance with a shot layout of mask patterns
08/11/1998US5793160 Platform-based multiple foil high current electrode attachment for medium pressure quartz lamps
08/11/1998US5793052 Dual stage following method and apparatus
08/11/1998US5793048 Curvilinear variable axis lens correction with shifted dipoles
08/11/1998US5792823 Polyvinyl acetals based on a vinyl acetate-vinyl alcohol copolymer and p-hydroxybenzaldehyde protected by 2,3-dihydro-4h-pyran; photoresists; radiation transparent; heat resistance; dry etching resistance
08/11/1998US5792672 Photoresist strip method
08/11/1998US5792596 Pattern forming method
08/11/1998US5792594 Metallization and termination process for an integrated circuit chip
08/11/1998US5792592 Photosensitive liquid precursor solutions and use thereof in making thin films
08/11/1998US5792591 Method of manufacturing a semiconductor device whereby photomasks comprising partial patterns are projected onto a photoresist layer so as to merge into one another
08/11/1998US5792590 Pattern formation method
08/11/1998US5792589 Organic binder; optically crosslinkable compound; radical-generating agent: 2,4,5-triaryl imidazole dimer, amino-group containing benzophenone photosensitizer, a thiol compound
08/11/1998US5792588 Negative working, peel developable, single sheet color proofing system
08/11/1998US5792587 Cyan dye mixtures for thermal color proofing
08/11/1998US5792586 Positive resist composition comprising a novolac resin made from a cycloalkyl substituted phenol
08/11/1998US5792585 Mixture containing low molecular weight novolak and quinonediazide sensitizer; sensitivity, resolution, heat resistance
08/11/1998US5792581 Method of correcting pattern data for drawing photomask to overcome proximity effects
08/11/1998US5792580 Method of aligning reticle pattern
08/11/1998US5792314 Exposing resin to mixture of fluorine compound gas, steam, and ozone, exciting the gas mixture, gasifying the resin
08/11/1998US5792274 Remover solution containing salt of hydrofluoric acid with metal-free base, water soluble organic solvent, water and,optionally, a corrosion inhibitor
08/11/1998US5792259 Substrate processing apparatus and air supply method in substrate processing apparatus
08/11/1998US5791767 Power supply for a mercury lamp
08/11/1998US5791250 Method and apparatus for an automated plate handler with slip sheet removal mechanism
08/11/1998CA2094656C Device manufacture involving lithographic process
08/11/1998CA2094439C Fully automated and computerized conveyor based manufacturing line architecture adapted to pressurized sealable transportable containers
08/06/1998WO1998034266A1 Digital direct write electron beam lithography
08/06/1998WO1998034234A1 Method and apparatus for producing extreme ultra-violet light for use in photolithography
08/06/1998WO1998034159A1 Photosensitive resin composition, method for producing pattern therefrom, electronic devices produced by using the same, and method for production thereof
08/06/1998WO1998034158A1 Radiation sensitive diazo sulfo-acrylic adducts
08/06/1998WO1998034092A2 Object inspection and/or modification system and method
08/06/1998WO1998033764A1 Aminobenzophenones and photopolymerizable compositions including same
08/06/1998WO1998033761A1 Non-volatile phenylglyoxalic esters
08/06/1998CA2275667A1 Non-volatile phenylglyoxalic esters
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