Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
09/1998
09/23/1998EP0865455A1 Isolation of novolak resin without high temperature distillation and photoresist composition therefrom
09/23/1998EP0548312B1 Pressure relieving pellicle
09/23/1998CN1194057A Removal of material by polarized radiation and back side application of radiation
09/23/1998CN1193753A Chemically amplified resist
09/22/1998US5812958 Anti-vibration system
09/22/1998US5812892 Multi-beam image forming system
09/22/1998US5812631 Method for manufacturing monolithic capillary X-ray lens, a monolithic capillary X-ray lens and apparatus using same
09/22/1998US5812420 Vibration-preventive apparatus and exposure apparatus
09/22/1998US5812396 Synchronous positioning control apparatus and control method thereof
09/22/1998US5812271 Reticle pre-alignment apparatus and method thereof
09/22/1998US5812244 Reticle assembly having non-superposed position measurement patterns
09/22/1998US5812242 Projection exposure apparatus including a temperature control system for the lens elements of the optical system
09/22/1998US5811505 Energy-polymerizable compositions comprising a cyanate ester monomer or oligomer and a polyol
09/22/1998US5811316 Method of forming teos oxide and silicon nitride passivation layer on aluminum wiring
09/22/1998US5811224 Transporting used developer through ultrafiltration cartridges generating a clear permeate and a remainder
09/22/1998US5811223 Forming patterns by use of positive photoresist film patterns and negative photoresist film patterns formed on adjacent dies, detecting difference in dimension between patterns
09/22/1998US5811222 Projecting an image onto photosensitive material covering semiconductor substrate, then projecting a second image which partially overlaps the first
09/22/1998US5811221 Alkaline developing composition and method of use to process lithographic printing plates
09/22/1998US5811220 On-press lithographic development methodology facilitated by the use of a disperse hydrophilic microgel
09/22/1998US5811219 Photosensitive blends comprising an acrylate copolymer binder, a multi-thiol compound photoinitiator; heat resistance, colorfastness, chromating, stability
09/22/1998US5811218 Photoinitiator compositions including amino acids, coumarin and titanocene and photosensitive materials using the same
09/22/1998US5811216 Imaging element for making an improved printing plate according to the silver salt diffusion transfer process
09/22/1998US5811215 Aqueous silicate treatment method for preparing a hydrophilic surface of an lithographic printing plate aluminum base
09/22/1998US5811211 Peripheral edge exposure method
09/22/1998US5811210 Water-less lithographic raw plate
09/22/1998US5811156 Positioning transferable colorant layer; patterning photoresist; leaving portion of transferable colorant layer over selected pixels
09/22/1998US5811020 Non-photolithographic etch mask for submicron features
09/22/1998CA2098169C Aqueous developer for lithographic printing plates with improved desensitizing capability
09/17/1998WO1998040792A1 System and method for optically aligning films and substrates used in printed circuit boards
09/17/1998WO1998040791A1 Positioning device having two object holders
09/17/1998WO1998040790A1 Photosensitive quinolone compounds and a process of preparation
09/17/1998WO1998040789A1 Positive photoresists containing novel photoactive compounds
09/17/1998WO1998040453A1 Alkanolamine semiconductor process residue removal composition and process
09/17/1998WO1998040213A1 Method of imaging lithographic printing plates with high intensity laser
09/16/1998EP0865040A2 Methods for providing generic and specific artwork on plastic information discs
09/16/1998EP0864929A2 Determining method of movement sequence and alignment apparatus for executing the same
09/16/1998EP0864928A1 A correcting agent for a silver imaged lithographic printing plate
09/16/1998EP0864927A1 Water-developable photosensitive resin composition
09/16/1998EP0864926A1 Photosensitive resin composition, and coating film, resist ink, resist, solder resist and printed circuit board each produced therefrom
09/16/1998EP0864925A1 Photosensitive recording medium
09/16/1998EP0864870A2 Method of making an integrated circuit testing device
09/16/1998EP0864422A2 Exposure control technique for platesetting and imagesetting operations
09/16/1998EP0864420A1 Heat-sensitive imaging element for making positive working printing plates
09/16/1998EP0864419A1 Method for making positive working lithographic printing plates
09/16/1998EP0864119A1 Photosensitive composition
09/16/1998EP0864118A1 Donor elements and processes for thermal dye transfer by laser
09/16/1998EP0863925A1 Metal ion reduction in photoresist compositions by chelating ion exchange resin
09/16/1998EP0760970B1 Novel ethylenically unsaturated monomers
09/16/1998EP0628180B1 Pliable, aqueous processable, photoimageable permanent coatings for printed circuits
09/16/1998EP0624261B1 Process for preparing photohardenable elastomeric element having increased exposure latitude
09/16/1998CN1193183A Mask for exposure of part of primary electron beam and method thereof
09/16/1998CN1193129A Electron beam exposure system and using method thereof
09/16/1998CN1193128A Chemically-reinforced photoetching glue
09/15/1998US5809360 Cassette for storing and accessing plates within an automated plate handler
09/15/1998US5808910 On a substrate
09/15/1998US5808846 Combination current sensor and relay
09/15/1998US5808814 Short wavelength projection optical system
09/15/1998US5808805 Exposure apparatus having catadioptric projection optical system
09/15/1998US5808796 Projection method and projection system and mask therefor
09/15/1998US5808731 System and method for visually determining the performance of a photolithography system
09/15/1998US5808310 Electron beam cell projection lithography method for correcting coulomb interaction effects
09/15/1998US5808108 Dental composites
09/15/1998US5807969 Preparation of poly-O-hydroxyamides and poly O-mercaptoamides
09/15/1998US5807947 Copolymers 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene
09/15/1998US5807905 Polymerization of unsaturated compounds
09/15/1998US5807660 Avoid photoresist lifting by post-oxide-dep plasma treatment
09/15/1998US5807659 Photosensitive printing plate
09/15/1998US5807658 Hydrophilic metal compound protective layer
09/15/1998US5807657 Polyvinyl alcohol base photosensitive resin, photosensitive composition, and method for pattern-formation using the same
09/15/1998US5807656 Polyhydroxy compound and a positive photoresist containing the same
09/15/1998US5807649 Lithographic patterning method and mask set therefor with light field trim mask
09/15/1998US5807648 Photo-Mask having optical filtering layer on transparent substrate uncovered with photo-shield pattern and process of fabrication
09/15/1998US5807647 Method for determining phase variance and shifter stability of phase shift masks
09/15/1998US5807519 Plastic molds and methods of producing same
09/15/1998US5806193 Tilt and movement apparatus using flexure and air cylinder
09/15/1998CA2121819C Device fabrication entailing plasma-derived x-ray delineation
09/15/1998CA2103411C Electron beam lithography with reduced charging effects
09/15/1998CA2094437C Dispatching apparatus with a gas supply distribution system for handling and storing pressurized sealable transportable containers
09/11/1998WO1998039798A1 Methods and apparatus for removing photoresist mask defects_in a plasma reactor
09/11/1998WO1998039688A1 Method for producing a structured layer
09/11/1998WO1998039319A1 Photoactive coumarin derivatives
09/11/1998WO1998039318A1 Process for preparing coumarin sulfonates
09/11/1998WO1998039317A1 Process for preparing photoactive coumarin derivatives
09/11/1998WO1998039102A1 Insulator cure process for giant magnetoresistive heads
09/09/1998EP0863440A2 Projection exposure apparatus and device manufacturing method
09/09/1998EP0863439A2 Exposure unit, exposure system and device manufacturing method
09/09/1998EP0863438A1 Method of and apparatus for processing photoresist, method of evaluating photoresist film, and processing apparatus using the evaluation method
09/09/1998EP0863437A1 A method for forming a resist layer on a circuit base plate
09/09/1998EP0863436A1 Heat resistant photosensitive polymer composition, process for forming pattern and semiconductor device
09/09/1998EP0863435A1 Material and process for covering the edges of photopolymerizable printing plates for flexographic printing
09/09/1998EP0863001A2 Lithographic printing system with reusable support surfaces and lithographic constructions for use therewith
09/09/1998EP0832438A4 Method and apparatus for probing, testing, burn-in, repairing and programming of integrated circuits in a closed environment using a single apparatus
09/09/1998EP0811181B1 Method and device for producing features on a photolithographic layer
09/09/1998EP0759193B1 Vinylbenzyl thymine monomers and polymers and products prepared from same
09/09/1998CN1192811A Water-less lithographic plates
09/08/1998US5805866 Alignment method
09/08/1998US5805365 Ringfield lithographic camera
09/08/1998US5805357 Catadioptric system for photolithography
09/08/1998US5805356 Projection exposure apparatus
09/08/1998US5805344 Projection optical system and projection exposure apparatus