| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/21/1998 | US5783366 Method for eliminating charging of photoresist on specimens during scanning electron microscope examination |
| 07/21/1998 | US5783365 Manufacturing method of semiconductor device |
| 07/21/1998 | US5783364 Thin-film imaging recording constructions incorporating metallic inorganic layers and optical interference structures |
| 07/21/1998 | US5783363 Spinning electroconductive transfer layer on planarizing layer where conductive layer contains metal soap dopant |
| 07/21/1998 | US5783362 Anti-interference films, fluorosurfactants which are amine salts of a fluorocarboxylic acid or fluorosulfonic acid |
| 07/21/1998 | US5783361 When applied immediately under and proximate to a chemically amplified photoresist film reduce the resist structure sidewall foot or undercut caused by an adverse contact reaction |
| 07/21/1998 | US5783359 Composite comprising photosensitive agent, cyclized rubber, mixture of xylene and decalin having specified boiling range as solvent |
| 07/21/1998 | US5783358 Stabilization of liquid radiation-curable compositions against undesired premature polymerization |
| 07/21/1998 | US5783356 Screening; exposure to radiation beam |
| 07/21/1998 | US5783355 Mixture of a 1,2-quinonediazide compound, alkali solubleand an aromatic polyhydroyl compound |
| 07/21/1998 | US5783354 Quaternary ammonium compounds |
| 07/21/1998 | US5783353 Having developer and photohardenable microcapsules in same imaging layer sealed between two support members |
| 07/21/1998 | US5783342 Method and system for measurement of resist pattern |
| 07/21/1998 | US5783341 Alignment for layer formation through determination of target values for translation, rotation and magnification |
| 07/21/1998 | US5783340 Method for photolithographic definition of recessed features on a semiconductor wafer utilizing auto-focusing alignment |
| 07/21/1998 | US5783339 Repairing defects, use in multicolor display devices |
| 07/21/1998 | US5783251 Method for suppressing electrification and for observing or inspecting an article |
| 07/21/1998 | US5782978 Coating device with movable fluid supply nozzle and rotatable substrate holder |
| 07/21/1998 | CA2067297C Protected photosensitive recording films |
| 07/16/1998 | WO1998030937A1 Articulated platform mechanism for laser pattern generation on a workpiece |
| 07/16/1998 | WO1998030667A1 Semiconductor wafer cleaning composition and method with aqueous ammonium fluoride and amine |
| 07/16/1998 | WO1998030400A1 Wet lithographic printing constructions incorporating metallic inorganic layers |
| 07/16/1998 | CA2248002A1 Articulated platform mechanism for laser pattern generation on a workpiece |
| 07/15/1998 | EP0852743A1 Process for producing surfactant having a low metal ion level and developer produced therefrom |
| 07/15/1998 | EP0852742A1 Projection aligner for integrated circuit fabrication |
| 07/15/1998 | EP0852599A1 Improved colored articles and compositions and methods for their fabrication |
| 07/15/1998 | CN1187688A Simulation method in lithographic process |
| 07/15/1998 | CN1187637A Methd for pattern-processing of photosensitive resin composition |
| 07/15/1998 | CN1187496A Novel amide-or imide-introduced copolymer, preparation thereof and photoresist comprising same |
| 07/15/1998 | CN1187495A Method and device using ArF photoresist |
| 07/14/1998 | US5781608 X-ray exposure system |
| 07/14/1998 | US5781346 Magnification correction for small field scanning |
| 07/14/1998 | US5781278 Projection optical system and exposure apparatus with the same |
| 07/14/1998 | US5781277 Projection exposure apparatus and exposure method and semiconductor device production method therewith |
| 07/14/1998 | US5780943 For controlling a position of an object |
| 07/14/1998 | US5780882 Semiconductor integrated circuit device, process for fabricating the same, and apparatus for fabricating the same |
| 07/14/1998 | US5780874 Process for forming fluorinated resin or amorphous carbon layer and devices containing same |
| 07/14/1998 | US5780861 Adjustable blade reticle assembly |
| 07/14/1998 | US5780566 Polymers containing protected styrene and unprotected hydroxybenzyl (meth)acrylamides |
| 07/14/1998 | US5780406 Mixture of hydroxylammonium salt and amine and/or quaternary ammonium hydroxide; semiconductors |
| 07/14/1998 | US5780316 Linewidth control apparatus and method |
| 07/14/1998 | US5780208 Reducing light scatter while producing resist feature on circuit substrate by providing resist layer, blocking transmission of radiation to portion of resist layer defining resist feature, radiating |
| 07/14/1998 | US5780206 Using an anthracene derivative as an absorber on highly reflective surfaces; alkali-soluble polymers; generation of acid catalysts; fine patterns |
| 07/14/1998 | US5780204 Backside wafer polishing for improved photolithography |
| 07/14/1998 | US5780203 Process for forming colored partial picture element and light-shielding light-sensitive resin composition used therefor |
| 07/14/1998 | US5780202 Antistatic photosensitive multilayered structure and method for producing the same |
| 07/14/1998 | US5780201 Ultra thin photolithographically imageable organic black matrix coating material |
| 07/14/1998 | US5780199 A copolyamic acid from tetracarboxylic acid dianhydride, organic diamine, fluorinated diamine, fluorinated tetracarboxylic acid dianhydride, a photoinitiator and sensitizer; exposure to form images, patterning, crosslinking |
| 07/14/1998 | US5780188 Multiple exposure of photoresist through mask patterns having complementary partial images in conjunction with stepping target at alternating distances between exposures to provide whole image pattern with accurate alignment |
| 07/14/1998 | US5780105 Method for uniformly coating a semiconductor wafer with photoresist |
| 07/14/1998 | US5780070 Apparatus for solidifying and shaping optically cured fluid by carrying out scanning simultaneously with recoating |
| 07/14/1998 | US5779967 Method and apparatus for production of three-dimensional objects by stereolithography |
| 07/14/1998 | US5779922 Resistor value control technique |
| 07/14/1998 | US5779799 Substrate coating apparatus |
| 07/14/1998 | US5779796 Resist processing method and apparatus |
| 07/14/1998 | US5779751 Photolithographic method of fabricating fresnel lenses |
| 07/14/1998 | US5778911 Liquid supplying apparatus |
| 07/14/1998 | CA2089240C Method and apparatus for fabrication of thin film semiconductor devices using non-planar, exposure beam lithography |
| 07/09/1998 | WO1998029900A1 Patterning chemical liquid centralized controller |
| 07/09/1998 | WO1998029782A1 Method for controlling an exposure device |
| 07/09/1998 | DE19700049A1 Exposure equipment for semiconductor device |
| 07/08/1998 | EP0852341A1 Method for the pattern-processing of photosensitive resin composition |
| 07/08/1998 | EP0852029A1 Avoidance of pattern shortening by using an off axis illumination with twisting dipole and polarizing apertures |
| 07/08/1998 | EP0852028A1 Black-and-white photothermographic and thermographic elements comprising hydroxamic acid compounds as contrast enhancers |
| 07/08/1998 | EP0852027A2 Black-and-white photothermographic and thermographic elements comprising amine compounds as contrast enhancers |
| 07/08/1998 | EP0852026A1 Black-and-white photothermographic and thermographic elements comprising acrylonitrile compounds as co-developers |
| 07/08/1998 | EP0851880A1 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom |
| 07/08/1998 | EP0851879A1 Fractionation of phenol formaldehyde condensate and photoresist compositions produced therefrom |
| 07/08/1998 | EP0721398B1 Process for preparing improved lithographic printing plates |
| 07/08/1998 | CN1039076C Method and device for peeling a film |
| 07/08/1998 | CN1039018C Method for preparing printing plate and printing plate |
| 07/07/1998 | US5777744 Exposure state detecting system and exposure apparatus using the same |
| 07/07/1998 | US5777724 Exposure amount control device |
| 07/07/1998 | US5777722 Scanning exposure apparatus and method |
| 07/07/1998 | US5777721 Exposure method and apparatus with control of a linear motor |
| 07/07/1998 | US5777342 Method and apparatus for microlithography |
| 07/07/1998 | US5777327 Pattern shape inspection apparatus for forming specimen image on display apparatus |
| 07/07/1998 | US5777314 Optical scanner with fixed focus optics |
| 07/07/1998 | US5777068 Photosensitive polyimide resin composition |
| 07/07/1998 | US5776996 Photopolymerizable composition |
| 07/07/1998 | US5776995 Photopolymerizable urethane (meth)acrylate compound, alkali-soluble polymer, photopolymerization initiator, complex of alkali thiocyante with polyether |
| 07/07/1998 | US5776836 Self aligned method to define features smaller than the resolution limit of a photolithography system |
| 07/07/1998 | US5776764 Polysilane, photoradical generator, oxidizing agent |
| 07/07/1998 | US5776662 Multilayer electroconductive material, lamination and chips |
| 07/07/1998 | US5776661 Curing a photosensitive resin using a thin film protective covering |
| 07/07/1998 | US5776660 Fabrication method for high-capacitance storage node structures |
| 07/07/1998 | US5776659 Coating on a resist film forming a pattern |
| 07/07/1998 | US5776658 Silicone-compatible photoinitiators, and photosensitive mixtures comprising them |
| 07/07/1998 | US5776657 Wet-chemical developable, etch-stable photoresist for UV radiation with a wavelength below 200 NM |
| 07/07/1998 | US5776655 Containing photopolymer |
| 07/07/1998 | US5776654 On the press development of a diazo based printing plate |
| 07/07/1998 | US5776653 On the press development of a diazo based printing plate |
| 07/07/1998 | US5776652 Aromatic hexafluoropropanesulfonate diazonium salts and their use in radiation-sensitive mixtures |
| 07/07/1998 | US5776651 Polymer shell-core latex thermal adhesives with radiation transparent film, waxes, optical brighteners and ultraviolet radiation absorbers |
| 07/07/1998 | US5776645 Lithographic print bias/overlay target and applied metrology |
| 07/07/1998 | US5776644 Photolithographic method for high resolution circle patterning utilizing calibrated opaque microspheres |
| 07/07/1998 | US5776641 Method of making color filter arrays by colorant transfer using chemical mechanical polishing |
| 07/07/1998 | US5776640 Photo mask for a process margin test and a method for performing a process margin test using the same |
| 07/07/1998 | US5776639 Exposure mask, method of producing the same, exposure mask producing apparatus, and method of forming surface profile on material using exposure mask |
| 07/07/1998 | US5776638 Projection exposure method and mask employed therein |