| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/05/1998 | EP0856872A2 Charged-particle-beam exposure apparatus |
| 08/05/1998 | EP0856774A1 Method and apparatus for coating resist and developing the coated resist |
| 08/05/1998 | EP0856773A1 Chemical amplification type positive resist composition |
| 08/05/1998 | EP0856772A1 Photopolymerizable composition for the production of flexographic printing forms for corrugated board printing |
| 08/05/1998 | EP0565664B1 Stereographic equipment and method |
| 08/05/1998 | CN1189898A Differential interferometer system and lithographic step-and-scan appts. provided with such a system |
| 08/04/1998 | US5790574 Low cost, high average power, high brightness solid state laser |
| 08/04/1998 | US5790512 Optical information carrier |
| 08/04/1998 | US5790315 Synthetic silica glass formed article for optical use |
| 08/04/1998 | US5790273 Method and apparatus for producing a grey scale stencil |
| 08/04/1998 | US5790257 Alignment device for an exposure system using a CCD camera |
| 08/04/1998 | US5790254 Monitoring of minimum features on a substrate |
| 08/04/1998 | US5790253 Method and apparatus for correcting linearity errors of a moving mirror and stage |
| 08/04/1998 | US5790239 Illumination optical apparatus containing an optical integrator and projection exposure apparatus using the same |
| 08/04/1998 | US5789853 Method of patterned eroding of a coating provided on a substrate |
| 08/04/1998 | US5789734 Exposure apparatus that compensates for spherical aberration of an image forming device |
| 08/04/1998 | US5789522 Resin purification process |
| 08/04/1998 | US5789460 Radiation curable compositions |
| 08/04/1998 | US5789142 Depositing photodefinable resin containing cuprous oxide to a printed ciruit layer of a circuit board |
| 08/04/1998 | US5789141 For improved resolution and increased density of integrated circuits; |
| 08/04/1998 | US5789140 Low energy actinic radiation |
| 08/04/1998 | US5789137 Dyes for color filters and photosensitive resist resin composition containing the same |
| 08/04/1998 | US5789136 Negative-working photoresist composition |
| 08/04/1998 | US5789125 Embossed substrate and photoreceptor device incorporating the same and method |
| 08/04/1998 | US5789124 Radiation exposure |
| 08/04/1998 | US5789121 Acrylic polymer and ultraviolet light absorbing material coatings; high resolution; stripping with halogen-free solvent |
| 08/04/1998 | US5789120 Method for designing a reticle mask |
| 08/04/1998 | US5789119 Zones with different scattering or absorption |
| 08/04/1998 | US5789118 Method and apparatus for precision determination of phase-shift in a phase-shifted reticle |
| 08/04/1998 | US5789117 Direct transfer printing onto the pattern layer of a phase shift photomask |
| 08/04/1998 | US5789039 Radiation curing of powder coatings on heat sensitive substrates: chemical compositions and processes for obtaining coated workpieces |
| 08/04/1998 | US5788870 Promotion of the adhesion of fluorocarbon films |
| 08/04/1998 | US5788800 Wet etching station and a wet etching method adapted for utilizing the same |
| 08/04/1998 | CA1339983C Polyfluoride sulfonium compounds and polymerization initiator thereof |
| 07/30/1998 | WO1998033097A1 Method and apparatus for wafer-focusing |
| 07/30/1998 | WO1998033096A1 Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate |
| 07/30/1998 | WO1998032802A1 Soluble chromophores having improved solubilising groups |
| 07/30/1998 | WO1998032756A1 Substituted aminoalkylidenamino triazines as herbicides |
| 07/30/1998 | CA2275965A1 Soluble chromophores having improved solubilising groups |
| 07/29/1998 | EP0855745A2 Method of making color filter arrays |
| 07/29/1998 | EP0855744A2 Method of making color filter arrays by thermal transfer of colorant |
| 07/29/1998 | EP0855624A2 Apparatus and method for exposure |
| 07/29/1998 | EP0855623A2 Projection exposure method and apparatus |
| 07/29/1998 | EP0855622A1 Pattern formation method |
| 07/29/1998 | EP0855621A2 Manufacturing method and apparatus for semiconductor device |
| 07/29/1998 | EP0855620A1 Positive photoresist composition |
| 07/29/1998 | EP0855605A2 Writing gratings |
| 07/29/1998 | EP0855267A2 Planographic printing plate |
| 07/29/1998 | EP0855050A1 Water-processable, chemically amplified resist compositions and processes |
| 07/29/1998 | EP0855049A1 A method of forming a monolayer of particles, and products formed thereby |
| 07/29/1998 | EP0854850A1 Low metal ion containing 4,4'-(1-(4-(1-(4-hydroxyphenyl)-1-methylethyl)phenyl)ethylidene)bisphenol and photoresist compositions therefrom |
| 07/29/1998 | EP0854783A1 Process for producing polymeric layers having selectively coloured regions |
| 07/29/1998 | CN1189219A Variable focus lens by small changes of equatorial lens diameter |
| 07/29/1998 | CN1188908A Precision photo etching imaging material on metal surface and manufacture method and use thereof |
| 07/28/1998 | US5786897 Method and device for measuring pattern coordinates of a pattern formed on a pattern surface of a substrate |
| 07/28/1998 | US5786582 Optical scanner for reading and decoding one- and two-dimensional symbologies at variable depths of field |
| 07/28/1998 | US5786131 Process for use of photoresist composition with deep ultraviolet radiation |
| 07/28/1998 | US5786130 Applying an infrared material which is transparent to visible light; forming pattern not visible to the human eye; useful for positioning microscope platform or for locating objects without interference from visible light |
| 07/28/1998 | US5786128 On-press development of a lithographic printing plate having an aryldiazosulfonate resin in a photosensitive layer |
| 07/28/1998 | US5786127 A transparent protective coatings comprising an acidic polyvinyl alcohol blends with a hydrolyzed maleic anhydride resin; hardness, nonabrasive, flexibility, noncracking |
| 07/28/1998 | US5786126 Anti-tack layer for photopolymer printing plate and composition for forming the same |
| 07/28/1998 | US5786125 Light-sensitive lithographic printing plate requiring no fountain solution |
| 07/28/1998 | US5786122 Offset printing plates |
| 07/28/1998 | US5786116 Advanced tilted illumination on mask; improved accuracy, resolution, depth of focus |
| 07/28/1998 | US5785918 Method and apparatus for production of three-dimensional objects by stereolithography |
| 07/28/1998 | US5785875 Selectively etching the film with an hydrous acid and exposing the photoresists material to isopropyl alcohol vapors in closed reaction chamber |
| 07/28/1998 | US5785759 Rotating cup type liquid supply device |
| 07/28/1998 | US5784925 Vacuum compatible linear motion device |
| 07/23/1998 | WO1998032200A1 Excimer laser with greater spectral bandwidth and beam stability |
| 07/23/1998 | WO1998032162A1 Pattern forming method |
| 07/23/1998 | WO1998032054A1 Methods and apparatus for integrating optical and interferometric lithography to produce complex patterns |
| 07/23/1998 | WO1998032053A1 Lithographic plate precursor |
| 07/23/1998 | WO1998031545A1 Lithographic plate precursor |
| 07/23/1998 | WO1998031473A1 Method for coating a plurality of fluid layers onto a substrate |
| 07/23/1998 | WO1998031472A1 Method for minimizing waste when coating a fluid with a slide coater |
| 07/22/1998 | EP0854498A1 Ultra-clean transport carrier |
| 07/22/1998 | EP0854390A1 Baking apparatus and baking method |
| 07/22/1998 | EP0854389A1 Process for the production of a coating of molecular thickness on a substrate |
| 07/22/1998 | EP0854388A2 Negative-type image recording materials |
| 07/22/1998 | EP0854374A2 Illumination apparatus with a high laser damage threshold and pattern transfer apparatus comprising the same |
| 07/22/1998 | EP0854169A1 Black photosensitive resin composition, color filter made by using the same, and process for the production thereof |
| 07/22/1998 | EP0854003A1 Laser apparatus |
| 07/22/1998 | EP0853774A1 Holographic medium and process |
| 07/22/1998 | EP0853613A1 Light-sensitive resist which can be developed in an aqueous-alkali manner and operates negatively |
| 07/22/1998 | EP0634028B1 Method for forming a lithographic pattern in a process for manufacturing semiconductor devices |
| 07/22/1998 | CN1188328A Process for manufacturing optical shade of zero level of integrated circuit |
| 07/22/1998 | CN1188327A Method for forming contact window |
| 07/22/1998 | CN1188256A Photosensitive diazonium salt sensitizer and preparing method and its use |
| 07/21/1998 | US5784166 In a precision motion system |
| 07/21/1998 | US5784150 Electron-beam cell projection lithography system |
| 07/21/1998 | US5784135 Display device in which display regions have non-linear boundaries and transmit light differently for the same applied voltage |
| 07/21/1998 | US5783833 Method and apparatus for alignment with a substrate, using coma imparting optics |
| 07/21/1998 | US5783804 Reflectance method for accurate process calibration in semiconductor substrate heat treatment |
| 07/21/1998 | US5783712 Curable; stereolithography; three-dimensional molding material |
| 07/21/1998 | US5783654 Preparation of poly-O-hydroxyamides and poly O-mercaptoamides |
| 07/21/1998 | US5783639 Composition of epoxy group-containing cycloolefin resin |
| 07/21/1998 | US5783615 Curing; stereolithography; three-dimensional molding material |
| 07/21/1998 | US5783551 Paraffinic cleaning solutions |
| 07/21/1998 | US5783452 Covered microchannels and the microfabrication thereof |
| 07/21/1998 | US5783367 Process for production of semiconductor device and resist developing apparatus used therein |