| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/07/1998 | US5776636 Photoresists with substrates, exposure to form patterns deflection and development, stamping and molding |
| 07/07/1998 | US5776634 Photosensitive recording medium and method of preparing volume type phase hologram member using same |
| 07/07/1998 | US5776250 Device for recovering photoresist material exhausted from a spin coater |
| 07/07/1998 | CA2024976C Radiation sensitive compositions |
| 07/07/1998 | CA2003890C Processing of radiation sensitive plates |
| 07/02/1998 | WO1998028666A1 System for the transfer of digitized images to an image support or vice-versa |
| 07/02/1998 | WO1998028665A1 Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device |
| 07/02/1998 | WO1998028664A1 Two-dimensionally balanced positioning device, and lithographic device provided with such a positioning device |
| 07/02/1998 | WO1998028663A1 Use for stereoscopic photolithography of a liquid composition cross-linkable by irradiation using a cation comprising a photoinitiator of the onium salts or of organometallic complex type |
| 07/02/1998 | WO1998028661A2 Optical height meter, surface-inspection device provided with such a height meter, and lithographic apparatus provided with the inspection device |
| 07/02/1998 | WO1998028650A1 Beam homogenizer |
| 07/02/1998 | WO1998028644A1 Reticular objective for microlithography-projection exposure installations |
| 07/02/1998 | WO1998028608A1 Optical inspection device and lithographic apparatus provided with such a device |
| 07/02/1998 | WO1998028395A1 Formulations including a 1,3-dicarbonyl compound chelating agent for stripping residues from semiconductor substrates |
| 07/02/1998 | WO1998028340A1 Photoinitiator mixtures containing acylphosphinoxides and benzophenone derivatives |
| 07/02/1998 | WO1998019214A3 Method and apparatus for transfer of a reticle pattern onto a substrate by scanning |
| 07/02/1998 | DE19753276A1 Amid- oder Imid- enthaltendes Copolymer, Herstellungsverfahren für das Copolymer und dieses Copolymer enthaltendes Photoresist Amide or imide-containing copolymer manufacturing method of the copolymer and this copolymer containing photoresist |
| 07/02/1998 | CA2275995A1 System for the transfer of digitized images to an image support or vice-versa |
| 07/01/1998 | EP0851477A2 Method of controlling the accuracy of multiple-step etching |
| 07/01/1998 | EP0851305A1 Rinsing and stripping process for lithography |
| 07/01/1998 | EP0851304A2 Projection exposure apparatus and device manufacturing method |
| 07/01/1998 | EP0851303A2 Moving interferometer wafer stage |
| 07/01/1998 | EP0851302A1 Coating apparatus |
| 07/01/1998 | EP0851301A1 Liquid supplying device |
| 07/01/1998 | EP0851300A1 Bottom anti-reflective coating material composition and method of forming resist pattern using the same |
| 07/01/1998 | EP0851299A1 Photosensitive lithographic printing plate |
| 07/01/1998 | EP0851298A1 Radiation sensitive composition adapted for roller coating |
| 07/01/1998 | EP0851297A1 Radiation-sensitive composition adapted for roller coating |
| 07/01/1998 | EP0851296A1 Thermally imageable material |
| 07/01/1998 | EP0851295A1 Process for the fabrication of microstructures by multilayer conformation of a photosensitive resin et microstructures obtained therewith |
| 07/01/1998 | EP0850758A2 Method for preparing and using a screen printing stencil having raised edges |
| 07/01/1998 | EP0850501A1 Method and device for triggering diode-pumped solid state lasers |
| 07/01/1998 | EP0850397A1 Methods for detecting striae |
| 07/01/1998 | EP0850253A1 Betaketosulfonic derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same |
| 07/01/1998 | EP0515577B1 Making and testing an integrated circuit using high density probe points |
| 07/01/1998 | CN2285482Y Developing device for photomechanical production |
| 07/01/1998 | CN1186328A Electron beam exposure of subpatterns of pattern |
| 06/30/1998 | US5774575 Inspection apparatus, and exposure apparatus and device manufacturing method using the inspection apparatus |
| 06/30/1998 | US5774274 Variable focus lens by small changes of the equatorial lens diameter |
| 06/30/1998 | US5774240 Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques |
| 06/30/1998 | US5774205 Exposure and method which tests optical characteristics of optical elements in a projection lens system prior to exposure |
| 06/30/1998 | US5773953 Substrate transfer system |
| 06/30/1998 | US5773918 Lamp with light reflection back into bulb |
| 06/30/1998 | US5773836 Method for correcting placement errors in a lithography system |
| 06/30/1998 | US5773591 Photoresists, light sensitive elements and diazo resins |
| 06/30/1998 | US5773536 Resin composition to be plated |
| 06/30/1998 | US5773518 Binder polymer |
| 06/30/1998 | US5773485 Acrylic syrup curable to a crosslinked viscoelastomeric material |
| 06/30/1998 | US5773201 Water vapor is added to an oxygen plasma gas generated by microwaves; lowered operating temperature prevents contamination |
| 06/30/1998 | US5773200 Forming novolak resin photoresist containing 1,2-naphthoquinonediazidosulfonyl group on substrate, exposing to light, patterning, developing, baking, metallizing, stripping |
| 06/30/1998 | US5773199 Method for controlling linewidth by etching bottom anti-reflective coating |
| 06/30/1998 | US5773198 Removal of photoresists after plating |
| 06/30/1998 | US5773196 Prevention of anti-reflection coating damage |
| 06/30/1998 | US5773194 Photosensitivity; durability |
| 06/30/1998 | US5773192 Organic silicon compound, resist, thermal polymerization composition and photopolymerization composition |
| 06/30/1998 | US5773191 Radiation-sensitive composition |
| 06/30/1998 | US5773190 Resist composition |
| 06/30/1998 | US5773188 Image protective overcoat comprising a clear polymer film |
| 06/30/1998 | US5773187 Water developable diazonium and mineral acid containing recording material for producing water-free offset printing plates |
| 06/30/1998 | US5773180 Semiconductor wafers |
| 06/30/1998 | US5773178 Liquid crystal polymers for films for patterns |
| 06/30/1998 | US5773174 Method of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and surface modification layer width |
| 06/30/1998 | US5773172 Solvent and binder solubility |
| 06/30/1998 | US5773170 UV-absorbing media bleachable by IR-radiation |
| 06/30/1998 | US5773083 Method for coating a substrate with a coating solution |
| 06/30/1998 | US5773082 Cooling after applying on a wafer, rotation and spreading |
| 06/30/1998 | US5772947 Stereolithographic curl reduction |
| 06/30/1998 | US5772925 Organic solvent-soluble polyimide, solvent |
| 06/30/1998 | US5772905 Nanoimprint lithography |
| 06/30/1998 | US5772839 Film applying apparatus |
| 06/30/1998 | US5772764 Coating apparatus |
| 06/30/1998 | US5771808 Photopolymerizable liquid |
| 06/25/1998 | WO1998027796A1 Process and apparatus for the coating of boards |
| 06/25/1998 | WO1998027463A1 Method of contact printing on gold coated films |
| 06/25/1998 | WO1998027462A1 Photoresist composition containing a polymeric additive |
| 06/25/1998 | WO1998027461A1 A method for reducing metal ion contaminants in photoresist compositions containing an organic polar solvent by ion exchange |
| 06/25/1998 | WO1998027450A1 Short wavelength pulsed laser scanner |
| 06/25/1998 | WO1998027430A1 Lithographic mask design and synthesis of diverse probes on a substrate |
| 06/25/1998 | WO1998027130A1 Fractionated novolak resin and photoresist composition therefrom |
| 06/25/1998 | WO1998027129A1 Fractionated novolak resin from cresol-formaldehyde reaction mixture and photoresist composition therefrom |
| 06/25/1998 | WO1998027128A1 Isolation of novolak resin without high temperature distillation and photoresist composition therefrom |
| 06/25/1998 | CA2275629A1 Process and apparatus for the coating of boards |
| 06/25/1998 | CA2244712A1 Short wavelength pulsed laser scanner |
| 06/24/1998 | EP0849638A2 Method for the measurement of aberration of optical projection system |
| 06/24/1998 | EP0849637A2 Illumination apparatus and exposure apparatus |
| 06/24/1998 | EP0849636A1 Photosensitive polymer composition containing photosensitive polyamide and negative working photosensitive element |
| 06/24/1998 | EP0849635A1 Radiation-sensitive composition and the letterpress-printing plate prepared therefrom |
| 06/24/1998 | EP0849634A1 Radiation sensitive resin composition |
| 06/24/1998 | EP0849091A1 Heat-sensitive imaging element for making lithographic printing plates comprising polymer particles with a specific particle size |
| 06/24/1998 | EP0849090A2 Thermosensitive imaging element for the preparation of lithographic printing plates with improved transporting properties |
| 06/24/1998 | CN1185593A Positive-action dry film photoresist with high resolution ratio |
| 06/24/1998 | CN1185449A Copolymer containing N-vinyllactam derivative preparation method and photoresist |
| 06/24/1998 | CN1038875C Method for mfg. of optical plastic chrome plated code disc and disc thereof |
| 06/23/1998 | US5771260 Enclosure system for laser optical systems and devices |
| 06/23/1998 | US5771125 Catadioptric system for photolithography |
| 06/23/1998 | US5771098 Laser interferometric lithographic system providing automatic change of fringe spacing |
| 06/23/1998 | US5771090 Image recording apparatus comprising an imagesetter and a vertical processor |
| 06/23/1998 | US5770995 Semiconductor device |
| 06/23/1998 | US5770899 Linear motor |
| 06/23/1998 | US5770685 Photolabile polymers with triazenedor/and pentazadiene building blocks |