Patents for G03F 1 - Originals for photomechanical production of textured or patterned surfaces, e.g. masks, photo-masks or reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof (24,849) |
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01/21/1986 | US4565755 Photoresists, forming latent images, development |
01/16/1986 | WO1986000426A1 Mask repairing apparatus |
01/15/1986 | EP0167948A2 X-ray mask |
01/14/1986 | US4564589 Image-forming composite with film |
01/07/1986 | US4563407 Semiconductors, integrated circuits |
12/27/1985 | EP0165686A2 Method for repairing a photomask by laser-induced polymer degradation |
12/27/1985 | EP0165685A2 Laser-based system for the total repair of photomasks |
12/24/1985 | US4561061 Method of tracing/recording image lines and apparatus therefor |
12/18/1985 | EP0164820A2 Mask structure for x-ray lithography and method for making same |
12/18/1985 | EP0164461A1 IMprovements in or relating to electro-sensitive materials |
12/17/1985 | US4559603 Apparatus for inspecting a circuit pattern drawn on a photomask used in manufacturing large scale integrated circuits |
12/17/1985 | US4559293 Photosensitive recording material developable with aqueous neutral salt solution |
12/11/1985 | EP0163641A1 Storage structures |
12/10/1985 | US4558214 Transmission illumination device in a picture scanning device |
12/10/1985 | US4557995 Applying two patterns on opposite side of the substrate |
12/10/1985 | US4557986 High resolution lithographic process |
12/03/1985 | US4556608 Photomask blank and photomask |
11/26/1985 | US4555471 Image-recording materials and image-recording carried out using these |
11/26/1985 | US4555460 Mask for the formation of patterns in lacquer layers by means of X-ray lithography and method of manufacturing same |
11/21/1985 | WO1985005193A1 Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces |
11/21/1985 | EP0161908A2 System for detecting difference between image on primary sheet and image on secondary sheet |
11/21/1985 | EP0161258A1 Data handling system for a pattern generator |
11/19/1985 | US4554259 Low expansion, alkali-free borosilicate glass suitable for photomask applications |
11/19/1985 | US4554239 Recording material containing a dyed thermally coagulatable proteinaceous compound |
11/19/1985 | US4554238 Spectrally-sensitized imaging system |
11/12/1985 | US4553172 Picture scanning and recording method |
11/12/1985 | US4552826 Method of forming composite image as in add-on non-silver microfiche |
11/06/1985 | EP0160526A2 Image modification |
11/06/1985 | EP0160396A2 Laser-imageable assembly and process for production thereof |
11/06/1985 | EP0160395A2 Laser, imageable assembly and process for production thereof |
11/06/1985 | EP0159985A1 Improvements in or relating to electro-sensitive materials |
11/05/1985 | US4551408 Color image forming method and color image forming photo-sensitive material to be used therefor |
11/05/1985 | CA1196223A1 Imageable materials |
10/22/1985 | US4548883 Applying metal coating, removing defect by ion beam |
10/16/1985 | EP0158139A1 Error-corrected corpuscular beam lithography |
10/09/1985 | EP0157241A1 Photosensitive recording material and its use in a process for the production of a printing plate or a printed circuit |
10/02/1985 | EP0156535A2 Spectrally-sensitized imaging system |
10/02/1985 | EP0155942A1 Method of producing contamination-free pellicles. |
09/25/1985 | EP0155687A2 Method of forming inspection patterns |
09/24/1985 | US4543270 Nucleation |
09/24/1985 | US4543266 Plasma deposition, silicon nitride, boron nitride, silicon carbidecyclotrons, heating, frames |
09/18/1985 | EP0155138A2 A reticle used in semiconductor device fabrication and a method for inspecting a reticle pattern thereon |
09/18/1985 | EP0154675A2 A process for reactive ion etching a polymer film |
09/18/1985 | EP0154629A1 Dustfree packaging container and method. |
09/17/1985 | US4542392 Method and apparatus for setting and monitoring an exposure spot for printing |
09/17/1985 | US4541712 Laser pattern generating system |
09/10/1985 | CA1193308A1 Drum scanners |
09/04/1985 | EP0153854A2 Process for forming a pattern film |
09/03/1985 | US4539478 Method and apparatus for picture signal enhancement |
09/03/1985 | US4539278 Composite |
09/03/1985 | US4539070 Exposure of photo resist |
08/28/1985 | EP0153096A2 Anodic bonding method and apparatus for X-ray masks |
08/27/1985 | US4537813 Photomask encapsulation |
08/27/1985 | US4537498 Focal plane adjusted photomask and methods of projecting images onto photosensitized workpiece surfaces |
08/21/1985 | EP0152294A1 Adaptive X-ray lithography mask |
08/20/1985 | US4536882 Embedded absorber X-ray mask and method for making same |
08/14/1985 | EP0151191A1 Photosensitive material for the production of orginals |
08/14/1985 | EP0151178A1 Method for making permanent colored images and apparatus therefor |
08/07/1985 | EP0150445A2 Apparatus for film registration for the fabrication of printing plates for office offset-printing machines |
08/06/1985 | US4534047 Mask ring assembly for X-ray lithography |
08/06/1985 | US4533623 Silver halide photographic light-sensitive materials for plate making and method of reduction treatment for them |
08/06/1985 | US4532865 Electrostatic printing method using heat sensitive thermal ink transfer |
08/06/1985 | CA1191477A1 X-ray mask substrate and method of fabrication thereof |
08/06/1985 | CA1191377A1 Graphic arts film including a toner adhesive elastomeric silicone resin layer and a solidified ink deposit on the toned image |
08/01/1985 | WO1985003353A1 Inspection system utilizing dark-field illumination |
07/31/1985 | EP0150129A2 Method and apparatus for lithographic rotate and repeat processing |
07/30/1985 | US4532650 Photomask inspection apparatus and method using corner comparator defect detection algorithm |
07/30/1985 | CA1191040A1 Machine reticle inspection device |
07/23/1985 | US4530891 Photo-mask blank for use in lithography including a modified chromium compound |
07/16/1985 | US4529299 Interposer element for photomasks in projection printer |
07/16/1985 | CA1190355A1 Low temperature reduction process for large photomasks |
07/16/1985 | CA1190354A1 Low temperature reduction process for photomasks |
07/10/1985 | EP0147580A1 Laser pattern generating system |
07/09/1985 | US4528261 Prelamination, imagewise exposure of photohardenable layer in process for sensitizing, registering and exposing circuit boards |
07/09/1985 | US4528071 Process for the production of masks having a metal carrier foil |
07/09/1985 | CA1190082A1 Phase-shifting production mask for photolithography |
07/09/1985 | CA1190081A1 Transparency, a method for forming it and a photographic mask whose optical densities are correlated with the contour of a surface |
07/02/1985 | US4527070 Method and apparatus for inspecting a pattern |
06/25/1985 | US4525062 Positioning jig for positioning copy material for offset printing |
06/25/1985 | CA1189374A1 Image scanning apparatus and method |
06/18/1985 | US4523974 Method of fabricating a pellicle cover for projection printing system |
06/18/1985 | CA1189083A1 Cycloalkylsulfonates, polymers and processes relating to same |
06/11/1985 | US4522914 Imaging method of making a raised line facsimile of a photographic image |
06/11/1985 | US4522862 Layer packs comprising a filter |
06/11/1985 | US4522842 Annealing |
05/29/1985 | EP0143004A2 Apparatus for inspecting mask used for manufacturing integrated circuits |
05/21/1985 | US4518668 Method for preparing a lithographic printing plate |
05/21/1985 | US4518666 Enlargement of photopolymer images in photopolymer mask |
05/15/1985 | EP0141548A2 Photomask pattern inspection |
05/15/1985 | EP0141434A2 Process for the correction of photo masks |
05/15/1985 | EP0141335A1 Process for the production of an X-ray mask with a metallic support foil |
05/14/1985 | US4517036 Making of printing plates |
05/14/1985 | CA1187203A1 Integrated circuit photomask |
05/14/1985 | CA1187193A1 Forms manufacturing system |
05/09/1985 | WO1985001906A1 Data handling system for a pattern generator |
05/08/1985 | EP0140455A2 Process for the production of masks for the exposure of resits with X-ray litography |
05/07/1985 | US4516030 Scanning electron beam exposure system |
05/07/1985 | US4515877 Image-recording materials and image-recording carried out using these to produce an optical mask |
05/07/1985 | US4515876 X-Ray lithography mask and method for fabricating the same |
04/30/1985 | US4514767 Apparatus for making masks and/or block copies for printing |