Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
02/2003
02/20/2003WO2002093618A3 Semiconductor structure including low-leakage, high crystalline dielectric
02/20/2003US20030036483 High temperature superconducting thick films
02/20/2003US20030035769 Carbide and oxycarbide based compositions, rigid porous structures including the same, methods of making and using the same
02/20/2003US20030033976 Silicon carbide sublimation systems and associated methods
02/18/2003US6521042 Semiconductor growth method
02/13/2003WO2003012831A2 Structure including a monocrystalline perovskite oxide layer
02/13/2003WO2003012826A2 Monitoring and controlling perovskite oxide film growth
02/13/2003US20030029376 High quality, semiconductor-grade, single crystals of silicon carbide; optics, electronics; minimization of gapping between tiles
02/11/2003US6518637 Cubic (zinc-blende) aluminum nitride
02/06/2003WO2002093664A3 Cesium dispensers and process for the use thereof
02/04/2003US6514897 nanorods having carbides and/or oxycarbides; catalyst supports for various catalysts such as hydrogenation, hydrodesulfurisation, hydrodenitrogenation, hydrodemetallisation, hydrodeoxygenation, hydrodearomatization, dehydrogenation, hydrogenolysis, isomerization, alkylation, dealkylation, oxidation
02/04/2003US6514338 Comprising allowing a silicon raw material to continuously react with a carbon raw material to generate gas, which reaches a seed crystal substrate on which a silicon carbide single crystal grows
01/2003
01/30/2003WO2003009354A1 Semiconductor structure including a monocrystalline compound semiconductor layer
01/30/2003WO2003008084A1 Method for making synthetic gems comprising elements recovered from complete or partial human or animal remains and the product thereof
01/30/2003WO2001026165A9 Method and apparatus for forming buffer layers
01/30/2003US20030022525 Semiconductor structure and device including a monocrystalline layer formed overlying a compliant substrate and a method of forming the same
01/30/2003US20030022520 Light-assisted deposition method for fabricating a compliant substrate for epitaxial growth of monocrystalline materials
01/30/2003US20030022431 Structure including a monocrystalline perovskite oxide layer and method of forming the same
01/30/2003US20030021885 Processing line having means to monitor crystallographic orientation
01/30/2003US20030021732 Multilayer semiconductor laser analyzer; vertical cavities
01/30/2003US20030020089 Method for real-time monitoring and controlling perovskite oxide film growth and semiconductor structure formed using the method
01/30/2003US20030019668 Particle beam biaxial orientation of a substrate for epitaxial crystal growth
01/30/2003US20030019507 Cleaning and drying method and apparatus
01/29/2003CN1393575A Molecular beam source apparatus for film deposition and method for depositing film by molecular beam
01/28/2003US6512229 Process for preparing a bolometer material and bolometer device
01/23/2003WO2002041365A3 Single crystalline oxide on a semiconductor substrate
01/23/2003US20030017932 Cremeting; filtering carbon particles; sublimation; polishing
01/21/2003US6509070 Laser ablation, low temperature-fabricated yttria-stabilized zirconia oriented films
01/21/2003US6508880 Apparatus for growing low defect density silicon carbide
01/16/2003WO2003005425A1 Semiconductor layer formation utilizing laser irradiation
01/16/2003WO2002089188A3 Semiconductor structures utilizing binary metal oxide layers
01/16/2003WO2002048434A3 Gallium nitride materials and methods for forming layers thereof
01/16/2003WO2001068957A9 Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals
01/16/2003US20030013275 Isotopically pure silicon-on-insulator wafers and method of making same
01/16/2003US20030010978 Semiconductor wafers with integrated heat spreading layer
01/15/2003EP1144737B1 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride:silicon carbide alloy
01/14/2003US6507046 High-resistivity silicon carbide substrate for semiconductor devices with high break down voltage
01/14/2003US6506618 Method of forming a GaInNAs layer
01/09/2003WO2003003431A1 Relaxed sige films by surfactant mediation
01/09/2003US20030008772 Carbon nanotubes, carbide nanorods, and mixtures with uniform diameter of 1-100 nm, length to diameter ratio of > 5, and ammonia desorption peak at a temperature of >100 degrees C; isomerization catalysts
01/09/2003US20030008527 Structure and method for fabricating semiconductor structures and devices utilizing the formation of a compliant substrate and laser radiation for materials used to form the same
01/09/2003US20030008505 Method to grow self-assembled epitaxial nanowires
01/09/2003US20030008179 Non-c-axis oriented bismuth-layered perovskite ferroelectric structure epitaxially grown on buffered silicon
01/09/2003US20030005878 ZnO/sapphire substrate and method for manufacturing the same
01/07/2003US6503610 Having low dislocation density without increasing thickness of mask layer; regrowth of masking layer continues until disappearance of underlying crystal
01/03/2003WO2003001573A2 Apparatus for fabricating semiconductor structures
01/02/2003US20030003704 Underlayer made of a III-V semiconductor compound is formed on a substrate, and a chromium-antimony (crsb) compound is epitaxially grown by molecular beam epitaxy; ferromagnetic layer
01/02/2003EP1271569A2 Zinc blende type CrSb compound, method for fabricating the same, and multilayered structure
01/02/2003EP1270768A1 Epitaxial growing method for growing aluminum nitride and growing chamber therefor
01/02/2003EP1268883A1 Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals
01/02/2003EP1268882A2 Axial gradient transport apparatus and process for producing large size, single crystals of silicon carbide
01/01/2003CN1388838A Titanium dioxide cobalt magnetic film and its manufacturing method
12/2002
12/31/2002US6500568 Palladium layer has desired in-plane and out-of-plane crystallographic orientations, which allow subsequent layers that are applied on the article to also have the desired orientations; high temperature superconductivity
12/31/2002US6500258 Method of growing a semiconductor layer
12/27/2002WO2002103090A2 A method of growing a semiconductor layer
12/27/2002WO2002103089A2 Heating of an effusion cell for molecular beam epitaxy
12/26/2002US20020198112 High temperature superconductor ceramics and sintering products of interaction with silicone material
12/26/2002US20020197841 Group III nitride compound semiconductor element and method for producing the same
12/26/2002US20020197501 Palladium layer has desired in-plane and out-of-plane crystallographic orientations, which allow subsequent layers that are applied on the article to also have the desired orientations; high temperature superconductivity
12/26/2002US20020197489 Silicon, a buffer layer, template layer comprises a perovskite oxide
12/26/2002US20020197418 Molecular beam epitaxy effusion cell for use in vacuum thin film deposition and a method therefor
12/26/2002US20020195057 Apparatus for fabricating semiconductor structures and method of forming the same
12/24/2002US6498113 Free standing substrates by laser-induced decoherency and regrowth
12/24/2002US6497829 Heating doped silicon and carbon while subjecting to a vacuum, to vaporize and diffuse the silicon and to react the silicon vapor with the carbon in the binder
12/24/2002US6497764 Method for growing SiC single crystals
12/19/2002US20020192508 Method of fabricating improved buffer architecture for biaxially textured structures
12/19/2002US20020189536 Silicon carbide single crystal and production thereof
12/19/2002US20020189535 Method for manufacturing semiconductor crystal film
12/19/2002US20020189534 GaN selective growth on SiC substrates by ammonia-source MBE
12/19/2002US20020189533 Superconductor incorporating therein superconductivity epitaxial thin film and manufacturing method thereof
12/19/2002US20020189532 Oxygen doping method to gallium nitride single crystal substrate and oxygen-doped N-type gallium nitride freestanding single crystal substrate
12/18/2002EP1267408A2 Composite integrated circuit and its fabrication method
12/18/2002EP1266958A1 Bio-chip substrate for the embedding of DNA or protein and its fabrication method
12/12/2002WO2002099168A1 Biaxially textured metal substrate with palladium layer
12/12/2002WO2002083975A9 Apparatus and method for epitaxial sputter deposition of epilayers and high quality films
12/12/2002WO2002047119A3 High temperature superconducting thick films
12/12/2002US20020187356 Reducing stresses; noncracking; semiconductor
12/12/2002DE10125912A1 Production of a semiconductor layer on a crystalline substrate by molecular beam epitaxy used in the semiconductor industry comprises growing at a specified temperature using a vicinal substrate having a predetermined mis-orientation
12/11/2002EP1264011A1 Iii-v nitride substrate boule and method of making and using the same
12/11/2002CN1384892A Method and apparatus for growing silicon carbice crystals
12/05/2002WO2002097174A1 PRODUCTION METHOD OF α-SIC WAFER
12/05/2002WO2002097173A2 Semi-insulating silicon carbide without vanadium domination
12/05/2002WO2002097172A2 Molecular beam epitaxy equipment
12/05/2002US20020182889 Free standing substrates by laser-induced decoherency and regrowth
12/05/2002US20020182885 Lithium fluoride from lithium carbonate; simple multistep conversion; industrial scale
12/05/2002US20020178999 Laminate articles on biaxially textured metal substrates
12/05/2002CA2446818A1 Semi-insulating silicon carbide without vanadium domination
12/04/2002CN2523768Y Ampoule for purifying and growing mono-crystal
12/04/2002CN1382842A Method and equipment for growing monocrystal of cadmium selenide by gas-phase vertical pulling
12/03/2002US6489587 Fabrication method of erbium-doped silicon nano-size dots
12/03/2002US6488908 Spinel ferrite thin film and method of manufacturing the same
11/2002
11/28/2002WO2002095084A1 Process and apparatus for producing crystalline thin film buffer layers and structures having biaxial texture
11/28/2002US20020177328 Substrate for semiconductor device and method of manufacturing the same
11/27/2002EP1259662A1 Method and apparatus for growing low defect density silicon carbide and resulting material
11/26/2002US6485565 Process and apparatus for making oriented crystal layers
11/21/2002WO2002093664A2 Cesium dispensers and process for the use thereof
11/21/2002WO2002093618A2 Semiconductor structure including low-leakage, high crystalline dielectric
11/21/2002WO2002092886A1 High-resistivity silicon carbide substrate for semiconductor devices with high breakdown voltage
11/21/2002US20020170491 Seed crystal holders and seed crystals for fabricating silicon carbide crystals and methods of fabricating silicon carbide crystals
11/21/2002US20020170490 Method and apparatus for growing aluminum nitride monocrystals
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