Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
10/2000
10/11/2000EP1043427A1 Semiconductor structure having a crystalline alkaline earth metal oxide interface between silicon and a single crystal oxide layer
10/11/2000EP1043426A1 Method for fabricating a semiconductor structure having a single atomic layer with alkaline earth metal metal, oxygen and silicon at the interface between a silicon substrate and a single crystal oxide layer
10/11/2000EP1042095A1 Substrates for superconductors
10/03/2000US6126744 Method and system for adjusting semiconductor processing equipment
10/03/2000CA2161487C Process for preparing a substrate for the deposition of a thin supercon ducting material layer
09/2000
09/27/2000EP1038996A1 Combinatorial molecular layer epitaxy device
09/27/2000EP1038057A1 Low vacuum vapor process for producing superconductor articles with epitaxial layers
09/27/2000EP1038056A1 A method of growing a buffer layer using molecular beam epitaxy
09/27/2000EP1038055A1 Method and apparatus for growing high purity single crystal silicon carbide
09/26/2000US6123768 Method for the preparation and doping of highly insulating monocrystalline gallium nitride thin films
09/21/2000WO2000055398A1 Method of crystal growth, method of forming fine semiconductor structure, semiconductor device, and system
09/21/2000WO2000022195A3 Production of bulk single crystals of silicon carbide
09/20/2000EP1037268A1 METHOD FOR SYNTHESIZING SINGLE CRYSTAL AlN THIN FILMS OF LOW RESISTANT n-TYPE AND LOW RESISTANT p-TYPE
09/20/2000EP1036863A1 Method for synthesizing n-type diamond having low resistance
09/13/2000EP1034324A1 Low vacuum vapor process for producing epitaxial layers
09/06/2000EP1032727A1 Thin films having a rock-salt-like structure deposited on amorphous surfaces
09/05/2000US6113692 Apparatus and process for the formation of monocrystalline silicon carbide (SiC) on a nucleus
09/05/2000US6113690 Method of preparing crystalline alkaline earth metal oxides on a Si substrate
08/2000
08/29/2000US6110279 Forming cubic silicon carbide single-crystal layer, which functions as seed crystal, on silicon single-crystal substrate; forming alpha-type single-crystal silicon carbide on cubic silicon carbide single-crystal layer by sublimation
08/24/2000WO2000049207A1 Method for growing an $g(a)-sic volume single crystal
08/24/2000WO2000048725A1 Method for preparation of libraries using a combinatorial molecular beam epitaxy (combe) apparatus
08/22/2000US6106616 Layer crystal structure oxide, production method thereof, and memory element using the same
08/15/2000US6103023 Thin films of quasicrystalline alloys, their preparation and their uses
08/09/2000EP1026290A1 Method and apparatus for producing silicon carbide single crystal
08/08/2000US6099917 Pretreatment of oxide substrates and radiation reactive n2+ ion beams on oxide substrates
08/08/2000US6099640 Molecular beam epitaxial growth method
08/01/2000US6096434 The conductive oxide thin film is an epitaxial film composed of strontium ruthenate formed on silicon substrate
07/2000
07/25/2000US6093242 Anisotropy-based crystalline oxide-on-semiconductor material
07/20/2000WO2000041808A1 Carbide and oxycarbide based compositions and nanorods
07/20/2000CA2359336A1 Carbide and oxycarbide based compositions and nanorods
07/19/2000EP1020898A2 Semiconductor crystal, fabrication method thereof, and semiconductor device
07/19/2000EP1019568A1 Apparatus and process for crystal growth
07/19/2000CN1260594A Semiconductor crystal, its producing method and semiconductor device
07/13/2000WO2000022204A3 Simulated diamond gemstones formed of aluminum nitride and aluminum nitride:silicon carbide alloys
07/06/2000WO2000039372A1 Method for growing single crystal of silicon carbide
07/06/2000WO2000039371A1 Method of manufacturing single-crystal silicon carbide
07/04/2000US6083884 A-axis high temperature superconducting films with preferential in-plane alignment
06/2000
06/29/2000DE19859429A1 Verfahren zur Herstellung epitaktischer Silizium-Germaniumschichten Process for the preparation of epitaxial silicon-germanium layers
06/28/2000EP1014431A2 Method of fabricating epitaxial silicon-germanium layers
06/28/2000EP0819187B1 Process for growing an epitaxial film on an oxide surface and product
06/22/2000CA2293060A1 Process for producing epitactic-silicon germanium layers
06/20/2000US6077344 Sol-gel deposition of buffer layers on biaxially textured metal substances
06/14/2000EP1007770A2 Molecular beam epitaxy effusion cell
06/14/2000CN2382726Y Crystallizing room of adjustable vapour phase diffusion for protein crystal growth
06/13/2000US6074990 Superconducting garnet thin film system
06/13/2000US6074768 Process for forming the oxide superconductor thin film and laminate of the oxide superconductor thin films
06/13/2000US6074485 Crystal growth observing apparatus using a scanning tunneling microscope
06/08/2000WO2000033388A1 METHOD OF PRODUCING DEVICE QUALITY (Al)InGaP ALLOYS ON LATTICE-MISMATCHED SUBSTRATES
06/07/2000EP1005639A1 Apparatus and method for in-situ thickness and stoichiometry measurement of thin films
06/06/2000US6071338 Method for crystal growth of multi-element oxide thin film containing bismuth as constituent element
05/2000
05/31/2000CN1255170A Process of diamond growth from C70
05/31/2000CN1254770A Enclosing method of ampoule for growing crystal by sublimation method
05/25/2000DE19852585A1 Manufacture method of manometer thick wire or network, or cluster on substrate surface for opto-electronic components
05/24/2000EP1002140A1 A phosphorus effusion cell for producing molecular beams to be deposited on a substrate
05/16/2000US6063201 Effusion cell assembly for epitaxial apparatus
05/16/2000US6063185 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride: silicon carbide alloy
05/10/2000EP0830218A4 Structures having enhanced biaxial texture and method of fabricating same
05/02/2000US6057557 Semiconductor substrate semiconductor device and liquid crystal display device
05/02/2000US6056820 Advanced physical vapor transport method and apparatus for growing high purity single crystal silicon carbide
04/2000
04/25/2000US6053981 Effusion cell and method of use in molecular beam epitaxy
04/20/2000WO2000022204A2 Simulated diamond gemstones formed of aluminum nitride and aluminum nitride:silicon carbide alloys
04/20/2000WO2000022203A2 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride:silicon carbide alloy
04/20/2000WO2000022202A1 p-TYPE ZnO SINGLE CRYSTAL AND METHOD FOR PRODUCING THE SAME
04/20/2000WO2000022195A2 Production of bulk single crystals of silicon carbide
04/12/2000EP0993027A1 Method for manufacturing compound semiconductors
04/11/2000US6048813 Simulated diamond gemstones formed of aluminum nitride and aluminum nitride: silicon carbide alloys
04/11/2000US6048398 Device for epitaxially growing objects
04/04/2000US6045613 Production of bulk single crystals of silicon carbide
03/2000
03/28/2000US6043141 Forming a lattice comprising hg and a group vi material wherein a cation-rich condition is established at the surface; generating an elemental group v flux by evaporating an elemental group v material
03/23/2000WO2000015884A1 Combinatorial molecular layer epitaxy device
03/23/2000WO2000015883A1 Effusion cell and method of use in molecular beam epitaxy
03/14/2000US6036774 Method of producing metal oxide nanorods
03/09/2000WO2000012784A1 Method for producing a defect-free monocrystalline silicon carbide layer
03/09/2000DE19842109A1 Apparatus for growing silicon carbide monocrystals comprises shielding element which is movable along the axis of symmetry of the apparatus for adjustment of a local temperature field
03/09/2000DE19838945A1 Verfahren zur Herstellung einer defektarmen, einkristallinen Silizium-Carbid-Schicht A process for preparing a low-defect, monocrystalline silicon carbide layer
03/08/2000CN1050158C Method and apparatus for treating surface
03/07/2000US6033783 Ultrafine Al particle and production method thereof
03/07/2000US6033471 Metallic thin flim and method of manufacturing the same, and surface acoustic wave device using the metallic thin film and the method thereof
03/07/2000US6032611 Apparatus for forming single-crystalline thin film by beam irradiator and beam reflecting device
03/02/2000DE19839363A1 Composition graded material film, especially digital graded molecular beam epitaxy or chemical vapor deposition semiconductor film, is deposited by subdividing the film depth profile into regions of homogeneous preselected composition
02/2000
02/29/2000US6030458 Cell for providing pure phosphorus vapor from solid phosphorus, where vacuum jacket encloses and supports an inner compartment containing a red phosphorus crucible, a condensing crucible for white phosphorus, a heater, a cracking tube
02/23/2000CN1245540A Method for preparation of metal intercalated fullerene-like metal chalcogenides
02/22/2000US6027564 Placing a crystallographically oriented target surface of a substrate, including contaminant materials in high pressure and heating the substrate surface to greater than the threshold temperature for forming epitaxial layer
02/17/2000WO2000008691A1 Zinc oxide films containing p-type dopant and process for preparing same
02/16/2000EP0979319A1 Method of making a low resistivity silicon carbide boule
02/15/2000US6025289 Single crystals doped with nitrogen and aluminum; synthetic gemstones having extraordinary toughness and hardness, and brilliance meeting or exceeding that of diamond
02/08/2000US6023082 Strain-based control of crystal anisotropy for perovskite oxides on semiconductor-based material
02/08/2000US6022832 Low vacuum vapor process for producing superconductor articles with epitaxial layers
02/08/2000US6022458 Method of production of a semiconductor substrate
02/08/2000US6022410 Molecular beam epitaxy chamber
01/2000
01/27/2000WO2000004212A1 Method and device for producing at least one silicon carbide monocrystal
01/27/2000WO2000004211A1 METHOD FOR GROWING SiC MONOCRYSTALS
01/20/2000DE19917601A1 Silicon carbide single crystal production apparatus comprises a crucible with one or more heat flux control inserts of non-reactive vitreous carbon
01/20/2000DE19833755A1 Multiple silicon carbide single crystal growth apparatus has a common reaction chamber with seed crystal holders arranged above one another to provide reproducible growth conditions and controlled growth rates
01/20/2000DE19827198A1 Single crystal aluminum nitride layers, useful as high frequency SAW filters and buffer layers for electronic and optoelectronics component deposition, are grown on silicon using silicon surface construction and reconstruction steps
01/18/2000US6015459 Method for doping semiconductor materials
01/13/2000WO2000002240A1 METHOD FOR SYNTHESIZING SINGLE CRYSTAL AlN THIN FILMS OF LOW RESISTANT n-TYPE AND LOW RESISTANT p-TYPE
01/13/2000WO2000001867A1 Method for synthesizing n-type diamond having low resistance
01/11/2000US6013130 Process and device for the production of epitaxial layers
01/11/2000US6013129 Production of heavily-doped silicon
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