Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
11/2001
11/28/2001EP1158077A1 Method and apparatus for producing single crystal of silicon carbide
11/21/2001EP1155171A1 Method for growing an $g(a)-sic volume single crystal
11/21/2001EP0979319B1 Method of making a low resistivity silicon carbide boule
11/14/2001EP1154049A1 Method of manufacturing single-crystal silicon carbide
11/14/2001EP1152827A1 Carbide and oxycarbide based compositions and nanorods
11/13/2001US6316098 Molecular layer epitaxy method and compositions
11/06/2001US6313016 Method for producing epitaxial silicon germanium layers
11/06/2001US6313015 Growth method for silicon nanowires and nanoparticle chains from silicon monoxide
11/01/2001WO2001082347A1 Method of manufacturing group-iii nitride compound semiconductor device
11/01/2001US20010036214 Method and apparatus for in-situ deposition of epitaxial thin film of high-temperature superconductors and other complex oxides under high-pressure
10/2001
10/31/2001DE10119216A1 Verfahren zur Ausformung eines Halbleiterfilms vom Typ P und eine dieses nutzende lichtemittierende Vorrichtung Method for forming a semiconductor film of type P and a this-use light emitting device
10/30/2001US6309460 Hazardous containment for MBE maintenance
10/25/2001US20010034115 Method for forming p-type semiconductor film and light emitting device using the same
10/18/2001US20010031385 Group III-V compound semiconductor and method of producing the same
10/18/2001US20010029884 Method for producing a single-crystalline film
10/18/2001DE10115937A1 Verdampfer zum Erzeugen von Speisegas für eine Lichtbogenkammer Evaporator for generating feed gas for an arc chamber
10/17/2001EP1144737A2 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride:silicon carbide alloy
10/17/2001CN1317875A Thin film electrode and surface sonic wave device utilizing same
10/16/2001US6303094 Wherein silicon atoms are removed from a sic crystal by heating said sic crystal in a vacuum at a temperature ranging from 1200 to 2200 degrees c.
10/11/2001WO2001011428A8 Superconductor articles, compositions, and methods for making same
10/11/2001US20010028034 Process for preparing a bolometer material and bolometer device
10/10/2001EP1143493A2 Sublimation growth of silicon carbide crystals
10/10/2001CN1317155A Zinc oxide films containing P-type dopant and process for preparing same
10/04/2001WO2001072104A1 Method for the production of silicon carbide (sic) layers by means of ionic implantation of carbon and anneals
10/04/2001US20010027167 By applying RF power to a substrate holder and irradiating positive ions having a moderate energy while preventing damage to the strained lattice film to be stacked by oxygen negative ions; good crystalline property
10/04/2001DE10114029A1 III-V-Halbleiter und Verfahren zu seiner Herstellung III-V semiconductors and process for its preparation
10/02/2001US6296956 Vapor deposition of aluminum nitride forming single crystals
10/02/2001US6296701 Method of depositing an electrically conductive oxide film on a textured metallic substrate and articles formed therefrom
09/2001
09/27/2001WO2000022203A3 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride:silicon carbide alloy
09/27/2001US20010024885 Substrate for semiconductor device and method of manufacturing the same
09/27/2001US20010023945 Semi-insulating silicon carbide without vanadium domination
09/27/2001US20010023660 Method for fabricating a semiconductor structure having a crystalline alkaline earth metal oxide interface with silicon
09/27/2001EP1144737A3 Production of bulk single crystals of aluminum nitride, silicon carbide and aluminum nitride:silicon carbide alloy
09/20/2001WO2001068957A1 Large size single crystal seed crystal fabrication by intergrowth of tiled seed crystals
09/20/2001WO2001068955A1 Iii-v nitride substrate boule and method of making and using the same
09/20/2001WO2001068954A2 Axial gradient transport apparatus and process
09/20/2001WO2001008231A9 Methods of making a superconductor
09/19/2001EP0781355B1 Epitaxially layered structure
09/18/2001US6291319 Method for fabricating a semiconductor structure having a stable crystalline interface with silicon
09/18/2001US6291318 Growth of GaN on sapphire with MSE grown buffer layer
09/18/2001US6291085 Zinc oxide films containing P-type dopant and process for preparing same
09/11/2001US6287710 Generic process for preparing a crystalline oxide upon a group IV semiconductor substrate and a crystalline oxide-on-semiconductor structure
09/11/2001US6287645 Ablation material from target onto substrate; hetaing
09/07/2001WO2001065590A2 Esrf source for ion plating epitaxial deposition
09/06/2001US20010019750 Vapor deposition; molecular beam epitaxial
09/06/2001US20010019132 Semi-insulating silicon carbide without vanadium domination
09/05/2001EP1130137A1 Material for raising single crystal sic and method of preparing single crystal sic
09/05/2001EP1129238A2 Production of bulk single crystals of silicon carbide
09/05/2001EP0845055B1 SEED CRYSTAL FOR GROWING MONOCRYSTALS, USE OF THE SEED CRYSTAL AND PROCESS FOR PRODUCING SiC MONOCRYSTALS OR MONOCRYSTALLINE SiC LAYERS
08/2001
08/30/2001WO2001063020A1 Method and apparatus for growing low defect density silicon carbide and resulting material
08/30/2001WO2001008231A3 Methods of making a superconductor
08/30/2001US20010017374 Semi-insulating silicon carbide without vanadium domination
08/30/2001US20010017257 Method for fabricating ZnO thin film for ultraviolet detection and emission source operated at room temperature, and apparatus therefor
08/29/2001EP1127961A1 Pyrolytic boron nitride double container and manufacture thereof
08/28/2001US6281099 Method for synthesizing single crystal AIN thin films of low resistivity n-type and low resistivity p-type
08/28/2001US6280580 Method for manufacturing a double-sided high-temperature superconducting oxide thin film having large area
08/23/2001US20010015169 Method for growing SiC single crystals
08/22/2001CN1309729A Method for growing SiC monocrystals
08/16/2001WO2001059186A1 Processing line having means to monitor crystallographic orientation
08/16/2001US20010013313 Apparatus for fabricating semiconductor structures and method of forming the structures
08/16/2001US20010013311 Epitaxial compound structure and device comprising same
08/16/2001EP1123993A2 Single crystal SiC and method of growing the same
08/15/2001CN1308690A Method and device for producing at least one silicon carbide monocrystal
08/14/2001US6274206 Method of coating a silicon or silicide substrate
08/09/2001WO2000071787A3 Semi-insulating silicon carbide without vanadium domination
08/09/2001US20010011519 Single crystal SiC and a method of growing the same
08/07/2001US6270908 Rare earth zirconium oxide buffer layers on metal substrates
08/07/2001US6270574 Method of growing a buffer layer using molecular beam epitaxy
08/07/2001US6270573 Growing silicon carbide thin film via molecular beam epitaxy (mbe) on hexagonal crystal using an off-cut inclined surface prevents occurrence of twin; substrate crystal layers each have different stacked crystal systems; semiconductors
08/02/2001WO2001055472A2 Method and apparatus for in-situ deposition of epitaxial thin film of high-temperature superconductors and other complex oxides under high-pressure
08/02/2001US20010010203 Molecular beam source and molecular beam epitaxy apparatus
08/01/2001EP1119653A2 Simulated diamond gemstones formed of aluminum nitride and aluminum nitride:silicon carbide alloys
07/2001
07/19/2001WO2001051201A1 Carbide- and oxycarbide-based compositions, rigid porous structures including the same, and methods of making and using the same
07/19/2001WO2001051160A1 Ultra-low temperature effusion cell
07/19/2001CA2396922A1 Carbide- and oxycarbide-based compositions, rigid porous structures including the same, and methods of making and using the same
07/18/2001EP1115919A1 Effusion cell and method of use in molecular beam epitaxy
07/18/2001CN1303959A Indium-doped barium-titanate material and its preparation method
07/18/2001CN1303958A Indium-doped strontium titanate material and its preparation method
07/17/2001US6261704 MgO buffer layers on rolled nickel or copper as superconductor substrates
07/17/2001US6261363 Technique for growing silicon carbide monocrystals
07/12/2001WO2000041808A9 Carbide and oxycarbide based compositions and nanorods
07/11/2001EP0865518B1 A device for heat treatment of objects
07/11/2001CN1303131A Basis substrate for crystal growth and method for making substrate using same
07/10/2001US6258459 Multilayer thin film
07/05/2001WO2001048277A1 Method and apparatus for producing single crystal of silicon carbide
07/05/2001DE19960823A1 Semiconductor wafer has a rear side and a front side with an epitaxial layer having a specified maximum density of scattered light centers
07/05/2001DE10055694A1 Strip-like nickel metal substrate used in the production of a high temperature superconductor consists of very pure nickel which is textured
07/04/2001EP0956381B1 Apparatus for growing large silicon carbide single crystals
06/2001
06/28/2001WO2001046500A1 SiC SINGLE CRYSTAL AND METHOD FOR GROWING THE SAME
06/28/2001WO2000079570A3 Silicon carbide epitaxial layers grown on substrates offcut towards <1100>
06/28/2001US20010004877 Method and apparatus for producing silicon carbide single crystal
06/28/2001US20010004875 Device and method for producing at least one SiC single crystal
06/27/2001EP0948672B1 Apparatus for growing silicon carbide crystals
06/27/2001CN1301038A Manufacture of semiconductor structure with steady crystalizing interface with silicon
06/21/2001WO1998005807A8 CaTiO3 INTERFACIAL TEMPLATE STRUCTURE ON SUPERCONDUCTOR
06/20/2001EP1108805A1 Method for fabricating a semiconductor structure having a stable crystalline interface with silicon
06/19/2001US6248459 Semiconductor structure having a crystalline alkaline earth metal oxide interface with silicon
06/14/2001WO2001043165A2 Oxide films containing p-type dopant and process for preparing same
06/13/2001EP1105555A1 METHOD FOR GROWING SiC MONOCRYSTALS
06/13/2001DE10051632A1 Substrate for crystal growth, has base on which crystal system containing separate crystals which are different from epitaxial crystal layer, and epitaxial crystal layer having island-like crystals, are formed
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