Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
07/2004
07/22/2004US20040140535 Semiconductor device, method of forming epitaxial film, and laser ablation device
07/22/2004CA2508883A1 Method and apparatus for producing large, single crystals of aluminum nitride
07/21/2004EP1438443A1 Method and apparatus for sputter deposition of epilayers with high deposition rate
07/21/2004EP1438442A1 Dual-source, single-chamber method and apparatus for sputter deposition
07/21/2004CN1514469A Crystal mask, amorphous silicon crystallization method and method of manufacturing array base plate using same
07/20/2004US6765151 Enhanced high temperature coated superconductors
07/15/2004US20040134418 SiC substrate and method of manufacturing the same
07/15/2004US20040134417 Mask for crystallizing, method of crystallizing amorphous silicon and method of manufacturing array substrate using the same
07/15/2004US20040134416 Production method of opto-electronic device array
07/14/2004EP1436448A1 Low temperature epitaxial growth of quaternary wide bandgap semiconductors
07/08/2004WO2004057631A2 Reduction of dislocation pile-up formation during relaxed lattice-mismatched epitaxy
07/08/2004WO2004019392A3 Mbe growth of a semiconductor layer structure
07/08/2004US20040132242 Method for the production of one-dimensional nanostructures and nanostructures obtained according to said method
07/08/2004US20040131537 Multilayer ribbon; epitaxial deposits; laser ablation
07/08/2004US20040129216 Molecular beam epitaxy equipment
07/08/2004DE10196294T5 Verfahren zur Herstellung von ultradünnen Schutzbeschichtungen Process for the preparation of ultra-thin protective coatings
07/07/2004EP1435091A1 Magnetic material structures, devices and methods
07/07/2004CN1511199A Metallic very thin film, metallic very thin film multilayer body, and method for manufacturing metallic very thin film or metallic very thin film laminate
07/01/2004WO2004055876A1 Method for preparation of ferroelectric single crystal film structure using deposition method
07/01/2004US20040127064 Production method for composite oxide thin film and device therefor and composite oxide film produced thereby
07/01/2004US20040124501 Bonding metallic substrates; reducing thickness
07/01/2004US20040123797 Spinel-structured metal oxide on a substrate and method of making same by molecular beam epitaxy
06/2004
06/30/2004CN1155995C Multilayered body, method for fabricating multilayered body and semiconductor device
06/29/2004US6756320 Gallium/gadolinium/arsenic oxides having low defect and current leakage; field effect transistors
06/29/2004US6756139 Buffer layers on metal alloy substrates for superconducting tapes
06/24/2004WO2004053965A1 Free standing substrates by laser-induced decoherency and regrowth
06/24/2004WO2004039731A3 Nanostructures produced by phase-separation during growth of (iii-v)1-x(iv2)x alloys
06/24/2004US20040119067 Gallium nitride materials and methods
06/23/2004CN1507506A High-resisting silicon carbide substrate for semiconductor devices with high breakdown voltage
06/22/2004US6753648 Cesium dispensers and process for the use thereof
06/17/2004WO2004051719A1 Mbe growth of p-type nitride semiconductor materials
06/17/2004WO2004051718A1 3-5 group compound semiconductor and method for preparation thereof
06/17/2004WO2004009492A3 Diamondoid-based components in nanoscale construction
06/17/2004US20040115941 Epitaxially coated semiconductor wafer and process for producing it
06/17/2004US20040115114 Crystals comprising single-walled carbon nanotubes
06/17/2004US20040112278 II-IV group or III-V compound based single crystal ferromagnetic compound and method for adjusting its ferromagnetic characteristics
06/15/2004US6750121 Apparatus and method for forming single crystalline nitride substrate using hydride vapor phase epitaxy and laser beam
06/15/2004US6749686 Crystal growth method of an oxide and multi-layered structure of oxides
06/15/2004US6749685 Silicon carbide sublimation systems and associated methods
06/10/2004WO2004048647A1 Topological crystal of transition metal chalcogenide and method of forming the same
06/10/2004WO2003054929B1 Method for depositing iii-v semiconductor layers on a non-iii-v substrate
06/10/2004US20040110003 Method for shaping a nanotube and a nanotube shaped thereby
06/10/2004US20040107895 Quartz thin film
06/08/2004US6747317 Semiconductor device
06/03/2004US20040105796 Tank for epitaxy installation and installation comprising such a tank
06/03/2004US20040104472 One atom in thickness; forms two-dimensionally continuous film; catalysts
06/03/2004US20040104384 Growth of high temperature, high power, high speed electronics
06/01/2004US6743503 Ultra-thin seed layer for multilayer superlattice magnetic recording media
06/01/2004US6743481 Process for production of ultrathin protective overcoats
05/2004
05/26/2004CN1500160A Method for mfg. ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device
05/25/2004CA2142307C Methods and apparati for producing fullerenes
05/21/2004WO2004042785A2 Functional bimorph composite nanotapes and methods of fabrication
05/21/2004WO2004042783A2 Hafnium nitride buffer layers for growth of gan on silicon
05/20/2004US20040097096 Method for fabricating semiconductor structures and devices on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process
05/20/2004US20040096707 Oxidation of nitride layer; forming oxide; high temperature superconductivity
05/20/2004US20040096692 Metal substrates; forming semiconductors; then dielectrics; reducing defects at interface
05/20/2004US20040096587 Epitaxial oxide films via nitride conversion
05/20/2004US20040094085 Process for preparing p-n junctions having a p-type ZnO film
05/19/2004EP1419542A2 Cesium dispensers and process for the use thereof
05/13/2004WO2004040047A1 Single crystal base thin film
05/13/2004WO2004040046A1 Method for forming thin film on basic material through intermediate layer
05/13/2004WO2004039731A2 Nanostructures produced by phase-separation during growth of (iii-v)1-x(iv2)x alloys
05/13/2004DE10248025A1 Schichtmaterial sowie Verfahren zur Verbesserung der Stromtragfähigkeit von Hochtemperatur-Supraleiter-Dünnschichten Layer material and method for improving the current carrying capacity of high-temperature superconducting thin films
05/11/2004US6734461 SiC wafer, SiC semiconductor device, and production method of SiC wafer
05/11/2004US6733895 ZnO film, method for manufacturing the same, and luminescent element including the same
05/06/2004EP1415012A1 Process and apparatus for producing crystalline thin film buffer layers and structures having biaxial texture
05/05/2004CN1494607A II-VI group or III-V group based single crystal ferromagnetic compound and method for adjusting its ferromagnetic characteristics
05/04/2004US6730164 Systems and methods for forming strontium- and/or barium-containing layers
04/2004
04/29/2004WO2004012227A3 Method for producing by vapour-phase epitaxy a gallium nitride film with low defect density
04/29/2004US20040079285 Automation of oxide material growth in molecular beam epitaxy systems
04/29/2004US20040079277 Method for forming suspended microstructures
04/28/2004EP1219731B1 FERROMAGNETIC p-TYPE SINGLE CRYSTAL ZINC OXIDE AND METHOD FOR PREPARATION THEREOF
04/28/2004CN1492940A Laminated film and method of forming film
04/22/2004US20040077177 Dielectric materials
04/22/2004US20040077165 Hafnium nitride buffer layers for growth of GaN on silicon
04/22/2004DE10296504T5 Ultradünner Metallfilm, ultradünner mehrschichtiger Metallfilm, und Verfahren zur Herstellung des ultradünnen Metallfilms oder ultradünnen, mehrschichtigen Metallfilms Ultra-thin metal film, ultra-thin metal multilayer film, and method of making the ultra-thin metal film or ultra-thin, multi-layered metal film
04/22/2004DE10248964A1 Production of aluminum nitride crystals comprises embedding an arrangement of heating elements in a highly pure aluminum nitride powder, heating in an atmosphere of nitrogen or a mixture of nitrogen and hydrogen, and further processing
04/21/2004EP1411152A2 Layered material and method for improving the current carrying capacity of high temperature superconductor thin films
04/20/2004US6723186 Method of manufacturing metallic film consisting of giant single crystal grains
04/20/2004US6723166 Seed crystal holder with lateral mount for an SiC seed crystal
04/15/2004WO2004019390A3 Mbe growth of an algan layer or algan multilayer structure
04/15/2004US20040072425 Mbe-method for production of a gallium manganese nitride ferromagnetic film
04/13/2004US6720240 Silicon based nanospheres and nanowires
04/13/2004US6719843 Powder metallurgy tungsten crucible for aluminum nitride crystal growth
04/13/2004US6718775 Dual chamber cooling system with cryogenic and non-cryogenic chambers for ultra high vacuum system
04/08/2004WO2004005593A3 Metal nano-objects, formed on semiconductor surfaces, and method for making said nano-objects
04/08/2004WO2003103031A3 Formation of lattice-tuning semiconductor substrates
04/08/2004WO2003097905A3 Formation of single-crystal silicon carbide
04/08/2004WO2003054929A3 Method for depositing iii-v semiconductor layers on a non-iii-v substrate
04/08/2004US20040067386 Laminated film and method forming film
04/07/2004EP1404904A1 PRODUCTION METHOD OF $g(a)-SIC WAFER
04/07/2004EP1200651B1 Seed crystal holder with a lateral border for an sic seed crystal
04/06/2004US6716796 Polycrystalline thin film and method of producing the same and oxide superconductor and method of producing the same
04/06/2004US6716795 Useful where an electronically active layer is deposited on the buffer layer
04/06/2004US6716724 Method of producing 3-5 group compound semiconductor and semiconductor element
04/06/2004US6716655 Group III nitride compound semiconductor element and method for producing the same
04/01/2004WO2004027122A1 Silicon carbide single crystal and method and apparatus for producing the same
04/01/2004US20040062708 Process for the synthesis of nanotubes of transition metal dichalcogenides
03/2004
03/31/2004EP1403911A2 Thin film device and its fabrication method
03/31/2004EP1119653B1 Simulated diamond gemstones formed of aluminum nitride and aluminum nitride:silicon carbide alloys
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