Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
06/2007
06/20/2007CN1322175C Preparation for r-Li ALO2 single-crystal thin-film covering layer substrate by pulsing laser deposition
06/19/2007US7232555 Alleviated cracking and improved utilization rate and cost effectiveness; preferably both of the principal faces of the wafer are mirror-polished and the peripheral edge is ground.
06/14/2007US20070134816 Atomic layer deposition using electron bombardment
06/14/2007US20070131161 Design and fabrication of 6.1-a family semiconductor devices using semi-insulating alsb substrate
06/14/2007US20070131160 Doped aluminum nitride crystals and methods of making them
06/14/2007US20070131159 Method for epitaxial growth with selectivity
06/13/2007EP1794254A2 Photonic crystal, conjugated polymers suitable for photonic crystals, and a method for synthesizing conjugated polymers
06/13/2007EP1214190A4 Silicon carbide epitaxial layers grown on substrates offcut towards 1100
06/12/2007US7230149 Method of using carbide and/or oxycarbide containing compositions
06/12/2007US7229498 Nanostructures produced by phase-separation during growth of (III-V)1-x(IV2)x alloys
06/07/2007WO2007063259A1 Large-capacity high-temperature effusion cell
06/06/2007CN1977070A Phosphorus effusion cell arrangement and method for producing molecular phosphorus
06/05/2007US7227066 Polycrystalline optoelectronic devices based on templating technique
05/2007
05/31/2007WO2007062250A2 Large aluminum nitride crystals with reduced defects and methods of making them
05/31/2007US20070120144 Semiconductor device having group III nitride buffer layer and growth layers
05/31/2007US20070119367 Method for producing silicon epitaxial wafer and silicon epitaxial wafer
05/30/2007CN1973359A Gallium oxide single crystal composite, process for producing the same, and process for producing nitride semiconductor film utilizing gallium oxide single crystal composite
05/30/2007CN1973064A One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer
05/24/2007US20070118936 Fine structure body, process for producing the same, and Raman spectroscopic method and apparatus
05/24/2007US20070117358 Epitaxy layer and method of forming the same
05/23/2007EP1786956A1 Seed and seedholder combinations for high quality growth of large silicon carbide single crystals
05/22/2007US7220313 Reducing nitrogen content in silicon carbide crystals by sublimation growth in a hydrogen-containing ambient
05/22/2007US7220312 Methods for treating semiconductor substrates
05/22/2007CA2331564C Magnetron sputter source for mbe apparatus
05/17/2007US20070107655 Sub-resolutional laser annealing mask
05/17/2007US20070107654 High-purity crystal growth
05/16/2007EP1784529A1 Manufacture of cadmium mercury telluride on patterned silicon
05/16/2007EP1784528A1 One hundred millimeter high purity semi-insulating single crystal silicon carbide wafer
05/16/2007CN1965111A Manufacture of cadmium mercury telluride
05/16/2007CN1963996A A method for orientation growth of VO2 film of pulse laser deposition Si base
05/16/2007CN1316076C Process for Li-N codoping growth P type ZnO crystal film
05/15/2007US7217322 Method of fabricating an epitaxial silicon-germanium layer and an integrated semiconductor device comprising an epitaxial arsenic in-situ doped silicon-germanium layer
05/10/2007US20070102709 P-type group ii-vi semiconductor compounds
05/10/2007US20070101931 Method for producing semiconductor crystal
05/10/2007US20070101930 Feature forming methods to reduce stacking fault nucleation sites
05/10/2007US20070101928 Method of forming a layer of silicon carbide on a silicon wafer
05/09/2007CN1958876A Monocrystal film of transparent electro-conductive oxide with structure of perovskite
05/08/2007US7215456 Method for patterning self-assembled colloidal photonic crystals and method for fabricating 3-dimensional photonic crystal waveguides of an inverted-opal structure using the patterning method
05/08/2007US7215411 Method of exposing wafer using scan-type exposure apparatus
05/08/2007US7214598 Formation of lattice-tuning semiconductor substrates
05/03/2007US20070095276 Synthesis of fibers of inorganic materials using low-melting metals
05/02/2007CN1313656C II-VI group or III-V group based single crystal ferromagnetic compound and method for adjusting its ferromagnetic characteristics
05/01/2007US7211146 Powder metallurgy crucible for aluminum nitride crystal growth
05/01/2007US7211143 Sacrificial template method of fabricating a nanotube
04/2007
04/26/2007US20070090341 Group i-vii semiconductor single crystal thin film and process for producing same
04/26/2007US20070089669 Apparatus and method for growth of a thin film
04/26/2007DE102005049932A1 Growth of silicon carbide-germanium-volume mixed crystals, comprises producing silicon-, carbon- and germanium gas phase from two source materials containing silicon, carbon and germanium by sublimation and evaporation
04/25/2007CN1312332C Oxide high-temperature superconductor and its production method
04/25/2007CN1312325C Method for developping monocrystalline iron nanometer thread on silicon substrate
04/24/2007US7208196 Oxidation of silicon nitride; overcoating metal substrate; high temperature superconductivity
04/18/2007CN1311518C Substrate for electronic apparatus, Method for producing substrate of electronic apparatus and electronic apparatus
04/12/2007WO2007040496A1 Silicon germanium semiconductive alloy and method of fabricating same
04/12/2007US20070079753 Method To Deposit Functionally Graded Dielectric Films Via Chemical Vapor Deposition Using Viscous Precursors
04/12/2007US20070079752 Coloured diamond
04/12/2007US20070079751 Inp single crystal, gaas single crystal, and method for production thereof
04/12/2007DE19960823B4 Verfahren zur Herstellung einer epitaxierten Halbleiterscheibe und deren Verwendung A process for producing an epitaxially coated semiconductor wafer, and the use thereof
04/11/2007EP1772539A1 Silicon carbide single crystal and single crystal wafer
04/11/2007CN1946868A Vacuum deposition method and sealed-type evaporation source apparatus for vacuum deposition
04/11/2007CN1309880C Metal strip for epitaxial coating and method for production thereof
04/05/2007WO2007037906A2 Methods for synthesis of metal nanowires
04/05/2007US20070077192 Tough diamonds and method of making thereof
04/05/2007US20070074652 Method for epitaxy with low thermal budget and use thereof
04/05/2007US20070074651 (Al, Ga, In) N-based compound semiconductor and method of fabricating the same
04/04/2007EP1769106A1 Phosphorus effusion cell arrangement and method for producing molecular phosphorus
04/04/2007CN1942610A Ultrahard diamonds and method of making thereof
04/03/2007US7199015 Rare earth-oxides, rare earth-nitrides, rare earth-phosphides and ternary alloys with silicon
03/2007
03/29/2007WO2007035570A2 Method for epitaxial growth of silicon carbide
03/29/2007US20070072320 Process for producing an epitalixal layer of galium nitride
03/29/2007US20070068450 Novel nitrogen semiconductor compound and device fabricated using the same
03/29/2007US20070068449 Growing method of SiC single crystal
03/28/2007EP1768181A1 Nitride semiconductor substrate, and method for working nitride semiconductor substrate
03/22/2007WO2007033312A2 Process for manufacture of super lattice using alternating high and low temperature layers to block parasitic current path
03/22/2007WO2007032180A1 Process for producing epitaxial wafer and epitaxial wafer produced therefrom
03/22/2007US20070062441 Method for epitaxial growth of silicon carbide
03/22/2007US20070062440 Gallium nitride crystal substrate and method of producing same
03/22/2007US20070062439 Temperature Control Method of Epitaxial Growth Apparatus
03/22/2007US20070062438 Epitaxially coated silicon wafer and method for producing epitaxially coated silicon wafers
03/20/2007US7192482 Seed and seedholder combinations for high quality growth of large silicon carbide single crystals
03/15/2007US20070059928 Methods for synthesis of metal nanowires
03/15/2007US20070057285 Wurtzite thin film, laminate containing wurtzite crystalline layer and their manufacturing methods
03/15/2007US20070056507 Sublimation chamber for phase controlled sublimation
03/15/2007US20070056506 Process for manufacture of super lattice using alternating high and low temperature layers to block parasitic current path
03/14/2007CN1304646C Preparation of beta-FeSi2 single crystal by pulsing laser method
03/13/2007US7189287 Atomic layer deposition using electron bombardment
03/08/2007WO2005122691A3 Crystal growth method and apparatus
03/08/2007US20070051302 Method of producing crystalline semiconductor material and method of fabricating semiconductor device
03/08/2007US20070051301 Method of manufacturing sic single crystal wafer
03/07/2007EP1215730B1 SiC WAFER, SiC SEMICONDUCTOR DEVICE AND PRODUCTION METHOD OF SiC WAFER
03/06/2007US7186295 Quartz thin film
03/01/2007DE102005041643A1 Semiconductor method for producing an isolated semiconductor substrate uses a masking layer with holes and an output layer
02/2007
02/28/2007EP1757717A1 Method to deposit ZnO-based crystalline layer and substrate for it
02/28/2007EP1595280B8 Buffer structure for heteroepitaxy on a silicon substrate
02/28/2007CN1922716A Vapor-phase growth method
02/28/2007CN1302564C Multi-layer structure, and actuator element, capacitive element and filter element using the same
02/27/2007US7182812 Direct synthesis of oxide nanostructures of low-melting metals
02/27/2007US7182810 Protein temperature evaporation-controlled crystallization device and method thereof
02/22/2007WO2007020092A1 A method of producing silicon carbide epitaxial layer
02/22/2007US20070042127 Film growth at low pressure mediated by liquid flux and induced by activated oxygen
02/21/2007EP1755154A1 Method and apparatus for manufacturing a zinc oxide thin film at low temperatures
02/21/2007CN2871563Y Sulfur-compound semiconductor single crystal device for preparing lead
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