Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
02/2007
02/20/2007US7179731 Hypercontacting
02/20/2007US7179667 Semiconductor base material and method of manufacturing the material
02/20/2007US7179329 Methods of hyperdoping semiconductor materials and hyperdoped semiconductor materials and devices
02/15/2007WO2007018555A2 Ultratough cvd single crystal diamond and three dimensional growth thereof
02/15/2007WO2007018216A1 ZnO CRYSTAL, METHOD FOR GROWING THE CRYSTAL, AND METHOD FOR MANUFACTURE OF LIGHT-EMITTING ELEMENT
02/15/2007WO2006097804B1 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy
02/15/2007WO2006091598A3 Effusion cell valve
02/15/2007US20070034145 Single crystal of silicon carbide, and method and apparatus for producing the same
02/15/2007US20070034144 Oxide crystal growth apparatus and fabrication method using the same
02/15/2007US20070034143 Crystal growth apparatus and method of producing a crystal
02/15/2007US20070034142 Methods of forming nanocrystals
02/13/2007US7175735 Method and apparatus for manufacturing coated conductor
02/13/2007US7175709 Epitaxy layer and method of forming the same
02/01/2007US20070022947 Process for preparing p-n junctions having a p-type ZnO film
02/01/2007US20070022946 Recovering purified water and potassium chloride from spent basic hydrogen peroxide
02/01/2007US20070022945 Methods of fabricating silicon carbide crystals
01/2007
01/30/2007US7169730 Modified carbide and oxycarbide containing catalysts and methods of making and using thereof
01/30/2007US7169619 Method for fabricating semiconductor structures on vicinal substrates using a low temperature, low pressure, alkaline earth metal-rich process
01/25/2007US20070020536 Laser beam pattern mask and crystallization method using the same
01/25/2007US20070020403 Process for producing extremely flat microcrystalline diamond thin film by laser ablation method
01/25/2007US20070017439 Method of fabricating orientation-controlled single-crystalline wire and method of fabricating transistor having the same
01/25/2007US20070017438 Method of forming dislocation-free strained thin films
01/24/2007EP1476900B1 Method for forming an oxide layer on a gaas-based semiconductor structure
01/24/2007EP0864537B1 Ferroelectric material, method of manufacturing the same, semiconductor memory, and method of manufacturing the same
01/24/2007CN1901222A Method and apparatus for epitaxially coating semiconductor wafer, and coated semiconductor wafer
01/24/2007CN1296969C Method of forming semiconductor device
01/18/2007WO2007008726A2 Use of surfactants to control unintentional dopant in semiconductors
01/18/2007WO2007008606A1 Method and system for deposition tuning in an epitaxial film growth apparatus
01/18/2007WO2006097804A3 System and process for high-density,low-energy plasma enhanced vapor phase epitaxy
01/18/2007US20070012241 Methods of assessing the temperature of semiconductor wafer substrates within deposition apparatuses
01/18/2007US20070012240 Light emitting diode with at least two light emitting zones and method for manufacture
01/17/2007CN1896344A Method for doping oxygen to gallium nitride crystal and oxygen-doped n-type gallium nitride single crystal substrate
01/11/2007WO2007005438A2 Apparatuses and methods for detecting defects in semiconductor workpieces
01/11/2007WO2006041660A3 100 mm silicon carbide wafer with low micropipe density
01/11/2007US20070006802 N-type bulk single crystal zinc oxide
01/11/2007US20070006801 Use of surfactants to control unintentional dopant in semiconductors
01/11/2007US20070006800 Methods of selectively forming an epitaxial semiconductor layer using ultra high vacuum chemical vapor deposition technique and batch-type ultra high vacuum chemical vapor deposition apparatus used therein
01/11/2007US20070006799 Silicon wafer support fixture with roughended surface
01/11/2007US20070006798 Systems and methods for forming strontium-and/or barium-containing layers
01/11/2007DE102005031692A1 New high ohmic silicon carbide single crystals, useful as substrates in semiconductor components, have controlled, low content of sulfur as electrically active multiple donor component
01/10/2007EP1740742A1 Manufacture of cadmium mercury telluride
01/10/2007CN1894446A Large area, uniformly low dislocation density GaN substrate and process for making the same
01/10/2007CN1891866A Growth of colorless silicon carbide crystal
01/09/2007US7161173 P-type group II-VI semiconductor compounds
01/04/2007WO2007001343A2 Nanostructured fuel cell electrode
01/04/2007US20070000435 Method of manufacturing a wafer
01/04/2007US20070000434 Apparatuses and methods for detecting defects in semiconductor workpieces
01/04/2007US20070000433 III-nitride semiconductor device fabrication
01/04/2007US20070000432 Method for growth of silicon carbide single crystal, silicon carbide seed crystal, and silicon carbide single crystal
01/02/2007US7157287 Method of substrate surface treatment for RRAM thin film deposition
01/02/2007US7157067 Crystallization of a single crystal diamond grown by microwave plasma chemical vapor deposition; heat treatment; noncracking, nonfracturing; hardness
12/2006
12/28/2006WO2006137631A1 Fabrication method of gallium manganese nitride single crystal nanowire
12/28/2006WO2006111618A8 Source, an arrangement for installing a source, and a method for installing and removing a source
12/28/2006US20060288929 Polar surface preparation of nitride substrates
12/28/2006US20060288928 Perovskite-based thin film structures on miscut semiconductor substrates
12/27/2006EP1736760A2 Nanosensors
12/27/2006EP1736571A1 Method of manufacturing thin crystal films
12/27/2006EP1595280B1 Buffer structure for heteroepitaxy on a silicon substrate
12/27/2006CN1886533A Method for manufacturing diamond coatings
12/27/2006CN1292103C Process for preparing low-temperature phase barium metaborate monocrystalline film through magnetron sputtering
12/26/2006US7153362 System and method for real time deposition process control based on resulting product detection
12/26/2006US7153361 Production method of opto-electronic device array
12/21/2006WO2006135662A2 Perovskite-based thin film structures on miscut semiconductor substrates
12/21/2006US20060283380 Semiconductor device and method of manufacturing the same
12/20/2006CN1880521A Li-doped p-Zn1-xMgxO crystal film and method for preparing same
12/20/2006CN1291073C Growth of colorless silicon carbide crystals
12/19/2006US7151007 Doped organic semiconductor materials and process for their preparation
12/19/2006US7150911 Electrical insulating vapor grown carbon fiber and method for producing the same, and use thereof
12/19/2006US7150789 Atomic layer deposition methods
12/14/2006WO2005067524A3 Nanocrystal doped matrixes
12/14/2006US20060281322 Epitaxial semiconductor deposition methods and structures
12/14/2006US20060281283 Silicon epitaxial wafer, and silicon epitaxial wafer manufacturing method
12/13/2006EP1732129A2 High temperature evaporator cell and method of evaporating high-melting materials
12/13/2006EP1730072A2 Methods of forming alpha and beta tantalum films with controlled and new microstructures
12/13/2006CN1876899A Crucible for preparing crystal by high-temperature gas phase process and use method thereof
12/13/2006CN1289707C Titanium dioxide cobalt magnetic film and its manufacturing method
12/12/2006US7147715 Growth of ultra-high purity silicon carbide crystals in an ambient containing hydrogen
12/12/2006US7147714 Manufacturing method of silicon carbide single crystals
12/12/2006US7147713 Phase controlled sublimation
12/07/2006US20060272574 Methods for manufacturing integrated circuits
12/07/2006US20060272573 Damage evaluation method of compound semiconductor member, production method of compound semiconductor member, gallium nitride compound semiconductor member, and gallium nitride compound semiconductor membrane
12/07/2006US20060272572 Nitride semiconductor substrate and method of producing same
12/07/2006US20060272571 Shaped thermally stable polycrystalline material and associated methods of manufacture
12/06/2006CN1873061A Method for producing grain sizes even distributed antimony trioxide in single crystal type, and equipment
11/2006
11/30/2006WO2006127611A2 Colorless single-crystal cvd diamond at rapid growth rate
11/30/2006US20060270199 Process for producing high-purity silicon and apparatus
11/30/2006US20060266282 Variable temperature deposition methods
11/30/2006US20060266281 Manufacturing gallium nitride substrates by lateral overgrowth through masks and devices fabricated thereof
11/30/2006US20060266280 Semiconductor Devices Having Gallium Nitride Epilayers on Diamond Substrates
11/29/2006CN1871662A Silver selenide film stoichiometry and morphology control in sputter deposition
11/29/2006CN1870217A Method for controlling and removing fog-shaped micro-defect of silicon gas-phase epitaxial layer
11/28/2006US7141117 Method of fixing seed crystal and method of manufacturing single crystal using the same
11/23/2006WO2006124103A1 Method and apparatus for the production of silicon carbide crystals
11/23/2006US20060260538 Use of Cl2 and/or HCl during silicon epitaxial film formation
11/23/2006US20060260537 Wet pet food products and method for preparation
11/16/2006WO2006120401A1 A bulk, free-standing cubic iii-n substrate and a method for forming same
11/16/2006US20060254507 Silicon carbide single crystal and production thereof
11/16/2006US20060254506 Methods of depositing an elemental silicon-comprising material over a substrate
11/16/2006US20060254505 Method and apparatus for the production of silicon carbide crystals
11/16/2006US20060254504 Plating bath and surface treatment compositions for thin film deposition
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