Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
05/2008
05/13/2008US7371281 Silicon carbide single crystal and method and apparatus for producing the same
05/08/2008WO2008054240A1 Growth manipulator of a vacuum chamber used for growing semiconductor heterostructures
05/08/2008WO2008054239A1 Growth manipulator of a vacuum chamber used for growing semiconductor heterostructures
05/07/2008EP1918428A2 Crystalline metal film
05/07/2008CN101174667A Oxide films and process for preparing same
05/06/2008US7369758 Molecular beam source for use in accumulation of organic thin-films
05/06/2008US7368172 epitaxial growth on semiconductor while keeping conformity; increased polarization; thin layer of zirconium oxide and a layer having a simple perovskite structure; ferroelectric
04/2008
04/30/2008EP1916321A1 Crystal producing apparatus, crystal producing method, substrate producing method, gallium nitride crystal, and gallium nitride substrate
04/30/2008EP1915888A2 Method and composition for adhering materials together
04/29/2008US7364644 Silver selenide film stoichiometry and morphology control in sputter deposition
04/29/2008US7364617 Seed and seedholder combinations for high quality growth of large silicon carbide single crystals
04/24/2008WO2008048628A2 Aligned crystalline semiconducting film on a glass substrate and methods of making
04/24/2008WO2007130916A3 A method of ultra-shallow junction formation using si film alloyed with carbon
04/24/2008US20080092803 Patterned atomic layer epitaxy
04/22/2008US7361956 Semiconductor device having partially insulated field effect transistor (PiFET) and method of fabricating the same
04/22/2008US7361222 Device and method for producing single crystals by vapor deposition
04/22/2008US7361220 Method of manufacturing group III nitride single crystal, device used for the method and group III nitride single crystal obtained by the method
04/17/2008WO2008044744A1 Process for producing single crystal of silicon carbide
04/17/2008US20080090390 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080090386 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080090328 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080090327 Method for producing ZnTe system compound semiconductor single crystal, ZnTe system compound semiconductor single crystal, and semiconductor device
04/17/2008US20080090072 Aligned crystalline semiconducting film on a glass substrate and method of making
04/17/2008US20080089831 high carrier concentration and low resistivity
04/16/2008CN101163824A Method of and system for forming sic crystals having spatially uniform doping impurities
04/16/2008CN101163815A Source, an arrangement for installing a source, and a method for installing and removing a source
04/16/2008CN100382244C Buffer structure for modifying a silicon substrate
04/15/2008US7358159 Method for manufacturing ZnTe compound semiconductor single crystal ZnTe compound semiconductor single crystal, and semiconductor device
04/15/2008US7358112 Method of growing a semiconductor layer
04/15/2008US7357838 Relaxed silicon germanium substrate with low defect density
04/15/2008US7357837 GaN single crystal substrate and method of making the same
04/10/2008WO2008041728A1 Seed crystal fixing device
04/10/2008US20080083366 Micropipe-free silicon carbide and related method of manufacture
04/09/2008EP1154049B1 Method of manufacturing single-crystal silicon carbide
04/09/2008CN100380588C Preparation method of coating of gallium nitride
04/09/2008CN100379901C III-V nitride substrate boule and its manufacturing method and use
04/08/2008US7355216 Fluidic nanotubes and devices
04/08/2008US7354477 Method of growing GaN crystal, method of producing single crystal GaN substrate, and single crystal GaN substrate
04/03/2008WO2008037960A1 Valve assembly for effusion cell
04/03/2008WO2008037958A1 Effusion and cracking cell
04/01/2008US7351993 Rare earth-oxides, rare earth-nitrides, rare earth-phosphides and ternary alloys with silicon
04/01/2008US7351286 One hundred millimeter single crystal silicon carbide wafer
04/01/2008US7351285 Method and system for forming a variable thickness seed layer
03/2008
03/27/2008US20080072819 Metal oxide films
03/27/2008US20080072818 Growing a desired portion of the nanowire, growing a sacrificial portion of the nanowire that is doped differently than the desired portion, differentially removing the sacrificial portion, and removing a growth stub from the desired portion, especially by etching
03/25/2008CA2406347C Gan substrate, method of growing gan and method of producing gan substrate
03/20/2008US20080069755 Method for Manufacturing Polycrystalline Silicon, and Polycrystalline Silicon for Solar Cells Manufactured by the Method
03/19/2008CN201037164Y Source material evaporator
03/19/2008CN101144180A Automatic pressure control device for controlling gas pressure in vacuum growth camber
03/19/2008CN101144179A Device for single-crystal growth by physical gas phase transmission precipitation method
03/13/2008WO2007081492A9 High growth rate methods of producing high-quality diamonds
03/13/2008US20080060573 APPARATUS FOR FABRICATION OF GaN BULK SINGLE CRYSTAL AND FABRICATION METHOD OF GaN SINGLE CRYSTAL INGOT USING THE SAME
03/13/2008CA2662734A1 Process for depositing a thin film of a metal alloy on a substrate, and a metal alloy in thin-film form
03/12/2008EP1583858A4 Sacrificial template method of fabricating a nanotube
03/11/2008US7341929 Method to fabricate patterned strain-relaxed SiGe epitaxial with threading dislocation density control
03/11/2008US7341883 Silicon germanium semiconductive alloy and method of fabricating same
03/06/2008DE112006001204T5 Verfahren und Vorrichtung zum Erzeugen von Siliciumkarbidkristallen Method and apparatus for producing silicon carbide crystals
03/05/2008CN101135059A Method for preparing nano zinc oxide whisker
03/04/2008US7339219 Capacitance device including a perovskite film having (001) orientation
02/2008
02/28/2008US20080050894 Preparation method of a coating of gallium nitride
02/28/2008US20080048207 Preparation method of a coating of gallium nitride
02/27/2008EP1315682B1 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
02/27/2008CN100371509C ZnO nano crystal column/nano crystal filament composite structure product and its preparing process
02/26/2008US7335283 Production method for composite oxide thin film and device therefor and composite oxide film produced thereby
02/26/2008US7335259 Growth of single crystal nanowires
02/20/2008EP1889953A1 Process for producing silicon carbide single crystal
02/20/2008EP1888821A1 Low basal plane dislocation bulk grown sic wafers
02/20/2008CN101128911A System and process for high-density, low-energy plasma enhanced vapor phase epitaxy
02/19/2008US7332030 Method of treating a part in order to alter at least one of the properties thereof
02/14/2008WO2007081492A3 High growth rate methods of producing high-quality diamonds
02/14/2008US20080035052 Method for manufacturing a semiconductor substrate
02/13/2008EP1887109A2 Aluminum nitride single crystal
02/13/2008CN101122048A Epitaxy strontium lead titanate film with LiNiO2 cushioning layer
02/13/2008CN101121108A Vacuum processing apparatus
02/12/2008US7329317 Method for producing silicon wafer
02/12/2008CA2467174C Differential stress reduction in thin films
02/07/2008WO2007107757B1 Growth method using nanostructure compliant layers and hvpe for producing high quality compound semiconductor materials
02/07/2008US20080029021 Method for forming pecvd silicon nitride film
02/06/2008EP1883719A1 A bulk, free-standing cubic iii-n substrate and a method for forming same
02/06/2008CN100367509C High-resisting silicon carbide substrate for semiconductor devices with high breakdown voltage
02/05/2008US7326652 Atomic layer deposition using photo-enhanced bond reconfiguration
02/05/2008US7326293 Patterned atomic layer epitaxy
01/2008
01/31/2008US20080026234 Epitaxial oxide films via nitride conversion
01/31/2008US20080022925 Method for marking a crystalline material using cathodoluminescence
01/29/2008US7323764 Buffer structure for modifying a silicon substrate
01/29/2008US7323356 Growing a base thin film on a single-crystal substrate; depositing amorphous or polycrystalline LnCuOX thin film to form laminate; and annealing film at 500 degrees C. or more in a vacuum environment; light-emitting diodes, semiconductor leasers, filed-effect transistors, hetero-bipolar transistors
01/29/2008US7323249 Methods of obtaining photoactive coatings and/or anatase crystalline phase of titanium oxides and articles made thereby
01/29/2008US7323051 One hundred millimeter single crystal silicon carbide wafer
01/24/2008US20080020212 Seed crystal consisting of silicon carbide carbide single crystal and method for producing ingot using the same
01/24/2008US20080019897 Phosphorus Effusion Cell Arrangement and Method for Producing Molecular Phosphorus
01/24/2008US20080017101 Germanium Deposition
01/24/2008US20080017100 Method for fabricating single-crystal GaN based substrate
01/24/2008US20080017099 Crystal growth method and apparatus
01/23/2008EP1268882A4 Axial gradient transport apparatus and process for producing large size, single crystals of silicon carbide
01/17/2008WO2008008407A1 Wide bandgap semiconductor materials
01/17/2008US20080011224 Method for producing hexagonal boron nitride single crystal and hexagonal boron nitride single crystal
01/17/2008US20080011223 Solid solution wide bandgap semiconductor materials
01/16/2008CN101106092A Making method for IV-VI semiconductor single crystal film and the heterogeneous structure
01/10/2008WO2008004657A1 p-TYPE ZINC OXIDE THIN FILM AND METHOD FOR FORMING THE SAME
01/10/2008WO2007131040A3 Method and apparatus for photo-excitation of chemicals for atomic layer deposition of dielectric film
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