Patents for C30B 23 - Single-crystal growth by condensing evaporated or sublimed materials (5,192)
07/2010
07/22/2010DE102009004751A1 Thermisch isolierte Anordnung und Verfahren zur Herstellung eines SiC-Volumeneinkristalls Thermally insulated arrangement and method for manufacturing a SiC bulk single
07/21/2010EP2207910A1 Method for the production of semiconductor ribbons from a gaseous feedstock
07/20/2010CA2524581C Silicon carbide single crystal, silicon carbide substrate and manufacturing method for silicon carbide single crystal
07/15/2010US20100175614 Thermally insulated configuration and method for producing a bulk sic crystal
07/15/2010US20100175613 Base material for forming single crystal diamond film and method for producing single crystal diamond using the same
07/14/2010CN101775644A Manganese oxide epitaxial film with anisotropic magnetoresistivity and preparation method and application thereof
07/13/2010US7754180 Ultrahard diamonds and method of making thereof
07/13/2010US7754013 Apparatus and method for atomic layer deposition on substrates
07/13/2010US7754012 Apparatus for production of crystal of group III element nitride and process for producing crystal of group III element nitride
07/01/2010WO2010020224A3 Method for producing a material containing zinc oxide and a semiconductor element with a material containing zinc oxide
07/01/2010DE102009009614A1 Producing a silicon carbide volume single crystal, comprises producing silicon carbide growth gas phase in crystal growing area of culture crucible and growing-off the silicon carbide volume single crystal from the gas phase by deposition
07/01/2010DE102008063129A1 Herstellungsverfahren für einen codotierten SiC-Volumeneinkristall und hochohmiges SiC-Substrat Manufacturing method of a co-doped SiC bulk and high-resistance SiC substrate
07/01/2010DE102008063124A1 Producing a silicon carbide volume single crystal, comprises producing silicon carbide growth gas phase in crystal growing area of culture crucible and growing-off the silicon carbide volume single crystal from the gas phase by deposition
06/2010
06/30/2010EP2202329A1 Iii nitride structure and method for manufacturing iii nitride semiconductor fine columnar crystal
06/30/2010EP1443131B1 Oxide high-temperature superconductor and its production method
06/29/2010US7745854 Substrate for growing compound semiconductor and epitaxial growth method
06/24/2010US20100159182 Production Method for a Codoped Bulk SiC Crystal and High-Impedance SiC Substrate
06/23/2010EP2200071A1 GaN single crystal substrate and method of making the same using homoepitaxy
06/23/2010EP2199434A1 Method for forming microscopic structures on a substrate
06/23/2010EP2199433A1 Method for forming microscopic structures on a substrate
06/17/2010US20100147212 Monocrystalline silicon carbide ingot, monocrystalline silicon carbide wafer and method of manufacturing the same
06/17/2010US20100147211 -Nitride Single-Crystal Growth Method
06/17/2010US20100147209 Polycrystalline Germanium-Alloyed Silicon And A Method For The Production Thereof
06/16/2010CN201506852U Vertical furnace for growing mercuric iodide single crystals
06/10/2010US20100143748 Method for Growing Aluminum Nitride Crystal, Process for Producing Aluminum Nitride Crystal, and Aluminum Nitride Crystal
06/10/2010US20100140755 Rare-earth oxides, rare-earth nitrides, rare-earth phosphides and ternary alloys
06/10/2010US20100139555 Apparatus for crystal growth
06/10/2010US20100139552 Axial Gradient Transport Growth Process and Apparatus Utilizing Resistive Heating
06/09/2010CN1942610B Ultrahard diamonds and method of making thereof
06/09/2010CN101724906A Method for growing high-quality conductive silicon carbide crystal
06/09/2010CN101724894A Molecular beam epitaxy method for GaAS-based InAs1-xSbx/InSb multi-quantum-well film
06/09/2010CN101724893A Method for preparing high-purity semi-insulating silicon carbide crystalloid
06/08/2010US7732012 Deposition of high-purity polycrystalline silicon at a high temperature onto a white-heated seed rod in a closed reaction furnace by pyrolysis or hydrogen reduction of a starting silane gas
06/03/2010WO2010061214A1 Electrooptic crystal and device
06/03/2010US20100133585 Growth of germanium epitaxial thin film with negative photoconductance characteristics and photodiode using the same
06/02/2010EP2192211A1 Stable Power Devices on Low-Angle Off-Cut Silicon Carbide Crystals
06/02/2010CN1364321B Multi-layer articles and method of making same
06/02/2010CN101426965B Production of bulk single crystals of silicon carbide
06/02/2010CN101311295B Device for preparing single wall carbon nanotube film by arc-discharge method
06/01/2010CA2555582C Group i-vii semiconductor single crystal thin film and process for producing same
05/2010
05/27/2010US20100126411 METHODS FOR PRODUCING GaN NUTRIENT FOR AMMONOTHERMAL GROWTH
05/26/2010EP2190007A1 Single crystal thin film of organic semiconductor compound and method for producing the same
05/19/2010EP2186920A1 Arrangement and method for regulating a gas stream or the like
05/18/2010US7718001 Method for fabricating semiconductor epitaxial layers using metal islands
05/13/2010US20100119849 Sic epitaxial substrate and method for producing the same
05/12/2010EP1540048B1 Silicon carbide single crystal and method and apparatus for producing the same
05/11/2010US7713507 Tough diamonds and method of making thereof
05/11/2010US7713353 β-Ga2O3 single crystal growing method, thin-film single crystal growing method, Ga2O3 light-emitting device, and its manufacturing method
05/11/2010US7713352 Synthesis of fibers of inorganic materials using low-melting metals
05/06/2010DE102008043447A1 Single crystalline gold or palladium nanowire useful in electrical-, optical- or magnetic device or sensors, comprises a vertical or horizontal orientation to a surface of a single crystalline semi-conductive- or non-conductive substrate
05/05/2010EP2182100A2 High purity semi-insulating single crystal silicon carbide wafer
05/05/2010CN1871662B Silver selenide film stoichiometry and morphology control in sputter deposition
05/05/2010CN101701358A Method for preparing high-quality large silicon carbide single crystal and silicon carbide single crystal prepared by same
05/05/2010CN101027433B Seed and seedholder combinations for high quality growth of large silicon carbide single crystals
05/04/2010US7709826 Rare earth-oxides, rare earth-nitrides, rare earth-phosphies, and ternary alloys with silicon
04/2010
04/29/2010US20100102330 Nitride semiconductor device having oxygen-doped n-type gallium nitride freestanding single crystal substrate
04/29/2010US20100101486 Substrate for epitaxial growth and method for producing nitride compound semiconductor single crystal
04/28/2010CN101698962A Method for accurately controlling growth and characterization of components of quaternary semiconductor direct bandgap material
04/21/2010EP2177649A1 Method for growing group III nitride semiconductor crystal and growing device for group III nitride semiconductor crystal
04/21/2010CN101086963B Method of growing gallium nitride crystal
04/20/2010US7700167 Coating on a stator vane comprising a polymer matrix fiber composite having a melting point, glass transition temperature, or maximum exposure temperature that is < 150 degrees C.; polymer matrix fiber composite of metal nitrides, carbides, carboxynitrides has a melting point of > 150 degrees C.
04/15/2010WO2010041497A1 Method for forming sic single crystal
04/15/2010US20100089311 Seed crystal consisting of silicon carbide single crystal and method for producing ingot using the same
04/14/2010EP2175054A2 Substrate for growing wurtzite type crystal and method for manufacturing the same and semiconductor device
04/14/2010EP2173921A2 High temperature evaporator cell having parallel-connected heating zones
04/13/2010US7696073 Method of co-doping group 14 (4B) elements to produce ZnTe system compound semiconductor single crystal
04/13/2010US7695565 Sublimation chamber for phase controlled sublimation
04/08/2010US20100083897 Seed crystal consisting of silicon carbide single crysatal and method for producing ingot using the same
04/07/2010EP2171134A1 Fabrication of sic substrates with low warp and bow
04/07/2010CN101691670A Method for growing P-type zinc oxide film by using target doped with zinc phosphate
03/2010
03/31/2010CN201433250Y Crystal growing furnace
03/30/2010US7687798 Epitaxy with compliant layers of group-V species
03/25/2010US20100075175 Large-area seed for ammonothermal growth of bulk gallium nitride and method of manufacture
03/25/2010US20100075107 Hexagonal wurtzite single crystal and hexagonal wurtzite single crystal substrate
03/25/2010US20100074826 Method for manufacturing a single crystal of nitride by epitaxial growth on a substrate preventing growth on the edges of the substrate
03/24/2010CN101680115A Defect reduction in seeded aluminum nitride crystal growth
03/24/2010CN101680112A Guided diameter sic sublimation growth with multi-layer growth guide
03/24/2010CN101680109A Apparatus and method for manufacturing compound semiconductor single crystal
03/23/2010US7683457 Group I-VII semiconductor single crystal thin film and process for producing same
03/18/2010US20100068118 High-pressure vessel for growing group III nitride crystals and method of growing group III nitride crystals using high-pressure vessel and group III nitride crystal
03/16/2010US7678195 Seeded growth process for preparing aluminum nitride single crystals
03/16/2010CA2411606C Preparation method of a coating of gallium nitride
03/11/2010WO2010027292A1 Substrate carrier for molecular-beam epitaxy
03/10/2010CN201420112Y Grower of SiC monocrystals
03/10/2010CN100593591C Growth of colorless silicon carbide crystal
03/04/2010WO2010025153A1 Nitride crystal with removable surface layer and methods of manufacture
02/2010
02/25/2010WO2010020224A2 Method for producing a material containing zinc oxide and a semiconductor element with a material containing zinc oxide
02/25/2010WO2009148671A3 Method for preparing ultraflat, atomically perfect areas on large regions of a crystal surface by heteroepitaxy deposition
02/25/2010DE102008039183A1 Verfahren zum Herstellen eines zinkoxidhaltigen Materials und ein Halbleiterbauelement mit einem zinkoxidhaltigen Material A method for producing a zinc oxide-containing material and a semiconductor device with a zinc oxide-containing material
02/23/2010US7667298 Oxygen-doped n-type gallium nitride freestanding single crystal substrate
02/23/2010CA2351123C Gan selective growth on sic substrates by ammonia-source mbe
02/17/2010EP2152943A1 Apparatus for crystal growth
02/17/2010CN101649487A Vertical-type furnace for alpha-HgI2 single crystal growth and growth method of alpha-HgI2 single crystal
02/16/2010US7663157 silicon, sapphire, gallium arsenide, magnesium oxide, zinc oxide and silicon carbide
02/11/2010US20100031877 Sic single crystals with reduced dislocation density grown by step-wise periodic perturbation technique
02/09/2010US7659190 Method for producing a Group III-V compound semiconductor
02/04/2010US20100025696 Process for Producing a Silicon Carbide Substrate for Microelectric Applications
02/03/2010CN100587132C Method for doping oxygen to gallium nitride crystal and oxygen-doped n-type gallium nitride single crystal substrate
02/03/2010CN100587127C Surfactant method for preparing surface smooth high quality zinc oxide epitaxial film
02/02/2010US7655197 III-V nitride substrate boule and method of making and using the same
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