| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
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| 03/08/2007 | US20070051355 Brazed diamond tools and methods for making the same |
| 03/08/2007 | US20070051354 Brazed diamond tools and methods for making the same |
| 03/08/2007 | DE102006033919A1 Polierzusammensetzung und Polierverfahren Polishing composition and polishing method |
| 03/07/2007 | EP1760127A2 Polishing method |
| 03/07/2007 | EP1759811A1 Method of adhering polishing pads and jig for adhering the same |
| 03/07/2007 | EP1759810A1 Wafer polishing method and polished wafer |
| 03/07/2007 | EP1758962A1 Polishing method for glass substrate, and glass substrate |
| 03/07/2007 | EP1758711A1 Polishing apparatus and polishing method |
| 03/07/2007 | EP1365888B1 Projected gimbal point drive |
| 03/07/2007 | EP1360033B1 Abrasive article suitable for modifying a semiconductor wafer |
| 03/07/2007 | CN1926666A Polishing pad and method of manufacturing semiconductor device |
| 03/07/2007 | CN1923943A Polishing composition |
| 03/07/2007 | CN1923935A 抛光组合物及抛光方法 Polishing composition and polishing method |
| 03/07/2007 | CN1303655C Polishing method for base copper-layer |
| 03/06/2007 | US7186654 Chemical mechanical polishing slurry and method of manufacturing semiconductor device by using the same |
| 03/06/2007 | US7186651 Chemical mechanical polishing method and apparatus |
| 03/06/2007 | US7186629 Protecting thin semiconductor wafers during back-grinding in high-volume production |
| 03/06/2007 | US7186448 comprises liquid crystal compounds for fixing a pad for chemical mechanical polishing of semiconductor wafers |
| 03/06/2007 | US7186322 Methods of producing and polishing semiconductor device and polishing apparatus |
| 03/06/2007 | US7186168 Chemical mechanical polishing apparatus and methods for chemical mechanical polishing |
| 03/06/2007 | US7186166 Fiber embedded polishing pad |
| 03/06/2007 | US7186164 Processing pad assembly with zone control |
| 03/05/2007 | WO2007049566A1 Adhesive composition and adhesive film |
| 03/01/2007 | WO2007025226A1 Polishing pad and method for manufacturing polishing pads |
| 03/01/2007 | WO2007024807A2 Apparatus and methods for spectrum based monitoring of chemical mechanical polishing |
| 03/01/2007 | WO2007024464A1 Surface textured microporous polishing pads |
| 03/01/2007 | US20070050077 Chemical Mechanical Polishing Method and Apparatus |
| 03/01/2007 | US20070049180 Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion, chemical mechanical polishing process, and process for producing semiconductor devices |
| 03/01/2007 | US20070049169 Nonwoven polishing pads for chemical mechanical polishing |
| 03/01/2007 | US20070049168 Polishing pad, pad dressing evaluation method, and polishing apparatus |
| 03/01/2007 | US20070049166 Polishing method and polishing apparatus |
| 03/01/2007 | US20070045232 Wafer polishing method and polished wafer |
| 03/01/2007 | US20070044913 Grooved Retaining Ring |
| 02/28/2007 | EP1758154A1 Silicon wafer manufacturing method and silicon wafer |
| 02/28/2007 | EP1757665A1 Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion for a chemical mechanical polishing process, and process for producing semiconductor devices |
| 02/28/2007 | EP1757406A1 Abrasive cloth and method for preparing nano-fiber structure |
| 02/28/2007 | EP1756244A1 Cerium oxide abrasive and slurry containing the same |
| 02/28/2007 | EP1755826A2 Polishing pad |
| 02/28/2007 | CN1919955A Aqueous dispersion for chemical mechanical polishing, kit for preparing the aqueous dispersion, chemical mechanical polishing process, and process for producing semiconductor devices |
| 02/28/2007 | CN1302515C Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
| 02/27/2007 | US7183213 Chemical mechanical polishing pad and chemical mechanical polishing method |
| 02/27/2007 | US7183212 Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device |
| 02/27/2007 | US7183211 Process for chemical mechanical polishing of semiconductor substrate and aqueous dispersion for chemical mechanical polishing |
| 02/27/2007 | US7182882 Method of improving chemical mechanical polish endpoint signals by use of chemical additives |
| 02/27/2007 | US7182680 Apparatus for conditioning processing pads |
| 02/27/2007 | US7182670 CMP pad having a streamlined windowpane |
| 02/27/2007 | US7182669 Methods and systems for planarizing workpieces, e.g., microelectronic workpieces |
| 02/27/2007 | US7182668 Methods for analyzing and controlling performance parameters in mechanical and chemical-mechanical planarization of microelectronic substrates |
| 02/22/2007 | WO2007021414A1 Chemically modified polishing pad for chemical mechanical polishing |
| 02/22/2007 | WO2007020939A1 Polishing slurry |
| 02/22/2007 | WO2007020859A1 Substrate polishing apparatus and substrate polishing method |
| 02/22/2007 | WO2007001700A3 Polishing pad comprising magnetically sensitive particles and method for the use thereof |
| 02/22/2007 | US20070042693 Polishing pad and method of manufacture |
| 02/22/2007 | US20070042682 Transparent polishing pad |
| 02/21/2007 | EP1754571A1 Retaining ring in a carrier head for a chemical mechanical polishing system |
| 02/21/2007 | EP1281199B1 Metal chemical mechanical polishing process for minimizing dishing during semiconductor wafer fabrication |
| 02/21/2007 | CN1915598A Polishing pad and method of manufacture |
| 02/21/2007 | CN1915596A 透明抛光垫 Transparent polishing pad |
| 02/21/2007 | CN1301184C Optical grinding machine and method for processing sapphire crystal substrate for semiconductor use |
| 02/20/2007 | US7180591 Semiconductor processors, sensors, semiconductor processing systems, semiconductor workpiece processing methods, and turbidity monitoring methods |
| 02/15/2007 | WO2007018391A1 Chemical mechanical polishing apparatus |
| 02/15/2007 | WO2007018117A1 Electron beam assisted eem method |
| 02/15/2007 | US20070037491 Chemically modified chemical mechanical polishing pad, process of making a modified chemical mechanical polishing pad and method of chemical mechanical polishing |
| 02/15/2007 | US20070037486 Polishing pad, method of manufacturing the polishing pad, and chemical mechanical polishing apparatus comprising the polishing pad |
| 02/15/2007 | US20070034506 Pad assembly for electrochemical mechanical processing |
| 02/15/2007 | US20070034335 Retainer ring of chemical mechanical polishing device |
| 02/14/2007 | EP1752521A1 Aqueous dispersion medium for abrasive particles |
| 02/14/2007 | EP1751243A1 Cmp porous pad with component-filled pores |
| 02/14/2007 | EP1458520B1 Methods for planarization of group viii metal-containing surfaces using a fixed abrasive article |
| 02/14/2007 | CN2868552Y Retainer ring fixed by magnetic mode |
| 02/14/2007 | CN2868551Y High-precision lapping machine lowr mould plate shift-out mechanism |
| 02/14/2007 | CN1914712A Temperature controlled hot edge ring assembly for reducing plasma reactor etch rate drift |
| 02/14/2007 | CN1914711A Polishing apparatus and substrate processing apparatus |
| 02/14/2007 | CN1914241A 聚氨酯抛光垫 Polyurethane polishing pad |
| 02/14/2007 | CN1914004A Multi-step pad conditioning system and method for chemical planarization |
| 02/14/2007 | CN1300828C Chemical mechanical polishing method for semiconductor substrate and water-dispersion solution for chemical mechanical polishing |
| 02/14/2007 | CN1300769C Multi-chambered, compliant apparatus for restraining workpiece and applying variable pressure thereto during lapping to improve flatness characteristics of workpiece |
| 02/14/2007 | CN1300277C Abrasive material |
| 02/14/2007 | CN1300276C Cerium based abrasive material, method of quality examination therefor and method for production thereof |
| 02/14/2007 | CN1299878C Apparatus for preparing grinding liquid |
| 02/13/2007 | US7177019 Apparatus for imaging metrology |
| 02/13/2007 | US7176145 Manufacturing method of semiconductor device |
| 02/13/2007 | US7175915 Method of producing polyurethane pads produced therewith |
| 02/13/2007 | US7175515 Static pad conditioner |
| 02/13/2007 | US7175510 Method and apparatus for conditioning a polishing pad |
| 02/13/2007 | US7175508 Polishing apparatus, method of manufacturing semiconductor device using the same, and semiconductor device manufactured by this method |
| 02/13/2007 | US7175505 Method for adjusting substrate processing times in a substrate polishing system |
| 02/13/2007 | US7175504 Vacuum suction holding apparatus and holding method, polishing apparatus using this holding apparatus, and device manufacturing method using this polishing apparatus |
| 02/13/2007 | US7175503 Methods and systems for determining a characteristic of polishing within a zone on a specimen from combined output signals of an eddy current device |
| 02/08/2007 | WO2007016498A2 Nonwoven polishing pads for chemical mechanical polishing |
| 02/08/2007 | WO2007015911A1 Self-contained conditioning abrasive article |
| 02/08/2007 | WO2007015909A1 Abrasive agglomerate polishing method |
| 02/08/2007 | WO2007015163A1 Precision machining apparatus and precision machining method |
| 02/08/2007 | WO2007014732A2 Method and device for subsequently treating glass panes |
| 02/08/2007 | US20070032182 Polishing pad and method of fabricating semiconductor substrate using the pad |
| 02/08/2007 | US20070032175 Polishing cloth, polishing cloth processing method, and substrate manufacturing method using same |
| 02/08/2007 | US20070032174 Polishing apparatus |
| 02/08/2007 | US20070032171 Methods and systems for conditioning planarizing pads used in planarizing susbstrates |
| 02/08/2007 | US20070032170 Polishing pad with built-in optical sensor |
| 02/08/2007 | US20070029285 Polishing method |