| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
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| 09/20/2007 | US20070218807 Method and apparatus for producing micro-texture on a slider substrate using chemical & mechanical polishing techniques |
| 09/20/2007 | US20070218279 Abrasive Cloth and Method for Producing Nanofiber Structure |
| 09/20/2007 | US20070215463 Pre-conditioning a sputtering target prior to sputtering |
| 09/19/2007 | EP1833640A1 Substrate holding device and polishing apparatus |
| 09/19/2007 | EP1469971B1 Grooved rollers for a linear chemical mechanical planarization system |
| 09/19/2007 | EP1340588B1 Abrasive cloth and polishing method |
| 09/19/2007 | CN101037586A Polishing fluid and method of polishing |
| 09/19/2007 | CN101037585A Polishing fluid and polishing method |
| 09/19/2007 | CN100337926C Cerium oxide particles and process for the production thereof |
| 09/19/2007 | CN100337790C Small-sized precise hand operated grinding and polishing apparatus |
| 09/18/2007 | US7270597 Rinsing to remove by-products; conditioning wafer surface of copper or oxide; applying ammonium chloride, copper chloride, hydrochloric acid, ammonium persulfate, sulfuric acid, ammonium hydroxide, citric acid, ammonium citrate, hydrofluoric acid, tetramethylammonium hydroxide, and/or chelate compound |
| 09/18/2007 | US7270595 Polishing pad with oscillating path groove network |
| 09/18/2007 | US7270594 Polishing apparatus |
| 09/13/2007 | WO2007104063A1 Composite polishing pad |
| 09/13/2007 | WO2007103578A1 Method of polishing a tungsten carbide surface |
| 09/13/2007 | US20070212988 Polishing apparatus |
| 09/13/2007 | US20070212987 Monitoring a metal layer during chemical mechanical polishing |
| 09/13/2007 | US20070212980 Polishing pad, platen, method of monitoring, method of manufacturing, and method of detecting |
| 09/13/2007 | US20070212979 Composite polishing pad |
| 09/13/2007 | US20070212882 Substrate polishing method and method of manufacturing semiconductor device |
| 09/13/2007 | DE102007005919A1 Polierzusammensetzung und Polierverfahren Polishing composition and polishing method |
| 09/12/2007 | EP1833085A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 09/12/2007 | EP1833084A2 Cerium oxide abrasive and method of polishing substrates |
| 09/12/2007 | EP1833083A1 Silicon wafer polishing method and silicon wafer producing method, apparatus for polishing disc-like work and silicon wafer |
| 09/12/2007 | EP1830985A2 Polishing apparatus and polishing method |
| 09/12/2007 | EP1594656B1 Polishing article for electro-chemical mechanical polishing |
| 09/12/2007 | EP0946979B1 Method for chemical-mechanical planarization of a substrate on a fixed-abrasive polishing pad |
| 09/12/2007 | CN200945582Y Wafer grinding ring special abrading processing machine |
| 09/11/2007 | US7268000 Method and system for controlling the chemical mechanical polishing of substrates by calculating an overpolishing time and/or a polishing time of a final polishing step |
| 09/11/2007 | US7267702 Abrasive with an average particle size of 1 to 30 nm and water and having a packing ratio of from 79 to 90% by weight; suitable for precision parts including such as magnetic recording media, photomask substrates, optical disks, lenses, mirrors, and prisms, and semiconductor substrates |
| 09/11/2007 | US7267608 Method and apparatus for conditioning a chemical-mechanical polishing pad |
| 09/11/2007 | US7267607 Transparent microporous materials for CMP |
| 09/11/2007 | US7267604 Grinding abrasive grains, abrasive, abrasive solution, abrasive solution preparation method, grinding method, and semiconductor device fabrication method |
| 09/11/2007 | US7267602 Seal assembly manufacturing methods |
| 09/11/2007 | US7267601 Method of producing polishing cloth |
| 09/07/2007 | WO2007100093A1 Metal oxide particle, polishing material containing same, substrate polishing method using such polishing material, and method for manufacturing semiconductor device |
| 09/07/2007 | WO2007099976A1 Substrate treating device, substrate convey device, substrate grasping device, and chemical solution treating device |
| 09/07/2007 | WO2007099799A1 Cerium-based abrasive material |
| 09/06/2007 | US20070207938 Cleaning compositions and methods of use thereof |
| 09/06/2007 | US20070204724 Aerosol method and apparatus, particulate products, and electronic devices made therefrom |
| 09/05/2007 | EP1828333A1 Polishing composition and polishing method |
| 09/05/2007 | CN200942486Y Programmable controlled full-automatic movable polishing machine |
| 09/05/2007 | CN101032001A CMP polishing compound and method for polishing substrate |
| 09/05/2007 | CN101028700A Processing device with rotary table |
| 09/05/2007 | CN101028699A Polishing head for trimming polished wafter evenness |
| 09/05/2007 | CN100336188C Method for copper CMP using polymeric complexing agents |
| 09/05/2007 | CN100336179C Polishing fluid and polishing method |
| 09/05/2007 | CN100336104C Grinding guide with dual-purpose for producing magnetoresistive head |
| 09/05/2007 | CN100335580C Polishing system with stopping compound and method of its use |
| 09/04/2007 | US7264641 Polishing pad comprising biodegradable polymer |
| 09/04/2007 | US7264536 Polishing pad with window |
| 09/04/2007 | US7264535 Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model |
| 08/30/2007 | WO2006081286A8 Multi-layer polishing pad for low-pressure polishing |
| 08/30/2007 | US20070202777 Linearly Advancing Polishing Method And Apparatus |
| 08/30/2007 | US20070202703 Polishing composition and polishing method |
| 08/30/2007 | US20070199923 Polishing device and polishing method |
| 08/30/2007 | DE202007005774U1 Reparaturwerkzeug für übliche Haushaltswasserhähne Repair tool for common household taps |
| 08/29/2007 | EP1299490B1 Silane containing polishing composition for cmp |
| 08/29/2007 | CN101025166A Rotary pump, hydrodynamic mixer with a rotary pump, and the use of the rotary pump |
| 08/29/2007 | CN100334691C Substrate processing apparatus and substrate processing method |
| 08/28/2007 | US7261832 Methods and apparatuses for monitoring and controlling mechanical or chemical-mechanical planarization of microelectronic substrate assemblies |
| 08/28/2007 | US7261616 Magnetorheological polishing devices and methods |
| 08/28/2007 | US7260887 Apparatus for controlling the lapping of a slider based on an amplitude of a readback signal produced from an externally applied magnetic field |
| 08/23/2007 | WO2007095421A2 Method for electrochemically polishing a conductive material on a substrate |
| 08/23/2007 | US20070197147 Polishing system with spiral-grooved subpad |
| 08/23/2007 | US20070197145 Polishing article with window stripe |
| 08/23/2007 | US20070197141 Polishing apparatus with grooved subpad |
| 08/23/2007 | US20070197134 Polishing article with integrated window stripe |
| 08/23/2007 | US20070197133 Polishing article with integrated window stripe |
| 08/23/2007 | US20070197132 Dechuck using subpad with recess |
| 08/23/2007 | US20070196975 Metal-Polishing Liquid And Polishing Method Using The Same |
| 08/23/2007 | US20070193686 Method of manufacturing semiconductor substrate and method of evaluating quality of semiconductor substrate |
| 08/22/2007 | EP1820603A2 Wafer and method for producing the same |
| 08/22/2007 | CN2936578Y Processing pad and substrate processing equipment including said processing pad |
| 08/22/2007 | CN101023512A Cmp polishing agent and method for polishing substrate |
| 08/22/2007 | CN101023511A Method for manufacturing semiconductor device |
| 08/22/2007 | CN101023429A Method, apparatus and system for use in processing wafers |
| 08/22/2007 | CN101022921A Method and apparatus for conditioning a polishing pad |
| 08/22/2007 | CN101022920A Retaining ring with conductive portion |
| 08/22/2007 | CN101022918A 抛光垫 Polishing pad |
| 08/22/2007 | CN101022910A 全序列金属和阻挡层电化学机械处理 Sequence metal and barrier layer electrochemical mechanical treatment |
| 08/21/2007 | US7258602 Polishing pad having grooved window therein and method of forming the same |
| 08/21/2007 | US7258598 Polishing solution supply system, method of supplying polishing solution, apparatus for and method of polishing semiconductor substrate and method of manufacturing semiconductor device |
| 08/21/2007 | US7258596 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces |
| 08/21/2007 | US7258595 Polishing apparatus |
| 08/16/2007 | WO2007091439A1 Abrasive pad and abrasion device |
| 08/16/2007 | US20070190913 Polishing apparatus and polishing method |
| 08/16/2007 | US20070190911 Polishing pad and forming method |
| 08/16/2007 | US20070190909 Three-dimensional network for chemical mechanical polishing |
| 08/16/2007 | US20070190905 Polishing pad and semiconductor device manufacturing method |
| 08/16/2007 | US20070190903 Apparatus and method for polishing semiconductor wafers using one or more polishing surfaces |
| 08/16/2007 | US20070190770 Post-cmp treating liquid and manufacturing method of semiconductor device using the same |
| 08/16/2007 | US20070187258 Method for electrochemically polishing a conductive material on a substrate |
| 08/16/2007 | US20070187257 Electrolytic processing apparatus and electrolytic processing method |
| 08/16/2007 | US20070186486 Polishing composition and rinse composition |
| 08/16/2007 | US20070186485 Polishing composition and rinse composition |
| 08/15/2007 | EP1818312A1 METHOD FOR PRODUCING CeO2 FINE PARTICLES AND POLISHING SLURRY CONTAINING SUCH FINE PARTICLES |
| 08/15/2007 | EP1719161A4 Polishing apparatus and substrate processing apparatus |
| 08/15/2007 | CN1331635C Electric current variable effect grinding method and its grinding device |
| 08/15/2007 | CN101015907A Grinding device for controlling grinding thickness |