| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
|---|
| 03/05/2015 | WO2015030050A1 Polishing method |
| 03/05/2015 | WO2015030032A1 Laminate and application thereof |
| 03/05/2015 | WO2015030009A1 Slurry, polishing solution set, polishing solution, substrate polishing method, and substrate |
| 03/05/2015 | WO2015029524A1 Method and device for polishing semiconductor wafer |
| 03/05/2015 | WO2015029294A1 Wafer polishing method and wafer polishing device |
| 03/05/2015 | US20150065020 Customized polishing pads for cmp and methods of fabrication and use thereof |
| 03/05/2015 | US20150065014 Method of chemical mechanical polishing a substrate |
| 03/05/2015 | US20150065013 Chemical mechanical polishing pad |
| 03/05/2015 | US20150065010 Apparatus and method for double-side polishing of work |
| 03/05/2015 | US20150059254 Polyurethane polishing pad |
| 03/05/2015 | US20150059253 Polishing pad |
| 03/05/2015 | DE102014012378A1 Verfahren zum chemisch-mechanischen polieren eines substrats A method for chemical mechanical polishing a substrate |
| 03/05/2015 | DE102014012353A1 Chemisch-mechanisches polierkissen Chemical mechanical polishing pad |
| 03/04/2015 | EP2843089A1 SiC SINGLE CRYSTAL SUBSTRATE |
| 03/04/2015 | EP2842157A1 Printed chemical mechanical polishing pad |
| 03/03/2015 | US8968058 Polishing pad with alignment feature |
| 03/03/2015 | US8968052 Systems and methods of wafer grinding |
| 03/03/2015 | US8966939 Method for producing glass substrate for information recording medium |
| 02/26/2015 | WO2015026477A1 Lapping slurry having a cationic surfactant |
| 02/26/2015 | WO2015025852A1 Polishing head and polishing processing device |
| 02/26/2015 | WO2015025469A1 Two-side polishing method for wafer |
| 02/26/2015 | US20150056900 Polishing pad with homogeneous body having discrete protrusions thereon |
| 02/26/2015 | US20150056895 Ultra high void volume polishing pad with closed pore structure |
| 02/26/2015 | US20150056894 Polishing pad having micro-grooves on the pad surface |
| 02/26/2015 | US20150056892 Polishing pad with porous interface and solid core, and related apparatus and methods |
| 02/26/2015 | US20150056891 Measuring method of surface roughness of polishing pad |
| 02/25/2015 | EP2840591A1 Composition for silicon wafer polishing liquid |
| 02/24/2015 | US8962223 Mask blank, reflective mask blank, photomask, reflective mask, photomask set and method of manufacturing a semiconductor device |
| 02/24/2015 | US8961266 Polishing pad with secondary window seal |
| 02/19/2015 | US20150050870 Retainer ring structure for chemical-mechanical polishing machine |
| 02/19/2015 | US20150050869 Retainer ring structure for chemical-mechanical polishing machine and method for manufacturing the same |
| 02/19/2015 | US20150050868 Holder for polished work, and laminate plate used for same |
| 02/19/2015 | US20150050866 Polishing pad, polishing apparatus and method for manufacturing polishing pad |
| 02/19/2015 | US20150050863 Substrate processing apparatus, substrate processing method, substrate holding mechanism, and substrate holding method |
| 02/19/2015 | US20150050862 Polishing composition and method using said polishing composition to manufacture compound semiconductor substrate |
| 02/18/2015 | EP2838110A1 Polishing apparatus |
| 02/17/2015 | US8956201 Correcting current crowding in row bar and vias for single pad bonding |
| 02/17/2015 | US8956200 Wafer grounding design for single pad lapping |
| 02/12/2015 | WO2015020082A1 Polishing tool and processing method for member |
| 02/12/2015 | WO2015019911A1 Slurry for cmp |
| 02/12/2015 | WO2015019877A1 Polishing material, polishing material slurry |
| 02/12/2015 | WO2015019849A1 Slurry for cmp |
| 02/12/2015 | WO2015019848A1 Slurry for cmp |
| 02/12/2015 | WO2015019820A1 Composition for polishing |
| 02/12/2015 | WO2015019706A1 Method for producing polished object and composition kit for polishing |
| 02/12/2015 | US20150044951 Cmp pads having material composition that facilitates controlled conditioning |
| 02/12/2015 | US20150044947 Method of polishing a new or a refurbished electrostatic chuck |
| 02/11/2015 | EP2835218A1 Chemical mechanical polishing fastening fixture and fastening base |
| 02/11/2015 | CN204149007U 一种研磨垫调整器 A polishing pad adjuster |
| 02/11/2015 | CN204149006U 一种用于光纤连接器端面研磨的多卡位式研磨盘 A fiber optic connector for face grinding bit multi-card type grinding disc |
| 02/11/2015 | CN204149005U 化学机械研磨装置 Chemical mechanical polishing apparatus |
| 02/11/2015 | CN104350582A 具有光稳定透光区的抛光垫 Light-stable light transmissive area having a polishing pad |
| 02/11/2015 | CN104339258A 玻璃基板用托板、磁记录介质用玻璃基板的研磨方法及磁记录介质用玻璃基板的制造方法 A glass substrate by the pallet, and a polishing method using a glass substrate of a magnetic recording medium and magnetic recording medium manufacturing method of a glass substrate |
| 02/11/2015 | CN104339244A 摆动机构及球芯摆动研磨机 Swing swing mechanism and ball mill cores |
| 02/11/2015 | CN103029035B 一种研磨垫及利用该研磨垫进行研磨时的损耗检测方法 Loss detecting method utilizing a polishing pad and the polishing pad during polishing |
| 02/11/2015 | CN102922410B 玻璃基板表面处理方法 Surface treatment of the glass substrate |
| 02/11/2015 | CN102416599B 一种全自动微钻钻头研磨检测机中转机构 A fully automatic detection of micro drill grinding machine transit agency |
| 02/11/2015 | CN102152141B 夹具 Fixture |
| 02/10/2015 | US8951813 Method of polishing a substrate having a film on a surface of the substrate for semiconductor manufacturing |
| 02/10/2015 | US8951096 Method for machining flat workpieces |
| 02/05/2015 | WO2015017138A1 Low density polishing pad |
| 02/05/2015 | WO2015015706A1 Dressing method and dressing device |
| 02/05/2015 | WO2015015705A1 Wafer polishing method and wafer polishing device |
| 02/05/2015 | US20150038066 Low density polishing pad |
| 02/05/2015 | US20150038065 Textured membrane for a multi-chamber carrier head |
| 02/05/2015 | US20150038056 Temperature modification for chemical mechanical polishing |
| 02/05/2015 | DE102014214940A1 Bearbeitungsvorrichtung, die einen Laserstrahlaufbringmechanismus und ein Trennmittel beinhaltet Machining apparatus including a Laserstrahlaufbringmechanismus and a release agent |
| 02/05/2015 | DE102013012905A1 Verfahren und Vorrichtung zurn Seitenplanschleifen von Werkstücken Method and apparatus ZURN bottom grinding of workpieces |
| 02/04/2015 | EP2833392A1 Polishing composition |
| 02/04/2015 | EP2832774A1 Polishing pad and method for producing polishing pad |
| 02/04/2015 | EP2832498A1 Material for holding item to be polished, and laminate plate using same |
| 02/04/2015 | CN204135872U 适用于棒状晶体的手持抛光夹持装置 Holding means suitable for hand-held polishing of rod-shaped crystals |
| 02/04/2015 | CN204135871U 一种研磨垫 A polishing pad |
| 02/04/2015 | CN204135870U 一种新型阀体密封面研磨盘 A new valve sealing surface grinding disc |
| 02/04/2015 | CN204135869U 配重式汽轮机汽缸导汽管法兰研磨装置 Counterweight guide cylinder steam turbine flange grinding apparatus |
| 02/04/2015 | CN204135868U 环保无酸型镜面研磨机 Environmental non-acid-type mirror grinding machine |
| 02/04/2015 | CN204135867U 球面研磨机 Spherical grinding machine |
| 02/04/2015 | CN204135866U 双向中心孔研磨机床 Two-way center hole grinding machine |
| 02/04/2015 | CN204135865U 一种动车组用弹簧研磨机 One kind EMU spring grinding machine |
| 02/04/2015 | CN204135864U 一种刮胶研磨机 One kind of squeegee grinding machine |
| 02/04/2015 | CN104335331A 悬浮液、研磨液套剂、研磨液、基体的研磨方法及基体 Suspensions, the polishing liquid set, the polishing liquid, the polishing method of substrate and substrate |
| 02/04/2015 | CN104334675A 悬浮液、研磨液套剂、研磨液、基体的研磨方法及基体 Suspensions, the polishing liquid set, the polishing liquid, the polishing method of substrate and substrate |
| 02/04/2015 | CN104325391A 一种钢球光、磨机床的自动下球装置 One kind of ball of light, automatic grinding machine under the ball device |
| 02/04/2015 | CN104325389A 磁记录介质用玻璃基板的研磨方法以及制造方法 A polishing method using a magnetic recording medium and a method of manufacturing a glass substrate |
| 02/04/2015 | CN104325388A 一种研磨机控制器的结构 Structure of a grinding machine controller |
| 02/04/2015 | CN104325387A 球体研磨机 Ball mill |
| 02/04/2015 | CN104325162A 多功能弹出式刀具结构 Multifunction Pop-tool structure |
| 02/04/2015 | CN103087637B 研浆组成物及其用途 Research slurry composition and its use |
| 02/04/2015 | CN102729137B 距离监控装置 Distance monitoring device |
| 02/04/2015 | CN102133734B 具有侦测窗的研磨垫及其制造方法 Polishing pad and its manufacturing method detection window |
| 02/03/2015 | US8944888 Chemical-mechanical polishing pad and chemical-mechanical polishing method |
| 02/03/2015 | US8944887 Apparatus and method for surface grinding and edge trimming workpieces |
| 02/03/2015 | US8944884 Fitting of optical model to measured spectrum |
| 01/29/2015 | WO2015012118A1 Silica for cmp, aqueous dispersion, and process for producing silica for cmp |
| 01/29/2015 | US20150031273 Pad conditioner and method of reconditioning planarization pad |
| 01/29/2015 | US20150031271 Double-side polishing apparatus |
| 01/29/2015 | US20150030650 Liquid suspensions and powders of cerium oxide particles and preparation and polishing applications thereof |
| 01/28/2015 | CN204123258U 一种单面研磨机的砝码加压件及砝码加压机构 One kind of one-sided grinding machine weights and weight pressing member pressing mechanism |
| 01/28/2015 | CN204123257U 一种用于晶圆片研磨抛光的支撑底座 A wafer polishing support base |
| 01/28/2015 | CN204123256U 插芯研磨盘 Mortise grinding disc |