| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
|---|
| 05/03/2007 | WO2007050313A1 Cmp of copper/ruthenium substrates |
| 05/03/2007 | US20070099552 Conductive pad with ion exchange membrane for electrochemical mechanical polishing |
| 05/03/2007 | US20070099426 Polishing method, polishing apparatus, and electrolytic polishing apparatus |
| 05/03/2007 | US20070096315 Ball contact cover for copper loss reduction and spike reduction |
| 05/03/2007 | US20070094936 Abrasive slurry having high dispersion stability and manufacturing method for a substrate |
| 05/02/2007 | EP1778439A2 Methods for producing in-situ grooves in chemical mechanical planarization (cmp) pads, and novel cmp pad designs |
| 05/02/2007 | CN2894939Y Drive separating device of upper-lower grinding disk for two-side lapping machine |
| 05/02/2007 | CN2894938Y Pneumatic device for two-side lapping machine |
| 05/02/2007 | CN2894937Y Electric device for two-side lapping machine |
| 05/02/2007 | CN2894935Y Steel wire arrangemetn for hard material slicing machine |
| 05/02/2007 | CN2894934Y Roller structure for hard material slicing machine |
| 05/02/2007 | CN2894933Y Sand-preventing device of roller rotation shaft bearing for hard material slicing machine |
| 05/02/2007 | CN1957253A Method for evaluating quality of abrasive particles, method for polishing glass and abrasive composition for polishing glass |
| 05/02/2007 | CN1956819A Polishing pad with oscillating path groove network |
| 05/02/2007 | CN1954967A Lapping pad and its manufacturing method |
| 05/02/2007 | CN1314096C CMP process involving frequency analysis-based monitoring |
| 05/02/2007 | CN1313216C Modular controlled platen preparation system and method |
| 05/01/2007 | US7211460 Methods for exposing device features on a semiconductor device |
| 05/01/2007 | US7211122 Polishing composition and rinse composition |
| 05/01/2007 | US7211121 Polishing composition |
| 05/01/2007 | US7210989 Planarizing machines and methods for dispensing planarizing solutions in the processing of microelectronic workpieces |
| 05/01/2007 | US7210982 Method and apparatus for polishing a substrate |
| 04/26/2007 | WO2007046420A1 Cerium oxide slurry, cerium oxide polishing liquid, and method for polishing substrate by using those |
| 04/26/2007 | US20070093186 Substrate delivery mechanism |
| 04/26/2007 | US20070093064 Polishing method of Cu film and method for manufacturing semiconductor device |
| 04/25/2007 | EP1777736A1 Electrolytic processing device and substrate processing apparatus |
| 04/25/2007 | EP1776300A2 Non-contact support platforms for distance adjustment |
| 04/25/2007 | EP1483182A4 Reinforced chemical mechanical planarization belt |
| 04/25/2007 | CN1953842A Composition for polishing |
| 04/25/2007 | CN1951634A Method of adhering polishing pads and jig for adhering the same |
| 04/25/2007 | CN1312742C Polishing disk, polishing machine and method for manufacturing semiconductor |
| 04/25/2007 | CN1312740C Grinding work holding disk, work grinding device and grinding method |
| 04/25/2007 | CN1312739C Chemical mechanical polishing pad with micro-holes |
| 04/24/2007 | US7208111 Method of producing inlaid polishing pad |
| 04/24/2007 | US7207878 Conductive polishing article for electrochemical mechanical polishing |
| 04/24/2007 | US7207870 Seal assembly manufacturing methods and seal assemblies manufactured thereby |
| 04/24/2007 | US7207862 Polishing apparatus and method for detecting foreign matter on polishing surface |
| 04/19/2007 | WO2007043614A1 Cerium polishing material |
| 04/19/2007 | WO2007043517A1 Polishing solution for cmp and method of polishing |
| 04/19/2007 | WO2007043263A1 Truing member for abrasive pad and truing method of abrasive pad |
| 04/19/2007 | WO2007042681A2 Abrasive aqueous suspension based on cerium and silica dioxide particles for polishing surfaces of materials |
| 04/19/2007 | US20070087671 Method of adhering polishing pads and jig for adhering the same |
| 04/19/2007 | US20070087666 Grinding jig set and grinding method |
| 04/19/2007 | US20070087663 Polishing apparatus |
| 04/19/2007 | US20070087662 Friction sensor for polishing system |
| 04/19/2007 | US20070087570 Planarization of a heteroepitaxial layer |
| 04/19/2007 | US20070087177 Stacked pad and method of use |
| 04/19/2007 | US20070084131 Abrasive Articles and Methods for the Manufacture and Use of Same |
| 04/19/2007 | DE112005000723T5 Polierkissen und Verfahren zur Herstellung desselben Polishing pad and method for manufacturing the same |
| 04/18/2007 | EP1775068A1 Method of adhering polishing pads and jig for adhering the same |
| 04/18/2007 | EP1773541A1 Real time polishing process monitoring |
| 04/18/2007 | EP1226220B1 Polishing system and method of its use |
| 04/18/2007 | CN2889612Y Dynamically synchronous abrading machine |
| 04/18/2007 | CN1950930A Polishing pad and method for manufacture of semiconductor device using the same |
| 04/18/2007 | CN1947944A Technique for nanometer grade super smooth processing gallium phosphide wafer |
| 04/18/2007 | CN1947943A Method and device for internally machining cylinder jacket |
| 04/18/2007 | CN1311009C Additive composition, slurry composition including the same, and method of polishing an object using the slurry composition |
| 04/17/2007 | US7205265 Cleaning compositions and methods of use thereof |
| 04/17/2007 | US7204924 Method and apparatus to deposit layers with uniform properties |
| 04/17/2007 | US7204917 Workpiece surface influencing device designs for electrochemical mechanical processing and method of using the same |
| 04/17/2007 | US7204865 Polishing composition |
| 04/17/2007 | US7204742 Polishing pad comprising hydrophobic region and endpoint detection port |
| 04/17/2007 | US7204679 Flow control system |
| 04/12/2007 | WO2007041020A1 Polishing apparatus and method with direct load platen background |
| 04/12/2007 | WO2007040103A1 Abrasive cloth and process for production thereof |
| 04/12/2007 | US20070082581 Systems and methods for detecting device-under-test dependency |
| 04/12/2007 | US20070081931 abrasive material for polishing silicon oxide layer or silicon nitride layer on silicon substrate; forming a shallow trench isolation; chemical mechanical polishing; obtained via a low-temperature calcination, pulverization, and a high-temperature calcination; high pore fraction and low strength |
| 04/12/2007 | US20070080142 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates |
| 04/12/2007 | US20070079933 Method and apparatus for forming a planarizing pad having a film and texture elements for planarization of microelectronic substrates |
| 04/12/2007 | DE10117612B4 Polieranlage Polishing System |
| 04/11/2007 | EP1772503A2 Polishing slurry, method of treating surface of GaxIn1-xAsyP1-y crystal and GaxIn1-xAsyP1-y crystal substrate |
| 04/11/2007 | EP1771279A1 Polishing apparatus and substrate processing method |
| 04/11/2007 | EP1397828A4 Electrolytic processing device and substrate processing apparatus |
| 04/11/2007 | CN1946516A Abrasive cloth and method for preparing nano-fiber structure |
| 04/11/2007 | CN1943993A Polishing pad and polishing apparatus |
| 04/10/2007 | US7203564 Treatment condition decision method, treatment condition decision system, treatment system, treatment condition decision calculator program, program recording medium, and semiconductor device manufacturing method |
| 04/10/2007 | US7201829 Mask plate design |
| 04/10/2007 | US7201647 Subpad having robust, sealed edges |
| 04/10/2007 | US7201642 Process for producing improved membranes |
| 04/10/2007 | US7201641 For the polishing of the surfaces of semiconductor wafers |
| 04/10/2007 | US7201640 Method of sucking water and water sucking device |
| 04/10/2007 | US7201639 Powder for disks |
| 04/10/2007 | US7201637 Simultaneous planarization of pole piece and coil materials for write head applications |
| 04/10/2007 | US7201636 Chemical mechanical polishing a substrate having a filler layer and a stop layer |
| 04/10/2007 | US7201635 Methods and systems for conditioning planarizing pads used in planarizing substrates |
| 04/10/2007 | US7201633 Systems and methods for wafer polishing |
| 04/10/2007 | US7201632 In-situ chemical-mechanical planarization pad metrology using ultrasonic imaging |
| 04/05/2007 | WO2007037319A1 Jig for polishing disc-like member, method for polishing rear surface of disc-like member and machine for polishing rear surface of disc-like member |
| 04/05/2007 | US20070077868 Cerium-based abrasive, abrasive slurry, and production of cerium-based abrasive |
| 04/05/2007 | US20070077867 Polishing pad and polishing apparatus |
| 04/05/2007 | US20070077862 System for Endpoint Detection with Polishing Pad |
| 04/05/2007 | US20070077764 Polishing method, polishing composition and polishing composition kit |
| 04/05/2007 | US20070075041 Chemically mechanically polishing the surface gallium-indium-arsenide-phosphide crystal using polishing slurry containing abrasive grains formed of SiO2; crystal surface having a small surface roughness can be formed at a high polishing rate and effectively |
| 04/05/2007 | US20070074457 Polishing composition and polishing method |
| 04/04/2007 | EP1770768A2 Polishing method, polishing composition and polishing composition kit |
| 04/04/2007 | EP1770136A2 Polishing composition and polishing method |
| 04/04/2007 | EP1622743A4 Whole-substrate spectral imaging system for cmp |
| 04/04/2007 | CN1943018A Polishing slurry |
| 04/04/2007 | CN1943017A Metal polishing liquid and polishing method using it |
| 04/04/2007 | CN1943016A Loading device for chemical mechanical polisher of semiconductor wafer |