| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
|---|
| 09/17/2008 | CN100418702C Ultrafine fiber polishing sheet and its manufacturing method |
| 09/16/2008 | US7425250 Electrochemical mechanical processing apparatus |
| 09/16/2008 | US7425172 Customized polish pads for chemical mechanical planarization |
| 09/12/2008 | WO2008109576A2 Systems and methods for efficient slurry application for chemical mechanical polishing |
| 09/12/2008 | WO2008108463A1 Polishing tool and polishing device |
| 09/11/2008 | US20080220698 Systems and methods for efficient slurry application for chemical mechanical polishing |
| 09/11/2008 | US20080220694 Centerless feed-through super-finishing device having a lapping system containing a freely-disposed abrasive |
| 09/11/2008 | US20080220585 Method of manufacturing a semiconductor device |
| 09/11/2008 | US20080219130 Methods and Apparatus for Formatting and Tracking Information for Three-Dimensional Storage Medium |
| 09/11/2008 | DE102006056339A1 Vorrichtung zum Trennen von zwei aufeinander angeordneten scheibenförmigen Elementen bei der Entnahme Device for separating two successive disc-shaped elements arranged in the extraction |
| 09/10/2008 | CN101263583A Polishing compound, method for polishing surface to be polished, and process for producing semiconductor integrated circuit device |
| 09/10/2008 | CN101262982A Polishing platen and polishing apparatus |
| 09/10/2008 | CN101262981A Polishing method and polishing apparatus, and program for controlling polishing apparatus |
| 09/10/2008 | CN100417493C Polishing pad with window for planarization |
| 09/09/2008 | US7422677 Membrane-mediated electropolishing |
| 09/09/2008 | US7422516 Conductive polishing article for electrochemical mechanical polishing |
| 09/09/2008 | US7422511 Element for detecting the amount of lapping having a resistive film electrically connected to the substrate |
| 09/04/2008 | WO2008105342A1 Metal polishing liquid and polishing method |
| 09/04/2008 | WO2008105223A1 Cmp slurry for silicon film |
| 09/04/2008 | WO2008105137A1 Polishing apparatus |
| 09/04/2008 | WO2008064268A3 Friction sensor for polishing system |
| 09/04/2008 | US20080214093 cerium oxide particles, a dispersing agent (lauryl betaine), a water-soluble polymer containing N-mono-substituted product and an N,N-di-substituted product of any one selected from acrylamide, methacrylamide and alpha -substituted product; polishing a silicon dioxide film |
| 09/04/2008 | US20080214005 Chemical solution feeding apparatus and method for preparing slurry |
| 09/04/2008 | US20080210665 Polishing composition and polishing method |
| 09/03/2008 | EP1965417A1 Polishing composition, polishing method, and method for forming copper wiring for semiconductor integrated circuit |
| 09/03/2008 | EP1963048A1 Method for manufacturing microporous cmp materials having controlled pore size |
| 09/03/2008 | EP1626840A4 Apparatus and method for polishing semiconductor wafers using one or more polishing surfaces |
| 09/03/2008 | CN101258106A Cerium oxide powder for one-component CMP slurry, preparation method thereof, one-component CMP slurry composition comprising the same, and method of shallow trench isolation using the slurry |
| 09/03/2008 | CN101255316A Polishing liquid |
| 09/03/2008 | CN101254586A Polishing apparatus |
| 09/03/2008 | CN100416868C Nitride semiconductor wafer and method of processing nitride semiconductor wafer |
| 09/03/2008 | CN100416770C Method of flatting semiconductor die |
| 09/03/2008 | CN100416753C Method of manufacturing semiconductor device |
| 09/03/2008 | CN100415447C Polishing apparatus and method |
| 09/02/2008 | US7419946 Chemical solution feeding apparatus and method for preparing slurry |
| 09/02/2008 | US7419910 Slurry for CMP, polishing method and method of manufacturing semiconductor device |
| 09/02/2008 | US7419420 Substrate holding mechanism, substrate polishing apparatus and substrate polishing method |
| 08/28/2008 | WO2008102672A1 Polishing slurry, method for manufacturing the polishing slurry, nitride crystalline material and method for polishing surface of the nitride crystalline material |
| 08/28/2008 | WO2008102521A1 Final polishing process for silicon single crystal wafer and silicon single crystal wafer |
| 08/28/2008 | US20080207089 Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool |
| 08/28/2008 | US20080206995 Metal-polishing liquid and polishing method therewith |
| 08/28/2008 | US20080203354 Polishing liquid |
| 08/28/2008 | US20080202036 Covering with photo-reactive film coating; exposure to light through mask; removal using developers; etching; polishing |
| 08/27/2008 | EP1961519A1 Grinding tools |
| 08/27/2008 | CN201105409Y Chemical mechanical grinder bench discharging pipe |
| 08/27/2008 | CN101253606A Polishing composition |
| 08/27/2008 | CN101253022A Polishing pad |
| 08/27/2008 | CN101249623A Grinding method and grinding device of circular disk shape substrate |
| 08/26/2008 | US7416962 Method for processing a semiconductor wafer including back side grinding |
| 08/26/2008 | US7416942 Method for manufacturing semiconductor device |
| 08/21/2008 | WO2008100400A1 Cmp system utilizing halogen adduct |
| 08/21/2008 | US20080200033 Chemical mechanical planarization of silicon carbide at high removal rate without affecting silicon dioxide dielectric layer; abrasive particles combined with benzotriazole, 1H-tetrazole, benzene sulfonic acid, phosphoric acid or organic phosphonic acid in solvent and water |
| 08/21/2008 | US20080200032 Polishing method of semiconductor substrate |
| 08/21/2008 | US20080197456 Substrate polishing method, semiconductor device and fabrication method therefor |
| 08/21/2008 | US20080196833 Retaining ring with shaped surface |
| 08/20/2008 | EP1957600A1 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same |
| 08/20/2008 | EP1957599A1 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same |
| 08/20/2008 | EP1593148A4 Substrate holding apparatus and polishing apparatus |
| 08/20/2008 | EP1218464B1 Chemical mechanical polishing systems and methods for their use |
| 08/20/2008 | CN101244536A Substrate polishing method, semiconductor device and fabrication method therefor |
| 08/20/2008 | CN101244535A Polishing article |
| 08/20/2008 | CN101244524A Surface finish method for magnesium alloy parts |
| 08/20/2008 | CN100413037C Methods and apparatus for electrical, mechanical and/or chemical removal of conductive material from a microelectronic substrate |
| 08/20/2008 | CN100413033C Polishing cloth and method of manufacturing semiconductor device |
| 08/20/2008 | CN100413032C Conductive polishing article for electrochemical mechanical polishing |
| 08/20/2008 | CN100412152C CMP systems and methods utilizing amine-containing polymers |
| 08/19/2008 | US7414080 Density, porosity uniformity; made with controlled isocyanate concentration; precision planarization of semiconductor, optical and magnetic substrates |
| 08/19/2008 | US7413989 Method of manufacturing semiconductor device |
| 08/19/2008 | US7413986 Feedforward and feedback control for conditioning of chemical mechanical polishing pad |
| 08/19/2008 | US7413832 Method of producing a glass substrate for a mask blank, method of producing a mask blank, and method of producing a transfer mask |
| 08/19/2008 | US7413498 Lapping apparatus and lapping method |
| 08/19/2008 | US7413497 Chemical mechanical polishing slurry pump monitoring system and method |
| 08/14/2008 | WO2008079516A3 Clean chemistry composition, method of manufacturing same, and system making use of same |
| 08/14/2008 | US20080194183 Planarization polishing method and method for manufacturing semiconductor device |
| 08/14/2008 | US20080194182 Mechano-chemical polishing method for GaAs wafer |
| 08/14/2008 | DE102008004874A1 Polierkissen mit Rillen zum Halten einer Aufschlämmung auf der Kissentextur Polishing pad with grooves for holding a slurry on the pad texture |
| 08/14/2008 | DE102008004441A1 Mechano-chemisches Polierverfahren für GaAs-Wafer Mechano-chemical polishing process for GaAs wafers |
| 08/13/2008 | EP1956642A1 Polishing agent for silicon oxide, liquid additive, and method of polishing |
| 08/13/2008 | EP1954776A2 Abrasive aqueous suspension based on cerium and silica dioxide particles for polishing surfaces of materials |
| 08/13/2008 | CN101242931A Apparatus and methods for spectrum based monitoring of chemical mechanical polishing |
| 08/13/2008 | CN101241843A Substrate polishing apparatus |
| 08/13/2008 | CN101240159A Polishing liquid composition |
| 08/13/2008 | CN101240146A Metal-polishing composition and chemical mechanical polishing method by using the same |
| 08/13/2008 | CN101239453A Planarization grinding method and method for manufacturing semiconductor device |
| 08/13/2008 | CN101239450A Chemical mechanical polishing method for GaAs wafer |
| 08/13/2008 | CN100411109C Method for polishing material layer on a semiconductor wafer |
| 08/13/2008 | CN100410017C Chemical mechanical polishing pad, production method thereof, and chemical mechanical polishing process |
| 08/13/2008 | CN100410016C Polishing pad, method for manufacturing the same, polishing system and method |
| 08/13/2008 | CN100410011C A grinding jig set and a method for grinding a number of objects |
| 08/12/2008 | US7410411 Method of determining the number of active diamonds on a conditioning disk |
| 08/12/2008 | US7410409 Abrasive compound for CMP, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for CMP abrasive compound |
| 08/12/2008 | CA2280865C Aerosol method and apparatus, particulate products, and electronic devices made therefrom |
| 08/07/2008 | WO2008093850A1 Polishing pad and process for production of polishing pad |
| 08/07/2008 | WO2008093450A1 Additive for abrasive composition |
| 08/07/2008 | WO2008042903A3 Systems for sensing pressure/shear force |
| 08/07/2008 | US20080188166 Lapping machine |
| 08/07/2008 | US20080188165 Method for manufacturing disk-substrates for magnetic recording media, disk-substrates for magnetic recording media, method for manufacturing magnetic recording media, magnetic recording media, and magnetic recording device |
| 08/07/2008 | US20080188163 Method of polishing a substrate |
| 08/07/2008 | US20080188162 Electrochemical mechanical polishing apparatus conditioning method, and conditioning solution |
| 08/07/2008 | US20080188079 Metal-polishing composition and chemical mechanical polishing method by using the same |