| Patents for B24B 37 - Lapping machines or devices; Accessories (20,836) |
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| 11/05/2009 | US20090275268 Method for producing glass substrate for magnetic disk |
| 11/04/2009 | EP1917123B1 Precision machining apparatus and precision machining method |
| 11/03/2009 | US7611552 Includes aqueous dispersion solution of fumed silica; efficiently polishing semiconductor device such as wafer at high polishing speed without causing flaw |
| 10/29/2009 | WO2009131892A2 Methods and apparatus for measuring substrate edge thickness during polishing |
| 10/29/2009 | WO2009131133A1 Polishing agent and method for polishing substrate using the polishing agent |
| 10/29/2009 | WO2009131106A1 Polyurethane foam and polishing pad |
| 10/29/2009 | WO2009129765A2 Method and device for working the surface of a hard material |
| 10/29/2009 | US20090267021 Colloidal silica for semiconductor wafer polishing and production method thereof |
| 10/29/2009 | US20090267020 Adjuvant for Controlling Polishing Selectivity and Chemical Mechanical Polishing Slurry |
| 10/29/2009 | DE112007002571T5 Polierkopf und Poliervorrichtung Polishing head and polishing machine |
| 10/28/2009 | CN201333664Y Lifting device for gear ring in grinder |
| 10/28/2009 | CN201333663Y Device for mounting hanging wall in grinder |
| 10/28/2009 | CN201333662Y Speed regulating device of grinder |
| 10/28/2009 | CN201333661Y Device for controlling soft pressure of upper grinding plate in grinding machine |
| 10/27/2009 | US7608543 Method for planarizing thin layer of semiconductor device |
| 10/22/2009 | WO2009128494A1 Polishing solution for cmp and polishing method |
| 10/22/2009 | WO2009128430A1 Polishing solution for metal films and polishing method using the same |
| 10/22/2009 | US20090264052 Polishing method and polishing apparatus, and program for controlling polishing apparatus |
| 10/21/2009 | CN201329543Y Chemical mechanical grinding device |
| 10/21/2009 | CN101563188A Conditioning tools and techniques for chemical mechanical planarization |
| 10/21/2009 | CN101560373A Polishing slurry for monox, additive liquid and polishing method |
| 10/21/2009 | CN100553410C Multilayer wiring board, method for producing multilayer wiring board, polisher for multilayer wiring board and metal sheet for producing wiring board |
| 10/21/2009 | CN100551626C Polishing pad and method of producing the same |
| 10/21/2009 | CN100551625C Polishing pad and method of producing the same |
| 10/21/2009 | CN100551624C Adsorption sheet for fixing polishing substrate and its manufacturing method and polishing device |
| 10/21/2009 | CN100551623C Pad constructions for chemical mechanical planarization applications |
| 10/20/2009 | US7604530 Inlaid polishing pad |
| 10/20/2009 | US7604527 Methods and systems for planarizing workpieces, e.g., microelectronic workpieces |
| 10/20/2009 | CA2607856C Polishing composition |
| 10/15/2009 | WO2009126823A2 A polishing system having a track |
| 10/15/2009 | WO2009089026A3 Composition and method for polishing nickel-phosphorous-coated aluminum hard disks |
| 10/15/2009 | US20090258580 Aqueous abrasives dispersion medium composition |
| 10/15/2009 | US20090258574 Polishing system having a track |
| 10/15/2009 | US20090258493 Semiconductor device manufacturing method |
| 10/15/2009 | US20090255189 Aluminum oxide particles |
| 10/14/2009 | EP2108482A1 Flow control system |
| 10/14/2009 | CN101554711A Micromachining methods and systems |
| 10/14/2009 | CN100550311C Polishing pad for CMP, method for polishing substrate using it and method for producing polishing pad for CMP |
| 10/14/2009 | CN100550290C Method for planarizing film of semiconductor device |
| 10/14/2009 | CN100548577C Substrate polishing method and apparatus |
| 10/14/2009 | CN100548576C 抛光垫和化学机械抛光方法 Chemical mechanical polishing pad and polishing method |
| 10/13/2009 | US7601050 Polishing apparatus with grooved subpad |
| 10/08/2009 | WO2009122472A1 Polishing apparatus and polishing method |
| 10/08/2009 | US20090253358 Polishing article with integrated window stripe |
| 10/08/2009 | US20090253355 Cmp abrasive, method for polishing substrate and method for manufacturing semiconductor device using the same, and additive for cmp abrasive |
| 10/08/2009 | US20090253353 Polishing pad |
| 10/08/2009 | US20090253351 Friction sensor for polishing system |
| 10/08/2009 | US20090250790 Nitride semiconductor wafer and method of processing nitride semiconductor wafer |
| 10/07/2009 | EP1095734B1 Polishing machine |
| 10/07/2009 | EP1016133B1 Method of planarizing the upper surface of a semiconductor wafer |
| 10/07/2009 | CN100547045C 抛光组合物 The polishing composition |
| 10/06/2009 | US7599165 Palladium-containing particles, method and apparatus of manufacturing palladium-containing devices made therefrom |
| 10/06/2009 | US7597769 forming a solar cell conductive feature using monodisperse silver or silver alloy fine particles coated with a ceramic or metal; silver particles made in an aerosol stream and coated by vapor deposition |
| 10/06/2009 | US7597729 edge polishing a semiconductor substrate using a mixture containing imidazole and the imidazole derivative contribute to an improvement of the polishing ability; silica abrasives, tetramethylammonium hydroxide, a water-soluble polymer, a chelating agent, and water, and containing no oxidizing agent |
| 10/06/2009 | US7597606 Fabrication process of semiconductor device and polishing method |
| 10/01/2009 | WO2009119485A1 Metal polishing liquid and polishing method using the polishing liquid |
| 10/01/2009 | WO2009119178A1 Colloidal silica with modified surface and polishing composition for cmp containing the same |
| 10/01/2009 | US20090247060 Retainer ring used for polishing a structure for manufacturing magnetic head, and polishing method using the same |
| 10/01/2009 | US20090247057 Polishing platen and polishing apparatus |
| 10/01/2009 | US20090247054 Method to prevent slurry caking on cmp conditioner |
| 10/01/2009 | US20090246957 Polishing liquid and polishing method |
| 10/01/2009 | US20090246956 Metal polishing composition and chemical mechanical polishing method |
| 10/01/2009 | DE102008016463A1 Verfahren zur Planarisierung einer Halbleiterstruktur Method for planarizing a semiconductor structure |
| 09/30/2009 | EP2105255A1 Wafer and method of producing the same |
| 09/30/2009 | CN100544892C Stirring mill |
| 09/24/2009 | US20090239450 Process for producing glass substrate for magnetic disks |
| 09/24/2009 | US20090239446 Polishing Apparatus and Polishing Method |
| 09/24/2009 | US20090239380 Polishing liquid for metal and polishing method using the same |
| 09/24/2009 | US20090239373 Chemical mechanical polishing method and method of manufacturing semiconductor device |
| 09/24/2009 | DE10229346B4 Verfahren zur Herstellung eines Halbleiterelementes A process for producing a semiconductor element |
| 09/23/2009 | CN101542690A Aqueous dispersion for chemical mechanical polishing and method of chemical mechanical polishing of semiconductor device |
| 09/23/2009 | CN101541910A Slurry composition and method for polishing organic polymer-based ophthalmic substrates |
| 09/23/2009 | CN101541477A Lapping carrier and method |
| 09/23/2009 | CN101541476A Polishing slurry, method for manufacturing the polishing slurry, nitride crystalline material and method for polishing surface of the nitride crystalline material |
| 09/23/2009 | CN101537601A Polishing pad |
| 09/23/2009 | CN101537599A Chemical mechanical polishing method |
| 09/23/2009 | CN100542748C Polishing pad conditioner and methods of manufacture and recycling |
| 09/23/2009 | CN100542747C Polished state monitoring apparatus and polishing apparatus using the same |
| 09/23/2009 | CN100542746C Grinding disk for power driven portable grinding tool |
| 09/22/2009 | US7591713 Polishing pad, method for processing polishing pad, and method for producing substrate using it |
| 09/22/2009 | US7591711 Apparatus and method for polishing semiconductor wafers using one or more polishing surfaces |
| 09/22/2009 | US7591708 Method and apparatus of eddy current monitoring for chemical mechanical polishing |
| 09/22/2009 | US7591061 Method for securing a subpad to a subpad support |
| 09/17/2009 | WO2009114413A1 Non-planar cvd diamond-coated cmp pad conditioner and method for manufacturing |
| 09/17/2009 | WO2009113399A1 Polishing pad |
| 09/17/2009 | US20090233532 Substrate holding apparatus and polishing apparatus |
| 09/17/2009 | US20090233525 Method for Detecting Polishing End in CMP Polishing Device, CMP Polishing Device, and Semiconductor Device Manufacturing Method |
| 09/17/2009 | US20090229189 Method for preparing a polishing slurry having high dispersion stability |
| 09/16/2009 | EP2100666A1 Method for purifying chemical added with chelating agent |
| 09/16/2009 | EP2100325A1 Water-based polishing slurry for polishing silicon carbide single crystal substrate, and polishing method for the same |
| 09/16/2009 | CN101530988A Polishing pad |
| 09/16/2009 | CN101530983A Polishing state monitoring apparatus and polishing apparatus and method |
| 09/16/2009 | CN101530982A Grinding clamp for changing wafer orientation |
| 09/16/2009 | CN100540221C Polishing pad and method of producing the same |
| 09/15/2009 | US7589023 Method of manufacturing semiconductor wafer |
| 09/15/2009 | US7588481 Wafer polishing method and polished wafer |
| 09/11/2009 | WO2009110180A1 Method for manufacturing template and polishing method wherein the template is used |
| 09/10/2009 | US20090227183 Working Surface, And System And Method For Production Thereof |
| 09/10/2009 | US20090226697 Polishing sheet and manufacturing method of elastic plastic foam sheet |
| 09/10/2009 | US20090223136 Polishing compound for semiconductor wafer polishing and polishing method |